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31. 发明申请

US20050007654A1 Light condensing method and light condenser as well as near-field optical microscope and storage device formed by applying the same 失效
标题翻译：光聚光法和光聚光镜以及近场光学显微镜及其应用形成的储存装置
公开(公告)号：US20050007654A1
公开(公告)日：2005-01-13
申请号：US10885663
申请日：2004-07-08
申请人： Tomohiro Yamada , Natsuhiko Mizutani
发明人： Tomohiro Yamada , Natsuhiko Mizutani
IPC分类号： G01Q60/22 , G01Q80/00 , G02B27/56 , G02B27/58 , G11B7/125 , G11B7/135 , G11B7/24 , G02F1/00 , G02B21/06
CPC分类号： G01Q60/22 , G02B27/56 , G02B27/58 , G11B7/1387
摘要： A light-condensing method of irradiating light whose electric field vectors show two or more than two different directions onto a member having apertures arranged at least at two positions and forming a light-condensing section having a strong electric field between the apertures arranged at two positions.
摘要翻译：一种聚光方法，其将电场矢量显示两个或多于两个不同方向的光照射到具有至少布置在两个位置处的孔的构件上，并且在布置在两个位置处的孔之间形成具有强电场的聚光部分。

32. 发明授权

US06785003B2 Ring laser gyro with optically independent semiconductor ring lasers 失效
标题翻译：环形激光陀螺仪，具有光学独立的半导体环形激光器
公开(公告)号：US06785003B2
公开(公告)日：2004-08-31
申请号：US09900951
申请日：2001-07-10
申请人： Natsuhiko Mizutani , Takahiro Numai
发明人： Natsuhiko Mizutani , Takahiro Numai
IPC分类号： G01C1968
CPC分类号： G01C19/66 , H01S3/083
摘要： A semiconductor ring laser gyro comprising two or more ring lasers, the ring lasers being optically independent of each other, is characterized in that a change in beat frequency with respect to a change in angular velocity of a first ring laser is opposite to that of a second ring laser, and angular velocity of rotation of the gyro is detected by a signal representing a difference between a first beat frequency generated by the first ring laser and a second beat frequency generated by the second ring laser.
摘要翻译：一种包括两个或更多个环形激光器的半导体环形激光陀螺仪，环形激光器彼此光学独立，其特征在于，相对于第一环形激光器的角速度的变化，拍频的变化与通过表示由第一环形激光器产生的第一拍频与由第二环形激光器产生的第二拍频之间的差的信号来检测陀螺仪的旋转角度旋转速度。

33. 发明授权

US06526075B2 Method for driving a semiconductor light source device for transmitting a signal 失效
标题翻译：驱动用于发送信号的半导体光源装置的方法
公开(公告)号：US06526075B2
公开(公告)日：2003-02-25
申请号：US09105049
申请日：1998-06-26
申请人： Natsuhiko Mizutani
发明人： Natsuhiko Mizutani
IPC分类号： H01S310
CPC分类号： H01S5/0625 , H01S5/06236 , H01S5/06258
摘要： In a driving method or apparatus for driving a semiconductor laser as a light source for optical transmission, oscillation light of the semiconductor laser can be switched between two different polarization modes by modulating a current injected into a portion of a waveguide of the laser. The laser has characteristics that light in both modes is emitted within a polarization-mode switching range of the current and that intensities of the light in both modes respectively vary in accordance with an amount of the current within the polarization-mode switching range. The current injected into the portion of the waveguide is urged to a bias point current in the switching range, and a modulation signal current is superimposed on the bias point current such that the emitted light in at least one of the modes is intensity-modulated in accordance of an amount of the modulation signal current.
摘要翻译：在用于驱动半导体激光器作为用于光学传输的光源的驱动方法或装置中，可以通过调制注入到激光器的波导的一部分中的电流来在两种不同的偏振模式之间切换半导体激光器的振荡光。激光器具有两种模式的光在电流的偏振模式切换范围内发射的特性，并且两种模式中的光强度分别根据偏振模式切换范围内的电流量而变化。注入到该波导部分的电流被推到切换范围内的偏置点电流，并且调制信号电流叠加在偏置点电流上，使得至少一个模式中的发射光被强度调制根据调制信号电流的量。

