会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 35. 发明授权
    • Scanning exposure apparatus in which light exposure is a function of the
speed of the mask or substrate stage
    • 曝光是掩模或基板台的速度的函数的扫描曝光装置
    • US5995203A
    • 1999-11-30
    • US715641
    • 1996-09-18
    • Toshio Ueda
    • Toshio Ueda
    • G03F7/20G03F9/00H01L21/027G03B27/42G03B27/54G03B27/72
    • G03F7/70558G03F7/70358G03F7/70716G03F7/70725G03F9/70
    • When the scanning of a mask stage and a substrate stage is started, an interferometer measures the position of the substrate stage, while an interferometer unit differentiates the output of the interferometer to give a speed signal on the substrate stage, and delivers this speed signal. A main control unit produces a target value for the amount of exposure light adapted to this speed signal. A light amount adjustment system adjusts the amount of exposure light from an exposure light source in response to the target value calculated by the main control unit. Thus, exposure with appropriate amount of light adapted to the speed of the substrate stage is performed over all of the time zones from the start of drive of the substrate stage in the scan direction until its standstill. Hence, the exposure time can be shortened, and the throughput can be increased, in comparison with exposure being performed only in the constant speed zone of the stage.
    • 当开始掩模阶段和衬底台的扫描时,干涉仪测量衬底台的位置,而干涉仪单元区分干涉仪的输出以在衬底台上给出速度信号,并传送该速度信号。 主控制单元产生适合该速度信号的曝光量的目标值。 光量调节系统响应于由主控制单元计算的目标值来调节来自曝光光源的曝光光量。 因此,在从扫描方向的驱动开始到停止的扫描方向的所有时间区域都进行适合于基板台的速度的适当量的光的曝光。 因此,与仅在阶段的恒定速度区域进行曝光相比,可以缩短曝光时间,并且可以提高吞吐量。