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1. 发明授权

US09653340B2 Heated wafer carrier profiling 有权
公开(公告)号：US09653340B2
公开(公告)日：2017-05-16
申请号：US13483354
申请日：2012-05-30
申请人： Vadim Boguslavskiy , Joshua Mangum , Matthew King , Earl Marcelo , Eric A. Armour , Alexander I. Gurary , William E. Quinn , Guray Tas
发明人： Vadim Boguslavskiy , Joshua Mangum , Matthew King , Earl Marcelo , Eric A. Armour , Alexander I. Gurary , William E. Quinn , Guray Tas
IPC分类号： C23C16/52 , G01N21/71 , H01L21/687 , G01N21/75 , G01N23/20 , H01L21/67 , C23C16/458 , C23C16/46 , G01N21/74 , G01N21/17
CPC分类号： H01L21/68764 , C23C16/4584 , C23C16/46 , C23C16/52 , G01N21/71 , G01N21/75 , G01N23/20033 , G01N2021/1731 , G01N2021/745 , H01L21/67109 , H01L21/68771
摘要： An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates.

2. 发明授权

US08958061B2 Heated wafer carrier profiling 有权
标题翻译：加热晶片载体轮廓
公开(公告)号：US08958061B2
公开(公告)日：2015-02-17
申请号：US13483491
申请日：2012-05-30
申请人： Vadim Boguslavskiy , Joshua Mangum , Matthew King , Earl Marcelo , Eric A. Armour , Alexander I. Gurary , William E. Quinn , Guray Tas
发明人： Vadim Boguslavskiy , Joshua Mangum , Matthew King , Earl Marcelo , Eric A. Armour , Alexander I. Gurary , William E. Quinn , Guray Tas
IPC分类号： G01N21/00 , H01L21/687 , H01L21/67 , C23C16/458 , C23C16/46 , C23C16/52
CPC分类号： H01L21/68764 , C23C16/4584 , C23C16/46 , C23C16/52 , G01N21/71 , G01N21/75 , G01N23/20033 , G01N2021/1731 , G01N2021/745 , H01L21/67109 , H01L21/68771
摘要： A method for characterizing a surface comprises rotating a carrier about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer with a major surface of the wafer extending generally transverse to the axis of rotation. A surface characterization tool is moved over a plurality of positions relative to the top surface of the carrier, where a measurement location over the top surface of the carrier is changed while said top surface of the carrier is heated to a predetermined temperature. Characterization signals over the plurality of positions with the surface characterization tool are produced and contain information about the heated top surface of the carrier, or when semiconductor wafers are held on the carrier, information about the semiconductor wafer can also be obtained.
摘要翻译：用于表征表面的方法包括围绕旋转轴旋转载体，其中载体具有适于保持至少一个半导体晶片的顶表面，其中晶片的主表面大致横向于旋转轴线延伸。表面表征工具相对于载体的顶表面在多个位置上移动，其中载体顶表面上的测量位置改变，同时载体的顶表面被加热到预定温度。产生具有表面表征工具的多个位置上的表征信号，并且包含关于载体的加热的顶表面的信息，或者当半导体晶片被保持在载体上时，也可以获得关于半导体晶片的信息。

3. 发明申请

US20130276704A1 WAFTER CARRIER FOR CHEMICAL VAPOR DEPOSITION SYSTEMS 审中-公开
标题翻译：化学气相沉积系统的WAFTER载体
公开(公告)号：US20130276704A1
公开(公告)日：2013-10-24
申请号：US13450062
申请日：2012-04-18
申请人： Sandeep Krishnan , Jeffrey Scott Montgomery , Lukas Urban , Alexander I. Gurary , Yuliy Rashkovsky
发明人： Sandeep Krishnan , Jeffrey Scott Montgomery , Lukas Urban , Alexander I. Gurary , Yuliy Rashkovsky
IPC分类号： C23C16/458 , C23C16/46 , B23P17/00
CPC分类号： C23C16/4584 , Y10T29/49826
摘要： A wafer carrier for use in a system for growing epitaxial layers on one or more wafers by chemical vapor deposition. The wafer carrier includes wafer retention pockets recessed in its body. Each pocket includes a floor surface and a peripheral wall surface surrounding the floor surface and defining a periphery of that pocket. Each pocket has a center situated along a corresponding wafer carrier radial axis. In each of the pockets, a set of bumpers is positioned primarily at a distal portion of the wafer retention pocket opposite the central axis so as to maintain a gap of at least a predefined size between the peripheral wall surface at the distal portion and an edge of a wafer to be placed in the wafer retention pocket.
摘要翻译：一种晶片载体，用于通过化学气相沉积在一个或多个晶片上生长外延层的系统。晶片载体包括凹入其体内的晶片保留孔。每个口袋包括地板表面和围绕地板表面的周边壁表面并且限定该口袋的周边。每个口袋具有沿对应的晶片载体径向轴线定位的中心。在每个口袋中，一组保险杠主要定位在晶片保持袋的与中心轴线相对的远端部分处，以便在远端部分的周壁表面和边缘之间保持至少预定尺寸的间隙的晶片被放置在晶片保持口袋中。

