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41. 发明授权

US07433056B1 Scatterometry metrology using inelastic scattering 有权
标题翻译：散射测量使用非弹性散射
公开(公告)号：US07433056B1
公开(公告)日：2008-10-07
申请号：US11182171
申请日：2005-07-15
申请人： Gary R. Janik
发明人： Gary R. Janik
IPC分类号： G01B11/24 , G01B11/30 , G01B11/14 , G01J3/44 , G01J3/42 , G01J3/427 , G01J3/28
CPC分类号： G01B11/0616 , G01N21/65 , G01N2021/653
摘要： A system for characterizing material properties in miniature semiconductor structures performs a scatterometry analysis on inelastically scattered light. The system can include a narrowband probe beam generator and a detector. A single wavelength probe beam from the narrowband probe beam generator produces scattered light from a measurement pattern on a test sample. The scattered light is measured by the detector, and the measurement data (e.g., Raman spectrum) is used in a scatterometry analysis to determine material properties for the measurement pattern. The detector can measure either incoherent inelastically scattered light (e.g., using a spectrometer) or coherent inelastically scattered light (e.g., using an array detector). If the measurement pattern dimensions are substantially similar to actual device dimensions, the material property distributions determined for the measurement pattern can be applied to the actual devices on the test sample.
摘要翻译：用于表征微型半导体结构中的材料性质的系统对非弹性散射光进行散射分析。该系统可以包括窄带探测光束发生器和检测器。来自窄带探测光束发生器的单个波长探测光束从测试样品上的测量图形产生散射光。通过检测器测量散射光，并且在散射分析中使用测量数据（例如，拉曼光谱）来确定测量图案的材料特性。检测器可以测量非相干非弹性散射光（例如，使用光谱仪）或相干非弹性散射光（例如，使用阵列检测器）。如果测量图形尺寸基本上类似于实际的装置尺寸，则可以将测量图案确定的材料特性分布应用于测试样品上的实际装置。

42. 发明申请

US20080229811A1 STABILIZING A SUBSTRATE USING A VACUUM PRELOAD AIR BEARING CHUCK 有权
标题翻译：使用真空预紧空气轴承座稳定基板
公开(公告)号：US20080229811A1
公开(公告)日：2008-09-25
申请号：US11688720
申请日：2007-03-20
申请人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Alexander Belyaev , Christian H. Wolters , Paul Andrew Doyle , Howard W. Dando , Mehdi Vaez-Iravani
IPC分类号： G01N21/00
CPC分类号： B25B11/005 , F16C29/025 , F16C32/0603 , H01L21/67784 , H01L21/6838
摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.
摘要翻译：公开了基板处理方法和装置。基板处理装置包括具有真空预载的非接触式空气轴承卡盘。

43. 发明授权

US07423269B1 Automated feature analysis with off-axis tilting 有权
标题翻译：带离轴倾斜的自动特征分析
公开(公告)号：US07423269B1
公开(公告)日：2008-09-09
申请号：US11360325
申请日：2006-02-22
申请人： Amir Azordegan , Hedong Yang , Gongyuan Qu , Gian Francesco Lorusso
发明人： Amir Azordegan , Hedong Yang , Gongyuan Qu , Gian Francesco Lorusso
IPC分类号： G21K7/00 , G21N23/00
CPC分类号： H01J37/222 , G03F7/70625 , H01J37/1478 , H01J37/28 , H01J2237/24578 , H01J2237/2809 , H01J2237/2817
摘要： One embodiment relates to a method of automated microalignment using off-axis beam tilting. Image data is collected from a region of interest on a substrate at multiple beam tilts. Potential edges of a feature to be identified in the region are determined, and computational analysis of edge-related data is performed to positively identify the feature(s). Another embodiment relates to a method of automated detection of undercut on a feature using off-axis beam tilting. For each beam tilt, a determination is made of difference data between the edge measurement of one side and the edge measurement of the other side. An undercut on the feature is detected from the difference data. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及使用离轴光束倾斜的自动微距对准方法。在多个光束倾斜的基底上从感兴趣的区域收集图像数据。确定要在该区域中识别的特征的潜在边缘，并且执行边缘相关数据的计算分析以肯定地识别特征。另一实施例涉及使用离轴光束倾斜在特征上自动检测底切的方法。对于每个光束倾斜，确定一侧的边缘测量与另一侧的边缘测量之间的差数据。根据差异数据检测该特征的底切。还公开了其他实施例。

44. 发明授权

US07423264B2 Atomic force microscope 失效
标题翻译：原子力显微镜
公开(公告)号：US07423264B2
公开(公告)日：2008-09-09
申请号：US11518320
申请日：2006-09-08
申请人： Christopher F. Bevis , Marco Tortonese
发明人： Christopher F. Bevis , Marco Tortonese
IPC分类号： G01B11/02 , G01B11/04 , H01J37/252
CPC分类号： G01Q60/38 , G01Q70/02
摘要： In one embodiment, an atomic force microscope comprises a frame, a beam coupled to the frame at a first end and a second end, a probe mounted to the beam, means for inducing relative motion between the beam and an underlying surface, and means for detecting a characteristic of the beam.
摘要翻译：在一个实施例中，原子力显微镜包括框架，在第一端耦合到框架的梁和第二端，安装到梁的探针，用于引导梁和下面的表面之间的相对运动的装置，以及用于检测光束的特性。

