专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US6153886A Alignment apparatus in projection exposure apparatus 失效
标题翻译：投影曝光装置中的对准装置
公开(公告)号：US6153886A
公开(公告)日：2000-11-28
申请号：US407610
申请日：1999-09-28
申请人： Shigeru Hagiwara , Hideo Mizutani , Kazuya Ota
发明人： Shigeru Hagiwara , Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86
CPC分类号： G03F9/7065 , G03F9/7088
摘要： An alignment apparatus according to the present invention is constructed, for example, which is arranged in an exposure apparatus provided with a projection optical system which projects a predetermined pattern formed on a mask onto a substrate under exposure light, which performs relative positioning between the mask and the substrate, which has light irradiating means for irradiating alignment light in a wavelength region different from that of exposure light onto an alignment mark formed on the substrate through the projection optical system and detecting means for detecting light from the alignment mark through the projection optical system, wherein, for alignment light as irradiation light traveling toward the alignment mark and alignment light as detection light from the alignment mark, there are provided correction optical elements for irradiation light and correction optical elements for detection light to cause axial chromatic aberration and magnification chromatic aberration in the opposite directions to axial chromatic aberration and magnification chromatic aberration of the projection optical system between the mask and the substrate, wherein the alignment light is multi-colored light with a plurality of beams different in wavelength from each other in the wavelength region different from that of exposure light, and wherein the correction optical elements for irradiation light or the correction optical elements for detection light each are provided in correspondence with the plurality of beams different in wavelength.
摘要翻译：根据本发明的对准装置例如被构造成设置在具有投影光学系统的曝光装置中，该投影光学系统将在掩模上形成的预定图案投影到曝光光下的基板上，该曝光装置执行掩模以及基板，其具有用于通过投影光学系统将与曝光光不同的波长区域中的对准光照射到形成在基板上的对准标记上的光照射装置和用于通过投影光学器件检测来自对准标记的光的检测装置系统，其中，对于作为向对准标记行进的照射光的对准光和作为来自对准标记的检测光的对准光，设置有用于照射光的校正光学元件和用于检测光的校正光学元件，以产生轴向色差和倍率色彩像差在与掩模和基板之间的投影光学系统的轴向色差和倍率色差的相反方向上，其中对准光是具有多个不同波长区域的波长不同的多个光束的多色光曝光用光，并且其中用于照射光的校正光学元件或用于检测光的校正光学元件各自对应于波长不同的多个光束。

32. 发明授权

US5757505A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5757505A
公开(公告)日：1998-05-26
申请号：US800062
申请日：1997-02-14
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70358 , G03F7/70641 , G03F9/70
摘要： In order to measure an image formation characteristic of a projection optical system directly and continuously without using a substrate to be replaced during a step for exposure a reticle, a wafer or the like, a reference unit, on which a reference mark is formed, is disposed between the projection optical system and the wafer. In a measuring optical system, diffracted light obtained by irradiating laser beam onto a diffraction grating on a measuring reference plate is irradiated onto a reference mark on the reference unit through a modulator and the projection optical system. Interference light generated from the reference mark is received by a photoelectric sensor through the projection optical system. A variation quantity of a focus position of the projection optical system is obtained from a phase difference of a detection signals output from the photoelectric sensor. A variation quantity of a projection magnification is obtained from an average of the phases of the detection signals.
摘要翻译：为了在用于曝光标线片，晶片等的参考单元中，在其上形成参考标记的参考单元，直接且连续地测量投影光学系统的图像形成特性，而不使用要替换的基板，设置在投影光学系统和晶片之间。在测量光学系统中，通过将激光束照射到测量基准板上的衍射光栅上获得的衍射光通过调制器和投影光学系统照射到参考单元上的基准标记上。由参考标记产生的干涉光由光电传感器通过投影光学系统接收。从光电传感器输出的检测信号的相位差获得投影光学系统的聚焦位置的变化量。从检测信号的相位的平均值获得投影倍率的变化量。

