专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US06940069B2 Pattern inspection method and apparatus using electron beam 有权
标题翻译：使用电子束的图案检查方法和装置
公开(公告)号：US06940069B2
公开(公告)日：2005-09-06
申请号：US10637496
申请日：2003-08-11
申请人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
发明人： Takashi Hiroi , Asahiro Kuni , Masahiro Watanabe , Chie Shishido , Hiroyuki Shinada , Yasuhiro Gunji , Atsuko Takafuji
IPC分类号： G01N23/04 , G01N23/20 , G01N23/225 , G01Q30/04 , G02F1/13 , G06T1/00 , G21K7/00 , H01J37/22 , H01J37/244 , H01J37/28 , G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2817
摘要： A pattern inspection method which irradiates a charged particle beam onto a surface of a specimen on which a pattern is formed, simultaneously detecting with plural sensors secondary particles emanated from the surface of the specimen by the irradiation, adding signals outputted from each sensor of the plural sensors which simultaneously detected the secondary particles, obtaining an image of the surface of the specimen on which the pattern is formed from the added signals and processing the image to detect a defect of the pattern.
摘要翻译：将带电粒子束照射在其上形成有图案的样本的表面上的图案检查方法，同时利用多个传感器检测从照射后从样品表面发出的二次粒子，从多个传感器的每个传感器输出的相加信号同时检测次级粒子的传感器，从附加的信号获得形成有图案的样本的表面的图像，并处理图像以检测图案的缺陷。

32. 发明授权

US06465781B1 Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus 有权
标题翻译：用于基于带电粒子束成像检查或测量样品的方法和装置，以及带电粒子束装置
公开(公告)号：US06465781B1
公开(公告)日：2002-10-15
申请号：US09589065
申请日：2000-06-08
申请人： Norimasa Nishimura , Akira Shimase , Masahiro Watanabe , Asahiro Kuni , Taku Ninomiya , Hiroshi Miyai
发明人： Norimasa Nishimura , Akira Shimase , Masahiro Watanabe , Asahiro Kuni , Taku Ninomiya , Hiroshi Miyai
IPC分类号： G01N2300
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/0047 , H01J2237/2482 , H01J2237/2817
摘要： A method and an apparatus for inspecting or measuring a sample based on charged-particle beam are provided to relieve charge-up of the sample, so that high-quality electron image is obtained. A UV light irradiation optical system is controlled by an irradiation controller, scanning of the charged-particle beam is controlled by a scanning controller, and the irradiation controller and the scanning controller are controlled by a general controller. They are mutually synchronized, and a signal from an electron detector is imaged by an image slicing circuit and an image processing circuit.
摘要翻译：提供了一种用于基于带电粒子束检查或测量样品的方法和装置，以减轻样品的电荷，从而获得高质量的电子图像。 UV照射光学系统由照射控制器控制，由扫描控制器控制带电粒子束的扫描，照射控制器和扫描控制器由通用控制器控制。它们相互同步，并且来自电子检测器的信号由图像分割电路和图像处理电路成像。

33. 发明申请

US20050080647A1 Business process diagnostic method and business process diagnostic system 审中-公开
标题翻译：业务流程诊断方法和业务流程诊断系统
公开(公告)号：US20050080647A1
公开(公告)日：2005-04-14
申请号：US10929418
申请日：2004-08-31
申请人： Koji Okada , Tatsuya Suzuki , Asahiro Kuni
发明人： Koji Okada , Tatsuya Suzuki , Asahiro Kuni
IPC分类号： G06Q10/00 , G06Q10/06 , G06Q50/00 , G06F17/60
CPC分类号： G06Q10/06 , G06Q30/0203
摘要： In business process diagnosis, answers to questions is improved in their accuracy, and an accurate result of diagnosis is obtained. A computer diagnoses a business process of an organization based on answers to questions. The diagnosis includes a first answer reception step in which a first question sheet containing common questions is displayed to receive answers to said common questions and to receive questions proper to the organization, and then a second question sheet containing said common questions, said answers to the common questions, and said questions proper to the organization is generated; a second answer reception step in which said second question sheet is displayed to receive answers to said questions proper to the organization, and then a third question sheet containing said common questions, said answers to the common questions, said questions proper to the organization, and said answers to the questions proper to the organization is generated; and a diagnosis step in which the business process of said organization is diagnosed based on the answers to said common questions and the answers to said questions proper to the organization, with said answers to said common questions and said answers to said questions proper to the organization being filled in said third question sheet.
摘要翻译：在业务流程诊断中，问题的答案在准确性方面得到改进，得到了准确的诊断结果。计算机根据问题的答案诊断组织的业务流程。诊断包括第一答案接收步骤，其中显示包含常见问题的第一问题单以接收对所述常见问题的答案并且接收适合于该组织的问题，然后包含包含所述常见问题的第二个问题单，对共同的问题，并提出了适合组织的问题; 第二回答接收步骤，其中显示所述第二问题单以接收对组织适当的所述问题的答案，然后包含第三个问题单，其中包含所述常见问题，常见问题的答案，对组织适用的所述问题，以及表示对组织适用的问题的答案是产生的; 以及诊断步骤，其中基于所述常见问题的答案和对组织适当的所述问题的答案来诊断所述组织的业务流程，所述答案涉及对所述组织适合的所述常见问题和所述问题的答案填写在第三个问题单中。

34. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

35. 发明授权

US4647196A Surface flaw detection method 失效
标题翻译：表面探伤法
公开(公告)号：US4647196A
公开(公告)日：1987-03-03
申请号：US695231
申请日：1985-01-28
申请人： Asahiro Kuni , Kazuo Yamaguchi , Nobuyuki Akiyama , Juro Endo
发明人： Asahiro Kuni , Kazuo Yamaguchi , Nobuyuki Akiyama , Juro Endo
IPC分类号： G01B9/02 , G01N21/88
CPC分类号： G01N21/88 , G01B9/02021 , G01B9/02032
摘要： A flaw detection method for detecting flaw existing in the surface of a substantially plate-shaped examination object by making use of an interference of light. A coherent light is applied to the surface of the examination object and also to a reference mirror surface. The light reflected by the surface of the examination object and the light reflected by the reference mirror surface are made to interfere with each other to form an interference image from which the flaw is detected. The reference mirror surface is disposed at an optical inclination to the surface of the examination object. The reference mirror surface may be the reverse surface of the examination object while the obserse side of the same is being examined. Infrared coherent ray is preferably used as the coherent light.
摘要翻译：一种用于通过利用光的干涉来检测存在于基本上板状的检查对象的表面中的缺陷的探伤方法。相干光被施加到检查对象的表面，并且也被施加到参考镜表面。由检查对象的表面反射的光和由参考镜面反射的光被相互干涉，形成检测出缺陷的干涉图像。参考镜面设置在与检查对象表面成光学倾斜度。参考镜面可以是检查对象的反面，同时正在检查异物侧。红外相干光线优选用作相干光。

36. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

37. 发明授权

US5463667A Inspection method for soldered joints using x-ray imaging and apparatus therefor 失效
标题翻译：使用X射线成像的焊接接头的检查方法及其设备
公开(公告)号：US5463667A
公开(公告)日：1995-10-31
申请号：US53240
申请日：1993-04-28
申请人： Toshiaki Ichinose , Takanori Ninomiya , Asahiro Kuni , Kozo Nakahata , Toshimitsu Hamada , Toshihiko Ayabe
发明人： Toshiaki Ichinose , Takanori Ninomiya , Asahiro Kuni , Kozo Nakahata , Toshimitsu Hamada , Toshihiko Ayabe
IPC分类号： G01N23/04 , H01L21/66 , H01L23/50 , H05K3/34 , H05K13/08
CPC分类号： H05K13/08 , G01N23/04
摘要： A method and an apparatus for inspecting a soldered joint with an X-ray, the soldered joint being formed by soldering a lead to a surface of a substrate. The method may include moving the substrate so as to move the surface of the substrate in an XY plane to position the soldered joint at a desired position in the XY plane, rotating the substrate so as to rotate the surface of the substrate in the XY plane to position the soldered joint at a desired orientation in the XY plane, rotating an X-ray source and a detector about the soldered joint in both of two mutually perpendicular planes perpendicular to the XY plane while maintaining the X-ray source and the detector at fixed positions relative to each other to establish a desired oblique irradiation angle between an X-ray from the X-ray source and the lead on the surface of the substrate, irradiating the soldered joint with the X-ray from the X-ray source at the desired oblique irradiation angle such that the X-ray is transmitted through the soldered joint and the substrate, detecting the X-ray transmitted through the soldered joint and the substrate with the detector, the detector producing an output signal indicative of the detected X-ray, and determining a condition of the soldered joint based on the output signal of the detector. The apparatus may operate in the same fashion.
摘要翻译：一种用X射线检测焊接接头的方法和装置，所述焊接接头通过将引线焊接到基板的表面而形成。该方法可以包括移动基板以使基板的表面在XY平面中移动，以将焊接接头定位在XY平面中的期望位置，旋转基板以使基板的表面在XY平面中旋转将焊接接头定位在XY平面中所需的取向上，使X射线源和检测器围绕焊接接头在与XY平面垂直的两个相互垂直的平面中旋转，同时将X射线源和检测器保持在固定位置，以建立来自X射线源的X射线与衬底表面上的铅之间的期望的倾斜照射角度，用X射线源的X射线照射焊接接头所需的倾斜照射角度，使得X射线透射通过焊接接头和基板，通过检测器检测透过焊接接头和基板的X射线，检测器产品选择表示检测到的X射线的输出信号，以及基于检测器的输出信号确定焊接接头的状态。该装置可以以相同的方式操作。

