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31. 发明申请

US20050234325A1 Method and apparatus for processing data, and medical appliance system for processing data 有权
标题翻译：处理数据的方法和装置，以及用于处理数据的医疗器具系统
公开(公告)号：US20050234325A1
公开(公告)日：2005-10-20
申请号：US11093239
申请日：2005-03-30
申请人： Ralf Hofmann , Ivan Murphy , Andreas Schuelke
发明人： Ralf Hofmann , Ivan Murphy , Andreas Schuelke
IPC分类号： A61B5/00 , A61B5/05 , G06F19/00 , H04N1/00 , H04N1/21
CPC分类号： H04N1/2183 , A61B5/0013 , A61B5/002 , A61B5/0022 , G06F19/00 , G06F19/321 , H04N1/00347 , H04N1/2179 , H04N1/2187 , H04N1/2191 , H04N2201/0039 , H04N2201/0079
摘要： A method for processing data is proposed, particularly image data in a medical system, in which a plurality of imaging modalities for capturing the data and their associated apparatus for locally processing and storing the data are connected to one another via a data transmission unit for the purpose of data interchange. Common data for all modalities are respectively stored locally and are coordinated with one another such that the respective modality remains active regardless of the state of the data transmission unit.
摘要翻译：提出了一种用于处理数据的方法，特别是医疗系统中的图像数据，其中用于捕获数据的多个成像模式及其用于本地处理和存储数据的相关联的装置经由数据传输单元彼此连接，数据交换的目的。所有模态的公共数据分别在本地存储并且彼此协调，使得相应的模态保持有效，而与数据传输单元的状态无关。

32. 发明授权

US06132566A Apparatus and method for sputtering ionized material in a plasma 失效
标题翻译：用于在等离子体中溅射电离材料的装置和方法
公开(公告)号：US06132566A
公开(公告)日：2000-10-17
申请号：US126357
申请日：1998-07-30
申请人： Ralf Hofmann , John C. Forster
发明人： Ralf Hofmann , John C. Forster
IPC分类号： C23C14/35 , C23C14/56 , H01J37/32 , C23C14/34
CPC分类号： H01J37/32477 , C23C14/358 , C23C14/564 , H01J37/321 , Y10S156/916
摘要： An external inductive coil is used in a plasma process system having a dielectric shield which separates the coil from the plasma. The shield includes channels provided along the inner side of the shield facing the plasma region. The channels inhibit the formation of a continuous metal film over the inner surface of the shield during sputtering and deposition. The sidewalls defining the channels permit RF transmission after the surfaces directly facing the plasma are coated with metal.
摘要翻译：在具有将线圈与等离子体分离的介电屏蔽的等离子体处理系统中使用外部感应线圈。护罩包括沿着屏蔽物的面向等离子体区域的内侧设置的通道。在溅射和沉积期间，通道阻止在屏蔽的内表面上形成连续的金属膜。限定通道的侧壁在直接面向等离子体的表面被金属涂覆之后允许RF传输。

33. 发明授权

US5902461A Apparatus and method for enhancing uniformity of a metal film formed on a substrate with the aid of an inductively coupled plasma 失效
标题翻译：借助电感耦合等离子体增强在基片上形成的金属膜的均匀性的装置和方法
公开(公告)号：US5902461A
公开(公告)日：1999-05-11
申请号：US922893
申请日：1997-09-03
申请人： Zheng Xu , Ralf Hofmann
发明人： Zheng Xu , Ralf Hofmann
IPC分类号： C23C14/35 , H01J37/32 , C23C14/34
CPC分类号： H01J37/321 , C23C14/35 , C23C14/358 , H01J37/3266
摘要： An apparatus and method for sputtering ionized material onto a substrate with the aid of an inductively coupled plasma which ionizes the material, which apparatus includes: a support member having a support surface for supporting a substrate; a target constituting a source of sputtering material; a coil for generating a plasma which is inductively coupled to the coil and which ionizes material sputtered from the target; and components for piacing the support member at a potential which causes ionized material to be attracted to the support member. Magnets are provided to generate a magnetic field which is defined by magnetic field lines that lie in planes substantially perpendicular to the support surface and which have a constant polarity around the support surface.
摘要翻译：借助于电离所述材料的电感耦合等离子体将离子化材料溅射到基底上的装置和方法，该装置包括：具有用于支撑基底的支撑表面的支撑构件; 构成溅射材料源的靶; 用于产生等离子体的线圈，所述等离子体感应耦合到所述线圈并且电离从所述靶溅射的材料; 以及用于在使电离材料被吸引到支撑构件的电位下引导支撑构件的部件。提供磁体以产生由位于基本上垂直于支撑表面的平面中并且在支撑表面周围具有恒定极性的磁场线限定的磁场。

