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31. 发明申请

US20060024622A1 Developing method and apparatus 失效
公开(公告)号：US20060024622A1
公开(公告)日：2006-02-02
申请号：US11229534
申请日：2005-09-20
申请人： Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
发明人： Kiyohisa Tateyama , Masafumi Nomura , Taketora Shinogi
IPC分类号： G03C3/00
CPC分类号： G03D3/065 , G03D3/06 , G03F7/30 , G03F7/3071 , H01L21/6715 , H01L21/67253
摘要： In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.

32. 发明授权

US06447608B1 Spin coating apparatus 有权
标题翻译：旋涂机
公开(公告)号：US06447608B1
公开(公告)日：2002-09-10
申请号：US09675178
申请日：2000-09-29
申请人： Mitsuhiro Sakai , Hideyuki Takamori , Masafumi Nomura
发明人： Mitsuhiro Sakai , Hideyuki Takamori , Masafumi Nomura
IPC分类号： B05C1302
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005 , G03F7/162
摘要： A coating process comprises the steps of (a) holding a-substrate using a spin chuck surrounded by inner and outer cups, such that the substrate can rotate, (b) rotating the substrate by rotating the spin chuck, and applying a coating liquid onto the substrate, thereby forming a coating on the substrate, (c) discharging, from the inner and outer cups, that part of the coating liquid which is scattered from the substrate while the substrate is rotated, (d) exhausting the inner and outer cups through a plurality of exhaust ports formed in outer peripheral portions of the outer cup, and (e) reducing, from a peripheral region of the substrate, the mist of the coating liquid which has occurred during the step (b), before the substrate stops rotation.
摘要翻译：涂覆方法包括以下步骤：（a）使用由内杯和外杯围绕的旋转卡盘保持基底，使得基底可以旋转，（b）通过旋转旋转卡盘旋转基底，并将涂布液施加到从而在基板上形成涂层，（c）从内杯和外杯排出在基板旋转时从基板散射的涂布液的一部分，（d）排出内杯和外杯通过形成在外杯的外周部的多个排气口，和（e）在基板停止之前，从基板的周边区域减少在步骤（b）期间发生的涂布液的雾回转。

33. 发明授权

US06376227B1 Alkaline protease 有权
公开(公告)号：US06376227B1
公开(公告)日：2002-04-23
申请号：US09509814
申请日：2000-04-06
申请人： Mikio Takaiwa , Mitsuyoshi Okuda , Katsuhisa Saeki , Hiromi Kubota , Jun Hitomi , Yasushi Kageyama , Shitsuw Shikata , Masafumi Nomura
发明人： Mikio Takaiwa , Mitsuyoshi Okuda , Katsuhisa Saeki , Hiromi Kubota , Jun Hitomi , Yasushi Kageyama , Shitsuw Shikata , Masafumi Nomura
IPC分类号： C12N950
CPC分类号： C12N9/54 , C11D3/386 , C11D3/38609 , C11D3/38618
摘要： An alkaline protease having the following properties; a gene encoding the same; a microorganism producing the same; and washing compositions containing the same; (i) acting over a broad pH value range of 4 to 13 and achieving, at pH 6 to 12, 80% or more the activity at the optimum pH value; (ii) when treated at 40° C. for 30 minutes, being stable over a pH value range of 6 to 11; (iii) having an isoelectric point of about 8.9 to 9.1; and (iv) having casein digesting activity that is not inhibited by oleic acid. The alkaline protease of the present invention is highly stable to various surface active agents and fatty acids, and exhibits high stability to oxidizing agents, and is therefore useful as an enzyme to be used in detergents for automatic dishwashers and laundry detergents, both containing bleaching components.

34. 发明授权

US06197740B1 Detergent composition 失效
公开(公告)号：US06197740B1
公开(公告)日：2001-03-06
申请号：US09527264
申请日：2000-03-17
申请人： Shitsuw Shikata , Masafumi Nomura , Toshihiro Oki , Hitoshi Tanimoto , Tsutomu Tokumoto , Nobuyuki Ogura
发明人： Shitsuw Shikata , Masafumi Nomura , Toshihiro Oki , Hitoshi Tanimoto , Tsutomu Tokumoto , Nobuyuki Ogura
IPC分类号： C11D3300
CPC分类号： C11D3/0084 , C11D3/046 , C11D3/386
摘要： The present invention provides a detergent composition which is excellent in enzyme stability and exhibits excellent detergency particularly to protein-related dirt of socks and other items even under laundering conditions at a lower temperature. That is, the present invention provides a detergent composition comprising specific proportions of (a) an anionic surfactant, (b) a chlorine scavenger, (c) a protease whose &agr;-keratin-hydrolyzing activity at 10° C. is not less than 0.09×10−3 &mgr;g/mPU·min and (d) a protease whose &agr;-keratin-hydrolyzing activity at 10° C. is less than 0.09×10−3 &mgr;g/mPU·min.

