专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

US20140267495A1 LIQUID EJECTION APPARATUS 有权
标题翻译：液体喷射装置
公开(公告)号：US20140267495A1
公开(公告)日：2014-09-18
申请号：US14206791
申请日：2014-03-12
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Takashi KURODA , Tamio FUKUI
IPC分类号： B41J2/165
CPC分类号： B41J2/16538 , B41J2/16552 , B41J2/16588
摘要： An inkjet printer includes a cleaning unit to be brought into contact with a head lower surface of an ejection head, and a unit movement mechanism for moving the cleaning unit. The cleaning unit includes a base part, a cleaning liquid ejecting part protruding above the base part, and a pair of positioning parts. The positioning parts are brought into contact with a block lower surface of a head fixation block on opposite sides of the cleaning liquid ejecting part to keep an under-head gap for holding the cleaning liquid between the cleaning liquid ejecting part and the head lower surface. Since the positioning parts are spaced from the cleaning liquid ejecting part, it is possible to prevent the cleaning liquid that has spread from the under-head gap to the surrounding area from adhering to the block lower surface via the positioning parts.
摘要翻译：喷墨打印机包括与喷头的头部下表面接触的清洁单元和用于移动清洁单元的单元移动机构。清洁单元包括基部，在基部上方突出的清洗液喷射部和一对定位部。使定位部件与清洁液喷射部的相对侧的头部固定块的块下表面接触，以保持用于将清洁液保持在清洁液喷射部和头部下表面之间的下头间隙。由于定位部件与清洗液喷射部分间隔开，所以可以防止从头部下方的间隙向周围区域扩散的清洗液经由定位部附着到块下表面。

32. 发明申请

US20140253911A1 INSPECTING DEVICE AND INSPECTING METHOD 有权
标题翻译：检查设备和检查方法
公开(公告)号：US20140253911A1
公开(公告)日：2014-09-11
申请号：US14201298
申请日：2014-03-07
申请人： OSAKA UNIVERSITY , DAINIPPON SCREEN MFG. CO., LTD.
发明人： Hidetoshi Nakanishi , Akira Ito , Masayoshi Tonouchi , Iwao Kawayama
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/636 , G01N21/9505
摘要： An inspecting device includes: an irradiation part for dividing pulsed light emitted from a femtosecond laser into measurement pump light and measurement probe light, to irradiate a solar cell; a detection part for detecting an electromagnetic wave emitted from the solar cell in accordance with the irradiation with the measurement probe light; and a measurement delay part for delaying the time of arrival of the measurement probe light at the solar cell relatively to the measurement pump light. The irradiation part is provided with a galvano mirror for scanning with the measurement probe light a wide range which is wider than an irradiated range (pump light spot) being irradiated with the measurement pump light in a solar cell.
摘要翻译：检查装置包括：照射部，其将从飞秒激光发射的脉冲光分为测量泵浦光和测量探测光，照射太阳能电池; 用于根据所述测量探针光的照射来检测从所述太阳能电池发射的电磁波的检测部; 以及用于相对于测量泵浦光将测量探针光到达太阳能电池的时间延迟的测量延迟部分。照射部设置有用于用测量探针光进行扫描的电流反射镜，其宽度大于在太阳能电池中照射测量泵浦光的照射范围（泵浦光斑）。

33. 发明申请

US20140253625A1 PRINTED MATTER, PRINTING APPARATUS, AND PRINTING PRECISION MEASURING METHOD 有权
标题翻译：印刷品，印刷装置和印刷精密测量方法
公开(公告)号：US20140253625A1
公开(公告)日：2014-09-11
申请号：US14142020
申请日：2013-12-27
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Takaharu YAMAMOTO
IPC分类号： B41J29/393
CPC分类号： B41J29/393 , B41J3/60 , B42D15/0006 , B42D15/008
摘要： Provided is a printed matter for measuring printing precision of a printing apparatus configured to perform printing to both sides of a printing medium. The printed matter includes a plurality of positioning reference marks printed orthogonal to a transportation direction of the printing medium; and an inspecting window bored in a positioning reference mark of the plurality of positioning reference marks, the positioning reference mark corresponding to an object to be inspected. The printing medium is folded so as to make another positioning reference mark on the printing medium visible through the inspecting window, and the positioning reference mark on a side of the inspecting window is compared with the positioning reference mark visible through the inspecting window, whereby printing precision is measured.
摘要翻译：提供了一种用于测量打印设备的打印精度的打印物，其被配置为对打印介质的两侧进行打印。打印物包括与打印介质的传送方向正交地印刷的多个定位参考标记; 以及在多个定位参考标记的定位参考标记中钻孔的检查窗口，所述定位参考标记对应于待检查的对象。打印介质被折叠，以便通过检查窗口在打印介质上可以看到另一个定位参考标记，并且将检查窗口一侧的定位参考标记与通过检查窗可见的定位参考标记进行比较，由此打印测量精度。