33. 发明授权

US5587794A Surface position detection apparatus 失效
标题翻译：表面位置检测装置
公开(公告)号：US5587794A
公开(公告)日：1996-12-24
申请号：US239847
申请日：1994-05-09
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： A surface position detection apparatus includes a projection optical system for projecting pattern light having a predetermined pattern on a detection surface from an oblique direction to the detection surface, an imaging optical system for forming an image of the pattern light reflected by the detection surface, a light-receiving-side light-shield arranged at a position substantially conjugate with the detection surface in the imaging optical system, and having an opening portion with a predetermined shape, a scanner for scanning the pattern image formed by the imaging optical system relative to the light-receiving-side light-shield, and a detection device for the pattern light into a plurality of portions, and selectively detecting at least one such portion of the pattern light.
摘要翻译：表面位置检测装置包括：投影光学系统，用于将检测表面上具有预定图案的图案光从倾斜方向投射到检测表面;成像光学系统，用于形成由检测表面反射的图案光的图像; 光接收侧光屏配置在与成像光学系统中的检测面基本共轭的位置，具有规定形状的开口部的扫描器，用于扫描由摄像光学系统形成的图案图像相对于光接收侧光屏蔽和用于将图案光分解为多个部分的检测装置，并且选择性地检测图案光的至少一个部分。

34. 发明授权

US5569929A Double-beam light source apparatus, position detecting apparatus and aligning apparatus 失效
公开(公告)号：US5569929A
公开(公告)日：1996-10-29
申请号：US470889
申请日：1995-06-06
申请人： Hideo Mizutani , Kazuya Ota
发明人： Hideo Mizutani , Kazuya Ota
IPC分类号： G03F9/00 , G01N21/86 , G06K7/015 , G01B11/00
CPC分类号： G03F9/7049 , G03F9/7076
摘要： A position detecting apparatus comprises a double-beam producing device for producing two beams different in frequency from each other, which are guided to irradiate a diffraction grating on an object to be inspected in two predetermined directions, and a detector photoelectrically detecting through an objective optical system diffracted light produced by the diffraction grating, in which the double-beam producing device comprises a light source for supplying a beam of a single wavelength or multiple wavelengths, a beam splitting device for splitting the beam from the light source into two predetermined beams, a relay optical system for converging the two split beams at a predetermined position, and a frequency difference producing device disposed at or near a converging position by the relay optical system, for producing a predetermined frequency difference between the two split beams.

35. 发明授权

US5204535A Alignment device having irradiation and detection light correcting optical elements 失效
标题翻译：具有辐照和检测的对准装置光修正光学元件
公开(公告)号：US5204535A
公开(公告)日：1993-04-20
申请号：US888828
申请日：1992-05-27
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： The device is of the type used for semiconductor exposure apparatus equipped with a projection lens for transferring a pattern, formed on a reticle, onto a substrate with an exposure light. The device is adapted for detecting the position of an alignment mark formed on the substrate. The device includes light irradiation means, detector, an irradiation light correcting optical element and a detection light correcting optical element. The light irradiation means irradiates the alignment mark, through the projection lens, with alignment light having a wavelength different from that of the exposure light. The detector detects, through the projection optical system, light from the alignment mark. The irradiation light correcting optical element is provided between the reticle and the substrate and adapted for deflecting the irradiation optical path so as to correct, by predetermined amount, the longitudinal chromatic aberration and the chromatic aberration of magnification of the projection optical system for the irradiation light. The detection light correcting optical element is provided between said reticle and said substrate and adapted for deflecting the detection optical path toward the peripheral part of an exposure area of said reticle, so as to correct, by a predetermined amount, the chromatic aberration of magnification of the projection optical system for the detection light.

