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1. 发明申请

US20100156055A1 SUBSTRATE TEMPERATURE CONTROL FIXING APPARATUS 有权
标题翻译：基板温度控制固定装置
公开(公告)号：US20100156055A1
公开(公告)日：2010-06-24
申请号：US12643472
申请日：2009-12-21
申请人： Miki Saito , Tadayoshi Yoshikawa , Koki Tamagawa
发明人： Miki Saito , Tadayoshi Yoshikawa , Koki Tamagawa
IPC分类号： B23B31/28
CPC分类号： H01L21/67103 , H01L21/67109 , H01L21/6831 , Y10T279/23
摘要： A substrate temperature control fixing apparatus comprises an electrostatic chuck which includes a base body and adsorbs and holds an adsorbing target mounted on one of surfaces of the base body, a base plate which supports the electrostatic chuck, and a bank portion provided on an outer periphery of one of surfaces of the base plate which is opposed to the other of the surfaces of the base body.
摘要翻译：基板温度控制定影装置包括：静电卡盘，其包括基体并吸附并保持安装在基体的一个表面上的吸附靶，支撑静电卡盘的基板和设置在外周上的堤部与基体的另一个表面相对的基板的一个表面。

2. 发明申请

US20100134122A1 Substrate, substrate holding apparatus, analysis apparatus, program, detection system, semiconductor device, display apparatus, and semiconductor manufacturing apparatus 有权
标题翻译：基板，基板保持装置，分析装置，程序，检测系统，半导体装置，显示装置和半导体制造装置
公开(公告)号：US20100134122A1
公开(公告)日：2010-06-03
申请号：US12592219
申请日：2009-11-19
申请人： Yuji Furumura , Naomi Mura , Koki Tamagawa , Tadayoshi Yoshikawa , Hiroshi Yonekura
发明人： Yuji Furumura , Naomi Mura , Koki Tamagawa , Tadayoshi Yoshikawa , Hiroshi Yonekura
IPC分类号： G01R27/28 , G01K7/00 , H02N2/00 , B05C13/00 , C23F1/08 , H01L29/66 , H01L29/82
CPC分类号： H01L21/67248 , G01K7/32 , G01K11/265 , H01J37/32935
摘要： A substrate including a sensor unit, wherein the sensor unit includes a coil wound at least once arranged on the surface of the sensor or embedded within and near the surface thereof. With such an arrangement, an electric current that corresponds to information with respect to the substrate flows through the coil.
摘要翻译：一种包括传感器单元的基板，其中传感器单元包括至少一次布置在传感器表面上或嵌入在其表面内和附近的线圈。通过这种布置，对应于相对于衬底的信息的电流流过线圈。

3. 发明授权

US08641825B2 Substrate temperature regulation fixed apparatus 有权
标题翻译：基板温度调节固定装置
公开(公告)号：US08641825B2
公开(公告)日：2014-02-04
申请号：US12482482
申请日：2009-06-11
申请人： Hiroshi Yonekura , Miki Saito , Koki Tamagawa
发明人： Hiroshi Yonekura , Miki Saito , Koki Tamagawa
IPC分类号： C23C16/50 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/6875 , C23C16/4581 , C23C16/4586 , H01J2237/2001 , H01L21/67103 , H01L21/67109 , H01L21/6831
摘要： A substrate temperature regulation fixed apparatus has a base substance on which a vacuumed object is placed, an adhesive layer and a base plate. The base substance is fixed on the base plate through the adhesive layer. The adhesive layer contains a substance having plasma resistance.
摘要翻译：基板温度调节固定装置具有放置真空物体的基础物质，粘合剂层和基板。基材通过粘合剂层固定在基板上。粘合剂层含有具有耐等离子体性的物质。