38. 发明授权

US4666291A Light-exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4666291A
公开(公告)日：1987-05-19
申请号：US852729
申请日：1986-04-16
申请人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
发明人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
IPC分类号： H01L51/00 , G03F7/20 , G03F9/00 , G03B27/68
CPC分类号： G03F9/7053 , G03F7/703 , G03F7/707
摘要： A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.
摘要翻译：能够使掩模和晶片之间的间隙保持均匀并且减小适于使晶片变形的垂直移动器的布置密度，从而降低装置的成本和重量的曝光装置。该装置具有薄板变形机构，其包括用于在其顶表面上保持晶片的卡盘台板，卡盘台板的底表面形成为由多个三角形网格构成的网格形式的无孔狭缝，使得卡盘台板可以沿着三角形网格附近的弯曲线变形，并且多个垂直移动器用于使各个三角形网格垂直变形，以使其平坦化或变形成所需形状的晶片。

39. 发明授权

US4449818A Method of inspecting microscopic surface defects 失效
标题翻译：检查微观表面缺陷的方法
公开(公告)号：US4449818A
公开(公告)日：1984-05-22
申请号：US347248
申请日：1982-02-09
申请人： Kazuo Yamaguchi , Asahiro Kuni , Nobuyuki Akiyama , Juro Endo
发明人： Kazuo Yamaguchi , Asahiro Kuni , Nobuyuki Akiyama , Juro Endo
IPC分类号： G01N21/84 , G01N21/88 , G01N21/94 , G01N21/956 , G01N21/00
CPC分类号： G01N21/88
摘要： A method is provided for inspecting defects in the surface of an object to be inspected, wherein oblique lighting and perpendicular lighting are alternately applied to a location where a defect or a foreign substance possibly exists. Brightness detected in the location under the application of oblique lighting is evaluated as a foreign substance so as to be discriminated from a defect. Defects are classified through shape recognition of a defect pattern obtained under the application of perpendicular lighting.
摘要翻译：提供了一种用于检查待检查物体的表面中的缺陷的方法，其中倾斜照明和垂直照明交替施加到可能存在缺陷或异物的位置。在倾斜照明的应用下，在该位置处检测到的亮度被评价为异物，以便与缺陷区分开来。通过在垂直照明的应用下获得的缺陷图案的形状识别来分类缺陷。

40. 发明授权

US4814615A Method and apparatus for detecting defect in circuit pattern of a mask for X-ray exposure 失效
标题翻译：用于检测用于X射线曝光的掩模的电路图案中的缺陷的方法和装置
公开(公告)号：US4814615A
公开(公告)日：1989-03-21
申请号：US45538
申请日：1987-05-04
申请人： Satoru Fushimi , Yasuo Nakagawa , Asahiro Kuni , Hitoshi Kubota , Hiroya Koshishiba
发明人： Satoru Fushimi , Yasuo Nakagawa , Asahiro Kuni , Hitoshi Kubota , Hiroya Koshishiba
IPC分类号： H01L21/66 , G01B15/00 , G01N23/02 , G02B21/00 , G03F1/00 , G03F1/84 , G03F1/86 , H01J37/26 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/86 , H01J37/3174 , H01J2237/2802 , H01J2237/31798
摘要： In accordance with the present invention, there is provided a pattern defect detecting apparatus using a scanning and transmission electron microscope, comprising an electron gun for accelerating an electron beam with high energy enough to transmit it through a sample and for radiating the accelerated electron beam, a condenser lens for focusing the electron beam generated by said electron gun, a beam deflection coil for deflecting the electron beam focused by said condenser lens, an objective lens for further focusing the electron beam deflected by said beam deflection coil onto a fixed spot, an XY stage for disposing the sample so as to be opposed to said objective lens, said XY stage being movable in X and Y directions in a step and repeat manner, a sample chamber for housing the XY stage in vacuum, said sample chamber including at least the outlet of the electron beam of said objective lens, an electron beam detector for detecting electron beams transmitted through said sample, said electron beam detector being fixed to a stationary member such as said chamber or a lens barrel, and defect detecting means for scanning the electron beam by using said beam deflection coil for each step and repeat operation of said XY stage, for comparing a video signal obtained from said electron beam detector with a reference pattern read out from memory means, and for thereby detecting a defect of the sample.
摘要翻译：根据本发明，提供了一种使用扫描和透射电子显微镜的图案缺陷检测装置，其包括用于加速具有足够高能量的电子束以通过样品透射并用于辐射加速电子束的电子枪的电子枪，用于聚焦由所述电子枪产生的电子束的聚光透镜，用于偏转由所述聚光透镜聚焦的电子束的光束偏转线圈，用于将由所述光束偏转线圈偏转的电子束进一步聚焦到固定点上的物镜， XY台，用于将样品设置为与所述物镜相对，所述XY台可以在X和Y方向上以一个步骤和重复的方式移动，用于在XY真空中容纳XY台的样品室，所述样品室至少包括所述物镜的电子束的出口，用于检测透过所述样品的电子束的电子束检测器 d电子束检测器固定到诸如所述腔室或透镜镜筒之类的静止构件上，以及缺陷检测装置，用于通过每个步骤使用所述光束偏转线圈扫描电子束，并重复所述XY平台的操作，用于比较视频信号从所述电子束检测器获得从存储装置读出的参考图案，从而检测样品的缺陷。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式