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1. 发明授权

US4888994A Method of carrying objects into and from a furnace, and apparatus for carrying objects into and from a furnace 失效
标题翻译：将物体搬入和从炉子运送的方法，以及用于将物体运入和从炉子运送的装置
公开(公告)号：US4888994A
公开(公告)日：1989-12-26
申请号：US273063
申请日：1988-11-18
申请人： Shin Nakamaki , Yuzuru Sasahara
发明人： Shin Nakamaki , Yuzuru Sasahara
IPC分类号： C30B31/10
CPC分类号： H01L21/67259 , C30B31/103 , H01L21/67754 , Y10S414/14
摘要： A method of carrying a boat, on which a number of wafers are mounted, into and from a furnace using a soft-landing loader having a fork. In this method, before loading the boat into the furnace, the reaction applied on the fork at a specific point is measure while the fork is supporting the boat, and the reaction thus measured is stored in a memory. The fork is inserted into, then pulled out of the furance, thus loading the boat and leaving it within the furnace. The wafers are heat-treated within the furnace, then, the fork is inserted again, and raises the wafer boat within the furnace. The reaction applied on the fork at this time is measured, and compared with the value stored in the memory. When it is not equal to the value stored in the memory, the fork is lowered and moved slightly back or forth, and then raised again to support the boat, repeating this motion until the reaction applied on the fork becomes equal to the value stored in the memory. After the compared both reactions have been found equal, the fork is pulled out of the furnace, thereby unloading the boat therefrom.
摘要翻译：使用具有叉子的软着陆装载机将携带有多个晶片的船运送到炉内的方法。在这种方法中，在将船装载到炉中之前，在叉子支撑船时测量在特定点处施加在叉上的反作用力，并且将如此测量的反应存储在存储器中。将叉子插入，然后从保险箱中拉出，从而装载船并将其放入炉内。在炉内对晶片进行热处理，然后再次插入叉，并将晶片舟升起炉内。此时测量在叉上施加的反应，并与存储在存储器中的值进行比较。当它不等于存储在存储器中的值时，叉被稍微向前或向前移动，然后再次升高以支撑船，重复该运动，直到施加在叉上的反应变得等于存储在记忆。在比较两个反应相同后，将叉从炉中拉出，从而卸载船。

2. 发明授权

US4573431A Modular V-CVD diffusion furnace 失效
标题翻译：模块化V-CVD扩散炉
公开(公告)号：US4573431A
公开(公告)日：1986-03-04
申请号：US757920
申请日：1985-07-22
申请人： Robert F. Sarkozy
发明人： Robert F. Sarkozy
IPC分类号： C23C16/44 , C23C16/455 , C30B31/10
CPC分类号： C23C16/455 , C23C16/45578 , C30B31/103
摘要： A novel modular V-CVD diffusion furnace includes a cylindrical quartz diffusion tube having integral end flanges, a first metallic sealing plate having gas ports removably fastened to one flange, a second metallic sealing plate having a plurality of precisely aligned gas injection tube receiving apertures removably fastened to the other flange, a like plurality of gas injection tubes slidably mounted in and sealed to corresponding gas injection tube receiving apertures, and a cylindrical quartz liner slidably mounted in the cylindrical diffusion tube.
摘要翻译：一种新型的模块化V-CVD扩散炉包括具有整体端部凸缘的圆柱形石英扩散管，具有可移除地固定在一个凸缘上的气体端口的第一金属密封板，具有多个精确对准的气体注入管，可拆卸地接纳孔的第二金属密封板固定在另一个凸缘上，可滑动地安装在相应的气体注入管接收孔中并密封到相应的气体注入管接收孔中的多个气体注入管，以及可滑动地安装在圆柱形扩散管中的圆柱形石英衬垫。

3. 发明授权

US4389967A Boat for carrying semiconductor substrates 失效
标题翻译：用于运载半导体衬底的船
公开(公告)号：US4389967A
公开(公告)日：1983-06-28
申请号：US227075
申请日：1981-01-11
申请人： Haruo Shimoda , Kaoru Tanabe
发明人： Haruo Shimoda , Kaoru Tanabe
IPC分类号： H01L21/22 , C30B31/10 , B61B13/00
CPC分类号： C30B31/103
摘要： In a boat with wheels for carrying semiconductor substrates, the friction surfaces of the wheel systems are coated with a silicon nitride film to prevent seizure from occurring during a diffusion, oxidation or annealing process for semiconductor substrates.
摘要翻译： PCT No.PCT / JP80 / 00099 Sec。 371日期：1981年1月11日 102（e）日期1980年12月31日PCT提交日期1980年5月9日PCT公布。公开号WO80 / 02622 日期为1980年11月27日。在具有用于承载半导体衬底的轮子的船上，轮系统的摩擦表面涂覆有氮化硅膜，以防止在半导体衬底的扩散，氧化或退火过程期间发生卡塞。