4. 发明申请

US20110287635A1 WAFER CARRIER WITH HUB 失效
标题翻译：带框架的拖车
公开(公告)号：US20110287635A1
公开(公告)日：2011-11-24
申请号：US13188605
申请日：2011-07-22
申请人： Vadim Boguslavskiy , Alexander I. Gurary
发明人： Vadim Boguslavskiy , Alexander I. Gurary
IPC分类号： H01L21/302
CPC分类号： C23C16/4581 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate.
摘要翻译：用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。在清洁板时可以拆下轮毂。

5. 发明申请

US20090155028A1 Wafer carrier with hub 失效
标题翻译：带轮毂的晶圆架
公开(公告)号：US20090155028A1
公开(公告)日：2009-06-18
申请号：US12001761
申请日：2007-12-12
申请人： Vadim Boguslavskiy , Alexander I. Gurary
发明人： Vadim Boguslavskiy , Alexander I. Gurary
IPC分类号： B65H1/00
CPC分类号： C23C16/4581 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate.
摘要翻译：用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。在清洁板时可以拆下轮毂。

6. 发明授权

US06398406B1 Temperature determination using pyrometry 有权
标题翻译：使用高温计测定温度
公开(公告)号：US06398406B1
公开(公告)日：2002-06-04
申请号：US09587375
申请日：2000-06-01
申请人： William G. Breiland , Alexander I. Gurary , Vadim Boguslavskiy
发明人： William G. Breiland , Alexander I. Gurary , Vadim Boguslavskiy
IPC分类号： G01J500
CPC分类号： G01J5/524
摘要： A method for determining the temperature of a surface upon which a coating is grown using optical pyrometry by correcting Kirchhoff's law for errors in the emissivity or reflectance measurements associated with the growth of the coating and subsequent changes in the surface thermal emission and heat transfer characteristics. By a calibration process that can be carried out in situ in the chamber where the coating process occurs, an error calibration parameter can be determined that allows more precise determination of the temperature of the surface using optical pyrometry systems. The calibration process needs only to be carried out when the physical characteristics of the coating chamber change.
摘要翻译：使用光学高温测量法确定涂层生长的表面的温度的方法，通过校正与涂层生长相关联的发射率或反射率测量的误差的基尔霍夫定律以及随后的表面热发射和传热特性的变化。通过可以在发生涂覆过程的室中原位进行的校准过程，可以确定误差校准参数，其允许使用光学高温测量系统更精确地确定表面的温度。只有当涂层室的物理特性发生变化时，才需要进行校准过程。

7. 发明申请

US20130252404A1 KEYED WAFER CARRIER 有权
标题翻译：键盘拖车
公开(公告)号：US20130252404A1
公开(公告)日：2013-09-26
申请号：US13424821
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
发明人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
IPC分类号： C23C16/458 , H01L21/203
CPC分类号： C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/6719 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.
摘要翻译：化学气相沉积反应器的结构理想地包括具有内部的反应室，安装在反应室中的主轴和可拆卸地安装到主轴上以与其一起旋转的晶片载体。主轴理想地具有沿着垂直旋转轴线延伸的轴和从轴向外突出的键。晶片载体优选地具有限定相对面对的顶表面和底表面的主体，并且至少一个晶片保持特征构造成使得晶片可以被保持在其中，晶片的表面暴露在主体的顶表面处。晶片载体理想地还具有从主体的底表面延伸到主体中的凹槽和沿着第一横向轴线从凹部的周边向外突出的键槽。轴优选地接合在凹部中，并且键优选地接合到键槽中。

8. 外观设计

USD687791S1 Multi-keyed wafer carrier 有权
标题翻译：多键式晶圆载体
公开(公告)号：USD687791S1
公开(公告)日：2013-08-13
申请号：US29416236
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
设计人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek

9. 外观设计

USD687790S1 Keyed wafer carrier 有权
标题翻译：键合晶片载体
公开(公告)号：USD687790S1
公开(公告)日：2013-08-13
申请号：US29416220
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
设计人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek

10. 发明申请

US20120304926A1 HEATED WAFER CARRIER PROFILING 有权
标题翻译：加热滚筒载体轮廓
公开(公告)号：US20120304926A1
公开(公告)日：2012-12-06
申请号：US13483354
申请日：2012-05-30
申请人： Vadim Boguslavskiy , Joshua Mangum , Matthew King , Earl Marcelo , Eric A. Armour , Alexander I. Gurary , William E. Quinn , Guray Tas
发明人： Vadim Boguslavskiy , Joshua Mangum , Matthew King , Earl Marcelo , Eric A. Armour , Alexander I. Gurary , William E. Quinn , Guray Tas
IPC分类号： C23C16/52 , G01H1/00 , G01J5/00 , G01N21/956 , G01J5/02
CPC分类号： H01L21/68764 , C23C16/4584 , C23C16/46 , C23C16/52 , G01N21/71 , G01N21/75 , G01N23/20033 , G01N2021/1731 , G01N2021/745 , H01L21/67109 , H01L21/68771
摘要： An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates.
摘要翻译：一种装置包括可围绕旋转轴线旋转的载体，其中载体具有适于保持至少一个半导体晶片的顶表面和可操作以相对于载体的顶表面在多个位置上移动的表面表征工具，以及 /或横向于旋转轴线的晶片。表面表征工具可操作以相对于载体的横向于旋转轴线的载体和/或晶片的顶表面在多个位置上移动，并且还适于在至少一部分上的多个位置上产生表征信号和/或在载体旋转时在晶片的所述主表面的至少一部分上。

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