35. 发明授权

US5965200A Processing apparatus and processing method 失效
公开(公告)号：US5965200A
公开(公告)日：1999-10-12
申请号：US936723
申请日：1997-09-25
申请人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
发明人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
IPC分类号： G03F7/30 , B05C5/02 , B05C11/08 , B05C11/10 , H01L21/02 , H01L21/027 , B05D3/12
CPC分类号： B05C11/1039 , G03F7/3021 , B05C11/08 , B05C5/0208 , Y10S134/902
摘要： A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.

36. 发明授权

US5681614A Hydrophobic treatment method involving delivery of a liquid process agent to a process space 失效
标题翻译：涉及将液体加工剂输送到工艺空间的疏水处理方法
公开(公告)号：US5681614A
公开(公告)日：1997-10-28
申请号：US595785
申请日：1996-02-02
申请人： Tsutae Omori , Kouji Harada , Takami Satoh , Noriyuki Anai , Masafumi Nomura
发明人： Tsutae Omori , Kouji Harada , Takami Satoh , Noriyuki Anai , Masafumi Nomura
IPC分类号： G03F7/16 , C23C16/44 , C23C16/448 , H01L21/027 , H01L21/30 , C23C16/52
CPC分类号： C23C16/4485 , C23C16/4412 , Y10S427/101
摘要： An apparatus for hydrophobic treatment of a semiconductor wafer comprises a tank in which HMDS liquid is stored, a process chamber in which the wafer is treated, and a unit for supplying HMDS liquid from the tank into the process chamber in an amount needed at any desired time. The process chamber can be decompressed by an ejector which is connected to the process chamber through an exhaust pipe. A mount on which the wafer is mounted is arranged in the process chamber and it includes a heater embedded therein. A ring surrounds the mount and two liquid receiving recesses are formed on the top of the ring. Two HMDS liquid supply pipes extend just above their corresponding liquid receiving recesses. HMDS in liquid phase is supplied into the process chamber and vaporized in it. The density of HMDS gas in the process chamber is controlled by adjusting the amount of HMDS liquid supplied.
摘要翻译：用于半导体晶片的疏水处理的设备包括其中存储HMDS液体的罐，处理所述晶片的处理室，以及用于将HMDS液体从所述罐供应到所述处理室中的单元，其以任何所需的量时间。处理室可以通过排气管连接到处理室的喷射器进行减压。安装有晶片的安装件布置在处理室中，并且其包括嵌入其中的加热器。一个环围绕安装座，两个液体接收凹口形成在环的顶部。两个HMDS液体供应管正好在其相应的液体接收凹槽上方延伸。液相中的HMDS被供应到处理室中并在其中蒸发。通过调节供应的HMDS液体的量来控制处理室中的HMDS气体的密度。

37. 发明授权

US5505781A Hydrophobic processing apparatus including a liquid delivery system 失效
标题翻译：疏水处理装置，包括液体输送系统
公开(公告)号：US5505781A
公开(公告)日：1996-04-09
申请号：US189071
申请日：1994-01-28
申请人： Tsutae Omori , Kouji Harada , Takami Satoh , Noriyuki Anai , Masafumi Nomura
发明人： Tsutae Omori , Kouji Harada , Takami Satoh , Noriyuki Anai , Masafumi Nomura
IPC分类号： G03F7/16 , C23C16/44 , C23C16/448 , H01L21/027 , H01L21/30 , C23C16/00
CPC分类号： C23C16/4485 , C23C16/4412 , Y10S427/101
摘要： An apparatus for hydrophobic treatment of a semiconductor wafer comprises a tank in which HMDS liquid is stored, a process chamber in which the wafer is treated, and a unit for supplying HMDS liquid from the tank into the process chamber in an amount needed at any desired time. The process chamber can be decompressed by an ejector which is connected to the process chamber through an exhaust pipe. A mount on which the wafer is mounted is arranged in the process chamber and it includes a heater embedded therein. A ring surrounds the mount and two liquid receiving recesses are formed on the top of the ring. Two HMDS liquid supply pipes extend just above their corresponding liquid receiving recesses. HMDS in liquid phase is supplied into the process chamber and vaporized in it. The density of HMDS gas in the process chamber is controlled by adjusting the amount of HMDS liquid supplied.
摘要翻译：用于半导体晶片的疏水处理的设备包括其中存储HMDS液体的罐，处理所述晶片的处理室，以及用于将HMDS液体从所述罐供应到所述处理室中的单元，其以任何所需的量时间。处理室可以通过排气管连接到处理室的喷射器进行减压。安装有晶片的安装件布置在处理室中，并且其包括嵌入其中的加热器。一个环围绕安装座，两个液体接收凹口形成在环的顶部。两个HMDS液体供应管正好在其相应的液体接收凹槽上方延伸。液相中的HMDS被供应到处理室中并在其中蒸发。通过调节供应的HMDS液体的量来控制处理室中的HMDS气体的密度。

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