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31. 发明授权

US4954079A Heat-treating apparatus and a method for the same 失效
标题翻译：热处理装置及其制造方法
公开(公告)号：US4954079A
公开(公告)日：1990-09-04
申请号：US395645
申请日：1989-02-03
申请人： Kenichi Yamaga
发明人： Kenichi Yamaga
IPC分类号： C30B31/10 , C30B35/00
CPC分类号： C30B35/005 , C30B31/103 , Y10S414/14
摘要： According to this invention, a boat carried by an elevator is put on a boat supporting unit installed at a boat delivery position and capable of moving up and down and then, the boat is delivered from the boat supporting unit to transfer means for a heat-treating furnace. Therefore, boats can be transferred by the common elevator to the boat delivery positions at heat-treating furnace arranged in multiple stages. Even when heat-treating furnaces of different types are installed in multiple stages, boats can be transferred to those furnaces by using the common elevator. As a result, when boats to be sent to different types of furnaces arrive at the work position, for example, boats can be delivered to the furnaces with extremely high efficiency and by simple devices.
摘要翻译：根据本发明，将由电梯承载的船放在安装在船运送位置并能够上下移动的船支撑单元上，然后将舟从船支撑单元输送到用于热交换装置的转移装置，处理炉。因此，可以将公共电梯的船舶转移到以多级排列的热处理炉的船舶送出位置。即使在多级安装不同类型的热处理炉的情况下，也可以使用公共电梯将船只转移到那些炉子。因此，当要送往不同类型的炉子的船只到达工作位置时，例如，船只可以以极高的效率和简单的装置运送到炉子。

32. 发明授权

US4911103A Processing apparatus and method 失效
标题翻译：处理装置和方法
公开(公告)号：US4911103A
公开(公告)日：1990-03-27
申请号：US274611
申请日：1988-11-22
申请人： Cecil J. Davis , Dean W. Freeman , Robert T. Matthews , Joel T. Tomlin , Rhett B. Jucha
发明人： Cecil J. Davis , Dean W. Freeman , Robert T. Matthews , Joel T. Tomlin , Rhett B. Jucha
IPC分类号： C23C16/54 , C30B31/10 , C30B35/00 , H01L21/00
CPC分类号： H01L21/67017 , C23C16/54 , C30B31/103 , C30B35/005
摘要： A process module which is compatible with a system using primarily vacuum wafer transport, but which permits processing multiple slices in parallel in a single module. This is accomplished by using notched quartz arms in the module, so that the transfer arm can place each of several wafers into one set of notches in the quartz arms. Optionally, a vertical degree of movement in the arm may be used to accomplish this, and the quartz arms may be immovable. This means that the port from the multi-wafer module into the wafer transfer system must be high enough to accommodate the necessary vertical movement of the transfer arm. After the transfer arm has placed the wafer on the quartz arms, the process module can be elevated to close around the set of wafers and made a seal. If the wafer transport arm is already configured to access wafers directly out of a multi-wafer vacuum wafer carrier, the necessary degree of freedom will necessarily already be present in the transfer arm, and at least one port of the necessary vertical dimensions will necessarily also be already present (between the loadlock and the transfer chamber). This is particularly useful in combination with relatively slow processes, such as thick field oxidation, long anneals, or long furnace heating steps used to drive in diffusions.
摘要翻译：一种与使用主要是真空晶片传输的系统兼容的处理模块，但是允许在单个模块中并行处理多个片段。这通过在模块中使用缺口石英臂来实现，使得传输臂可以将几个晶片中的每一个放置在石英臂中的一组凹口中。可选地，可以使用臂中的垂直移动度来实现这一点，并且石英臂可以是不可移动的。这意味着从多晶片模块到晶片传送系统的端口必须足够高以适应传送臂的必要的垂直移动。在传送臂已经将晶片放置在石英臂上之后，可以将处理模块升高以围绕该组晶片闭合并且形成密封。如果晶片传送臂已经被配置成直接从多晶片真空晶片载体中进入晶片，则必需的自由度必然已经存在于传送臂中，并且必要的垂直尺寸的至少一个端口也将必然地已经存在（在负载锁和转移室之间）。这特别适用于相对较慢的工艺，例如厚场氧化，长退火或用于扩散驱动的长炉加热步骤。