34. 发明授权

US09748125B2 Continuous substrate processing system 有权
公开(公告)号：US09748125B2
公开(公告)日：2017-08-29
申请号：US13755891
申请日：2013-01-31
申请人： Banqiu Wu , Nag B. Patibandla , Toshiaki Fujita , Ralf Hofmann , Pravin K. Narwankar , Jeonghoon Oh , Srinivas Satya , Li-Qun Xia
发明人： Banqiu Wu , Nag B. Patibandla , Toshiaki Fujita , Ralf Hofmann , Pravin K. Narwankar , Jeonghoon Oh , Srinivas Satya , Li-Qun Xia
IPC分类号： C23C16/00 , H01L21/00 , H01L21/673 , H01L21/677 , C23C16/455 , C23C16/458 , C23C16/54
CPC分类号： H01L21/673 , C23C16/45546 , C23C16/4558 , C23C16/4584 , C23C16/54 , H01L21/67346 , H01L21/677
摘要： A processing chamber having a plurality of movable substrate carriers stacked therein for continuously processing a plurality of substrates is provided. The movable substrate carrier is capable of being transported from outside of the processing chamber, e.g., being transferred from a load luck chamber, into the processing chamber and out of the processing chamber, e.g., being transferred into another load luck chamber. Process gases delivered into the processing chamber are spatially separated into a plurality of processing slots, and/or temporally controlled. The processing chamber can be part of a multi-chamber substrate processing system.

35. 发明申请

US20140038431A1 APPARATUS AND METHODS FOR MICROWAVE PROCESSING OF SEMICONDUCTOR SUBSTRATES 有权
标题翻译：半导体衬底微波加工的装置和方法
公开(公告)号：US20140038431A1
公开(公告)日：2014-02-06
申请号：US14112012
申请日：2012-03-29
申请人： Michael W. Stowell , Majeed A. Foad , Ralf Hofmann , Wolfgang R. Aderhold , Stephen Moffatt
发明人： Michael W. Stowell , Majeed A. Foad , Ralf Hofmann , Wolfgang R. Aderhold , Stephen Moffatt
IPC分类号： H01L21/263 , H05B6/70
CPC分类号： H01L21/263 , H01L21/324 , H01L21/67115 , H05B6/702 , H05B6/708
摘要： Methods and apparatus for radiation processing of semiconductor substrates using microwave or millimeter wave energy are provided. The microwave or millimeter wave energy may have a frequency between about 600 MHz and about 1 THz. Alternating current from a magnetron is coupled to a leaky microwave emitter that has an inner conductor and an outer conductor, the outer conductor having openings with a dimension smaller than a wavelength of the emitted radiation. The inner and outer conductors are separated by an insulating material. Interference patterns produced by the microwave emissions may be uniformized by phase modulating the power to the emitter and/or by frequency modulating the frequency of the power itself. Power from a single generator may be divided to two or more emitters by a power divider.
摘要翻译：提供了使用微波或毫米波能量的半导体衬底的辐射处理方法和装置。微波或毫米波能量可以具有在约600MHz和约1THz之间的频率。来自磁控管的交流电耦合到具有内部导体和外部导体的泄漏的微波发射器，该外部导体具有尺寸小于所发射的辐射的波长的开口。内外导体由绝缘材料分开。由微波发射产生的干扰模式可以通过相位调制发射器的功率和/或通过频率调制电源本身的频率而被均匀化。来自单个发电机的功率可以由功率分配器划分为两个或更多个发射器。

