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    • 32. 发明授权
    • Heat shield for heater in semiconductor processing apparatus
    • 半导体加工装置用加热器用隔热罩
    • US08753447B2
    • 2014-06-17
    • US12482042
    • 2009-06-10
    • Gary LindJohn Floyd Ostrowski
    • Gary LindJohn Floyd Ostrowski
    • C23C16/00
    • C23C16/4586C23C16/4401C23C16/4581
    • A heat shield employed in semiconductor processing apparatus comprises a high performance insulation that has low thermal conductivity, such as, below the thermal conductivity of still air over a wide range of temperatures utilized in operation of the apparatus. As an example, the thermal conductivity of the insulation may be in the range of about 0.004 W/m·h to about 0.4 W/m·h over a temperature range of about 0° C. to about 600° C. or more. The deployment of the high performance heat shield reduces the power consumption necessary for the heater by as much as 20% to reach a desired processing temperature as compared to a case of heater power consumption required to reach the same desired temperature without the shield. Further, the heat shield significantly reduces the amount of undesired depositions from gas-entrained constituents on components in the chamber of the apparatus, particularly below or beyond the heat shield, by as much as 90% since the temperature drop is as much as ten orders of magnitude difference.
    • 在半导体处理装置中使用的隔热罩包括具有低热导率的高性能绝缘体,例如低于在设备的操作中使用的宽范围的温度范围内的静止空气的热导率。 例如,绝缘体的导热率可以在约0℃至约600℃或更高的温度范围内在约0.004W / m·h至约0.4W / m·h的范围内。 与没有屏蔽的达到相同的期望温度所需的加热器功率消耗的情况相比,高性能隔热罩的部署将加热器所需的功率消耗降低多达20%以达到所需的加工温度。 此外,热屏蔽显着地减少了装置室内部件上气体夹带的成分不希望的沉积量,特别是低于或超过隔热层的沉积量多达90%,因为温度下降高达十次 的差异。
    • 34. 发明授权
    • Vapor phase deposition apparatus and support table
    • 气相沉积装置和支撑台
    • US08460470B2
    • 2013-06-11
    • US13297483
    • 2011-11-16
    • Hironobu HirataAkira JyogoYoshikazu Moriyama
    • Hironobu HirataAkira JyogoYoshikazu Moriyama
    • C23C16/00
    • C23C16/481C23C16/4581C23C16/4585C30B25/10C30B29/06C30B35/00
    • A vapor phase deposition apparatus includes a chamber, a support table arranged in the chamber, and having a first support unit which is in contact with a back side surface of a substrate and on which the substrate is placed and a second support unit which is connected to the first support unit to support the first support unit, a heat source arranged at a position having a distance from a back side surface of the substrate, the distance being larger than a distance between back side surface of the support table and the heat source, and which heats the substrate, a first flow path configured to supply a gas to form a film into the chamber, and a second flow path configured to exhaust the gas from the chamber.
    • 气相沉积设备包括一个室,一个布置在室中的支撑台,并具有一个第一支撑单元,该第一支撑单元与一个基板的背面接触并且其上放置该基板,一个第二支撑单元被连接 所述第一支撑单元支撑所述第一支撑单元,所述热源布置在距离所述基板的背侧表面的距离的位置处,所述距离大于所述支撑台的背侧表面与所述热源之间的距离 并且其加热所述基板,构造成供应气体以在所述室中形成膜的第一流动路径和被配置为从所述室排出气体的第二流动路径。
    • 38. 发明授权
    • Methods for preparation of high-purity polysilicon rods using a metallic core means
    • 使用金属芯制备高纯度多晶硅棒的方法
    • US08216643B2
    • 2012-07-10
    • US12160837
    • 2007-05-21
    • Hee Young KimKyung Koo YoonYong Ki ParkWon Choon ChoiSang Jin Moon
    • Hee Young KimKyung Koo YoonYong Ki ParkWon Choon ChoiSang Jin Moon
    • C23C16/24
    • C23C16/4581C01B33/035C23C16/24Y10T428/2913
    • A method for preparing a polysilicon rod using a metallic core means, including: installing a core means in an inner space of a deposition reactor used for preparing a silicon rod, the core means being constituted by forming at least one separation layer on the surface of a metallic core element and being connected to an electrode means, heating the core means by supplying electricity through the electrode means, and supplying a reaction gas into the inner space for silicon deposition, thereby forming a deposition output in an outward direction on the surface of the core means. The deposition output and the core means can be separated easily from the silicon rod output obtained by the process of silicon deposition, and the contamination of the deposition output caused by impurities of the metallic core element can be minimized, thereby a high-purity silicon can be prepared more economically and conveniently.
    • 一种使用金属芯装置制备多晶硅棒的方法,包括:将芯装置安装在用于制备硅棒的沉积反应器的内部空间中,所述芯装置通过在至少一个分离层的表面上形成 金属芯元件,与电极装置连接,通过电极装置供电来加热芯装置,并将反应气体供给到用于硅沉积的内部空间中,从而在表面上形成向外的沉积输出 核心手段。 沉积输出和芯装置可以容易地从通过硅沉积过程获得的硅棒输出分离,并且可以最小化由金属芯元件的杂质引起的沉积输出的污染,从而高纯度的硅可以 准备更经济,便捷。