34. 发明申请

US20140202989A1 SUBSTRATE TREATMENT METHOD 有权
标题翻译：基板处理方法
公开(公告)号：US20140202989A1
公开(公告)日：2014-07-24
申请号：US14248690
申请日：2014-04-09
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Takuya KISHIMOTO , Koji ANDO
IPC分类号： H01L21/02 , C03C15/00 , H01L21/465
CPC分类号： H01L21/02052 , H01L21/02087 , H01L21/465 , H01L21/67051 , H01L21/6708 , H01L21/6875
摘要： A substrate treatment method includes a substrate holding unit which horizontally holds a substrate; a rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; and a first nozzle having an opposing face to be opposed to a lower surface of the substrate inward of a peripheral portion of the substrate in spaced relation to the lower surface of the substrate during rotation of the substrate by the rotating unit and a treatment liquid spout provided in the opposing face for filling a space defined between the lower surface of the substrate and the opposing face with a treatment liquid spouted from the treatment liquid spout to keep the space in a liquid filled state; wherein the treatment liquid spreads outwardly over the lower surface of the substrate and further, flows around to a peripheral portion of an upper surface of the substrate.
摘要翻译：基板处理方法包括水平保持基板的基板保持单元; 旋转单元，其使由所述基板保持单元保持的所述基板绕垂直轴旋转; 以及第一喷嘴，其具有相对面，所述相对面在与所述基板的下表面间隔开的状态下与所述基板的周边部分的内侧相对，在所述基板通过所述旋转单元旋转期间和处理液喷口设置在所述相对面中，用从所述处理液喷口喷射的处理液填充所述基板的下表面和所述相对面之间的空间，以将所述空间保持在液体填充状态; 其中所述处理液体向外扩散在所述基底的下表面上，并且进一步流过所述基底的上表面的周边部分。

35. 发明申请

US20140182626A1 SUBSTRATE TREATING METHOD FOR TREATING SUBSTRATES WITH TREATING LIQUIDS 有权
标题翻译：用处理液体处理衬底的衬底处理方法
公开(公告)号：US20140182626A1
公开(公告)日：2014-07-03
申请号：US14148324
申请日：2014-01-06
申请人： Dainippon Screen MFG. Co., Ltd.
发明人： Toyohide HAYASHI
IPC分类号： H01L21/67
CPC分类号： H01L21/67023 , B08B3/048 , B08B3/08 , H01L21/67028 , H01L21/67051 , H01L21/67057 , H01L21/67253
摘要： A method for treating substrates with treating liquids, using a treating tank for storing the treating liquids, a holding mechanism for holding the substrates and placing the substrates in a treating position inside the treating tank, a first and a second treating liquid supply device, a temperature control device, and a control device. A first treating liquid is supplied into the treating tank, then a second treating liquid of lower surface tension and higher boiling point than the first treating liquid, is supplied into the treating tank, and placed in a temperature range above the boiling point of the first treating liquid and below the boiling point of the second treating liquid, and then controlling the second treating liquid supply device to replace the first treating liquid stored in the treating tank with the second treating liquid, and controlling the temperature control device to maintain the second treating liquid in the same said temperature range.
摘要翻译：一种用处理液处理基材的方法，使用处理槽储存处理液，保持机构用于保持基板并将基板放置在处理槽内的处理位置，第一和第二处理液供应装置，温度控制装置和控制装置。将第一处理液体供给到处理槽中，然后将比第一处理液低的表面张力低沸点的第二处理液供给到处理槽中，放置在高于第一处理液的沸点的温度范围内处理液体并且低于第二处理液的沸点，然后控制第二处理液体供给装置以用第二处理液替换存储在处理槽中的第一处理液，并且控制温度控制装置保持第二处理液体在相同温度范围内。

