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1. 发明授权

US07350404B2 Scanning type probe microscope and probe moving control method therefor 失效
标题翻译：扫描型探针显微镜及探头移动控制方法
公开(公告)号：US07350404B2
公开(公告)日：2008-04-01
申请号：US10569373
申请日：2004-08-27
申请人： Tooru Kurenuma , Hiroaki Yanagimoto , Hiroshi Kuroda , Yasushi Minomoto , Shigeru Miwa , Ken Murayama , Yukio Kenbou , Yuuichi Kunitomo , Takenori Hiroki , Yoshiyuki Nagano , Takafumi Morimoto
发明人： Tooru Kurenuma , Hiroaki Yanagimoto , Hiroshi Kuroda , Yasushi Minomoto , Shigeru Miwa , Ken Murayama , Yukio Kenbou , Yuuichi Kunitomo , Takenori Hiroki , Yoshiyuki Nagano , Takafumi Morimoto
IPC分类号： G21K7/00 , G01B5/18
CPC分类号： G01Q10/06 , G01Q30/06 , Y10T29/49828
摘要： The probe tip movement control method of the scanning probe microscope is used for a scanning probe microscope provided with a cantilever 21 having a probe tip 20 facing a sample 12. The atomic force occurring between the probe tip and sample is measured when the probe tip scans the surface of the sample. X-, Y-, and Z-fine movement mechanisms 23, 29, and 30 are used to relatively change the positions of the probe tip and sample. It is possible to maintain a high measurement accuracy and enable scan movement of a probe tip on a sample surface by simple control when measuring a part having a gradient in measurement of an uneven shape on a sample surface.
摘要翻译：扫描探针显微镜的探针头移动控制方法用于具有面向样品12的探针尖端20的悬臂21的扫描探针显微镜。当探针尖端扫描样品的表面时，测量探针尖端和样品之间发生的原子力。 X，Y和Z精细运动机构23,29和30用于相对改变探针尖端和样品的位置。通过简单的控制，可以在测量样品表面上具有不均匀形状的测量梯度的部分时，保持高测量精度并且能够使探针尖端在样品表面上进行扫描运动。

2. 发明申请

US20050185172A1 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20050185172A1
公开(公告)日：2005-08-25
申请号：US11104621
申请日：2005-04-13
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01B11/30 , G01B11/24 , G01B11/245 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/66 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.
摘要翻译：表面检查装置和检查样品表面的方法能够在工作目标（例如，工件的表面上的绝缘膜）上区别地检查在工作目标表面上发生的各种构造和附着异物的划痕半导体衬底）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。在本发明中，通过使用大致相同的光通量，在样品的抛光或地面上发生的划痕和异物被表面照射和倾斜照射，来自浅划痕的散射光强度与来自应用异物，从而区分浅刮痕和异物，并且检测散射光的方向性以区分线状划痕和异物。

3. 发明申请

US20120069329A1 SURFACE INSPECTION APPARATUS AND METHOD THEREOF 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20120069329A1
公开(公告)日：2012-03-22
申请号：US13114160
申请日：2011-05-24
申请人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
摘要翻译：一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。

4. 发明授权

US07952085B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US07952085B2
公开(公告)日：2011-05-31
申请号：US12196647
申请日：2008-08-22
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process.
摘要翻译：本发明提供了一种表面检查装置和用于检查样品表面的方法，所述表面检查装置和检查方法能够区分各种构型的刮擦和在作业目标（例如，工件）上发生在工作目标表面上的被粘附的异物之间的差异，半导体衬底上的绝缘膜）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。

5. 发明授权

US07242016B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US07242016B2
公开(公告)日：2007-07-10
申请号：US11104621
申请日：2005-04-13
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.
摘要翻译：表面检查装置和检查样品表面的方法能够在工作目标（例如，工件的表面上的绝缘膜）上区别地检查在工作目标表面上发生的各种构造和附着异物的划痕半导体衬底）在半导体制造工艺或磁头制造工艺中进行诸如CMP或研磨工艺的抛光工艺。在本发明中，通过使用大致相同的光通量，在样品的抛光或地面上发生的划痕和异物被表面照射和倾斜照射，来自浅划痕的散射光强度与来自应用异物，从而区分浅刮痕和异物，并且检测散射光的方向性以区分线状划痕和异物。