34. 发明授权

US07968256B2 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device 失效
标题翻译：近场曝光掩模，使用掩模形成抗蚀剂图案的方法，以及制造装置的方法
公开(公告)号：US07968256B2
公开(公告)日：2011-06-28
申请号：US12376426
申请日：2007-10-05
申请人： Toshiki Ito , Natsuhiko Mizutani , Akira Terao
发明人： Toshiki Ito , Natsuhiko Mizutani , Akira Terao
IPC分类号： G03F1/00 , G03F7/00
CPC分类号： G03F7/2014 , B82Y10/00 , G03F1/50 , G03F7/70325
摘要： Provided are a near field exposure mask which can suppress heat generation of a mask during exposure and can also suppress variation in size of a resist pattern for each shot, and a resist pattern forming method using the same. The near field exposure mask includes a transparent mask matrix l0; a light shielding layer l2 formed above the transparent mask matrix l0 and containing silicon; a reflective layer l1 formed between the transparent mask matrix l0 and the light shielding layer l2; and an opening pattern provided in the reflective layer l1 and the light shielding layer l2 and being less in size than an exposure wavelength λ (nm), wherein the reflectance at an interface between the transparent mask matrix l0 and the reflective layer l1 is higher than a reflectance at an interface between a transparent mask matrix and a light shielding layer formed on the transparent mask matrix and containing silicon of a near field exposure mask which has no reflective layer between the transparent mask matrix and the light shielding layer.
摘要翻译：提供一种可以抑制曝光期间掩模的发热的近场曝光掩模，并且还可以抑制每个镜头的抗蚀剂图案的尺寸变化，以及使用其的抗蚀剂图案形成方法。近场曝光掩模包括透明掩模矩阵10; 形成在透明掩模矩阵10上方并含有硅的遮光层12; 形成在透明掩模矩阵10和遮光层12之间的反射层l1; 以及设置在反射层11和遮光层12中并且尺寸小于曝光波长λ（nm）的开口图案，其中透明掩模矩阵10和反射层11之间的界面处的反射率高于在透明掩模矩阵和形成在透明掩模矩阵上的遮光层之间的界面处的反射率，并且包含在透明掩模矩阵和遮光层之间没有反射层的近场曝光掩模的硅。

35. 发明授权

US07733491B2 Sensor device and testing method utilizing localized plasmon resonance 失效
标题翻译：使用局部等离子体共振的传感器装置和测试方法
公开(公告)号：US07733491B2
公开(公告)日：2010-06-08
申请号：US12131433
申请日：2008-06-02
申请人： Ryo Kuroda , Natsuhiko Mizutani , Takako Yamaguchi , Yasuhisa Inao , Tomohiro Yamada
发明人： Ryo Kuroda , Natsuhiko Mizutani , Takako Yamaguchi , Yasuhisa Inao , Tomohiro Yamada
IPC分类号： G12Q1/68 , G01N1/02 , G01N21/55
CPC分类号： G01N21/648 , G01N21/554 , Y10T436/11
摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.
摘要翻译：传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器从开口穿过或反射。多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

