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31. 发明申请

US20050175920A1 Electrophotographic toner and production method therefor 有权
标题翻译：电子照相调色剂及其制备方法
公开(公告)号：US20050175920A1
公开(公告)日：2005-08-11
申请号：US10929678
申请日：2004-08-31
申请人： Yosuke Tsurumi , Hiroshi Nakazawa , Kazufumi Tomita , Shuji Sato , Akira Matsumoto
发明人： Yosuke Tsurumi , Hiroshi Nakazawa , Kazufumi Tomita , Shuji Sato , Akira Matsumoto
IPC分类号： G03G9/08 , G03G9/087
CPC分类号： G03G9/08782 , G03G9/0819 , G03G9/0821 , G03G9/0827 , G03G9/08795 , G03G9/08797
摘要： An electrophotographic toner contains a resin, a colorant and a releasing agent. The releasing agent has a solidifying point of from 79° C. to 109° C., and one peak in an endothermic curve measured by a differential scanning calorimeter. A difference between temperature to give a maximum endothermic peak of the releasing agent and an end-set temperature of the releasing agent is within 10° C. A melt viscosity of the releasing agent at 110° C. is in a range of from 4 mPa.s to 9 mPa.s. The releasing agent in one particle of the toner forms 3 or more domains. Domains having a ratio of a major axis to a minor axis which is in a range of from 5 to 15 occupy 90% or more by number based on the total number of domains.
摘要翻译：电子照相调色剂含有树脂，着色剂和脱模剂。脱模剂的固化点为79℃〜109℃，通过差示扫描量热计测定吸热曲线中的一个峰。脱模剂的最高吸热峰的温度与脱模剂的终止温度的差在10℃以内。脱模剂在110℃下的熔融粘度为4mPa .s至9 mPa.s. 调色剂的一个颗粒中的脱模剂形成3个或更多个结构域。具有5至15范围内的长轴与短轴的比例的畴占总数的90％以上。

32. 发明申请

US20050153244A1 Sulfonate derivatives and the use thereof as latent acids 有权
公开(公告)号：US20050153244A1
公开(公告)日：2005-07-14
申请号：US10495710
申请日：2003-01-28
申请人： Akira Matsumoto , Hitoshi Yamato , Toshikage Asakura , Peter Murer
发明人： Akira Matsumoto , Hitoshi Yamato , Toshikage Asakura , Peter Murer
IPC分类号： C07C301/00 , C07C309/67 , C07C309/68 , C07C317/04 , C07C317/14 , C07C323/66 , C07C381/00 , C07D209/48 , C07D209/76 , C07D291/00 , C07D333/36 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/075 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0037 , B33Y70/00 , C07C323/66 , C07C381/00 , G03F7/001 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0758 , Y10S430/114
摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH═CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example —OR20, —NR21R22, —SR23; X′ is —X1-A3-X2—; X1 and X2 are for example —O—, —S— or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is —S— or —O—; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a are phenyl or C1-C18alkyl; give high resolution with good resist profile.