33. 发明授权

US4355974B1 失效
公开(公告)号：US4355974B1
公开(公告)日：1988-10-18
申请号：US20990580
申请日：1980-11-24
IPC分类号： B65D85/86 , C30B31/10 , C30B31/14 , H01L21/22 , H01L21/67 , H01L21/673
CPC分类号： H01L21/67313 , C30B31/103 , C30B31/14 , Y10S118/90 , Y10S206/833

34. 发明授权

US4669938A Apparatus for automatically loading a furnace with semiconductor wafers 失效
标题翻译：用于自动加载具有半导体晶片的炉的装置
公开(公告)号：US4669938A
公开(公告)日：1987-06-02
申请号：US912191
申请日：1986-09-25
申请人： Geoffrey Hayward
发明人： Geoffrey Hayward
IPC分类号： C30B31/10 , H01L21/22 , H01L21/677 , C30B25/12 , F27B9/20 , F27D3/00
CPC分类号： H01L21/67754 , C30B31/103 , Y10S414/14
摘要： An apparatus for loading a furnace with semiconductor wafers is known, which has at least two heat treatment chambers (1A, 1B, 1C, 1D), each of them having an associated stationary loading unit (8) with a receptacle movable in the direction of the furnace axis via a feed apparatus and having a loading system (2A, 2B, 2C, 2D) for semiconductor wafers. In order to provide such an apparatus for automatically loading the furnace with semiconductors which facilitates loading and overcomes the disadvantages of the known apparatuses, the apparatus according to the invention has a common central loading station (9) for all the semiconductor loading systems (2), and these loading systems are removable from the loading unit (8). Further, a transport device (10) is provided which is movable in two directions at right angles to one another as well as at right angles to the axis of the furnace and which has a coupling unit (12) for moving a respective loading system (2), loaded with semiconductor wafers, between the loading station (9) and the furnace loading unit (8).
摘要翻译：已知具有半导体晶片加载炉的装置，其具有至少两个热处理室（1A，1B，1C，1D），每个热处理室具有相关联的固定装载单元（8），该固定装载单元（8）具有可在炉轴通过进料装置并具有用于半导体晶片的装载系统（2A，2B，2C，2D）。为了提供这种用于自动加载具有便于加载的半导体的炉子的装置并且克服了已知装置的缺点，根据本发明的装置具有用于所有半导体装载系统（2）的共同的中央装载站（9），并且这些装载系统可从装载单元（8）移除。此外，提供了一种输送装置（10），其可以在两个方向上彼此成直角并且与炉的轴线成直角地移动，并且具有用于移动相应的装载系统的联接单元（12）在装载站（9）和炉装载单元（8）之间装载半导体晶片的装置（图2）。

35. 发明授权

US4523885A Apparatus for loading magazines into furnaces 失效
标题翻译：将杂志装入炉子的装置
公开(公告)号：US4523885A
公开(公告)日：1985-06-18
申请号：US483724
申请日：1983-04-11
申请人： Christopher J. Bayne , Joseph L. Lambert , Graham E. Collyer
发明人： Christopher J. Bayne , Joseph L. Lambert , Graham E. Collyer
IPC分类号： C30B31/10 , C30B33/00 , F27D5/00
CPC分类号： C30B31/103 , C30B33/005 , Y10S414/141
摘要： Apparatus for introducing silicon wafers in magazines into a process tube of a furnace or diffusion oven. At least two spaced silica tubes closed at the end next adjacent the process tube constitute supporting members for the loaded magazines and a clamping device holds and supports said members cantilever-fashion by that end thereof remote from the process tube. Motor means are associated with the clamping device for moving the supporting members with the loaded magazines thereon into and out of the process tube in a substantially horizontal direction in such a manner that the magazines and their supporting members remain entirely suspended throughout the loading, processing and unloading operations: thus no part thereof comes into contact with the interior wall of the process tube. The silica tubes preferably constitute a sheathing surrounding inserts in two or more sections fitting one within the other: the insert nearest the furnace is preferably silicon carbide and the insert remote from the furnace is preferably sintered alumina.
摘要翻译：用于将杂志中的硅晶片引入炉或扩散炉的工艺管中的装置。在靠近处理管的端部处封闭的至少两个隔开的二氧化硅管构成用于装载的盒的支撑构件，并且夹紧装置保持和支撑所述构件的悬臂方式，其远离工艺管的端部。电动机装置与夹紧装置相关联，用于将支撑构件与装载的箱体在基本上水平的方向上移入和移出工艺管，使得杂志及其支撑构件在整个装载，卸载操作：因此其任何部分都不会与处理管的内壁接触。二氧化硅管优选构成在两个或更多个部分中的两个或多个部分中的护套围绕另一个安装：最接近炉的插入件优选为碳化硅，并且远离炉的刀片优选为烧结氧化铝。