36. 发明授权

US4730900A Projection optical apparatus 失效
标题翻译：投影光学仪器
公开(公告)号：US4730900A
公开(公告)日：1988-03-15
申请号：US696085
申请日：1985-01-29
申请人： Makoto Uehara , Hideo Mizutani , Kiyoyuki Muramatsu , Takeshi Asami , Akikazu Tanimoto
发明人： Makoto Uehara , Hideo Mizutani , Kiyoyuki Muramatsu , Takeshi Asami , Akikazu Tanimoto
IPC分类号： G03B27/34 , G02B7/02 , G02B7/09 , G02B7/28 , G02B21/24 , G03F7/20 , G03F7/207 , H01L21/027 , H01L21/30 , G01J5/00 , G02B27/52
CPC分类号： G03F7/70241 , G02B21/241 , G02B7/028 , G03F7/70825 , G03F7/70883 , G03F7/70891
摘要： A projection optical apparatus comprises illuminating means providing for an illuminating light beam, a projection optical system including optical elements disposed across the illuminating light beam and having an imaging plane, and detecting mean including temperature sensor means provided on at least one of the optical elements and producing an output corresponding to the temperature of the one optical element.
摘要翻译：投影光学装置包括提供照明光束的照明装置，包括设置在照明光束两侧并具有成像平面的光学元件的投影光学系统，以及包括设置在至少一个光学元件上的温度传感器装置的检测装置，产生对应于一个光学元件的温度的输出。

37. 发明授权

US4723845A Optical apparatus for the detection of position 失效
标题翻译：用于检测位置的光学仪器
公开(公告)号：US4723845A
公开(公告)日：1988-02-09
申请号：US911464
申请日：1986-09-25
申请人： Hideo Mizutani , Yutaka Suenaga
发明人： Hideo Mizutani , Yutaka Suenaga
IPC分类号： G02B27/18 , G02B27/00 , G03F9/00 , G01B11/27
CPC分类号： G03F9/7023
摘要： An optical apparatus for detecting the position of an object by projecting a light image onto the object through a transparent plate and detecting the reflected light from the object through the transparent plate is disclosed. The projection optical system includes a first objective lens for forming the light image. The optical axis of the projection is disposed inclined to the above-said transparent plate. The detection optical system includes a second objective lens for refocusing the light reflected from the object. The optical axis of the reflection light detection between the second object lens and the object is disposed inclined to the transparent plate. The apparatus further comprises plane parallel optical members mounted obliquely so as to cancel the asymmetric aberrations generated by the above-said transparent plate. One of the aberration-correcting plane parallel optical members is interposed in the projection optical path on the side opposite to the transparent plate relative to the first objective lens. The other one is interposed in the detection optical path on the side opposite to the transparent plate relative to the second objective lens.
摘要翻译：公开了一种用于通过透明板将光图像投影到物体上并通过透明板检测来自物体的反射光来检测物体的位置的光学装置。投影光学系统包括用于形成光图像的第一物镜。突起的光轴与上述透明板倾斜地配置。检测光学系统包括用于将从物体反射的光重新聚焦的第二物镜。第二物镜与物体之间的反射光检测的光轴被设置成与透明板倾斜。该装置还包括倾斜安装的平面平行光学构件，以抵消由上述透明板产生的不对称像差。像差校正平面平行光学构件中的一个相对于第一物镜插入到与透明板相对的一侧的投影光路中。另一个相对于第二物镜插入到与透明板相对的一侧的检测光路中。

38. 发明授权

US09152062B2 Pattern forming device, pattern forming method, and device manufacturing method 有权
标题翻译：图案形成装置，图案形成方法和装置制造方法
公开(公告)号：US09152062B2
公开(公告)日：2015-10-06
申请号：US13526428
申请日：2012-06-18
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： B29C35/02 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70791 , G03F9/7003
摘要： Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface.
摘要翻译：提出了在细长片材的预定区域中形成预定图案的方法。所述方法包括将二维张力施加到包括片材的预定区域的部分，并且允许平坦的参考表面吸附与施加二维张力的片材的预定区域相对应的后表面部分。然后，该方法将对应于图案的能量束照射到吸附到参考表面的片材的预定区域。