4. 发明授权

US08199454B2 Electrostatic chuck and substrate temperature adjusting-fixing device 有权
标题翻译：静电吸盘和基板温度调节固定装置
公开(公告)号：US08199454B2
公开(公告)日：2012-06-12
申请号：US12333491
申请日：2008-12-12
申请人： Tomoaki Koyama , Koki Tamagawa
发明人： Tomoaki Koyama , Koki Tamagawa
IPC分类号： H01L21/683 , H01T23/00 , H01G7/02 , H05F3/00
CPC分类号： H01L21/6831
摘要： There is provided an electrostatic chuck for placing an adsorption object or a base body having an electrostatic electrode embedded therein and generating a coulombic force between the adsorption object and the electrostatic electrode by applying a voltage to the electrostatic electrode so as to hold the adsorption object in an adsorption state, wherein the base body includes a upper surface of the base body opposed to the adsorption object and a protrusion portion provided in the upper surface of the base body so as to come into contact with the adsorption object, and wherein the protrusion portion is provided in a region except for an outer edge portion of the upper surface of the base body, and the outer edge portion is substantially formed in the same plane as that of the upper surface of the base body.
摘要翻译：提供了一种静电卡盘，用于将吸附物体或具有静电电极的基体放置在其中并通过向静电电极施加电压以在吸附物体和静电电极之间产生库仑力，以将吸附物体保持在吸附状态，其中所述基体包括与所述吸附物体相对的所述基体的上表面和设置在所述基体的上表面中以与所述吸附物接触的突出部，并且其中所述突起部设置在除了基体的上表面的外缘部以外的区域中，外缘部大致形成在与基体的上表面相同的平面上。

5. 发明授权

US08023248B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US08023248B2
公开(公告)日：2011-09-20
申请号：US12714654
申请日：2010-03-01
申请人： Hiroshi Yonekura , Koki Tamagawa
发明人： Hiroshi Yonekura , Koki Tamagawa
IPC分类号： H01L21/683 , H01T23/00
CPC分类号： H01L21/6833
摘要： An electrostatic chuck includes a dielectric layer 30 formed with an attraction and fix face onto which a plate member 10 is attracted and fixed, wherein the attraction and fix face of the dielectric layer 30 is formed with a plurality of projection parts 32 each with only a tip face abutting the plate member 10 formed as a flat face by grinding and formed with a coolant gas flow path 36 where a coolant gas flows is opened to the flat face of each of the projection parts 32.
摘要翻译：静电卡盘包括形成有吸引和固定面板10的电介质层30，其中，电介质层30的吸引和固定面形成有多个突起部32，每个突起部32仅具有通过研磨而与形成为平坦面的板状构件10抵接的端面与形成有冷却剂气体流动的冷却剂气体流路36形成为每个突出部32的平坦面。

6. 发明申请

US20110096461A1 SUBSTRATE FOR ELECTROSTATIC CHUCK AND ELECTROSTATIC CHUCK 有权
标题翻译：静电卡盘和静电卡盘基座
公开(公告)号：US20110096461A1
公开(公告)日：2011-04-28
申请号：US12910493
申请日：2010-10-22
申请人： Tadayoshi YOSHIKAWA , Koki Tamagawa , Naoto Watanabe
发明人： Tadayoshi YOSHIKAWA , Koki Tamagawa , Naoto Watanabe
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： An electrostatic chuck includes a metal base member and an insulating substrate having an opposite surface to an attraction surface joined onto the base member via an adhesive layer. In the substrate, an electrode layer to which a direct current voltage for attraction is applied is embedded in a portion of the substrate, close to the attraction surface. In addition, a plurality of independent RF electrode layers to which different radio frequencies for plasma control are fed, respectively, are embedded in portions of the substrate, at an opposite side of the first electrode layer to the attraction surface. The RF electrode layers are arranged separately in different layers which are not on an identical plane in such a manner as to partially overlap each other in a plan view.
摘要翻译：静电卡盘包括金属基部件和绝缘基板，该绝缘基板具有通过粘合剂层接合到基底构件上的吸引表面的相反表面。在基板中，施加有用于吸引的直流电压的电极层嵌入基板的靠近吸引面的部分。此外，在第一电极层的与吸引表面相对的一侧的基板的部分分别嵌入多个用于等离子体控制的不同射频的独立RF电极层。 RF电极层分别布置在不在同一平面上的不同层中，以在平面图中彼此部分重叠的方式。

7. 发明申请

US20100220425A1 ELECTROSTATIC CHUCK 有权
标题翻译：静电卡
公开(公告)号：US20100220425A1
公开(公告)日：2010-09-02
申请号：US12714654
申请日：2010-03-01
申请人： Hiroshi Yonekura , Koki Tamagawa
发明人： Hiroshi Yonekura , Koki Tamagawa
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： An electrostatic chuck includes a dielectric layer 30 formed with an attraction and fix face onto which a plate member 10 is attracted and fixed, wherein the attraction and fix face of the dielectric layer 30 is formed with a plurality of projection parts 32 each with only a tip face abutting the plate member 10 formed as a flat face by grinding and formed with a coolant gas flow path 36 where a coolant gas flows is opened to the flat face of each of the projection parts 32.
摘要翻译：静电卡盘包括形成有吸引和固定面板10的电介质层30，其中，电介质层30的吸引和固定面形成有多个突起部32，每个突起部32仅具有通过研磨而与形成为平坦面的板状构件10抵接的端面与形成有冷却剂气体流动的冷却剂气体流路36形成为每个突出部32的平坦面。