36. 发明授权

US07697382B2 Near-field light generating method and near-field optical head using a light blocking metal film having a fine opening whose size is not more than a wavelength of irradiated light, and near-field optical microscope having the optical head 失效
标题翻译：使用具有不大于照射光的波长的微细开口的遮光金属膜的近场光产生方法和近场光学头，以及具有光头的近场光学显微镜
公开(公告)号：US07697382B2
公开(公告)日：2010-04-13
申请号：US10529892
申请日：2004-09-24
申请人： Natsuhiko Mizutani , Tomohiro Yamada
发明人： Natsuhiko Mizutani , Tomohiro Yamada
IPC分类号： G11B7/18 , G02B21/06 , G01N13/14 , G12B21/06
CPC分类号： G03F7/70325 , G01Q60/22 , G01Q80/00 , G03F1/50 , G03F7/2014 , G03F7/7035 , G11B7/122 , G11B7/1387 , G11B2005/0005 , G11B2005/0021
摘要： A near-field light generating method for irradiating light from a light source to a metal film having a fine opening that has a size of not more than a wavelength of the light emitted from the light source, and forming a fine light spot adjacent to the fine opening on a light outgoing side of the fine opening. The method includes providing the metal film with a rectangular fine opening whose length to width ratio is between 1.1 times and 2 times that of a standard square opening, obtained by increasing the length of the standard square opening, and irradiating the metal film with light from the light source to form the fine light spot, which has a length and a width that are substantially equal to those of the standard square opening, and where the fine light spot has a light intensity, which is not less than two times that of the standard square opening. This method is applicable in a corresponding near-field optical head, which can be included either in an optical microscope to observe a sample surface or in an apparatus for recording and reproducing with respect to a recording medium.
摘要翻译：一种近场光产生方法，用于将来自光源的光照射到具有不大于从光源发射的光的波长的尺寸的微细开口的金属膜，并且形成与该光源相邻的细光斑在精细开口的光出射侧的细开口。该方法包括：通过增加标准方形开口的长度，将金属膜的长宽比为标准正方形开口的1.1倍和2倍的矩形细孔提供金属膜，并用来自该光源形成具有与标准方形开口基本相等的长度和宽度的细光斑，并且其中细光斑的光强度不小于标准方形开口的两倍标准方形开口。该方法适用于相应的近场光学头，其可以包括在光学显微镜中以观察样品表面或用于相对于记录介质的记录和再现装置。

37. 发明授权

US07655390B2 Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment 失效
标题翻译：位置传感器，水平和垂直位置检测方法，对位装置，位置传感器，水平和垂直对准方法
公开(公告)号：US07655390B2
公开(公告)日：2010-02-02
申请号：US11549738
申请日：2006-10-16
申请人： Tomohiro Yamada , Natsuhiko Mizutani
发明人： Tomohiro Yamada , Natsuhiko Mizutani
IPC分类号： G01N21/55
CPC分类号： G03F9/7038 , G01B11/14 , G03F9/703 , G03F9/7088
摘要： A position sensor has an interface structure between negative dielectrics and a dielectric, and is provided with a configuration in which the plasmon intensity with respect to a microstructure in a surface including the interface structure or in the vicinity thereof is detected by the interface structure, and the positional relationship between the interface structure and the microstructure is thereby detected.
摘要翻译：位置传感器在负电介质和电介质之间具有界面结构，并且具有这样的构造，其中通过界面结构检测包括界面结构或其附近的表面中的微结构的等离子体激发强度，由此检测界面结构和微结构之间的位置关系。

38. 发明授权

US07606117B2 Information recording and reproducing apparatus, information recording medium and information recording apparatus 失效
标题翻译：信息记录和再现装置，信息记录介质和信息记录装置
公开(公告)号：US07606117B2
公开(公告)日：2009-10-20
申请号：US11387686
申请日：2006-03-24
申请人： Natsuhiko Mizutani , Tomohiro Yamada
发明人： Natsuhiko Mizutani , Tomohiro Yamada
IPC分类号： G11B11/00
CPC分类号： G11B11/10536 , G11B5/6011 , G11B7/00454 , G11B7/122 , G11B7/1387 , G11B11/10543 , G11B11/10554 , G11B11/1058 , G11B2005/0021
摘要： An information recording and reproducing apparatus including a recording medium that includes at least a substrate, a reflection layer disposed on the substrate, and a recording layer disposed so as to interpose the reflection layer between the substrate and the recording layer, and a near-field optical head, disposed close to the recording medium, for irradiating the recording medium with near-field light to effect recording and reproduction of information. The near-field optical head includes a light-blocking metal film which includes a dielectric base material provided with a small opening and which is disposed opposite to the reflection layer disposed on the substrate, so that the light-blocking metal film and the reflection layer constitute an optical resonator to increase intensity of the near-field light. The optical resonator satisfies the following resonance condition: 4πL/λ+φ1+φ2=2mπ, wherein L represents an optical path between a bottom surface, of the near-field optical head, at which the light-blocking metal film is disposed; λ represents a wavelength in a vacuum of a light source used in the near-field optical head; φ1 represents a phase shift due to reflection by the light-blocking metal film; φ2 represents a phase shift due to reflection by the reflection layer; and m represents a positive integer.
摘要翻译：一种信息记录和再现装置，包括至少包括基板，设置在基板上的反射层和设置成将反射层插入在基板和记录层之间的记录层的记录介质和近场光学头，靠近记录介质设置，用于用近场光照射记录介质以进行信息的记录和再现。近场光学头包括遮光金属膜，该遮光金属膜包括设置有小开口的电介质基材，并且与设置在基板上的反射层相对地设置，使得遮光金属膜和反射层构成光谐振器以增加近场光的强度。光谐振器满足以下谐振条件：4piL /λ+ phi1 + phi2 = 2mpi，其中L表示在设置有遮光金属膜的近场光学头的底表面之间的光路; λ表示在近场光学头中使用的光源的真空中的波长; phi1表示由于遮光金属膜的反射而产生的相移; phi2表示由反射层的反射引起的相移; m表示正整数。