33. 发明授权

US06826347B2 Two-dimensional optical element array and two-dimensional waveguide apparatus 有权
标题翻译：二维光学元件阵列和二维波导装置
公开(公告)号：US06826347B2
公开(公告)日：2004-11-30
申请号：US10190904
申请日：2002-07-08
申请人： Akira Matsumoto , Masashi Fukuyama , Akiyoshi Ide
发明人： Akira Matsumoto , Masashi Fukuyama , Akiyoshi Ide
IPC分类号： G02B600
CPC分类号： G02B6/3676 , G02B6/30 , G02B6/3636 , G02B6/3652 , G02B6/3839 , G02B6/3878 , G02B2006/1215
摘要： A two-dimensional optical element array with a high alignment precision of optical elements on a substrate and a high long-term reliability is provided. A two-dimensional optical fiber array includes a stacked plurality of optical fiber array units each having an optical fiber and a substrates, the substrate having one or more grooves each suited to a profile of the optical fiber on one of surfaces thereof, and one or more optical fibers being aligned and fixed in grooves, and is characterized in that optical fiber array units are stacked in a state such that surfaces of the substrates among adjacent two units out of the plurality of array units that face each other do not directly contact each other, and the adjacent two units do not have a direct mechanical influence on each other.
摘要翻译：提供了具有基板上的光学元件的高对准精度和高长期可靠性的二维光学元件阵列。二维光纤阵列包括层叠的多个光纤阵列单元，每个光纤阵列单元具有光纤和基板，该基板具有一个或多个凹槽，每个凹槽适合于光纤的一个表面上的轮廓，以及一个或多个更多的光纤被对准并固定在槽中，其特征在于，光纤阵列单元以这样的状态堆叠，使得彼此面对的多个阵列单元中相邻的两个单元之间的基板的表面不直接接触每个另外，相邻的两个单元之间没有直接的机械影响。

34. 发明授权

US06815148B2 Method of manufacturing a semiconductor device and designing a mask pattern 有权
标题翻译：制造半导体器件和设计掩模图案的方法
公开(公告)号：US06815148B2
公开(公告)日：2004-11-09
申请号：US10173037
申请日：2002-06-18
申请人： Akira Matsumoto
发明人： Akira Matsumoto
IPC分类号： G03F726
CPC分类号： H01L21/31144 , H01L21/76807
摘要： The present invention provides a method of manufacturing a semiconductor device and a method of designing a mask pattern which prevents dimensional errors caused by the difference in the resist film thickness, which is ascribed to a level-difference portion of an underlying layer. The present invention may be applied to transfer the pattern of a mask, which has a first pattern hole and a second pattern hole being different in size from each other, to a resist film covering an underlying layer having an uneven surface.
摘要翻译：本发明提供一种制造半导体器件的方法和设计掩模图案的方法，该掩模图案防止由于下层的电平差部分而导致的抗蚀剂膜厚度差异引起的尺寸误差。本发明可以应用于将具有第一图案孔和尺寸彼此不同的第二图案孔的掩模图案转印到覆盖具有不平坦表面的下层的抗蚀剂膜。

35. 发明授权

US06673850B1 Photoinitiators and their applications 失效
标题翻译：光引发剂及其应用
公开(公告)号：US06673850B1
公开(公告)日：2004-01-06
申请号：US09959174
申请日：2001-10-18
申请人： Hitoshi Yamato , Masaki Ohwa , Toshikage Asakura , Akira Matsumoto
发明人： Hitoshi Yamato , Masaki Ohwa , Toshikage Asakura , Akira Matsumoto
IPC分类号： C08F246
CPC分类号： C07D295/108 , B33Y70/00 , C07C323/54 , C08F2/50 , C08F293/005 , C08F295/00 , C08L53/00 , C08L53/02 , C09D153/00 , C09D153/02 , C09J153/00 , C09J153/02 , G03F7/031 , Y10S522/904
摘要： Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.
摘要翻译：具有链转移基团的式（Ia）或（Ib）的光引发剂，其中n为1或2; PI是例如式（IIa）的一组; PI“特别是一组式（IIIa）; Ar是例如苯基; Ar2尤其是亚苯基; R 1和R 2例如是C 1 -C 8烷基，或者R 1和R 2一起是C 2 -C 9亚烷基; M1特别是-NR 3 R 4或-OH; M1'例如是一组（c）; R3'是直接键，C1-C12亚烷基或亚苯基; R3是例如氢或C1-C12烷基; R4是例如 C 1 -C 12烷基; A1和A2例如是直接键; CT是链转移组; 可用于制备可用于制备嵌段共聚物的大分子引发剂。

