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    • 4. 发明授权
    • Displacement measurements using phase changes
    • 使用相位变化进行位移测量
    • US07609858B2
    • 2009-10-27
    • US10931414
    • 2004-08-31
    • Jun GaoCarl E. Picciotto
    • Jun GaoCarl E. Picciotto
    • G06K9/00
    • G01B11/002G06T7/262G06T7/37
    • A measurement process or system transforms image data corresponding to images of an object to the frequency domain and analyzes the frequency domain data to determine a displacement of the object occurring between first and second images. Analysis in the frequency domain simplifies identification and handling of data expected to be noisy. In particular, frequencies corresponding to modes of vibration, lighting variation, or sensor error characteristic of a measurement system or frequencies corresponding to small magnitude frequency-domain data can be given little or no weighting in analysis that provides the displacement measurement. In one embodiment, Fourier transforms of shifted and unshifted images differ by a phase delay. A least square fit slope of the phase values associated with the phase delay can indicate displacements to accuracies less than 1% of a pixel width, thereby providing nanometer scale precision using imaging systems having a pixel width of about 1 μm.
    • 测量过程或系统将对应于对象的图像的图像数据变换到频域,并分析频域数据以确定在第一和第二图像之间发生的对象的位移。 频域分析简化了预计嘈杂的数据的识别和处理。 特别地,对应于测量系统的振动模式,照明变化或传感器误差特性的频率或与小幅度频域数据相对应的频率的频率,在提供位移测量的分析中可以很少或没有加权。 在一个实施例中,移位和未移位图像的傅里叶变换相位延迟。 与相位延迟相关的相位值的最小平方拟合斜率可以指示小于像素宽度的1%的精度位移,从而使用具有约1um的像素宽度的成像系统提供纳米级精度。
    • 6. 发明授权
    • Sensing alignment of multiple layers
    • 感应多层的对齐
    • US07226797B2
    • 2007-06-05
    • US10995837
    • 2004-11-23
    • William M. TongWei WuJun GaoCarl E. Picciotto
    • William M. TongWei WuJun GaoCarl E. Picciotto
    • H01L21/00
    • G06T7/0004
    • Using an imaging system in relation to a plurality of material layers in an initial alignment state is provided, a first of the plurality of material layers at least partially obscuring a second of the plurality of material layers in the initial alignment state. The first material layer is moved from a first position corresponding to the initial alignment state to a second position out of a field of view of the imaging system, and a first image of the second material layer is stored. The first material layer is moved back the first position to restore the initial alignment state. A second image of the first material layer is acquired. The second image and the stored first image are processed to determine the initial alignment state.
    • 提供了在初始对准状态下相对于多个材料层使用成像系统,多个材料层中的第一个在初始对准状态下至少部分地遮蔽多个材料层中的第二个材料层。 第一材料层从对应于初始取向状态的第一位置移动到成像系统的视野外的第二位置,并且存储第二材料层的第一图像。 第一材料层被移回第一位置以恢复初始对准状态。 获取第一材料层的第二图像。 处理第二图像和存储的第一图像以确定初始对准状态。