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31. 发明申请

US20060147201A1 Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20060147201A1
公开(公告)日：2006-07-06
申请号：US11294877
申请日：2005-12-06
申请人： Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Koji Kaneyama , Tsuyoshi Okumura
发明人： Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Koji Kaneyama , Tsuyoshi Okumura
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.
摘要翻译：接口传送机构在将基板传送到曝光装置期间采用上手，并且在已经从曝光装置执行的基板的传送期间使用下手。第五中央机器人在通过曝光装置进行曝光处理之后的基板传送期间使用下手，并且在从干燥处理组进行的干燥处理之后的基板的输送过程中采用上手。也就是说，上面用于输送没有附着液体的基板，并且在曝光处理之后使用下手来输送附着有液体的基板。

32. 发明授权

US06832863B2 Substrate treating apparatus and method 有权
标题翻译：底物处理装置及方法
公开(公告)号：US06832863B2
公开(公告)日：2004-12-21
申请号：US10458719
申请日：2003-06-09
申请人： Kenji Sugimoto , Minobu Matsunaga , Masakazu Sanada , Katsushi Yoshioka , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama
发明人： Kenji Sugimoto , Minobu Matsunaga , Masakazu Sanada , Katsushi Yoshioka , Kaoru Aoki , Moritaka Yano , Satoshi Yamamoto , Tsuyoshi Mitsuhashi , Takashi Nagao , Mitsumasa Kodama
IPC分类号： G03D500
CPC分类号： H01L21/67173 , G03F7/70691 , H01L21/67178 , H01L21/67184 , H01L21/67276 , Y10S414/135 , Y10S414/14
摘要： A series of substrate transport paths for transporting substrates is arranged on upper and lower stories. Substrates are transferable between the substrate transport path on the first story and the substrate transport path on the second story. The paths include a going-only path for transporting the substrates forward, and a return-only path for transporting the substrates in the opposite direction, these paths being arranged on the upper and lower stories. An indexer connects one end of the substrate transport path on one story to one end of the substrate transport path on the other story. An interface connects the other end of the substrate transport path on one story to the other end of the substrate transport path on the other story. This construction efficiently reduces a waiting time due to interference between the substrates transported along the going-only path and the substrates transported along the return-only path.
摘要翻译：用于传送基板的一系列基板传送路径被布置在上层和下层。基底可以在第一层的基底输送路径和第二层的基底输送路径之间转移。这些路径包括用于向前传送基板的唯一路径，以及用于沿相反方向传送基板的返回路径，这些路径布置在上部和下部故事物上。分度器将另一个故事的基底传送路径的一端连接到基底传送路径的一端。一个界面将一个故事的基板传送路径的另一端连接到另一个故事的基板传送路径的另一端。这种构造有效地减少了由沿着仅路径传送的基板与沿着返回路径传送的基板之间的干涉导致的等待时间。

33. 发明授权

US06461805B1 Photothermographic material 失效
标题翻译：光热成像材料
公开(公告)号：US06461805B1
公开(公告)日：2002-10-08
申请号：US09817333
申请日：2001-03-16
申请人： Takeshi Habu , Shu Nishiwaki , Tsuyoshi Mitsuhashi , Toshihisa Takeyama , Takuji Hasegawa
发明人： Takeshi Habu , Shu Nishiwaki , Tsuyoshi Mitsuhashi , Toshihisa Takeyama , Takuji Hasegawa
IPC分类号： G03C1498
CPC分类号： G03C1/49845 , G03C1/04 , G03C1/49863 , G03C2200/50
摘要： A photothermograpahic material is disclosed having light-sensitive silver halide grains, an organic silver salt, a reducing agent and a binder, wherein the photothermographic material comprises a silane compound represented by formula (1) or (2): formula (1) (R1O)m—Si—[ (L1)xR2]n formula (2) wherein R1, R2, R3, R4, R5, R6, R7 and R8 represent each an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group; L1, L2, L3 and L4 represent each a bivalent linkage group; m and n are each an integer of 1 to 3, provided that m+n is 4; p1 and p2 are each an integer of 1 to 3 and q1 and q2 are each 0, 1 or 2, provided that p1+q1 and p2+q2 are each 3; r1 and t are each 0 or an integer of 1 to 1000; and x is 0 or 1. The photothermographic material is used on a support.
摘要翻译：公开了具有感光卤化银颗粒，有机银盐，还原剂和粘合剂的光热照相材料，其中光热敏成像材料包含由式（1）或（2）表示的硅烷化合物：式（1）式（ 2）其中R 1，R 2，R 3，R 4，R 5，R 6，R 7和R 8各自表示烷基，烯基，炔基，芳基或杂环基; L1，L2，L3和L4各自表示二价连接基团; m和n分别为1〜3的整数，条件是m + n为4; p1和p2各自为1〜3的整数，q1和q2分别为0,1或2，条件是p1 + q1和p2 + q2分别为3; r1和t分别为0或1〜1000的整数，并且x为0或1.光热敏成像材料用于支撑体上。