36. 发明授权

US06596445B1 O-acyloxime photoinitiators 有权
标题翻译： O-酰基肟光引发剂
公开(公告)号：US06596445B1
公开(公告)日：2003-07-22
申请号：US09338152
申请日：1999-06-23
申请人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： C07C25164
CPC分类号： C07C251/66 , B33Y70/00 , C07C251/68 , C07C323/47 , C07D295/135 , C07D335/18 , C08F2/50 , G03F7/0007 , G03F7/002 , G03F7/0045 , G03F7/031 , G03F7/0388
摘要： Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
摘要翻译：式I，II，III和IV其中R 1的肟酯化合物是苯基，任选被-O - ，C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基，或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基，或R1'是苯氧基羰基，或R1'是-CONR10R11或CN; R2是C2-C12烷酰基，C4-C6链烯酰基，苯甲酰基，C2-C6烷氧基羰基或苯氧基羰基; R3，R4，R5，R6和R7是氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12烷酰基，C2-C12烷氧基羰基，苯氧基羰基或OR8，SR9，SOR9，SO2R9或NR10R11; R4'，R5'和R6'为氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12-烷酰基，C2-C12烷氧基羰基，苯氧基羰基，或为OR8，SR9，SOR9，SO2R9 ，NR10R11; 条件是R3，R4，R5，R6，R7，R'4，R'5和R'6中的至少一个是OR8，SR9或NR10R

37. 发明授权

US06489081B1 Organosilyl radical generators and their applications 失效
标题翻译：有机硅自由基发生器及其应用
公开(公告)号：US06489081B1
公开(公告)日：2002-12-03
申请号：US09726684
申请日：2000-11-30
申请人： Akira Matsumoto , Yoshihiko Ito
发明人： Akira Matsumoto , Yoshihiko Ito
IPC分类号： C07F502
CPC分类号： G03F7/029 , B33Y70/00 , C07F7/0803
摘要： Compounds of formula I wherein R1, R2, and R3 independently of one another are hydrogen; C1-C20alkyl which is unsubstituted or substituted by OH, C1-C4alkoxy, C1-C4alkylthio, phenylthio, F, Cl, Br, I, CN, (C1-8alkyl)O—(CO)—, (C1-C4alkyl)—(CO)O— or/and di(C1-C4alkyl)amino; or R1, R2, and R3 independently of one another are C3-C6alkenyl; phenyl which is unsubstituted or substituted by OH, C1-C4alkoxy, C1-C4alkylthio, phenylthio, F, Cl, Br, I, CN, (C1-C8alkyl)O(CO)—, (C1-C4alkyl)—(CO)O— or/— and di(C1-C4alkyl)amino; or R1 and R2 together are C2-C9alkylene, o-xylylene, 2-butenylene, C3-C9oxaalkylene or C3-C9azaalkylene; R4, R5, R6, and R7 independently of one another are sec-C3-C20alkyl, tert-C4-C20alkyl or phenyl wherein these radicals are unsubstituted or substituted by OH, C1-C4alkoxy, C1-C4alkylthio, phenylthio, F, Cl, Br, I, CN, (C1-C8alkyl)O(CO)—, (C1-C4alkyl)—(CO)O— or/and di(C1-C4alkyl)amino; or R4 and R5, and/or R6 and R7 together are C2-C9alkylene, o-xylylene, 2-butenylene, C3-C9oxaalkylene or C3-C9azaalkylene, or R4 and R6, and/or R5 and R7 together are branched C2-C9alkylene, o-xylylene, 2-butenylene, C3-C9oxaalkylene or C3-C9azaalkylene; are suitable as photoinitiators for the photopolymerization of unsaturated compounds.
摘要翻译： R1，R2和R3彼此独立的式Ⅰ化合物是氢; 未被取代或被OH，C 1 -C 4烷氧基，C 1 -C 4烷硫基，苯硫基，F，Cl，Br，I，CN，（C 1-8烷基）O-（CO） - ，（C 1 -C 4烷基） - CO）O-或/和二（C 1 -C 4烷基）氨基; 或R 1，R 2和R 3彼此独立地为C 3 -C 6烯基; 苯基，未取代或被OH，C1-C4烷氧基，C1-C4烷硫基，苯硫基，F，Cl，Br，I，CN，（C1-C8烷基）O（CO） - ，（C1-C4烷基） - （CO） - 或 - 和二（C 1 -C 4烷基）氨基; 或者R 1和R 2一起是C 2 -C 9亚烷基，邻亚二甲苯基，2-亚丁烯基，C 3 -C 9亚烷基或C 3 -C 9氮杂亚烷基; R 4，R 5，R 6和R 7彼此独立地为C 1 -C 3烷基，C 4 -C 20烷基或苯基，其中这些基团未被取代或被OH，C 1 -C 4烷氧基，C 1 -C 4烷硫基，苯硫基，F，Cl， Br，I，CN，（C 1 -C 8烷基）O（CO） - ，（C 1 -C 4烷基） - （CO）O-或/和二（C 1 -C 4烷基）或R 4和R 5，和/或R 6和R 7一起是C 2 -C 9亚烷基，邻亚二甲苯基，2-亚丁烯基，C 3 -C 9亚烷基或C 3 -C 9亚烷基，