36. 发明申请

US20140174483A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20140174483A1
公开(公告)日：2014-06-26
申请号：US14193523
申请日：2014-02-28
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Katsuhiko MIYA , Akira IZUMI
IPC分类号： H01L21/67
CPC分类号： H01L21/67051 , H01L21/67028 , Y10S134/902
摘要： A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in the blocking member to replace the rinsing liquid adhering to the substrate surface with the liquid mixture while the nitrogen gas is supplied into the clearance space. Thus, an increase of the dissolved oxygen concentration of the liquid mixture can be suppressed upon replacing the rinsing liquid adhering to the substrate surface with the liquid mixture, which makes it possible to securely prevent from forming an oxide film or generating watermarks on the substrate surface.
摘要翻译：从形成在阻挡部件上的冲洗液体排出口排出冲洗液（DIW），在向间隙空间供给氮气的同时，向基板表面进行漂洗处理，并将液体混合物（IPA + DIW）从形成在所述阻挡构件中的液体混合物排出口，以在将所述氮气供应到所述间隙空间中时，用所述液体混合物代替粘附到所述基板表面的冲洗液。因此，当用液体混合物代替粘附到基板表面的冲洗液体时，可以抑制液体混合物的溶解氧浓度的增加，这使得可以可靠地防止在基板表面上形成氧化膜或产生水印。

37. 发明申请

US20140169772A1 HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATION WITH FLASH LIGHT 审中-公开
标题翻译：用于通过闪光灯照射加热衬底的热处理装置
公开(公告)号：US20140169772A1
公开(公告)日：2014-06-19
申请号：US14104178
申请日：2013-12-12
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Makoto ABE , Takahiro YAMADA , Kazuhiko FUSE
IPC分类号： H01L21/687 , H01L21/67
CPC分类号： H01L21/68735 , H01L21/324 , H01L21/67115 , H01L21/6875 , H05B3/0047
摘要： A susceptor of a holding part for holding a semiconductor wafer includes a disc-shaped holding plate, an annular shaped guide ring, and a plurality of support pins. The guide ring has an inside diameter greater than the diameter of the semiconductor wafer and is installed on the peripheral portion of the top face of the holding plate. The guide ring has a tapered surface along the inner circumference. The semiconductor wafer before irradiated with flash light is supported by the support pins. The annular shape of the guide ring increases the contact area when the semiconductor wafer that has jumped off the susceptor and fallen when irradiated with flash light collides with the guide ring, thus reducing the impact of the collision and preventing cracks in the substrate.
摘要翻译：用于保持半导体晶片的保持部的基座包括盘形保持板，环形导向环和多个支撑销。引导环的内径大于半导体晶片的直径，并且安装在保持板的顶面的周边部分上。导向环具有沿着内圆周的锥形表面。用闪光照射的半导体晶片由支撑销支撑。导向环的环状增大了当用闪光灯照射时从基座跳下而下降的半导体晶片与导向环碰撞时引起的接触面积增加，从而减少了碰撞的冲击并防止了基板中的裂纹。

38. 发明申请

US20140084184A1 APPARATUS FOR AND METHOD OF DRAWING 有权
标题翻译：装置和绘图方法
公开(公告)号：US20140084184A1
公开(公告)日：2014-03-27
申请号：US13912323
申请日：2013-06-07
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Yoshinori HONJO , Makoto UESATO
IPC分类号： H01L21/268
CPC分类号： G03F7/7015 , G03F7/70383 , H01L21/268
摘要： A drawing apparatus accepts a selection manipulation for selecting the type of shape of a light outgoing ratio function defining a relationship between the position of modulation units included in an optical unit as seen in the direction of the arrangement of the modulation units and a light outgoing ratio from among a plurality of shape type candidates. The drawing apparatus then adjusts the light outgoing ratio of each of the modulation units in accordance with the accepted shape type. While emitting a beam of drawing light of a strip-shaped cross-sectional configuration from the optical unit, the drawing apparatus moves the optical unit relative to a substrate in a direction orthogonal to the direction of the longer dimension of the strip-shaped cross section of the drawing light beam to perform a drawing process on the substrate.
摘要翻译：绘图装置接受选择操作，用于选择定义关于在调制单元的排列方向上看到的光学单元中包括的调制单元的位置与出光比之间的关系的光出射比函数的形状的类型从多个形状型候选中选出。然后，绘图装置根据接受的形状类型调整每个调制单元的光出射比。在从光学单元发射带状横截面构造的光束的同时，绘图装置沿着与条形截面的较长尺寸的方向正交的方向相对于基板移动光学单元的图形光束以在基板上进行拉丝处理。