34. 发明授权

US5466571A Silver halide photographic light-sensitive material 失效
标题翻译：卤化银照相感光材料
公开(公告)号：US5466571A
公开(公告)日：1995-11-14
申请号：US420626
申请日：1995-04-12
申请人： Tsuyoshi Mitsuhashi , Nobuaki Kagawa
发明人： Tsuyoshi Mitsuhashi , Nobuaki Kagawa
IPC分类号： G03C1/00 , G03C1/09 , G03C1/22 , G03C1/26 , G03C1/08
CPC分类号： G03C1/09 , G03C1/22 , G03C1/26
摘要： A silver halide photographic light-sensitive material is disclosed which comprises a support and provided thereon, a light-sensitive silver halide emulsion layer containing silver halide grains, the silver halide grains are chemically sensitized by a selenium compound and spectrally sensitized by a dye represented by formula (S-1): ##STR1##
摘要翻译：公开了一种卤化银照相感光材料，其包含载体并且在其上提供含有卤化银颗粒的感光卤化银乳剂层，卤化银颗粒被硒化合物化学增感，并用由式（S-1）：式（S-1）

35. 发明授权

US09195140B2 Developing apparatus and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US09195140B2
公开(公告)日：2015-11-24
申请号：US13053946
申请日：2011-03-22
申请人： Tsuyoshi Mitsuhashi , Kenji Sugimoto
发明人： Tsuyoshi Mitsuhashi , Kenji Sugimoto
IPC分类号： G03D5/00 , G03F7/30 , H01L21/67
CPC分类号： G03F7/3021 , H01L21/67051 , H01L21/67253
摘要： A joint nozzle that delivers a developer, a rinsing liquid and nitrogen gas is disposed adjacent the spin center of a substrate in plan view. A controller operates electromagnetic switch valves to continue supply of the developer, while spinning the substrate, in a developing process, and to start supply of the rinsing liquid in a rinsing process, immediately after the supply of the developer ends, thereby achieving a shortened period of the developing process. A switching is made to a drying process by starting supply of the nitrogen gas immediately after completion of the rinsing process. Thus, even if the substrate has a large angle of contact, formation of droplets of the rinsing liquid is inhibited to prevent post-develop defects.
摘要翻译：在平面图中，与基板的旋转中心相邻地设置输送显影剂，冲洗液和氮气的接合喷嘴。控制器在显影过程中操作电磁切换阀以继续供应显影剂，同时旋转基底，并且在显影剂供应结束后立即在漂洗过程中开始供应冲洗液，从而实现缩短的周期的发展过程。通过在完成漂洗处理之后立即开始供应氮气，进行干燥过程的切换。因此，即使基板具有大的接触角，也可以抑制漂洗液的液滴的形成，防止显影后的缺陷。

36. 发明授权

US08585830B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08585830B2
公开(公告)日：2013-11-19
申请号：US12698870
申请日：2010-02-02
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： B08B3/00 , H01L21/31 , G03F7/00 , G03F1/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.
摘要翻译：一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜所述曝光装置进行曝光处理之前的单元。该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