6. 发明申请

US20090103078A1 SURFACE INSPECTION APPARATUS AND METHOD THEREOF 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US20090103078A1
公开(公告)日：2009-04-23
申请号：US12196647
申请日：2008-08-22
申请人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro ISHIMARU , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/00 , G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： An apparatus for detecting defects, including: a table unit which mounts a specimen to be inspected having a linearly moving stage and a rotationally moving stage; a first illumination optical unit which illuminates an inspection region of a surface of the specimen from a normal direction or in the vicinity of the normal direction while the specimen is rotating by the rotationally moving stage and moving in one direction by the linearly moving stage; a second illumination optical unit which illuminates the inspection region from a first elevation angle toward the inspection region while the specimen is rotating and moving; a first detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a second elevation angle toward the inspection region; a second detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a third elevation angle toward the inspection region; and a signal processor which processes signals outputted from the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit, wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals which are selected from the signals outputted from the plural detectors arranged in plural portions of the second elevation angle and the plural detectors arranged in plural portions of the third elevation angle.
摘要翻译：一种用于检测缺陷的装置，包括：安装具有线性移动台和旋转移动台的待检查样本的台单元; 第一照明光学单元，其在通过旋转移动台旋转并通过线性移动台在一个方向上移动时，从正常方向或法线附近照射样本的表面的检查区域; 第二照明光学单元，其在所述检体旋转移动的同时，将所述检查区域从所述检查区域向第一仰角照射; 第一检测光学单元，其通过第一照明光学单元或第二照明光学单元的照明来检测从检查区域反射的光，多个检测器以检查区域的第二仰角的多个部分布置; 第二检测光学单元，其通过第一照明光学单元或第二照明光学单元的照射来检测从检查区域反射的光，多个检测器布置成朝向检查区域的第三仰角的多个部分; 以及处理从第一检测光学单元的多个检测器和第二检测光学单元的多个检测器输出的信号的信号处理器，其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从布置在第二仰角的多个部分的多个检测器输出的信号中选择的信号和布置在第三仰角的多个部分中的多个检测器。

7. 发明授权

US07417244B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US07417244B2
公开(公告)日：2008-08-26
申请号：US11657455
申请日：2007-01-25
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
摘要翻译：一种用于检测缺陷的装置，包括：第一照明光学单元，其从法向方向或附近照射; 第二照明光学单元，其从第一仰角照亮; 第一检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 第二检测光学单元，其利用多个检测器检测由第一照明光学单元或第二照明光学单元的照明反射的光; 其中第一检测光学单元的多个检测器和第二检测光学单元的多个检测器是光电倍增管，并且信号处理器处理从光电倍增管输出的信号，并调整其灵敏度的平衡。

8. 发明申请

US20050012936A1 Scanning probe microscope and measurement method using the same 失效
标题翻译：扫描探针显微镜和测量方法使用相同
公开(公告)号：US20050012936A1
公开(公告)日：2005-01-20
申请号：US10893364
申请日：2004-07-19
申请人： Ken Murayama , Yukio Kenbou , Yuuichi Kunitomo , Takenori Hiroki , Yoshiyuki Nagano , Takafumi Morimoto , Tooru Kurenuma , Hiroaki Yanagimoto , Hiroshi Kuroda , Shigeru Miwa
发明人： Ken Murayama , Yukio Kenbou , Yuuichi Kunitomo , Takenori Hiroki , Yoshiyuki Nagano , Takafumi Morimoto , Tooru Kurenuma , Hiroaki Yanagimoto , Hiroshi Kuroda , Shigeru Miwa
IPC分类号： G01B21/30 , G01B11/24 , G01B11/30 , G01Q10/04 , G01Q20/02 , G01Q30/02 , G01Q30/04 , G01Q30/20 , G01Q60/24 , H01L21/66
CPC分类号： G01Q20/02 , G01Q30/06 , G01Q70/04
摘要： A scanning probe microscope has a cantilever with a probe facing a sample and a measurement section for measuring a physical quantity occurring between the probe and the sample when the probe scans a surface of the sample, holding the physical quantity constant to measure the surface of the sample. The above microscope further has a probe tilt mechanism, an optical microscope etc. for detecting a position of the probe when the probe is tilted, and a control section for setting the probe in a first tilt posture and second tilt posture, measuring a surface of the sample by the measurement section at each tilt posture, detecting the position of the probe at least at the second tilt posture by the optical microscope etc., and making a measurement location at the second tilt posture match with a measurement location at the first tilt posture for measurement.
摘要翻译：扫描探针显微镜具有悬臂，探针面向样品和测量部分，用于测量探头和样品之间发生的物理量，当探针扫描样品的表面时，保持物理量常数以测量样品的表面样品。上述显微镜还具有探针倾斜机构，光学显微镜等，用于在探头倾斜时检测探头的位置;以及控制部，用于将探针设置在第一倾斜姿势和第二倾斜姿势中，通过测量部分在每个倾斜姿势下的样本，至少通过光学显微镜等检测第二倾斜姿势的探测器的位置，并且使第二倾斜姿势的测量位置与第一倾斜处的测量位置匹配测量姿势。

