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    • 31. 发明授权
    • Column for charged particle beam device
    • 用于带电粒子束装置的柱
    • US06452175B1
    • 2002-09-17
    • US09293482
    • 1999-04-15
    • Pavel Adamec
    • Pavel Adamec
    • H01J3720
    • H01J37/1478H01J37/28H01J2237/1506
    • A charged particle beam column comprises: a particle source; an objective lens; a pre-lens deflection unit for deflecting a beam of charged particles away from the optical axis on such a path that the combined action of the objective lens and the pre-lens deflection unit directs the beam of charged particles towards the optical axis to hit the specimen surface from a first direction; and an in-lens deflection unit arranged in the vicinity of the objective lens for redirecting the deflected beam of charged particles on such a path that the combined action of the objective lens and the in-lens deflection unit redirects the beam of charged particles towards the optical axis to hit the specimen surface under said large beam landing angle from a second direction substantially opposite to said first direction.
    • 带电粒子束柱包括:粒子源; 物镜; 一个预透镜偏转单元,用于在物镜和预透镜偏转单元的组合作用将带电粒子束朝向光轴引导以撞击光轴之前将带电粒子束偏离光轴偏转的路径, 样品表面从第一个方向; 以及布置在物镜附近的镜片内偏转单元,用于将偏转的带电粒子束重定向到物镜和镜片间偏转单元的组合作用将带电粒子束朝向 光轴从与所述第一方向大致相反的第二方向在所述大光束着落角下撞击所述样品表面。
    • 32. 发明授权
    • Feedback loop for emitter flashing
    • 发射器闪烁的反馈回路
    • US08674300B2
    • 2014-03-18
    • US12910502
    • 2010-10-22
    • Pavel Adamec
    • Pavel Adamec
    • H05B37/02
    • H01J37/073H01J2237/022H01J2237/0653H01J2237/2485
    • A method and a device for stabilizing the emission current of an emitter of a charged particle beam device are provided. In the method, the emitter is operated under predetermined operation parameters including at least one voltage with a predetermined value. The method includes determining a first value of the emission current under the predetermined operation parameters and flash cleaning the emitter while a first electric field is applied to the emitter. The first electric field is generated by the at least one voltage having a first value of the at least one voltage, wherein the first value of the at least one voltage is provided in dependence of the determined first value of the emission current.
    • 提供一种用于稳定带电粒子束装置的发射极的发射电流的方法和装置。 在该方法中,发射器在包括至少一个具有预定值的电压的预定操作参数下运行。 该方法包括在预定操作参数下确定发射电流的第一值,并且在向发射器施加第一电场时闪光清洁发射器。 第一电场由具有至少一个电压的第一值的至少一个电压产生,其中根据确定的发射电流的第一值提供至少一个电压的第一值。
    • 36. 发明申请
    • CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE
    • 充电颗粒射束发射装置和用于操作充电颗粒光束发射装置的方法
    • US20070158588A1
    • 2007-07-12
    • US11469728
    • 2006-09-01
    • Fang ZhouPavel AdamecJurgen FrosienJimmy Vishnipolsky
    • Fang ZhouPavel AdamecJurgen FrosienJimmy Vishnipolsky
    • A61N5/00
    • H01J37/073H01J2237/022H01J2237/06325
    • A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.
    • 提供了一种用于操作带电粒子束发射器件的方法,特别是包括冷场发射器的电子束发射器件。 该方法包括以下步骤:将冷场发射器置于给定压力的真空中,发射体表现出高的初始发射电流I 0和较低的稳定平均发射电流I S, 在给定的电提取场下; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过对冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理,由此在冷场发射器的发射电流已经下降到较低的稳定平均发光值I < S
    • 37. 发明申请
    • Protecting Aperture for Charged Particle Emitter
    • 保护充电粒子的孔径
    • US20070145303A1
    • 2007-06-28
    • US11553153
    • 2006-10-26
    • Pavel Adamec
    • Pavel Adamec
    • G21K5/10
    • H01J37/301H01J37/18H01J2237/188
    • A charged particle beam apparatus and a method are provided. The apparatus comprises a charged particle emitter located within a gun chamber, the gun chamber being adapted to encompass a first pressure; at least one further vacuum chamber adapted to encompass a second pressure between one order and four orders of magnitude higher than the first pressure; a first aperture unit; comprising at least a first aperture opening and a molecule blocking area; a second aperture unit comprising a second aperture opening. Thereby, the first aperture unit and/or the second aperture unit is a differential pressure aperture separating two independently evacuateable vacuum chambers and being adapted for maintaining a pressure difference of at least two orders of magnitude and the emitter, the molecule blocking area and the second aperture opening are positioned to be on a straight line.
    • 提供带电粒子束装置和方法。 该装置包括位于枪室内的带电粒子发射器,枪室适于包围第一压力; 至少一个另外的真空室,其适于包含比所述第一压力高一到四个数量级的第二压力; 第一光圈单元; 至少包括第一孔口和分子阻挡区域; 第二孔单元,包括第二孔口。 因此,第一孔单元和/或第二孔单元是分离两个独立可抽空的真空室的差压孔,并适于保持至少两个数量级的压力差和发射极,分子阻挡面积和第二孔 孔径开口位于直线上。