36. 发明申请

US20130196078A1 Multi-Chamber Substrate Processing System 审中-公开
标题翻译：多腔基底处理系统
公开(公告)号：US20130196078A1
公开(公告)日：2013-08-01
申请号：US13754771
申请日：2013-01-30
申请人： Joseph Yudovsky , Nag B. Patibandla , Pravin K. Narwankar , Li-Qun Xia , Toshiaki Fujita , Ralf Hofmann , Jeonghoon Oh , Srinivas Satya , Banqiu Wu
发明人： Joseph Yudovsky , Nag B. Patibandla , Pravin K. Narwankar , Li-Qun Xia , Toshiaki Fujita , Ralf Hofmann , Jeonghoon Oh , Srinivas Satya , Banqiu Wu
IPC分类号： C23C16/458
CPC分类号： C23C16/4584 , C23C16/45519 , C23C16/45551 , C23C16/54 , H01L21/67742
摘要： A substrate processing system for processing multiple substrates is provided and generally includes at least one substrate processing platform and at least one substrate staging platform. The substrate processing platform includes a rotary track system capable of supporting multiple substrate support assemblies and continuously rotating the substrate support assemblies, each carrying a substrate thereon. Each substrate is positioned on a substrates support assembly disposed on the rotary track system and being processed through at least one shower head station and at least one buffer station, which are positioned atop the rotary track system of the substrate processing platform. Multiple substrates disposed on the substrate support assemblies are processed in and out the substrate processing platform. The substrate staging platform includes at least one dual-substrate processing station, each dual-substrate processing station includes two substrate support assemblies for supporting two substrates thereon.
摘要翻译：提供了用于处理多个基板的基板处理系统，并且通常包括至少一个基板处理平台和至少一个基板分段平台。基板处理平台包括能够支撑多个基板支撑组件并且连续旋转基板支撑组件的旋转轨道系统，每个基板支撑组件在其上承载基板。每个基板定位在设置在旋转轨道系统上的基板支撑组件上，并且通过位于基板处理平台的旋转轨道系统顶部的至少一个喷头站和至少一个缓冲站进行处理。设置在基板支撑组件上的多个基板在基板处理平台内进出处理。衬底分级平台包括至少一个双衬底处理站，每个双衬底处理站包括用于在其上支撑两个衬底的两个衬底支撑组件。

37. 外观设计

USD664043S1 Packaging container for bottles 有权
标题翻译：瓶装包装容器
公开(公告)号：USD664043S1
公开(公告)日：2012-07-24
申请号：US29334415
申请日：2009-03-26
申请人： Ralf Hofmann , Christian Kranz , Carmen Lehner
设计人： Ralf Hofmann , Christian Kranz , Carmen Lehner
CPC分类号： B65D5/5061 , B65D85/42

38. 发明申请

US20080028384A1 Interconnection interface for flexible online/offline deployment of an n-layered software application 有权
标题翻译：互联接口，用于灵活的在线/离线部署n层软件应用程序
公开(公告)号：US20080028384A1
公开(公告)日：2008-01-31
申请号：US11878093
申请日：2007-07-20
申请人： Karlheinz Dorn , Ralf Hofmann
发明人： Karlheinz Dorn , Ralf Hofmann
IPC分类号： G06F9/44
CPC分类号： G06F8/00
摘要： A method is disclosed for producing a software application which has at least two layers, including a processing layer and a process layer, wherein each layer is encapsulated and hence platform-independent in terms of execution, and the encapsulated layers communicate with each other via an application programming interface. A system is also disclosed for producing an application including a flexible interconnection interface between encapsulated layers. By virtue of the implementation of an additional configurable interconnection interface in the application programming interface between two encapsulated application layers in each case, the architecture layering can be retained irrespective of the respective deployment, and only the communication profiles of the interconnection interfaces need be adapted to the deployment. This has the advantage, in at least one embodiment, that it is not necessary to produce and update different source code masters for the different deployments, and instead only one single architecture layering of the application need be created and maintained.
摘要翻译：公开了一种用于生产具有至少两层的软件应用的方法，其中包括处理层和处理层，其中每个层被封装并因此在执行方面与平台无关，并且封装层经由应用程序接口。还公开了一种用于生产包括在封装层之间的柔性互连接口的应用的系统。通过在每种情况下在两个封装的应用层之间的应用编程接口中实现附加的可配置互连接口，可以保持架构分层，而不管相应的部署如何，并且只有互连接口的通信简档需要适应部署。这在至少一个实施例中具有以下优点：不需要为不同部署生成和更新不同的源代码主机，而是需要创建和维护应用程序的一个单一架构分层。