37. 发明授权

US08545118B2 Substrate treating apparatus with inter-unit buffers 有权
标题翻译：具有单位间缓冲液的基板处理装置
公开(公告)号：US08545118B2
公开(公告)日：2013-10-01
申请号：US12324794
申请日：2008-11-26
申请人： Hiroyuki Ogura , Tsuyoshi Mitsuhashi , Yoshiteru Fukutomi , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
发明人： Hiroyuki Ogura , Tsuyoshi Mitsuhashi , Yoshiteru Fukutomi , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
IPC分类号： G03D5/00
CPC分类号： B05C13/00 , H01L21/67196 , H01L21/67201 , H01L21/67225
摘要： The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.
摘要翻译：本发明提供涂覆单元，热处理单元和用于将基底输送到这些处理单元中的每一个的第一主输送机构。基板通过接收器从第一主输送机构传送到第二主输送机构。当基板不能放置在接收器上时，将该基板放置在缓冲器上。因此，第一主输送机构可以继续输送其它基板。处理单元中的其它基材在处理单元之间没有延迟地输送，以接收包括涂覆处理和热处理的一系列处理。这防止了在基板上形成膜的处理质量的降低。

38. 发明申请

US20100136492A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20100136492A1
公开(公告)日：2010-06-03
申请号：US12698870
申请日：2010-02-02
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： G03F7/20
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.
摘要翻译：一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜所述曝光装置进行曝光处理之前的单元。该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

39. 发明申请

US20090139833A1 MULTI-LINE SUBSTRATE TREATING APPARATUS 审中-公开
标题翻译：多线基板处理设备
公开(公告)号：US20090139833A1
公开(公告)日：2009-06-04
申请号：US12324788
申请日：2008-11-26
申请人： Hiroyuki Ogura , Tsuyoshi Mitsuhashi , Yoshiteru Fukutomi , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
发明人： Hiroyuki Ogura , Tsuyoshi Mitsuhashi , Yoshiteru Fukutomi , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
IPC分类号： B65G43/08
CPC分类号： H01L21/67178 , H01L21/6715 , H01L21/67173 , H01L21/67276 , H01L21/67742
摘要： A substrate treating apparatus includes substrate treatment lines arranged one over another, each for treating substrates while transporting the substrates substantially horizontally. The apparatus further includes an interface section for transporting the substrates between the substrate treatment lines and an exposing machine having a plurality of exposing stages, the exposing machine being provided separately from the apparatus, and a controller for controlling transport of the substrates in the interface section to cause all the substrates similarly treated in each of the substrate treatment lines to be exposed on one of the exposing stages. This apparatus can uniform the quality of treatment among a plurality of substrates receiving the same type of treatment in the same substrate treating line.
摘要翻译：基板处理装置包括彼此重叠布置的基板处理线，每个基板处理线基本上水平地输送基板，用于处理基板。该装置还包括用于在基板处理线之间输送基板的接口部分和具有多个曝光台的曝光机，所述曝光机与所述装置分开设置，以及用于控制所述基板在所述界面部分中的传送的控制器使得在每个基板处理线中类似地处理的所有基板在一个曝光阶段上暴露。该装置可以在同一基板处理线中接收相同类型处理的多个基板之间使处理质量均匀。

40. 发明申请

US20090139450A1 MULTI-STORY SUBSTRATE TREATING APPARATUS WITH FLEXIBLE TRANSPORT MECHANISMS 有权
标题翻译：具有灵活运输机制的多层底板处理设备
公开(公告)号：US20090139450A1
公开(公告)日：2009-06-04
申请号：US12324802
申请日：2008-11-26
申请人： Hiroyuki Ogura , Tsuyoshi Mitsuhashi , Yoshiteru Fukutomi , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
发明人： Hiroyuki Ogura , Tsuyoshi Mitsuhashi , Yoshiteru Fukutomi , Kenya Morinishi , Yasuo Kawamatsu , Hiromichi Nagashima
IPC分类号： B05C11/00
CPC分类号： B05C13/00 , B05C9/12 , B05C11/08 , B05C13/02 , C23C14/568 , G03F7/16 , H01L21/67173 , H01L21/67178 , H01L21/67276 , H01L21/67703 , H01L21/67742 , H01L21/67745 , Y10S414/135
摘要： A treating section includes a plurality of treating blocks juxtaposed horizontally. Each treating block is vertically divided into stories. Each story includes treating units and a main transport mechanism. Substrates are transportable between the same stories of the treating blocks. Further, the substrates are transportable between different stories. Thus, the apparatus can transport the substrates flexibly between the treating blocks.
摘要翻译：处理部包括水平并列的多个处理块。每个处理块垂直分为故事。每个故事包括处理单位和主要运输机制。底物可在治疗块的相同故事之间运输。此外，基材可在不同的故事之间运输。因此，该装置可以在处理块之间灵活地输送基板。

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