39. 发明申请

US20090021742A1 SENSOR APPARATUS 失效
标题翻译：传感器装置
公开(公告)号：US20090021742A1
公开(公告)日：2009-01-22
申请号：US12174776
申请日：2008-07-17
申请人： Kentaro Furusawa , Natsuhiko Mizutani , Ryo Kuroda
发明人： Kentaro Furusawa , Natsuhiko Mizutani , Ryo Kuroda
IPC分类号： G01N21/55
CPC分类号： G01N21/553
摘要： A plasmon sensor apparatus using a metallic fine periodic structure designed to reduce the dependences of the resonance wavelength and sensitivity on the incident angle. The plasmon sensor apparatus has a sensing element including a metallic member having periodic slit openings and metallic portions, and a substrate on which the metallic member is held, a light source which emits light so that the light is incident on the sensing element, and a photodetector which detects light obtained from the light source. If the period of the slit openings is Λ; the width of the metallic portions is d; and the thickness of the metallic member is h, the aspect ratio h/(Λ−d) of the slit openings is 3 or higher and the opening width (Λ−d) is equal to or smaller than the wavelength of light applied from the light source to the sensing element.
摘要翻译：一种使用金属微细周期结构的等离子体激元传感器装置，其设计用于降低谐振波长和灵敏度对入射角的依赖性。等离子体激元传感器装置具有感测元件，其包括具有周期性狭缝开口的金属部件和金属部分，以及保持金属部件的基板，发射光以使得光入射到感测元件上的光源，以及检测从光源获得的光的光电检测器。如果狭缝开口的周期是λ; 金属部分的宽度为d; 并且金属构件的厚度为h，狭缝开口的长宽比h /（λ-d）为3以上，开口宽度（λ-d）为从光源传感元件。

40. 发明申请

US20080199817A1 RESIST PATTERN FORMING METHOD 失效
标题翻译：电阻图案形成方法
公开(公告)号：US20080199817A1
公开(公告)日：2008-08-21
申请号：US12102152
申请日：2008-04-14
申请人： Natsuhiko Mizutani , Yasuhisa Inao
发明人： Natsuhiko Mizutani , Yasuhisa Inao
IPC分类号： G03F7/00
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/36 , G03F1/50 , G03F7/2014 , G03F7/70325
摘要： A resist pattern forming method includes preparing a photomask for generating near-field light having an intensity distribution. The photomask has a light-transmissible base member, and a light-blocking film. The film has a micro-aperture adapted to expose an object to near-field light seeping out from the micro-aperture. The photomask has a periodic structure and a shift of a phase. The shift exists between recesses or projections adjacent to the micro-aperture. A difference in the intensity distribution of the near-field light in the area of the aperture is reduced. The photomask is arranged close to a photoresist film on a substrate. Light from a light source irradiates the photoresist film by way of the photomask to form a latent image based on the micro-aperture, and the photoresist film is developed to form a resist pattern on the substrate based on the latent image.
摘要翻译：抗蚀剂图案形成方法包括制备用于产生具有强度分布的近场光的光掩模。光掩模具有透光性基材和遮光膜。该膜具有适于将物体暴露于从微孔渗出的近场光的微孔。光掩模具有周期性结构和相位偏移。在与微孔相邻的凹部或突起之间存在偏移。孔径区域中的近场光的强度分布的差异减小。光掩模布置在基板上的光致抗蚀剂膜附近。来自光源的光通过光掩模照射光致抗蚀剂膜，以基于微孔形成潜像，并且基于潜像在光致抗蚀剂图案上显影以在基板上形成抗蚀剂图案。

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