45. 发明授权

US07420681B1 Gas purge system and methods 有权
标题翻译：气体净化系统和方法
公开(公告)号：US07420681B1
公开(公告)日：2008-09-02
申请号：US11457524
申请日：2006-07-14
申请人： Ning-Yi Wang , Ching-Ling Meng , Anthony Tang
发明人： Ning-Yi Wang , Ching-Ling Meng , Anthony Tang
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/211 , G01J3/02 , G01J3/0205 , G01J3/0286 , G01J3/447 , G01J4/00 , G01N21/15 , G01N21/8422 , G01N2021/151 , G01N2021/213
摘要： Gas purge systems and methods and a spectroscopic ellipsometer are disclosed. A purge gas system may include an input beam optics housing, a collection optics housing and a gas purge manifold. The input beam optics housing may include a first gas flow path between a first gas inlet and an aperture in a first nose cone proximate a measurement position. The collection optics housing may include a second gas flow path between a second gas inlet and an aperture in a second nose cone proximate the measurement position. The gas purge manifold may be disposed between the input beam optics housing and the collection optics housing. The gas purge manifold has a third gas flow path between a third gas inlet and an aperture in the gas manifold proximate the measurement position. The ellipsometer may include input beam optics in the input beam optics housing and collection optics in the collection optics housing. First, second, and third flows of purge gas may be supplied through the input beam optics housing, collection optics housing and gas purge manifold respectively. The purge gas is delivered directly to a measurement position of a surface of a substrate through the gas purge manifold, the first nosecone and the second nose cone.
摘要翻译：公开了气体吹扫系统和方法以及分光椭偏仪。吹扫气体系统可以包括输入光束光学器件壳体，收集光学器件壳体和气体吹扫歧管。输入光束光学器件壳体可以包括在第一气体入口和靠近测量位置的第一鼻锥中的孔之间的第一气体流动路径。收集光学器件壳体可以包括在第二气体入口和靠近测量位置的第二鼻锥中的孔之间的第二气体流动路径。气体吹扫歧管可以设置在输入光束光学器件壳体和收集光学器件壳体之间。气体吹扫歧管在靠近测量位置的第三气体入口和气体歧管中的孔之间具有第三气体流动路径。椭偏仪可以包括输入光束光学器件中的输入光束，并且在收集光学器件壳体中收集光学元件。吹扫气体的第一，第二和第三流动可以分别通过输入光束光学器件壳体，收集光学器件壳体和气体吹扫歧管提供。净化气体通过气体净化歧管，第一鼻锥和第二鼻锥直接输送到衬底的表面的测量位置。

46. 发明授权

US07408642B1 Registration target design for managing both reticle grid error and wafer overlay 有权
标题翻译：用于管理两个标线网格错误和晶圆覆盖的注册目标设计
公开(公告)号：US07408642B1
公开(公告)日：2008-08-05
申请号：US11356878
申请日：2006-02-17
申请人： Tony DiBiase
发明人： Tony DiBiase
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G03F9/7076
摘要： A combined overlay target and methods for its use are disclosed. The combined overlay target includes a grating-type overlay target and an image placement error target having substantially perpendicular features with spaced apart edges. The grating-type target and the image placement error target have a common centroid and are sufficiently separated that the grating-type overlay target does not interfere with measurement of image placement error.
摘要翻译：公开了组合覆盖目标及其使用方法。组合的覆盖目标包括光栅型覆盖目标和具有基本垂直的具有间隔开的边缘的特征的图像放置误差目标。光栅型目标和图像放置误差目标具有共同的质心并被充分分离，使得光栅型覆盖目标不影响图像放置误差的测量。

47. 发明申请

US20080094630A1 APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY 有权
标题翻译：用于使用散射检测来检测重叠错误的装置和方法
公开(公告)号：US20080094630A1
公开(公告)日：2008-04-24
申请号：US11963730
申请日：2007-12-21
申请人： Walter Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher Bevis , John Fielden , Noah Bareket , Kenneth Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus Dziura , Mark Ghinovker
发明人： Walter Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher Bevis , John Fielden , Noah Bareket , Kenneth Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus Dziura , Mark Ghinovker
IPC分类号： G01B11/00 , G01N21/55 , G01B9/02
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.
摘要翻译：公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。在一个实施例中，公开了一种用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的方法。提供了各自包括第一和第二结构的一部分的目标A，B，C和D。目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。目标A，B，C和D用电磁辐射照射，以获得光谱S A，B，C，S和S，分别来自目标A，B，C和D的SUB> D