9. 发明授权

US08729514B2 Surface inspection apparatus and method thereof 有权
标题翻译：表面检查装置及其方法
公开(公告)号：US08729514B2
公开(公告)日：2014-05-20
申请号：US13114160
申请日：2011-05-24
申请人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
发明人： Ichiro Ishimaru , Minori Noguchi , Ichiro Moriyama , Yoshikazu Tanabe , Yasuo Yatsugake , Yukio Kenbou , Kenji Watanabe , Hirofumi Tsuchiyama
IPC分类号： G01N21/88
CPC分类号： G01N21/88 , G01N21/474 , G01N21/94 , G01N21/9501 , G01N21/9503 , G01N2021/8825 , G01N2021/8854
摘要： A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
摘要翻译：一种缺陷检查装置，包括：第一照明光学系统，被配置为从相对于所述样品表面的法线方向或近似的方向照射样品表面上的检查区域; 第二照明光学系统，被配置为相对于所述样品表面从倾斜方向照射所述检查区域; 检测光学系统，具有分别相对于所述第二照明光学系统的照明方向位于所述检查区域的所述检查区域的前方和后方的多个第一检测器，并且其中所述规则反射光从所述样品表面通过所述第二照明光学系统的照明光分量不会收敛; 以及信号处理系统，其被配置为基于从所述多个第一检测器获得的信号来检查缺陷。

10. 发明申请

US20080236259A1 Method of Control of Probe Scan and Apparatus for Controlling Probe Scan of Scanning Probe Microscope 审中-公开
标题翻译：探针扫描控制方法及扫描探针显微镜探头扫描控制装置
公开(公告)号：US20080236259A1
公开(公告)日：2008-10-02
申请号：US11660271
申请日：2005-08-18
申请人： Tooru Kurenuma , Yukio Kenbou , Hiroaki Yanagimoto , Hiroshi Kuroda , Takafumi Morimoto
发明人： Tooru Kurenuma , Yukio Kenbou , Hiroaki Yanagimoto , Hiroshi Kuroda , Takafumi Morimoto
IPC分类号： G01B5/28
CPC分类号： G01Q10/065
摘要： A scanning probe microscope provided with a cantilever 21 having a probe 20 facing a sample 12, a measurement unit 24 measuring a physical quantity occurring between the probe and sample, and movement mechanisms 11, 29 changing a positional relationship between the probe and sample to cause a scanning operation and making the probe scan the surface of the sample by the movement mechanism and measure the surface of the sample by the measurement unit. This method is provided with a step of feeding the probe in a direction along the surface of the sample at a position separate from the surface at certain distances, a step of making the probe approach the sample at each of a plurality of measurement points determined at certain distances and perform measurement to obtain measurement values, then retract, and a step setting a measurement point at a position between a certain measurement point and next measurement point for measurement when a difference between a measurement value at the certain measurement point and a measurement value at the next measurement point is larger than a reference value.
摘要翻译：具有悬臂21的扫描探针显微镜，其具有面向样品12的探针20，测量在探针和样品之间发生的物理量的测量单元24和改变探针与样品之间的位置关系的移动机构11,29，扫描操作并使探针通过移动机构扫描样品的表面，并通过测量单元测量样品的表面。该方法具有以下步骤：沿着与样品表面在一定距离处分开的位置沿着样品表面的方向进给探针，使得探针在多个测量点中的每一个测量点处接近样品的步骤一定距离并进行测量以获得测量值，然后缩回，并且当在某个测量点处的测量值与测量值之间的差异时，将某个测量点和下一测量点之间的位置处的测量点设置为测量点在下一个测量点大于参考值。

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