38. 发明授权

US06485914B1 Method of detecting chlamydia pneumoniae gene using polynucleotides 失效
标题翻译：使用多核苷酸检测肺炎衣原体基因的方法
公开(公告)号：US06485914B1
公开(公告)日：2002-11-26
申请号：US09689914
申请日：2000-10-12
申请人： Hiroshi Izutsu , Kazuhiko Obara , Akira Matsumoto
发明人： Hiroshi Izutsu , Kazuhiko Obara , Akira Matsumoto
IPC分类号： C12Q168
CPC分类号： C12N9/003 , A61K38/00 , A61K39/00 , C07K14/295 , C07K2319/00
摘要： Chlamydia pneumoniae antigenic polypeptides, which comprise polypeptide A containing a sequence of at least 5 consecutive amino acids in the polypeptide of SEQ ID NO: 1; DNAs encoding the antigenic polypeptides, or DNAs complementary thereto; DNAs encoding the probes and primers for detection and/or measurement of Chlamydia pneumoniae gene. The present invention further provides a method for detection and/or measurement of Chlamydia pneumoniae gene, wherein the probe or primer is used; reagents for detection and/or measurement of Chlamydia pneumoniae gene, which comprise the probe or primer; and agents for diagnosis of Chlamydia pneumoniae infections, which comprise the probe or primer as an active ingredient.
摘要翻译：肺炎链球菌抗原多肽，其包含在SEQ ID NO：1的多肽中含有至少5个连续氨基酸的序列的多肽A. 编码抗原多肽的DNA或与其互补的DNA; 编码用于检测和/或测量肺炎衣原体基因的探针和引物的DNA。本发明还提供一种检测和/或测量肺炎衣原体基因的方法，其中使用探针或引物; 用于检测和/或测量肺炎衣原体基因的试剂，其包含探针或引物; 以及用于诊断肺炎衣原体感染的药剂，其包含探针或底物作为活性成分。

