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    • 32. 发明授权
    • Sputtering system
    • 溅射系统
    • US6077406A
    • 2000-06-20
    • US292623
    • 1999-04-16
    • Takashi KawakuboKenya SanoRyoichi OharaKatsutaro Ichihara
    • Takashi KawakuboKenya SanoRyoichi OharaKatsutaro Ichihara
    • C23C14/22C23C14/34C23C14/35H01J37/34H01L21/203H01L39/24C23C14/00
    • C23C14/225C23C14/3407C23C14/35H01J37/3405
    • A sputtering system comprises: a substrate holder for holding a substrate; and a cathode having a magnet therein and holding a target, the cathode being off-axis aligned with respect to the substrate. The cathode may comprise a plurality of cathodes, each of which has a flat backing plate, and two targets supported on both sides of the backing plate, the target being off-axis aligned with respect to the thin-film deposited surface of the substrate. The target may be supported on the side surface of a cylindrical or prismatic cathode body having a magnet therein, and the target being off-axis aligned with respect to the thin-film deposited surface of the substrate. Thus, if at least a part of the plurality of cathodes face the thin-film deposited surface of the substrate to be off-axis aligned, it is possible to enhance the inplane uniformity of film thickness, composition and crystallinity of a thin-film deposited on a substrate having a large diameter while inhibiting the substrate from being damaged by the irradiation with high energy particles, and to accelerate the thin film deposition rate.
    • 溅射系统包括:用于保持基板的基板保持器; 以及其中具有磁体并保持靶的阴极,阴极相对于衬底偏轴对准。 阴极可以包括多个阴极,每个阴极具有平的背板,并且支撑在背板的两侧上的两个靶,靶相对于衬底的薄膜沉积表面离轴对准。 靶可以被支撑在其中具有磁体的圆柱形或棱柱形阴极体的侧表面上,并且靶相对于衬底的薄膜沉积表面离轴对准。 因此,如果多个阴极的至少一部分面对基板的薄膜沉积表面以使其离轴对准,则可以增强薄膜沉积的薄膜厚度,组成和结晶度的面内均匀性 在具有大直径的基板上,同时抑制基板被高能粒子的照射损坏,并且加速薄膜沉积速率。
    • 33. 发明申请
    • Method for manufacturing an infrared detection element
    • 红外线检测元件的制造方法
    • US20050006584A1
    • 2005-01-13
    • US10901110
    • 2004-07-29
    • Takashi KawakuboKazuhide AbeKenya Sano
    • Takashi KawakuboKazuhide AbeKenya Sano
    • G01J1/02G01J5/02G01J5/34H01L37/02G01J5/10H01L37/00
    • H01L37/02
    • The present invention provides an infrared detection element having a single-crystalline base layer 3 with a thickness of 50 nm to 10 μm having a principal surface, a first electrode layer 4 formed on the principal surface of the single-crystalline base layer 3, a ferroelectric layer 5 which is formed on the first electrode layer 4 and is composed of a single-crystalline layer or a unidirectioally oriented layer. Distortion of the single-crystalline layer or a unidirectioally oriented layer in a surface parallel to the principal surface of the single-crystalline base layer 3 is elastically constrained by the single-crystalline base layer 3. The infrared detection element further has a second electrode layer 6 formed on the ferroelectric layer 5. An amount of charge is changed by changes in temperature caused by irradiation of infrared light to the ferroelectric layer 5. The amount of the charge is detected from the first and the second electrode layer4, 6. With the infrared detection element, an accurate temperature measurement is possible even in the neighborhood of the Curie temperature due to a discontinuous primary phase transition.
    • 本发明提供一种红外线检测元件,其具有厚度为50nm〜10μm的具有主面的单晶基底层3,形成在单晶基底层3的主面上的第一电极层4, 形成在第一电极层4上并由单晶层或单向取向层构成的铁电体层5。 在与单晶基底层3的主表面平行的表面中的单晶层或单向取向层的失真由单晶基底层3弹性约束。红外线检测元件还具有第二电极层 形成在铁电层5上的电荷量。由于红外光照射到铁电层5而引起的温度变化,电荷量被改变。从第一和第二电极层4,6检测电荷量。 红外线检测元件,由于不连续的初级相变,即使在居里温度附近也可进行精确的温度测量。
    • 34. 发明授权
    • Infrared detection element and infrared detector
    • 红外探测元件和红外探测器
    • US06797957B2
    • 2004-09-28
    • US10097405
    • 2002-03-15
    • Takashi KawakuboKazuhide AbeKenya Sano
    • Takashi KawakuboKazuhide AbeKenya Sano
    • H01L3702
    • H01L37/02
    • An infrared detection element having a single-crystalline base layer 3 with a thickness of 50 nm to 10 &mgr;m having a principal surface, a first electrode layer 4 formed on the principal surface of the single-crystalline base layer 3, a ferroelectric layer 5 which is formed on the first electrode layer 4 and is composed of a single-crystalline layer or a unidirectionally oriented layer. Distortion of the single-crystalline layer or a unidirectionally oriented layer in a surface parallel to the principal surface of the single-crystalline base layer 3 is elastically constrained by the single-crystalline base layer 3. The infrared detection element further has a second electrode layer 6 formed on the ferroelectric layer 5. An amount of charge varies with changes in temperature caused by irradiation of infrared light to the ferroelectric layer 5.
