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    • 41. 发明授权
    • Battery cover assembly for portable electronic device
    • 便携式电子设备的电池盖组件
    • US08206845B2
    • 2012-06-26
    • US12391353
    • 2009-02-24
    • Jun LuBin Zhao
    • Jun LuBin Zhao
    • H01M5/10
    • H01M2/1022E05B65/006E05C3/04H01M2/1066
    • A battery cover assembly for a portable electronic device, the battery cover assembly includes a housing, a removable battery cover and a locking mechanism. The housing defines an opening and a receiving hole communicating each other. The removable battery cover includes a protrusion. The locking mechanism includes a latching member and an operating member. The latching member engages in the opening of the housing, the latching member forming a post engaging with the protrusion of the cover. The operating member engages in the receiving hole of the housing, and the operating member rotatably brings the latching member to releasably lock the post with the protrusion of the cover.
    • 一种用于便携式电子设备的电池盖组件,电池盖组件包括壳体,可拆卸电池盖和锁定机构。 壳体限定了彼此相通的开口和接收孔。 可拆卸的电池盖包括突起。 锁定机构包括闩锁构件和操作构件。 闩锁构件接合在壳体的开口中,闩锁构件形成与盖的突起接合的柱。 操作构件接合壳体的接收孔,并且操作构件可旋转地使闩锁构件可释放地锁定柱与盖的突起。
    • 42. 发明授权
    • Image spam filtering based on senders' intention analysis
    • 基于发件人意图分析的图像垃圾邮件过滤
    • US08180837B2
    • 2012-05-15
    • US12114815
    • 2008-05-04
    • Jun LuJiandong Cheng
    • Jun LuJiandong Cheng
    • G06F15/16G06K9/00
    • G06Q10/107G06K9/00456
    • Systems and methods for an anti-spam detection module that can detect image spam are provided. According to one embodiment, an image spam detection process involves determining and measuring various characteristics of images that may be embedded within or otherwise associated with an electronic mail (email) message. An approximate display location of the embedded images is determined. The existence of one or more abnormal factors associated with the embedded images is identified. A quantity of text included in the one or more embedded images is determined and measured by analyzing one or more blocks of binarized representations of the one or more embedded images. Finally, the likelihood that the email message is spam is determined based on one or more of the approximate display location, the existence of one or more abnormal factors and the quantity and location of text measured.
    • 提供了可以检测图像垃圾邮件的反垃圾邮件检测模块的系统和方法。 根据一个实施例,图像垃圾邮件检测过程涉及确定和测量可以嵌入在电子邮件(电子邮件)消息内或以其他方式与电子邮件(电子邮件))消息相关联的图像的各种特征。 确定嵌入图像的近似显示位置。 识别与嵌入图像相关联的一个或多个异常因素的存在。 通过分析一个或多个嵌入图像的二值化表示的一个或多个块来确定和测量包含在一个或多个嵌入图像中的文本量。 最后,基于一个或多个近似显示位置,一个或多个异常因素的存在以及测量的文本的数量和位置来确定电子邮件是垃圾邮件的可能性。
    • 44. 发明授权
    • System and method for controlling deflection of a charged particle beam within a graded electrostatic lens
    • 用于控制渐变静电透镜内的带电粒子束的偏转的系统和方法
    • US08129695B2
    • 2012-03-06
    • US12647950
    • 2009-12-28
    • Peter L. KellermanFrank SinclairVictor BenvenisteJun Lu
    • Peter L. KellermanFrank SinclairVictor BenvenisteJun Lu
    • G21K1/06
    • H01J37/3171H01J37/1477H01J2237/053H01J2237/12H01J2237/24514
    • A method and apparatus for controlling deflection, deceleration, and focus of an ion beam are disclosed. The apparatus may include a graded deflection/deceleration lens including a plurality of upper and lower electrodes disposed on opposite sides of an ion beam, as well as a control system for adjusting the voltages applied to the electrodes. The difference in potential between pairs of upper and lower electrodes are varied using a set of “virtual knobs” that are operable to independently control deflection and deceleration of the ion beam. The virtual knobs include control of beam focus and residual energy contamination, control of upstream electron suppression, control of beam deflection, and fine tuning of the final deflection angle of the beam while constraining the beam's position at the exit of the lens. In one embodiment, this is done by fine tuning beam deflection while constraining the beam position at the exit of the VEEF. In another embodiment, this is done by fine tuning beam deflection while measuring the beam position and angle at the wafer plane. In a further embodiment, this is done by tuning a deflection factor to achieve a centered beam at the wafer plane.