48. 发明授权

US07362686B1 Film measurement using reflectance computation 有权
标题翻译：使用反射计算的电影测量
公开(公告)号：US07362686B1
公开(公告)日：2008-04-22
申请号：US11000771
申请日：2004-12-01
申请人： Paul Aoyagi , Philip D. Flanner, III , Leonid Poslavsky
发明人： Paul Aoyagi , Philip D. Flanner, III , Leonid Poslavsky
IPC分类号： G11B7/00 , B32B9/00
CPC分类号： G01B11/06
摘要： A method of determining actual properties of layered media. An incident beam of light is directed towards the layered media, such that the incident beam of light is reflected from the layered media as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the layered media are estimated. A mathematical model of the layered media is solved with the estimated properties of the layered media to yield theoretical properties of the reflected beam of light. The mathematical model is solved using a diagonal T matrix algorithm. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the layered media are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance. The estimated properties of the layered media are reported as the actual properties of the layered media.
摘要翻译：确定分层介质实际属性的方法。入射光束被引向分层介质，使得入射光束作为反射光束从分层介质反射。测量反射光束的实际特性，估算分层介质的性质。分层介质的数学模型通过分层介质的估计性质来解决，以产生反射光束的理论特性。使用对角T矩阵算法求解数学模型。将反射光束的理论性质与反射光束的实际特性进行比较，以产生成本函数。迭代地调整分层介质的估计性质，并且迭代地求解数学模型，直到成本函数在期望的公差内。分层介质的估计性质被报告为分层介质的实际性质。

49. 发明授权

US07360851B1 Automated pattern recognition of imprint technology 失效
标题翻译：压印技术的自动图案识别
公开(公告)号：US07360851B1
公开(公告)日：2008-04-22
申请号：US11355699
申请日：2006-02-15
申请人： Bryan L. Snyder
发明人： Bryan L. Snyder
IPC分类号： B41J3/00
CPC分类号： B41J3/407 , B41J3/44 , B41J3/50 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An apparatus and method for control of spreading of liquid drops are disclosed. An initial pattern of drops of liquid is deposited on a first surface. A second surface is brought into sufficient contact with the initial pattern of the drops that the liquid starts to spread. Two or more digital images of the liquid are captured after it begins to spread. A digital analysis is performed on these images to determine whether one or more portions of the initial pattern of drops require more or less liquid. A subsequent pattern of liquid droplets is adjusted based on the digital analysis.
摘要翻译：公开了一种用于控制液滴扩散的装置和方法。在第一表面上沉积有液滴的初始图案。使第二表面与液体开始扩散的液滴的初始模式充分接触。液体的两个或多个数字图像在开始扩展后被捕获。对这些图像进行数字分析以确定初始图案的一个或多个部分是否需要更多或更少的液体。基于数字分析调整液滴的后续模式。

50. 发明授权

US07359544B2 Automatic supervised classifier setup tool for semiconductor defects 有权
标题翻译：用于半导体缺陷的自动监控分类器设置工具
公开(公告)号：US07359544B2
公开(公告)日：2008-04-15
申请号：US10713628
申请日：2003-11-13
申请人： Lisheng Gao , Bo Magluyan , Jianxin Zhang , Kevin Yeung , Kenong Wu , Tong Huang
发明人： Lisheng Gao , Bo Magluyan , Jianxin Zhang , Kevin Yeung , Kenong Wu , Tong Huang
IPC分类号： G06K9/00 , G06K9/62
CPC分类号： G06K9/6253 , G06T7/0004
摘要： Disclosed are methods and apparatus for efficiently setting up and maintaining a defect classification system. In general terms, the setup procedure optionally includes automatically grouping a set of provided defects and presenting a representative set from each defect group to the user for classification. After the initial manual classification of the representative defects, the setup procedure includes an automatic procedure for classifying the non-reviewed or unclassified defects based on the manual class codes from the user-reviewed defects. After the automatic classification operation, the user may also be presented with defects from each class which may require re-classification. In particular embodiments, the user is iteratively presented with defects which have classifications that are suspect, which are near classification boundaries, or have classifications that have a low confidence level until each class is pure or contains a same type of defect classes as assigned by the user.
摘要翻译：公开了用于有效地建立和维护缺陷分类系统的方法和装置。一般来说，设置过程可选地包括自动地对一组提供的缺陷进行分组，并将来自每个缺陷组的代表集合给用户进行分类。在对代表性缺陷进行初步手动分类后，安装步骤包括根据用户审查缺陷的手册类代码分类未经审查或未分类的缺陷的自动程序。在自动分类操作之后，用户也可能会出现每个类别可能需要重新分类的缺陷。在特定实施例中，用户被迭代地呈现具有可疑的分类的缺陷，其接近分类边界，或者具有低置信度水平的分类，直到每个类是纯的或包含由所分配的相同类型的缺陷类别用户。

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