36. 发明授权

US4355974A Wafer boat 失效
标题翻译：晶圆船
公开(公告)号：US4355974A
公开(公告)日：1982-10-26
申请号：US209905
申请日：1980-11-24
申请人： Eui-Wan Lee
发明人： Eui-Wan Lee
IPC分类号： B65D85/86 , C30B31/10 , C30B31/14 , H01L21/22 , H01L21/67 , H01L21/673 , B05C13/02
CPC分类号： H01L21/67313 , C30B31/103 , C30B31/14 , Y10S118/90 , Y10S206/833
摘要： A wafer processing boat is provided with parallel slots that support each wafer at a slight angle with respect to vertical so that the wafers lean by gravity in a uniform manner and are thereby arranged in spaced parallel relationship. This enables the tolerances within the slots to be quite large with respect to the width of the wafer edges thus facilitating insertion and removal of the wafers while minimizing wafer damage and increasing wafer processing uniformity.
摘要翻译：晶片处理舟设置有平行的狭槽，其以相对于垂直方向以小角度支撑每个晶片，使得晶片以重力均匀地排列，从而以间隔开的平行关系布置。这使得槽内的公差相对于晶片边缘的宽度非常大，从而便于晶片的插入和移除，同时最小化晶片损坏并增加晶片加工均匀性。

37. 发明授权

US3744650A Boat mover for semiconductor fusion process 失效
标题翻译：用于半导体熔融过程的BOAT MOVER
公开(公告)号：US3744650A
公开(公告)日：1973-07-10
申请号：US3744650D
申请日：1971-10-26
申请人： SEMICONDUCTOR ELECT MEMORIES
发明人： HENEBRY T , PLATTER S
IPC分类号： C30B31/10 , C30B31/14 , F27D7/00 , F27D5/00
CPC分类号： C30B31/14 , C30B31/103 , F27D7/00
摘要： An arrangement for moving a boat carrying semiconductor wafers through a diffusion furnace is provided wherein the boat is supported free of the walls of the furnace while being moved therethrough, whereby damage to the wafers caused by sudden stops and starts of the boat is avoided.

38. 发明授权

US3563434A Apparatus for loading and unloading furnace 失效
标题翻译：装载和卸载炉的装置
公开(公告)号：US3563434A
公开(公告)日：1971-02-16
申请号：US3563434D
申请日：1969-02-27
申请人： TEXAS INSTRUMENTS INC
发明人： SHRIVER JAMES E , STREATER GERALD M
IPC分类号： C30B31/10 , B65G39/00
CPC分类号： C30B31/103 , Y10S414/14
摘要： In order to minimize slip dislocations, the rates of introduction and withdrawal of semiconductor wafers into and from a high temperature furnace are carefully controlled by means of apparatus comprising a conveyor, a pushrod for moving a furnace boat along the conveyor path, and a novel mechanism for driving the pushrod. The mechanism includes a roller drive and two idler wheels pivotally supported about an axis lying in a common plane with the roller drive axis.

39. 发明授权

US3481711A Crystal growth apparatus 失效
标题翻译：水晶生长装置
公开(公告)号：US3481711A
公开(公告)日：1969-12-02
申请号：US3481711D
申请日：1965-08-03
申请人： NIPPON ELECTRIC CO
发明人： MARUYAMA MITSUHIRO
IPC分类号： C22F1/00 , C30B11/00 , C30B13/30 , C30B13/32 , C30B15/20 , C30B15/30 , C30B15/32 , C30B19/10 , C30B31/10 , B01J17/18
CPC分类号： C22F1/00 , C30B11/007 , C30B13/30 , C30B13/32 , C30B15/20 , C30B15/30 , C30B15/32 , C30B19/10 , C30B31/103 , Y10S117/90 , Y10S117/917 , Y10T117/1008 , Y10T117/1012 , Y10T117/1064 , Y10T117/1092

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