39. 发明授权

US06372628B1 Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device 失效
标题翻译：包含无定形氟化碳的绝缘膜，包括这种绝缘膜的半导体器件及其半导体器件的制造方法
公开(公告)号：US06372628B1
公开(公告)日：2002-04-16
申请号：US09579474
申请日：2000-05-26
申请人： Yoshihisa Matsubara , Ko Noguchi , Shinya Ito , Noriaki Oda , Akira Matsumoto , Takashi Ishigami , Masahiko Nakamae , Tadahiko Horiuchi , Kazuhiko Endo , Toru Tatsumi , Yoshishige Matsumoto
发明人： Yoshihisa Matsubara , Ko Noguchi , Shinya Ito , Noriaki Oda , Akira Matsumoto , Takashi Ishigami , Masahiko Nakamae , Tadahiko Horiuchi , Kazuhiko Endo , Toru Tatsumi , Yoshishige Matsumoto
IPC分类号： H01L214763
CPC分类号： H01L21/02118 , H01L21/02126 , H01L21/02164 , H01L21/0217 , H01L21/022 , H01L21/312 , H01L21/3185 , H01L21/76801 , H01L21/76802 , H01L21/76832 , H01L21/76834 , H01L23/53223 , H01L23/5329 , H01L2924/0002 , H01L2924/00
摘要： A structure and manufacturing process of a low dielectric constant interlayer insulating film used between wiring layers and semiconductor devices using such film are disclosed. The insulating film which can withstand in an actual process comprises an amorphous carbon fluoride film. A diamond like carbon film and a silicon excess layer are disposed on both sides of the amorphous carbon fluoride film to be inserted between the wiring layers, whereby adhesion to wiring and another insulating film contacting it is significantly enhanced. In addition, a silicon based insulating film is disposed and flattened on a multilayer film containing an amorphous carbon fluoride film buried with a wiring layer, and is used as a hard mask for anisotropically etching the diamond like carbon film and the amorphous carbon fluoride film with oxygen plasma to form a via hole.
摘要翻译：公开了在布线层和使用这种膜的半导体器件之间使用的低介电常数层间绝缘膜的结构和制造工艺。可以在实际工艺中承受的绝缘膜包括无定形氟化碳膜。在无定形氟化碳膜的两侧设置有类金刚石碳膜和硅过剩层，以插入布线层之间，从而显着提高与布线的接合和与其接触的另一绝缘膜。另外，将硅基绝缘膜设置并平坦化在含有埋设有布线层的无定形氟化碳膜的多层膜上，并且用作用于各向异性蚀刻金刚石状碳膜和无定形氟化碳膜的硬掩模，氧等离子体形成通孔。

40. 发明授权

US06330219B1 Disk recording/reproducing device 失效
标题翻译：磁盘记录/再现装置
公开(公告)号：US06330219B1
公开(公告)日：2001-12-11
申请号：US09047524
申请日：1998-03-25
申请人： Kenji Urushibara , Akira Matsumoto , Makoto Doi , Isamu Nakade
发明人： Kenji Urushibara , Akira Matsumoto , Makoto Doi , Isamu Nakade
IPC分类号： G11B2300
CPC分类号： G11B17/0282 , G11B17/028
摘要： A disk recording/reproducing device includes a power transmitting mechanism which transmits movement of a pickup while engaging with the pickup, and a disk retaining mechanism which, in response to the movement of the pickup transmitted by the power transmitting mechanism, retains a disk on a turntable or releases retention of the disk. Radially inward movement of the pickup causes the disk retaining mechanism to retain the disk on the turntable, while radially outward movement of the pickup causes the disk retaining mechanism to release retention of the disk. For accomplishing the release of the retention of the disk upon the radially outward movement of the pickup, an operation switching mechanism is provided for changing a position of the power transmitting mechanism to cause the power transmitting mechanism to engage with the pickup upon the radially outward movement of the pickup.
摘要翻译：磁盘记录/再现装置包括：电源传输机构，其在与拾取器接合的同时传送拾取器的运动;以及磁盘保持机构，其响应于由电力传输机构传送的拾取器的移动将磁盘保持在磁盘上转盘或释放磁盘的保留。拾取器的向内向内移动导致盘保持机构将盘保持在转台上，同时拾取器的径向向外移动使得盘保持机构释放盘的保持。为了在拾取器的径向向外移动时实现盘的保持释放，提供了一种操作切换机构，用于改变动力传递机构的位置，以使得动力传递机构在径向向外移动时与拾取器接合的皮卡。

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