39. 发明申请

US20070243452A1 RELIABLE FUEL CELL ELECTRODE DESIGN 审中-公开
标题翻译：可靠的燃料电池电极设计
公开(公告)号：US20070243452A1
公开(公告)日：2007-10-18
申请号：US11734913
申请日：2007-04-13
申请人： Timothy W. Weidman , Karl J. Armstrong , David J. Eaglesham , Nety Krishna , Ralf Hofmann , Michael P. Stewart
发明人： Timothy W. Weidman , Karl J. Armstrong , David J. Eaglesham , Nety Krishna , Ralf Hofmann , Michael P. Stewart
IPC分类号： H01M4/92 , H01M8/02 , H01M4/88 , B05D5/12
CPC分类号： H01M4/8867 , C23C28/321 , C23C28/322 , C23C28/34 , C23C28/3455 , H01M4/8817 , H01M4/92 , H01M8/0206 , H01M8/021 , H01M8/023 , H01M8/0236 , H01M8/0245 , H01M8/086 , H01M8/1004 , Y02P70/56
摘要： The present invention generally relates to the creation of fuel cell components and the method of forming the various fuel cell components that have an improved lifetime, lower production cost and improved process performance. The invention generally includes treating or conditioning a substrate surface by depositing a material layer, or layers, having good adhesion to the substrate, low electrical resistivity (high conductivity) and has good resistance to chemical attack during the operation of fuel cell. The substrate may be, for example, a fuel cell part, a conductive plate, a separator plate, a bipolar plate or an end plate, among others. In one embodiment, the substrate surface is treated or conditioned by exposing at least a portion of it to a gas or liquid comprising ruthenium tetroxide.
摘要翻译：本发明一般涉及燃料电池部件的制造和形成具有改善的寿命，降低生产成本和改进工艺性能的各种燃料电池部件的方法。本发明通常包括通过沉积对基材具有良好粘附性的材料层或低层电阻（高导电性）并且在燃料电池操作期间具有良好的抗化学侵蚀性能来处理或调理基材表面。基板可以是例如燃料电池部件，导电板，隔板，双极板或端板等。在一个实施方案中，通过将其至少一部分暴露于包含四氧化钌的气体或液体来处理或调理基底表面。

40. 发明授权

US07269664B2 Network portal system and methods 有权
标题翻译：网络门户系统和方法
公开(公告)号：US07269664B2
公开(公告)日：2007-09-11
申请号：US09759740
申请日：2001-01-12
申请人： Matthias Hütsch , Ralf Hofmann , Kai Sommerfeld
发明人： Matthias Hütsch , Ralf Hofmann , Kai Sommerfeld
IPC分类号： G06F15/16 , G09G5/00
CPC分类号： H04L29/12047 , G06F9/541 , G06F9/547 , G06F17/21 , G06F17/2264 , H04L29/06 , H04L29/12009 , H04L29/12594 , H04L29/12783 , H04L61/15 , H04L61/30 , H04L61/35 , H04L67/04 , H04L67/2823 , H04L67/2838 , H04L67/2852 , H04L67/289 , H04L67/34 , H04L67/42 , H04L69/08 , H04L69/16 , H04L69/329 , Y10S707/99933
摘要： A network portal system includes a web-top manager and a universal content broker system. The web-top manager is configured to receive a content request from a user device, where the content request includes a content provider identifier. The universal content broker system is coupled to the web-top manager. The universal content broker system includes a plurality of content providers. Each content provider in the plurality of content providers is associated with a different content provider identifier. Also, each content provider accesses content having a different raw data format. A universal content broker is coupled to the web-top manager and to the plurality of content providers. Upon the receipt of the content request from the web-top manager, the universal content broker passes the request to a content provider in the plurality of content providers that is associated with the content provider identifier.
摘要翻译：网络门户系统包括网络管理器和通用内容代理系统。网络管理器被配置为从用户设备接收内容请求，其中内容请求包括内容提供商标识符。通用内容代理系统耦合到网络管理员。通用内容代理系统包括多个内容提供商。多个内容提供商中的每个内容提供商与不同的内容提供商标识符相关联。此外，每个内容提供者访问具有不同原始数据格式的内容。通用内容代理被耦合到网络管理器和多个内容提供者。在从网络顶部管理器接收到内容请求之后，通用内容代理将请求传递到与内容提供商标识符相关联的多个内容提供商中的内容提供商。

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