39. 发明授权

US09113562B2 Manufacturing method for printed wiring board 有权
标题翻译：印刷电路板的制造方法
公开(公告)号：US09113562B2
公开(公告)日：2015-08-18
申请号：US13427330
申请日：2012-03-22
申请人： Hideo Mizutani , Toshiyuki Matsui , Atsushi Deguchi
发明人： Hideo Mizutani , Toshiyuki Matsui , Atsushi Deguchi
IPC分类号： H05K3/02 , H05K3/10 , H05K3/06 , H05K3/46
CPC分类号： H05K3/108 , H05K3/067 , H05K3/4661 , H05K2203/0369 , H05K2203/0597 , H05K2203/122 , H05K2203/124 , H05K2203/1476 , Y10T29/49126 , Y10T29/49144 , Y10T29/49156 , Y10T29/49165
摘要： A manufacturing method for a printed wiring board includes forming an electroless plated film on an interlayer resin insulation layer, forming on the electroless plated film a plating resist with an opening to expose a portion of the electroless plated film, forming an electrolytic plated film on the portion of the electroless plated film exposed through the opening, removing the plating resist using a resist-removing solution containing an amine, reducing a thickness of a portion of the electroless plated film existing between adjacent portions of the electrolytic plated film by using the resist-removing solution, and forming a conductive pattern by removing the portion of the electroless plated film existing between the adjacent portions of the electrolytic plated film by using an etchant.
摘要翻译：一种印刷电路板的制造方法，包括在层间树脂绝缘层上形成无电解电镀膜，在所述无电解电镀膜上形成具有开口的电镀抗蚀剂，露出所述无电镀膜的一部分，在所述电镀膜上形成电解电镀膜通过开口露出的无电解电镀膜的一部分，使用含有胺的抗蚀剂去除溶液除去电镀抗蚀剂，通过使用抗蚀剂层，减少存在于电解电镀膜的相邻部分之间的部分无电解电镀膜的厚度，通过使用蚀刻剂除去存在于电解电镀膜的相邻部分之间的无电解电镀膜的部分，形成导电图案。

40. 发明授权

US08399263B2 Method for measuring expansion/contraction, method for processing substrate, method for producing device, apparatus for measuring expansion/contraction, and apparatus for processing substrate 有权
标题翻译：用于测量膨胀/收缩的方法，基板的处理方法，装置的制造方法，膨胀/收缩测量装置以及基板的处理装置
公开(公告)号：US08399263B2
公开(公告)日：2013-03-19
申请号：US12551057
申请日：2009-08-31
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： H01L21/66
CPC分类号： B41J3/407 , B41J11/008 , B41J11/42
摘要： An expansion/contraction measuring apparatus includes a transport section which transports a flexible substrate along a surface of the substrate; a detecting section detecting first and second marks which are formed on the substrate while being separated from each other by a predetermined spacing distance in a transport direction of the substrate and which are moved, in accordance with the transport of the substrate, to first and second detection areas disposed on a transport route for the substrate respectively; a substrate length setting section which sets a length of the substrate along the transport route between the first and second detection areas to a reference length; and a deriving section which derives information about expansion/contraction of the substrate in relation to the transport direction based on a detection result of the first and second marks. Accordingly, the expansion/contraction state of an expandable/contractible substrate is measured highly accurately.
摘要翻译：膨胀/收缩测量装置包括：输送部，其沿着基板的表面输送柔性基板; 检测部，其检测形成在所述基板上的第一和第二标记，同时沿着所述基板的输送方向彼此分离预定的间隔距离，并且根据所述基板的输送而移动到所述基板的第一和第二分别设置在基板的输送路径上的检测区域; 基板长度设定部，其将沿着第一和第二检测区域之间的输送路径的基板的长度设定为基准长度; 以及导出部，其基于第一和第二标记的检测结果，得出关于基板相对于输送方向的伸缩的信息。因此，可高精度地测量可膨胀/收缩基材的膨胀/收缩状态。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式