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41. 发明申请

US20070265797A1 METHOD AND ITS APPARATUS FOR INSPECTING PARTICLES OR DEFECTS OF A SEMICONDUCTOR DEVICE 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US20070265797A1
公开(公告)日：2007-11-15
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G06F15/00
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

42. 发明授权

US07241993B2 Inspection system by charged particle beam and method of manufacturing devices using the system 失效
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US07241993B2
公开(公告)日：2007-07-10
申请号：US09891511
申请日：2001-06-27
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： H01J37/28
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

43. 发明申请

US20070121108A1 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20070121108A1
公开(公告)日：2007-05-31
申请号：US11657455
申请日：2007-01-25
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
摘要翻译：一种用于检测缺陷的装置，包括：第一照明光学单元，其从法向方向或附近照射; 第二照明光学单元，其从第一仰角照亮; 第一检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 第二检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从光电倍增管输出的信号，并调整其灵敏度的平衡。

44. 发明申请

US20070097093A1 PAD TYPE INPUT DEVICE AND SCROLL CONTROLLING METHOD USING THE SAME 有权
标题翻译： PAD型输入装置和使用其的滚动控制方法
公开(公告)号：US20070097093A1
公开(公告)日：2007-05-03
申请号：US11552819
申请日：2006-10-25
申请人： Kazuhito Ohshita , Yoshiyuki Kikuchi , Kenji Watanabe , Shoji Suzuki
发明人： Kazuhito Ohshita , Yoshiyuki Kikuchi , Kenji Watanabe , Shoji Suzuki
IPC分类号： G09G5/00
CPC分类号： G06F3/04883 , G06F3/0485 , G06F3/04886
摘要： A pad type input device is provided. The pad type input device includes an operation surface which includes a scroll area operated by an operation body. A detector is operative to detect a touch position of the operation body placed on the operation surface as positional information on a coordinate plane. A data processor is operative to acquire an operation signal obtained by the detector to perform a predetermined process. The data processor outputs a scroll signal that moves display contents in a predetermined scroll direction when the operation body placed on the scroll area is in a stop state where the operation body does not move, even after a predetermined time elapses.
摘要翻译：提供垫型输入装置。垫型输入装置包括操作面，其包括由操作体操作的滚动区域。检测器用于检测放置在操作表面上的操作体的触摸位置作为坐标平面上的位置信息。数据处理器可操作以获取由检测器获得的操作信号以执行预定处理。数据处理器输出滚动信号，即使在经过预定时间之后，当放置在滚动区域上的操作体处于操作体未移动的停止状态时，也能以预定的滚动方向移动显示内容。

45. 发明授权

US07205540B2 Electron beam apparatus and device manufacturing method using same 失效
标题翻译：电子束装置及其制造方法
公开(公告)号：US07205540B2
公开(公告)日：2007-04-17
申请号：US11262844
申请日：2005-11-01
申请人： Mamoru Nakasuji , Takao Kato , Kenji Watanabe , Shoji Yoshikawa , Tohru Satake , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Kenji Watanabe , Shoji Yoshikawa , Tohru Satake , Nobuharu Noji
IPC分类号： G21K7/00 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： B82Y10/00 , G01N23/225 , G01R31/307 , H01J37/242 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24507 , H01J2237/2817
摘要： An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an E×B separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.
摘要翻译：提供电子束装置，用于以简单的结构以高通量可靠地测量电位对比度等。用于照射形成有电子束图案的晶片的样品（如晶片）以评估样品的电子束装置包括用于容纳电子束源的电子 - 光学柱，物镜，ExB分离器和次级电子束检测器用于保持样品的阶段，并相对于电子 - 光学柱相对移动样品; 用于容纳舞台并能够在真空气氛中控制其内部的工作室; 用于将样品供应到载物台的装载机; 电压施加机构，用于向样品施加电压，并且能够向物镜的下电极施加至少两个电压; 以及用于测量模具布置在样品上的方向的对准机构。当评估样品时，对载物台移动的方向进行校正，使其与模具的排列方向一致。

46. 发明申请

US20070018101A1 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US20070018101A1
公开(公告)日：2007-01-25
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuhara Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G21K7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