    • 具有厚度为50nm〜10μm的具有主面的单晶基底层3的红外线检测元件,形成在单晶基底层3的主面上的第一电极层4,强电介质层5 形成在第一电极层4上,由单晶层或单向取向层构成。 在与单晶基底层3的主表面平行的表面中的单晶层或单向取向层的失真由单晶基底层3弹性约束。红外线检测元件还具有第二电极层 形成在铁电层5上。电荷量随着红外光照射到铁电层5而引起的温度变化。
    • 35. 发明授权
    • Thin film capacitor
    • 薄膜电容器
    • US5889299A
    • 1999-03-30
    • US804394
    • 1997-02-21
    • Kazuhide AbeShuichi KomatsuMitsuaki IzuhaNoburu FukushimaKenya SanoTakashi Kawakubo
    • Kazuhide AbeShuichi KomatsuMitsuaki IzuhaNoburu FukushimaKenya SanoTakashi Kawakubo
    • H01L21/02H01L29/76
    • H01L28/55
    • A thin film capacitor including a first electrode having on its surface a (100) face of cubic system or a (001) face of tetragonal system, a dielectric thin film epitaxially grown on the first electrode and exhibiting a crystal structure which inherently belongs to a perovskite structure of cubic system, and a second electrode formed on the dielectric thin film. Further, the dielectric thin film meets the following relationship V/V.sub.0 .gtoreq.1.01 where a unit lattice volume of true perovskite crystal structure belonging to the cubic system (lattice constant a.sub.0) is represented by V.sub.0 =a.sub.0.sup.3, and a unit lattice volume (lattice constant a=b.noteq.c) which is strained toward a tetragonal system after the epitaxial growth is represented by V=a.sup.2 c, and also meets the following relationship c/a.gtoreq.1.01 where c/a represents a ratio between a lattice constant "c" in the direction thicknesswise of the film and a lattice constant "a" in the direction parallel with a plane of the film.
    • 一种薄膜电容器,包括在其表面上具有立方体系的(100)面或四方晶系的(001)面的第一电极,在第一电极上外延生长并呈现出固有地属于 立方体的钙钛矿结构,以及形成在电介质薄膜上的第二电极。 此外,电介质薄膜满足以下关系V / V0 / = 1.01,其中属于立方体系的真实钙钛矿晶体结构的单位晶格体积(晶格常数a0)由V0 = a03表示,单位晶格体积 晶格常数a = b NOTEQUAL c),其外延生长后由V = a2c表示为四方晶系,并满足以下关系c / a> / = 1.01其中c / a表示晶格常数 在膜的厚度方向上的“c”和与膜的平面平行的方向上的晶格常数“a”。
    • 40. 发明授权
    • Film bulk acoustic resonator and method for manufacturing the same
    • 薄膜体声波谐振器及其制造方法
    • US07321183B2
    • 2008-01-22
    • US10890989
    • 2004-07-15
    • Yasuo EbuchiTakako MotaiKenya Sano
    • Yasuo EbuchiTakako MotaiKenya Sano
    • H01L41/053H01L41/083
    • H03H9/172H03H3/02H03H9/02125H03H9/02133H03H9/173H03H9/587
    • A film bulk acoustic resonator, includes first to fourth insulator patterns disposed apart from each other. The third and fourth insulator patterns are disposed opposite the second and first insulator patterns in relation to the first and second insulating patterns, respectively. A bottom conductive layer is disposed above the first and third insulator patterns spreading from a region between the first and second insulator patterns to the third insulator pattern. A piezoelectric film is provided on the bottom conductive layer, disposed above the region between the first and second insulating patterns. A top conductive layer is facing the bottom conductive layer so as to sandwich the piezoelectric film, spreading from the region between the first and second insulator patterns to the fourth insulator pattern.
    • 薄膜体声波谐振器包括彼此分开布置的第一至第四绝缘体图案。 第三绝缘体图案和第四绝缘体图案分别相对于第一和第二绝缘图案与第二和第一绝缘体图案相对设置。 底部导电层设置在从第一和第二绝缘体图案之间的区域延伸到第三绝缘体图案的第一和第三绝缘体图案之上。 在底部导电层上设置压电薄膜,设置在第一和第二绝缘图案之间的区域之上。 顶部导电层面向底部导电层,以夹持压电膜,从第一和第二绝缘体图案之间的区域延伸到第四绝缘体图案。