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21. 发明授权

US07804058B2 Optical tweezers controlling device 有权
标题翻译：光镊控制装置
公开(公告)号：US07804058B2
公开(公告)日：2010-09-28
申请号：US12222249
申请日：2008-08-06
申请人： Long Hsu , Cheng-Hsien Liu , Sheng-Yang Tseng , Ai-Tang Chang , Chung-Cheng Chou , William Wang , Fung-Hsu Wu , Chen Peng , Ta-Yuan Lee
发明人： Long Hsu , Cheng-Hsien Liu , Sheng-Yang Tseng , Ai-Tang Chang , Chung-Cheng Chou , William Wang , Fung-Hsu Wu , Chen Peng , Ta-Yuan Lee
IPC分类号： H01S1/00 , H01S3/00 , H05H3/02
CPC分类号： G02B21/32
摘要： An optical tweezers controlling device including a light source, an objective lens and a focus adjusting unit is provided. The focus adjusting unit disposed between the light source and the objective lens includes a mirror set and a zoom lens set. The mirror set has at least a mirror. The mirror is rotatable such that after a light of the light source is projected to the mirror, the reflective direction of the light reflected from the mirror is changeable. The zoom lens set has at least a zoom lens disposed in accordance with the mirror. By rotating the mirror or changing the focal length of the zoom lens, the focusing location of the light changes on the focal plane of the objective lens or in the front or the rear of the focal plane.
摘要翻译：提供一种包括光源，物镜和焦点调节单元的光学镊子控制装置。设置在光源和物镜之间的聚焦调节单元包括镜组和变焦透镜组。镜子至少有一个镜子。反射镜可旋转，使得在光源的光被投射到反射镜之后，从反射镜反射的光的反射方向是可变的。变焦透镜组具有至少根据镜子设置的变焦透镜。通过旋转镜子或改变变焦镜头的焦距，光的聚焦位置在物镜的焦平面或焦平面的前面或后面改变。

22. 发明授权

US07786432B2 Apparatus and method for changing optical tweezers 有权
标题翻译：改变光学镊子的装置和方法
公开(公告)号：US07786432B2
公开(公告)日：2010-08-31
申请号：US12222250
申请日：2008-08-06
申请人： Long Hsu , Cheng-Hsien Liu , Sheng-Yang Tseng , Chung-Cheng Chou , William Wang , Fung-Hsu Wu , Chen Peng , Ta-Yuan Lee
发明人： Long Hsu , Cheng-Hsien Liu , Sheng-Yang Tseng , Chung-Cheng Chou , William Wang , Fung-Hsu Wu , Chen Peng , Ta-Yuan Lee
IPC分类号： H01S1/00 , H01S3/00 , H05H3/02
CPC分类号： G02B21/32
摘要： An apparatus and a method for changing optical tweezers are provided. The apparatus includes a diffractive optical element (DOE), a mask unit and an objective lens. The DOE includes a plurality of phase delay patterns. The mask unit includes a plurality of mask patterns that correspond to the phase delay patterns, respectively, wherein at least a portion of the mask patterns are complementary. A laser beam passing through each phase diffractive pattern correspondingly passes through each mask pattern to generate a compound diffractive pattern. The objective lens receives the compound diffractive pattern and focuses it on an examining object to form an optical tweezers.
摘要翻译：提供了一种用于改变光学镊子的设备和方法。该装置包括衍射光学元件（DOE），掩模单元和物镜。 DOE包括多个相位延迟模式。掩模单元包括分别对应于相位延迟图案的多个掩模图案，其中至少一部分掩模图案是互补的。通过每个相位衍射图案的激光束相应地通过每个掩模图案以产生复合衍射图案。物镜接收复合衍射图案并将其聚焦在检查对象上以形成光学镊子。

