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    • 42. 发明授权
    • Method and means of producing cured coating films
    • 生产固化涂膜的方法和方法
    • US06736898B2
    • 2004-05-18
    • US09977163
    • 2001-10-15
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • B05B1700
    • B05D3/061
    • The present invention relates to a method of producing at least one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.
    • 本发明涉及在基材表面的至少一个区域上生产至少一种涂膜的方法,该方法至少包括以下顺序的至少一个步骤:a)在至少一种反应性涂料中引发至少一种交联反应 制剂; b)在所述至少一个交联反应开始之前在所述基材表面的所述至少一个区域上施用所述至少一种反应性涂料制剂。本发明还涉及相应的方法, 至少一个基材表面的区域,至少具有以下元素:a)至少一个用于至少一种反应性涂料配方的储存容器,b)至少一个曝光单元,优选UV曝光单元,更优选UV激光 ,和c)至少一个具有喷嘴,特别是喷头的应用单元和/和用于静电施加的钟(ESTA钟)),其中所述至少一个曝光单元 t被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个施加单元中的所述至少一个反应性涂料配方接触。最后还要求一种涂膜,其可以由 本发明的方法。
    • 44. 发明授权
    • Method of producing cured coating films
    • 生产固化涂膜的方法
    • US06344244B1
    • 2002-02-05
    • US09433547
    • 1999-11-04
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • C08F248
    • B05D3/061
    • The present invention relates to a method of producing at cast one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.
    • 本发明涉及一种在基材表面的至少一个区域上生产浇铸的一个涂膜的方法,该方法至少包括以下顺序的以下步骤:a)在至少一种反应性涂料中引发至少一种交联反应 制剂; b)在所述至少一个交联反应开始之前,在所述基材表面的所述至少一个区域上施用所述至少一种反应性涂料制剂。 本发明还涉及在衬底表面的至少一个区域上产生至少一个涂膜的相应方法,其至少具有以下元素:a)至少一个用于至少一种反应性涂料配方的储存容器,b) 至少一个曝光单元,优选UV曝光单元,更优选UV激光,以及c)至少一个具有喷嘴,特别是喷头的应用单元和/或用于静电应用的钟(ESTA钟)),其中 所述至少一个曝光单元被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个应用单元中的所述至少一个反应性涂料配方接触。 最后还要求的是可以通过本发明的方法生产的涂膜。
    • 46. 发明授权
    • Sulfonium salts and use thereof
    • 锍盐及其用途
    • US5220037A
    • 1993-06-15
    • US825752
    • 1992-01-27
    • Reinhold SchwalmAndreas Boettcher
    • Reinhold SchwalmAndreas Boettcher
    • C07C381/12G03F7/029
    • C07C381/12G03F7/029
    • Novel sulfonium salts useful as photoinitiators for cationic polymerization and for producing relief patterns and relief images have the general formula (I) ##STR1## where A.sup..crclbar. is a non-nucleophilic counterion,x is 1, 2 or 3,R is a hydrocarbon radicalR' is arylene or substituted arylene, andR" is ##STR2## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or monohalogenated or polyhalogenated alkyl orR.sup.1 and R.sup.2 are each hydrogen or alkyl, and R.sup.3 is phenyl, alkenyl or cycloalkenyl, orR.sup.1 is hydrogen, and R.sup.2 and R.sup.3 form ethylenically unsaturated ring, orR.sup.1 and R.sup.2 are each hydrogen, alkyl, cycloalkyl or aryl, and R.sup.3 is alkoxy orR.sup.1 is hydrogen or alkyl and R.sup.2 and R.sup.3 are each alkoxy, aryloxy or substituted aryloxy.
    • 用作阳离子聚合和产生浮雕图案和浮雕图像的光引发剂的新型锍​​盐具有通式(I)其中A( - )是非亲核抗衡离子,x为1,2或3, R是烃基,R'是亚芳基或取代的亚芳基,R“是其中R 1,R 2和R 3各自是烷基或单卤代或多卤代烷基或R 1和R 2各自是氢或烷基,R 3是苯基, 烯基或环烯基,或R 1为氢,R 2和R 3为烯键式不饱和环,或者R 1和R 2各自为氢,烷基,环烷基或芳基,R 3为烷氧基或R 1为氢或烷基,R 2和R 3为烷氧基, 芳氧基或取代的芳氧基。