47. 发明申请

US20060237646A1 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample 有权
公开(公告)号：US20060237646A1
公开(公告)日：2006-10-26
申请号：US10543151
申请日：2004-01-27
申请人： Kenji Watanabe , Takeshi Murakami , Masahiro Hatakeyama , Yoshinao Hirabayashi , Tohru Satake , Nobuharu Noji , Yuichiro Yamazaki , Ichirota Nagahama
发明人： Kenji Watanabe , Takeshi Murakami , Masahiro Hatakeyama , Yoshinao Hirabayashi , Tohru Satake , Nobuharu Noji , Yuichiro Yamazaki , Ichirota Nagahama
IPC分类号： G21K7/00
CPC分类号： H01J37/32211 , G01N23/225 , H01J37/32357 , H01J2237/2441 , H01J2237/2446
摘要： An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the sample by irradiating the sample with a primary electron beam and forming on a detector an image of reflected electrons emitted from the sample. An electron impact-type detector such as an electron impact-type CCD or an electron impact-type TDI is used as the detector for detecting the reflected electrons. The reflected electrons are selectively detected from an energy difference between the reflected electrons and secondary electrons emitted from the sample. To eliminate charge-up caused on the sample surface by irradiation with the primary electron beam, the surface of the sample is covered with a cover placed above the sample and a gas is supplied to the space above the sample covered with the cover. The gas is brought into contact with the sample surface to reduce charge-up on the sample surface.

48. 发明授权

US07115892B2 Method and its apparatus for inspecting particles or defects of a semiconductor device 有权
公开(公告)号：US07115892B2
公开(公告)日：2006-10-03
申请号：US11302847
申请日：2005-12-13
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ooshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ooshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/4738 , G01N21/8806 , G01N21/93 , G01N21/94 , G01N21/9501 , G01N2015/1486 , G01N2015/1493
摘要： Conventionally, a particle/defect inspection apparatus outputs a total number of detected particles/defects as the result of detection. For taking countermeasures to failures in manufacturing processes, the particles/defects detected by the inspection apparatus are analyzed. Since the inspection apparatus outputs a large number of detected particles/defects, an immense time is required for analyzing the detected particles/defects, resulting in a delay in taking countermeasures to a failure in the manufacturing processes. In the present invention, an apparatus for optically inspecting particles or defects relates a particle or defect size to a cause of failure in an inspection result. A data processing circuit points out a cause of failure from the statistics on the inspection result, and displays information on the inspection result. A failure analysis is conducted by setting a threshold for identifying a failure in each of regions on a semiconductor device or the like to statistically evaluate detected particles.

49. 发明申请

US20060118719A1 Electron beam inspection system and inspection method and method of manufacturing devices using the system 有权
公开(公告)号：US20060118719A1
公开(公告)日：2006-06-08
申请号：US11290688
申请日：2005-12-01
申请人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
发明人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

50. 发明授权

US06971550B2 Spouting structure for liquid container and bag-in-box container 有权
标题翻译：液体容器和袋装箱容器的喷射结构
公开(公告)号：US06971550B2
公开(公告)日：2005-12-06
申请号：US10925010
申请日：2004-08-25
申请人： Raizo Kuge , Kenji Watanabe
发明人： Raizo Kuge , Kenji Watanabe
IPC分类号： B65D77/06 , B65D47/24 , B65D75/58 , B65D35/46
CPC分类号： B65D75/5877 , B65D47/247
摘要： A spouting structure includes a spout attached to the liquid container and having a mouthpiece, a cap screwed on the spout and having a top wall and a cylindrical protrusion protruding from a central part of the top wall having a bottom wall provided with an opening and defining a cylindrical bore, and a round plate axially movably fitted in the cylindrical bore of the cylindrical protrusion. The cylindrical protrusion protrudes downward from the top wall and is fitted in the mouthpiece of the spout. The round plate is provided with at least one opening in its peripheral part, has a plugging part formed in a central area of the lower surface thereof and capable of being plugged closely in the opening formed in the bottom wall of the cylindrical protrusion of the cap.
摘要翻译：喷射结构包括附接到液体容器并具有接口管的喷嘴，螺纹连接在喷口上的盖，并且具有顶壁和从顶壁的中心部分突出的圆柱形突出部，该底壁具有设置有开口并限定圆柱形孔和可轴向移动地装配在圆柱形突起的圆柱形孔中的圆形板。圆柱形突起从顶壁向下突出并且装配在喷嘴的接口中。圆板在其周边部分设置有至少一个开口，具有形成在其下表面的中心区域中并且能够紧密地堵塞在形成在盖的圆柱形突起的底壁中的开口中的堵塞部分。

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