23. 发明授权

US07777178B2 Plasma generating apparatus and method using neutral beam 有权
标题翻译：等离子体发生装置和使用中性束的方法
公开(公告)号：US07777178B2
公开(公告)日：2010-08-17
申请号：US11277261
申请日：2006-03-23
申请人： Geun-Young Yeom , Sang-Duk Park , Chang-Kwon Oh
发明人： Geun-Young Yeom , Sang-Duk Park , Chang-Kwon Oh
IPC分类号： H05H3/02
CPC分类号： H05H1/46 , H05H2001/4667
摘要： A plasma generating apparatus and method using a neutral beam, capable of readily generating plasma at the same gas flow rate by changing the structure of an ion gun, without a separate ignition device, are provided. The apparatus includes a plasma generating part formed of a quartz cup, a radio frequency (RF) applying antenna disposed at the periphery of the plasma generating part, a cooling water supply part disposed at the periphery of the plasma generating part, and an igniter in direct communication with the plasma generating part, wherein a gas for generating plasma is supplied into the igniter, and the igniter has a higher local pressure than the plasma generating part at the same gas flow rate. The ion gun is also cheaper to manufacture since it does not require a separate power supply.
摘要翻译：提供了一种使用中性束的等离子体发生装置和方法，其能够通过改变离子枪的结构而容易地以相同的气体流量产生等离子体，而不需要单独的点火装置。该装置包括由石英杯形成的等离子体产生部件，设置在等离子体产生部件周边的射频（RF）施加天线，设置在等离子体产生部件周边的冷却水供应部分，以及点火器与等离子体产生部件的直接连通，其中用于产生等离子体的气体被供应到点火器中，并且点火器具有比等离子体产生部件具有相同气体流量的更高的局部压力。离子枪制造成本也便宜，因为它不需要单独的电源。

24. 发明申请

US20100200739A1 Ultracold-Matter Systems 有权
标题翻译：超低密度体系
公开(公告)号：US20100200739A1
公开(公告)日：2010-08-12
申请号：US12600821
申请日：2008-05-19
申请人： Dana Z. Anderson , Evan Salim , Matthew Squires , Sterling Eduardo McBride , Steven Alan Lipp , Joey John Michalchuk
发明人： Dana Z. Anderson , Evan Salim , Matthew Squires , Sterling Eduardo McBride , Steven Alan Lipp , Joey John Michalchuk
IPC分类号： H05H3/02
CPC分类号： G21K1/006
摘要： Cold-atom systems and methods of handling cold atoms are disclosed. A cold-atom system has multiple chambers and a fluidic connection between two of the chambers. One of these two chambers includes an atom source and the other includes an atom chip.
摘要翻译：公开了冷原子系统和处理冷原子的方法。冷原子系统具有多个室和两个室之间的流体连接。这两个室中的一个包括原子源，另一个包括原子芯片。

25. 发明授权

US07705299B2 Scanning ion probe systems and methods of use thereof 有权
标题翻译：扫描离子探针系统及其使用方法
公开(公告)号：US07705299B2
公开(公告)日：2010-04-27
申请号：US12132730
申请日：2008-06-04
申请人： Andrei G. Fedorov
发明人： Andrei G. Fedorov
IPC分类号： H05H3/02
CPC分类号： H01J49/165 , G01Q30/02 , G01Q30/14 , H01J49/0004 , H01J49/0436
摘要： Briefly described, embodiments of this disclosure, among others, include scanning ion probe systems, methods of use thereof, scanning ion source systems, methods of use thereof, scanning ion probe mass spectrometry systems, methods of use thereof, methods of simultaneous ion analysis and imaging, and methods of simultaneous mass spectrometry and imaging.
摘要翻译：简而言之，本公开的实施例包括扫描离子探针系统，其使用方法，扫描离子源系统，其使用方法，扫描离子探针质谱系统，其使用方法，同时离子分析方法和成像和同时质谱法和成像方法。