    • 公开了一种用于控制离子束的偏转,减速和聚焦的方法和装置。 该装置可以包括梯度偏转/减速透镜,其包括设置在离子束的相对侧上的多个上下电极,以及用于调节施加到电极的电压的控制系统。 使用一组“虚拟旋钮”来改变上下电极对之间的电位差,可以独立地控制离子束的偏转和减速。 虚拟旋钮包括对束聚焦和剩余能量污染的控制,上游电子抑制的控制,光束偏转的控制以及光束的最终偏转角的微调,同时约束光束在透镜出射处的位置。 在一个实施例中,这是通过微调光束偏转来实现的,同时约束在VEEF的出口处的光束位置。 在另一个实施例中,这是通过在测量晶片平面处的光束位置和角度时微调光束偏转来完成的。 在另一个实施例中,这通过调整偏转因子来实现在晶圆平面处的中心束。
    • 49. 发明申请
    • SYSTEM AND METHOD FOR CONTROLLING DEFLECTION OF A CHARGED PARTICLE BEAM WITHIN A GRADED ELECTROSTATIC LENS
    • 控制抛光静电镜中带电粒子束的偏移的系统和方法
    • US20110155921A1
    • 2011-06-30
    • US12647950
    • 2009-12-28
    • Peter L. KellermanFrank SinclairVictor BenvenisteJun Lu
    • Peter L. KellermanFrank SinclairVictor BenvenisteJun Lu
    • G21K1/06H01J3/14
    • H01J37/3171H01J37/1477H01J2237/053H01J2237/12H01J2237/24514
    • A method and apparatus for controlling deflection, deceleration, and focus of an ion beam are disclosed. The apparatus may include a graded deflection/deceleration lens including a plurality of upper and lower electrodes disposed on opposite sides of an ion beam, as well as a control system for adjusting the voltages applied to the electrodes. The difference in potential between pairs of upper and lower electrodes are varied using a set of “virtual knobs” that are operable to independently control deflection and deceleration of the ion beam. The virtual knobs include control of beam focus and residual energy contamination, control of upstream electron suppression, control of beam deflection, and fine tuning of the final deflection angle of the beam while constraining the beam's position at the exit of the lens. In one embodiment, this is done by fine tuning beam deflection while constraining the beam position at the exit of the VEEF. In another embodiment, this is done by fine tuning beam deflection while measuring the beam position and angle at the wafer plane. In a further embodiment, this is done by tuning a deflection factor to achieve a centered beam at the wafer plane.
    • 公开了一种用于控制离子束的偏转,减速和聚焦的方法和装置。 该装置可以包括梯度偏转/减速透镜,其包括设置在离子束的相对侧上的多个上下电极,以及用于调节施加到电极的电压的控制系统。 使用一组“虚拟旋钮”来改变上下电极对之间的电位差,可以独立地控制离子束的偏转和减速。 虚拟旋钮包括对束聚焦和剩余能量污染的控制,上游电子抑制的控制,光束偏转的控制以及光束的最终偏转角的微调,同时约束光束在透镜出射处的位置。 在一个实施例中,这是通过微调光束偏转来实现的,同时约束在VEEF的出口处的光束位置。 在另一个实施例中,这是通过在测量晶片平面处的光束位置和角度时微调光束偏转来完成的。 在另一个实施例中,这通过调整偏转因子来实现在晶圆平面处的中心束。