4. 发明授权

US3998333A Carrier for processing semiconductor materials 失效
标题翻译：半导体材料加工用载体
公开(公告)号：US3998333A
公开(公告)日：1976-12-21
申请号：US586807
申请日：1975-06-13
申请人： Hiroshi Kamada
发明人： Hiroshi Kamada
IPC分类号： C23C16/44 , C23C16/458 , C30B31/10 , H01L21/22 , A47G19/02 , F27B9/00
CPC分类号： C30B31/103
摘要： A carrier for processing semiconductor materials consisting of a first removable mounting boat with supporting branches having grooves for receiving first type semiconductor substrates thereon, and a second mounting boat with a pair of elongated supporting members having grooves for receiving second type semiconductor substrates thereon. The mounting of the first type semiconductor substrates to the first boat can be independently performed and after this mounting, the first boat is then coupled with the second tupe semiconductor substrates. When the first and second boats are coupled, the two types of semiconductor substrates are aligned on the second mounting boat alternately between adjacent substrsates in a juxtaposed configuration. Thereby, handling of the two type of conductors are remarkably facilitated.
摘要翻译：一种用于处理半导体材料的载体，由具有用于在其上接收第一类型半导体衬底的沟槽的支撑分支的第一可移除安装舟和具有用于在其上接收第二类型半导体衬底的槽的一对细长支撑构件的第二安装舟组成。可以独立地执行将第一类型半导体衬底安装到第一舟皿上，并且在该安装之后，第一船只与第二图案半导体衬底耦合。当第一和第二船被联接时，两种类型的半导体衬底在并置的配置中在相邻的基座之间交替地对准在第二安装舟上。因此，显着地促进了两种类型的导体的处理。

5. 发明授权

US3842794A Apparatus for high temperature semiconductor processing 失效
标题翻译：高温半导体加工设备
公开(公告)号：US3842794A
公开(公告)日：1974-10-22
申请号：US37519073
申请日：1973-06-29
申请人： IBM
发明人： ING P
IPC分类号： H01L21/205 , C30B31/10 , C30B31/12 , C30B33/00 , F27D11/02 , H01L21/22 , H01L21/31 , H01L23/29 , H01L29/00 , C23C13/08
CPC分类号： H01L23/291 , C30B31/10 , C30B31/103 , C30B31/12 , C30B33/005 , F27D11/02 , H01L29/00 , H01L2924/0002 , Y10S118/90 , H01L2924/00
摘要： A low thermal mass furnace with minimized thermal lag and maximum thermal response for high temperature processing of semiconductor substrates.

6. 发明授权

US3295492A Jogging device in apparatus for treating semiconductor wafers in gas 失效
标题翻译：用于处理气体中的半导体晶片的装置中的慢跑装置
公开(公告)号：US3295492A
公开(公告)日：1967-01-03
申请号：US36985764
申请日：1964-05-25
申请人： SIEMENS AG
发明人： NORBERT SCHINK
IPC分类号： C23C16/458 , C30B25/12 , C30B31/10 , C30B31/14 , H01L21/00
CPC分类号： C30B25/12 , C23C16/4583 , C30B31/103 , C30B31/14 , H01L21/00 , Y10S414/135

7. 发明授权

US5221201A Vertical heat treatment apparatus 失效
标题翻译：立式热处理设备
公开(公告)号：US5221201A
公开(公告)日：1993-06-22
申请号：US734784
申请日：1991-07-23
申请人： Kenichi Yamaga , Katsutoshi Ishii , Naotaka Ogino
发明人： Kenichi Yamaga , Katsutoshi Ishii , Naotaka Ogino
IPC分类号： C30B31/10 , F27B17/00
CPC分类号： F27B17/0025 , C30B31/103 , Y10S414/137 , Y10S414/14
摘要： A vertical heat treatment apparatus includes a casing, a vertical heat treatment furnace provided in the casing, a substrate holding unit mounted in the casing for holding substrates to be heat-treated in the vertical heat treatment furnace, a loading/unloading unit having a wafer boat for supporting the substrates, the loading/unloading unit being adapted to put the substrates in and take the same out of the vertical heat treatment furnace, and a transportation robot for moving the substrates between the substrate holding unit and the wafer boat. The vertical heat treatment apparatus further includes a clean air supplying unit for supplying clean air sideways to the wafers supported by the wafer boat when the loading/unloading unit is at an unloading position, a and duct for introducing air from the outside of the apparatus. The clean air supplying unit is provided with an air filter disposed opposed to the wafer boat. Air in a clean room whose pressure is set to be higher than the pressure in the casing is introduced into the clean air supplying unit through the duct.
摘要翻译：立式热处理装置包括壳体，设置在壳体中的立式热处理炉，安装在壳体中用于保持在立式热处理炉中进行热处理的基板的基板保持单元，具有晶片的装载/卸载单元用于支撑基板的装载/卸载单元适于将基板放入立式热处理炉中并将其取出，以及用于在基板保持单元和晶片舟皿之间移动基板的输送机器人。垂直热处理装置还包括清洁空气供给单元，用于当装载/卸载单元处于卸载位置时，向由晶圆舟支撑的晶片横向地供应清洁空气，以及用于从设备的外部引入空气的管道。清洁空气供给单元设置有与晶片舟相对设置的空气过滤器。将其压力设定得高于壳体内的压力的洁净室内的空气通过导管引入清洁空气供给单元。