26. 发明申请

US20090140132A1 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING NEUTRALIZED BEAMS INCLUDING APPLYING A VOLTAGE TO A SUBSTRATE SUPPORT 有权
标题翻译：使用中性线处理基板的装置和方法，包括将电压应用于基板支持
公开(公告)号：US20090140132A1
公开(公告)日：2009-06-04
申请号：US12323783
申请日：2008-11-26
申请人： Do-Haing Lee , Ha-Na Kim , Yong-Jin Kim
发明人： Do-Haing Lee , Ha-Na Kim , Yong-Jin Kim
IPC分类号： H05H3/02
CPC分类号： H01J37/30 , H01J2237/0041 , H01J2237/04756 , H01J2237/20 , H01J2237/31
摘要： An apparatus and method for processing a substrate using neutralized beams are provided. A substrate processing apparatus includes an ion source generating device configured to form an ion source. An ion extraction device is configured to extract and accelerate ions from the ion source. An ion neutralizing device is configured to convert the ions extracted and accelerated from the ion extraction device into neutralized beams. A remaining portion of the ions extracted and accelerated from the ion extraction device is not converted into the neutralized beams. A substrate support is configured to support a substrate such that the neutralized beams are directed towards the substrate support. A substrate power supply is configured to apply a voltage to the substrate support such that the remaining portion of the ions that is not converted into the neutralized beams is directed away from the substrate support by the applied voltage of the substrate.
摘要翻译：提供了一种使用中和束来处理衬底的设备和方法。衬底处理装置包括被配置为形成离子源的离子源生成装置。离子提取装置被配置为从离子源提取和加速离子。离子中和装置被配置为将从离子提取装置提取和加速的离子转化成中和的束。从离子提取装置提取和加速的离子的剩余部分不被转换成中和的束。衬底支撑件被配置为支撑衬底，使得中和的光束被引向衬底支撑件。衬底电源被配置为向衬底支撑件施加电压，使得未转换成中和束的离子的剩余部分通过衬底的施加电压被引导离开衬底支撑。

27. 发明授权

US07488932B2 Apparatus for producing atomic beam 有权
标题翻译：用于生产原子束的装置
公开(公告)号：US07488932B2
公开(公告)日：2009-02-10
申请号：US11454361
申请日：2006-06-15
申请人： Chin-Kuo Ting
发明人： Chin-Kuo Ting
IPC分类号： H05H3/02
CPC分类号： H05H3/02
摘要： An apparatus for producing an atomic beam comprising an ionization chamber, an ion beam drawing device, a neutralization chamber and a voltage regulating device is provided. The ionization chamber generates an ion beam and the ion beam drawing device draws the ion beam out from the ionization chamber. The neutralization chamber and the voltage regulating device are disposed on the path of the ion beam. Moreover, the ion beam drawing device is disposed between the ionization chamber and the neutralization chamber and the voltage regulating device is disposed between the ion beam drawing device and the neutralization chamber. The energy of the ion beam can be reduced by the voltage regulating device. The ion beam is neutralized to a neutral atomic beam after passing through the neutralization chamber. Therefore, the apparatus for producing the atomic beam provided in this invention can effectively produce the neutral atomic beam.
摘要翻译：提供了一种用于制造包括电离室，离子束拉伸装置，中和室和电压调节装置的原子束的装置。电离室产生离子束，离子束引出装置将离子束从电离室中抽出。中和室和电压调节装置设置在离子束的路径上。此外，离子束拉伸装置设置在电离室和中和室之间，电压调节装置设置在离子束引出装置和中和室之间。离子束的能量可以通过电压调节装置来减少。离子束通过中和室后被中和到中性原子束。因此，本发明提供的原子束制造装置能够有效地产生中性原子束。

28. 发明授权

US07408147B2 Nanoelectromechanical and microelectromechanical sensors and analyzers 有权
标题翻译：纳米机电和微机电传感器和分析仪
公开(公告)号：US07408147B2
公开(公告)日：2008-08-05
申请号：US11460063
申请日：2006-07-26
申请人： Robert Heinrich Blick , Michael Scott Westphall , Lloyd Michael Smith
发明人： Robert Heinrich Blick , Michael Scott Westphall , Lloyd Michael Smith
IPC分类号： H05H3/02 , G01N11/00
CPC分类号： G01N29/022 , B82Y15/00 , G01N29/036 , G01N2291/0256 , G01N2291/0423 , G01N2291/0427 , G01N2291/106 , H01J49/025 , H01J2329/00
摘要： The present invention provides methods, devices and device components for detecting, sensing and analyzing molecules. Detectors of the present invention provide good detection sensitivity over a wide range of molecular masses ranging from a few Daltons up to 10s of megadaltons, which does not decrease as function of molecular mass. Sensors and analyzers of the present invention detect emission from an array of resonators to determine the molecular masses and/or electric charges of molecules which impact or contact an external surface of a membrane that is used to mount and excite the resonators in the array. Resonators in the array are excited via piezoelectric and/or magnetic excitation of the mounting membrane and, optionally, grid electrodes are used in certain configurations for electrically biasing for the resonator array, and for amplification or suppression of emission from the resonators so as to provide detection and mass/electric charge analysis with good sensitivity and resolution.
摘要翻译：本发明提供用于检测，感测和分析分子的方法，装置和装置组件。本发明的检测器在范围广泛的分子量范围内提供良好的检测灵敏度，范围从几道尔顿至10s兆兆分之一，其不随分子量的功能而降低。本发明的传感器和分析器检测来自谐振器阵列的发射，以确定影响或接触用于安装和激励阵列中的谐振器的膜的外表面的分子的分子质量和/或电荷。阵列中的谐振器通过安装膜的压电和/或磁激励而激发，并且可选地，栅极用于某些构造以用于谐振器阵列的电偏置，以及用于放大或抑制来自谐振器的发射，从而提供检测和质量/电荷分析具有良好的灵敏度和分辨率。