8. 发明授权

US08505928B2 Substrate temperature control fixing apparatus 有权
标题翻译：基板温度控制定影装置
公开(公告)号：US08505928B2
公开(公告)日：2013-08-13
申请号：US12643472
申请日：2009-12-21
申请人： Miki Saito , Tadayoshi Yoshikawa , Koki Tamagawa
发明人： Miki Saito , Tadayoshi Yoshikawa , Koki Tamagawa
IPC分类号： B23B31/28
CPC分类号： H01L21/67103 , H01L21/67109 , H01L21/6831 , Y10T279/23
摘要： A substrate temperature control fixing apparatus comprises an electrostatic chuck which includes a base body and adsorbs and holds an adsorbing target mounted on one of surfaces of the base body, a base plate which supports the electrostatic chuck, and a bank portion provided on an outer periphery of one of surfaces of the base plate which is opposed to the other of the surfaces of the base body.
摘要翻译：基板温度控制定影装置包括：静电卡盘，其包括基体并吸附并保持安装在基体的一个表面上的吸附靶，支撑静电卡盘的基板和设置在外周上的堤部与基体的另一个表面相对的基板的一个表面。

9. 发明授权

US08441772B2 Substrate for electrostatic chuck and electrostatic chuck 有权
标题翻译：静电吸盘和静电吸盘用基板
公开(公告)号：US08441772B2
公开(公告)日：2013-05-14
申请号：US12910493
申请日：2010-10-22
申请人： Tadayoshi Yoshikawa , Koki Tamagawa , Naoto Watanabe
发明人： Tadayoshi Yoshikawa , Koki Tamagawa , Naoto Watanabe
IPC分类号： H01L21/683 , H01T23/00 , H01G7/02 , H05F3/00 , G03G15/02
CPC分类号： H01L21/6833
摘要： An electrostatic chuck includes a metal base member and an insulating substrate having an opposite surface to an attraction surface joined onto the base member via an adhesive layer. In the substrate, an electrode layer to which a direct current voltage for attraction is applied is embedded in a portion of the substrate, close to the attraction surface. In addition, a plurality of independent RF electrode layers to which different radio frequencies for plasma control are fed, respectively, are embedded in portions of the substrate, at an opposite side of the first electrode layer to the attraction surface. The RF electrode layers are arranged separately in different layers which are not on an identical plane in such a manner as to partially overlap each other in a plan view.
摘要翻译：静电卡盘包括金属基部件和绝缘基板，该绝缘基板具有通过粘合剂层接合到基底构件上的吸引表面的相反表面。在基板中，施加有用于吸引的直流电压的电极层嵌入基板的靠近吸引面的部分。此外，在第一电极层的与吸引表面相对的一侧的基板的部分分别嵌入多个用于等离子体控制的不同射频的独立RF电极层。 RF电极层分别布置在不在同一平面上的不同层中，以在平面图中彼此部分重叠的方式。

10. 发明授权

US08068326B2 Electrostatic chuck and substrate temperature control fixing apparatus 有权
标题翻译：静电吸盘和基板温度控制定影装置
公开(公告)号：US08068326B2
公开(公告)日：2011-11-29
申请号：US12482901
申请日：2009-06-11
申请人： Tomoaki Koyama , Koki Tamagawa
发明人： Tomoaki Koyama , Koki Tamagawa
IPC分类号： H02G7/02
CPC分类号： H01L21/6833 , H01L21/67248
摘要： There is provided an apparatus including: an electrostatic chuck for holding an object; and a base plate which supports the electrostatic chuck and controls a temperature of the electrostatic chuck. The electrostatic chuck is fixed onto the base plate via an adhesive layer. The electrostatic chuck includes: a base; an electrostatic electrode built in the base; and a mounting portion containing a dielectric material and detachably mounted on the base. The object is mounted on the mounting portion.
摘要翻译：提供了一种装置，包括：用于保持物体的静电卡盘; 以及支撑静电卡盘并控制静电卡盘的温度的基板。静电卡盘通过粘合剂层固定在基板上。静电卡盘包括：基座; 内置于基座内的静电电极; 以及包含介电材料并可拆卸地安装在基座上的安装部分。物体安装在安装部分上。

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