8. 发明授权

US5069591A Semiconductor wafer-processing apparatus 失效
标题翻译：半导体晶片处理装置
公开(公告)号：US5069591A
公开(公告)日：1991-12-03
申请号：US328096
申请日：1989-03-23
申请人： Kenichi Kinoshita
发明人： Kenichi Kinoshita
IPC分类号： C30B31/10 , H01L21/677 , H01L21/687
CPC分类号： H01L21/67766 , C30B31/103 , H01L21/68707 , Y10S414/14
摘要： A semiconductor wafer-processing apparatus has a plurality of support members provided respectively for the processing units of a processing apparatus, and designed for supporting wafer receptacles each containing semiconductor wafers, and receptacle-inserting/extracting mechanism for inserting a wafer receptacle from the support members into the processing units, and for extracting the wafer receptacle from the processing units back to the support members. Receptacle-transporting mechanism is provided, operated independently of the receptacle inserting/extracting mechanism, for transporting the wafer receptacle between each support member and a predetermined position.
摘要翻译：半导体晶片处理装置具有分别为处理装置的处理单元设置的多个支撑构件，其设计用于支撑各自包含半导体晶片的晶片插座，以及用于从支撑构件插入晶片容器的插座/取出机构进入处理单元，并将晶片接收器从处理单元提回到支撑构件。提供了插座输送机构，独立于插座插入/拔出机构操作，用于在每个支撑构件和预定位置之间输送晶片插座。

9. 发明授权

US5060354A Heated plate rapid thermal processor 失效
标题翻译：加热板快速热处理器
公开(公告)号：US5060354A
公开(公告)日：1991-10-29
申请号：US547805
申请日：1990-07-02
申请人： George Chizinsky
发明人： George Chizinsky
IPC分类号： H01L21/22 , C23C16/46 , C30B31/10 , C30B31/12 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67748 , C23C16/46 , C23C16/463 , C30B31/103 , C30B31/12 , H01L21/67103 , Y10T29/413
摘要： A rapid thermal processor for heat treating and cooling semiconductor material is an elongated process chamber having a base, side and top walls which enclose a heater plate assembly through which thin pins longitudinally move to carry workpieces vertically to and from the heater assembly. A cooling shutter is adapted in the chamber to shield the workpiece from the heater plate when the cooling process takes place. The chamber has gaseous ambient control means which regulates the type of atmosphere or vacuum in the chamber during heat processing of the workpiece.
摘要翻译：用于热处理和冷却半导体材料的快速热处理器是具有底部，侧壁和顶壁的细长处理室，其包围加热器板组件，薄的销纵向移动通过加热器板组件将工件垂直地运送到加热器组件和从加热器组件垂直运送。当冷却过程发生时，冷却挡板适于在室中屏蔽工件与加热板。该室具有气态环境控制装置，其在工件的热处理期间调节腔室中的气氛类型或真空度。

10. 发明授权

US4218214A Guide wing for a furnace paddle 失效
标题翻译：导向翼用于炉子桨
公开(公告)号：US4218214A
公开(公告)日：1980-08-19
申请号：US9351
申请日：1979-02-05
申请人： Howard T. Nelson
发明人： Howard T. Nelson
IPC分类号： C30B31/10 , C30B31/14 , F27D5/00
CPC分类号： C30B31/14 , C30B31/103
摘要： A furnace paddle adapted to hold semiconductor wafers therein and having means attached thereto for supporting the paddle for movement along the inside of a cylindrically-shaped tube of a semiconductor processing furnace has means attached to the paddle adjacent the supporting means for limiting the lateral movement of the supporting means up the inside wall of the tube. The means includes a guide wing having two ends for contacting respectively the inside wall of the tube at intersecting points of a chord thereof and having a stem attached to the paddle adjacent the supporting means for maintaining the ends proximate the inside wall of the tube.
摘要翻译：适用于将半导体晶片保持在其中并具有连接到其上的装置的炉板，用于支撑桨沿着半导体加工炉的圆柱形管的内部移动，具有附接到与支撑装置相邻的桨的装置，用于限制支撑装置向上延伸管的内壁。该装置包括导向翼，其具有两个端部，用于分别在其弦的交叉点处与管的内壁接触，并且具有附接到支撑装置上的桨的杆，用于将端部保持靠近管的内壁。

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