29. 发明授权

US07385183B2 Substrate processing apparatus using neutralized beam and method thereof 有权
标题翻译：使用中和束的基板处理装置及其方法
公开(公告)号：US07385183B2
公开(公告)日：2008-06-10
申请号：US11335725
申请日：2006-01-19
申请人： Sung-Chan Park , Sung-Wook Hwang
发明人： Sung-Chan Park , Sung-Wook Hwang
IPC分类号： H05H3/02 , H01J37/26 , H01S1/00
CPC分类号： H01J37/026 , H01J37/32357 , H01J2237/0042 , H01J2237/334
摘要： In a substrate processing apparatus using a neutralized beam and a method thereof, the substrate processing apparatus includes: an ion source for emitting an ion beam at an emitting angle; reflectors at which the ion beam emitted by the ion source is incident and subject to 2n collisions (where n is a positive integer) in first and second opposite directions to neutralize the ion beam as a neutralized beam and to restore a direction of propagation of the neutralized beam to the emitting angle of the ion beam; and a substrate at which the neutralized beam generated by the reflectors is incident on to perform a process. Accordingly, an incident angle of the resultant neutralized beam is perpendicular to a substrate, while the direction of propagation of the originating ion source and the surface of the substrate are maintained to be perpendicular to each other.
摘要翻译：在使用中和束的基板处理装置及其方法中，基板处理装置包括：用于以发射角发射离子束的离子源; 由离子源发射的离子束入射并且在第一和第二相反方向上经受2n次碰撞（其中n是正整数）的反射器，以将离子束中和作为中和的光束，并恢复所述离子束的传播方向中和的束到离子束的发射角; 以及由反射器产生的被中和的光束入射的基板，以执行处理。因此，所得中和束的入射角垂直于基板，而原始离子源和基板的表面的传播方向保持彼此垂直。

30. 发明申请

US20080093543A1 Thermal management technology for polarizing xenon 有权
标题翻译：用于极化氙气的热管理技术
公开(公告)号：US20080093543A1
公开(公告)日：2008-04-24
申请号：US11903161
申请日：2007-09-20
申请人： F. Hersman
发明人： F. Hersman
IPC分类号： H05H3/02 , H05H6/00
CPC分类号： H05H6/005 , G21K1/16 , Y10S62/923 , Y10S62/925
摘要： A polarizing apparatus has a thermally conductive partitioning system in a polarizing cell. In the polarizing region, this thermally conductive partitioning system serves to prevent the elevation of the temperature of the polarizing cell where laser light is maximally absorbed to perform the polarizing process. By employing this partitioning system, increases in laser power of factors of ten or more can be beneficially utilized to polarize xenon. Accordingly, the polarizing apparatus and the method of polarizing 129Xe achieves higher rates of production.
摘要翻译：偏振装置在偏光元件中具有导热性分配系统。在偏光区域中，这种导热分隔系统用于防止激光被最大程度地吸收的偏光元件的温度升高，从而进行极化处理。通过采用这种分配系统，可以有益地利用10以上因素的激光功率的增加来极化氙气。因此，极化装置和极化氙的方法实现更高的生产率。

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