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    • 1. 发明授权
    • Thin film capacitor
    • 薄膜电容器
    • US5889299A
    • 1999-03-30
    • US804394
    • 1997-02-21
    • Kazuhide AbeShuichi KomatsuMitsuaki IzuhaNoburu FukushimaKenya SanoTakashi Kawakubo
    • Kazuhide AbeShuichi KomatsuMitsuaki IzuhaNoburu FukushimaKenya SanoTakashi Kawakubo
    • H01L21/02H01L29/76
    • H01L28/55
    • A thin film capacitor including a first electrode having on its surface a (100) face of cubic system or a (001) face of tetragonal system, a dielectric thin film epitaxially grown on the first electrode and exhibiting a crystal structure which inherently belongs to a perovskite structure of cubic system, and a second electrode formed on the dielectric thin film. Further, the dielectric thin film meets the following relationship V/V.sub.0 .gtoreq.1.01 where a unit lattice volume of true perovskite crystal structure belonging to the cubic system (lattice constant a.sub.0) is represented by V.sub.0 =a.sub.0.sup.3, and a unit lattice volume (lattice constant a=b.noteq.c) which is strained toward a tetragonal system after the epitaxial growth is represented by V=a.sup.2 c, and also meets the following relationship c/a.gtoreq.1.01 where c/a represents a ratio between a lattice constant "c" in the direction thicknesswise of the film and a lattice constant "a" in the direction parallel with a plane of the film.
    • 一种薄膜电容器,包括在其表面上具有立方体系的(100)面或四方晶系的(001)面的第一电极,在第一电极上外延生长并呈现出固有地属于 立方体的钙钛矿结构,以及形成在电介质薄膜上的第二电极。 此外,电介质薄膜满足以下关系V / V0 / = 1.01,其中属于立方体系的真实钙钛矿晶体结构的单位晶格体积(晶格常数a0)由V0 = a03表示,单位晶格体积 晶格常数a = b NOTEQUAL c),其外延生长后由V = a2c表示为四方晶系,并满足以下关系c / a> / = 1.01其中c / a表示晶格常数 在膜的厚度方向上的“c”和与膜的平面平行的方向上的晶格常数“a”。