39. 发明申请

US20140065295A1 SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理方法和基板处理装置
公开(公告)号：US20140065295A1
公开(公告)日：2014-03-06
申请号：US14011285
申请日：2013-08-27
申请人： DAINIPPON SCREEN MFG. CO., LTD
发明人： Tetsuya EMOTO , Manabu OKUTANI
IPC分类号： B05D1/00 , B05C9/12
CPC分类号： B05D1/005 , B05C9/12 , B05D3/02 , B05D3/0254 , B05D3/0493 , B05D5/08 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086 , H01L21/6715
摘要： A substrate treatment method is provided, which includes: a liquid film forming step of forming a liquid film of a treatment liquid on a front surface of a substrate; a hydrophobization liquid supplying step of supplying a hydrophobization liquid to a center portion of the front surface of the substrate for hydrophobizing the front surface of the substrate, while rotating the substrate; an inactivation suppressing step of suppressing inactivation of the supplied hydrophobization liquid on a peripheral edge portion of the front surface of the substrate simultaneously with the hydrophobization liquid supplying step; and a drying step of drying the substrate to which the hydrophobization liquid has been supplied.
摘要翻译：提供了一种基板处理方法，其包括：在基板的前表面上形成处理液的液膜的液膜形成步骤; 疏水化液体供给步骤，在旋转所述基板的同时，将疏水化液体供给到所述基板的前表面的中心部分，以使所述基板的前表面疏水化; 在疏水化液供给工序的同时，抑制供给的疏水化液在基材的表面的周缘部的失活的失活抑制工序; 以及干燥步骤，干燥已经提供疏水化液体的基材。

40. 发明申请

US20140051258A1 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR CARRYING OUT CHEMICAL TREATMENT FOR SUBSTRATE 有权
标题翻译：基板处理装置和基板处理方法，用于执行基板的化学处理
公开(公告)号：US20140051258A1
公开(公告)日：2014-02-20
申请号：US13953954
申请日：2013-07-30
申请人： DAINIPPON SCREEN MFG. CO., LTD.
发明人： Kenji IZUMOTO , Nobuyuki SHIBAYAMA
IPC分类号： H01L21/306 , H01L21/67
CPC分类号： H01L21/30604 , H01L21/02087 , H01L21/0209 , H01L21/32134 , H01L21/67028 , H01L21/6708 , H01L21/67086
摘要： It is an object to carry out a chemical treatment for a peripheral edge part of a substrate while suppressing an amount of consumption of a processing liquid and a time required for processing. In order to achieve the object, a substrate processing device injects heating steam to a peripheral edge part of a substrate to heat the peripheral edge part when carrying out a chemical treatment for the peripheral edge part of the substrate while rotating the substrate in a substantially horizontal posture. Moreover, the substrate processing device injects a gas from above the substrate toward a predetermined injection target region defined within a range surrounded by a rotating track of the peripheral edge part of the substrate in an upper surface of the substrate, thereby generating, on the substrate, a gas flow which flows from the injection target region toward the peripheral edge part of the substrate.
摘要翻译：本发明的目的是在抑制处理液的消耗量和处理所需的时间的同时对基板的周缘部进行化学处理。为了实现该目的，基板处理装置在基板的基本水平旋转的同时对基板的周缘部进行化学处理，向基板的周缘部喷射加热蒸汽，对周缘部进行加热，姿势。此外，基板处理装置从基板上方朝向在基板的上表面中由基板的周缘部的旋转轨道包围的范围内限定的规定的注入对象区域注入气体，从而在基板从喷射对象区域朝向基板的周缘部流动的气流。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式