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21. 发明授权

US09679740B2 Charged particle beam device 有权
公开(公告)号：US09679740B2
公开(公告)日：2017-06-13
申请号：US15109230
申请日：2014-12-16
申请人： Hitachi High-Technologies Corporation
发明人： Wen Li , Ryo Kadoi , Kazuki Ikeda , Hiroyuki Takahashi , Hajime Kawano
IPC分类号： H01J37/26 , G21K5/04 , H01J37/147 , H01J37/244 , H01J37/28
CPC分类号： H01J37/1472 , H01J37/244 , H01J37/28 , H01J2237/1504 , H01J2237/1508 , H01J2237/152 , H01J2237/1534 , H01J2237/2804 , H01J2237/2806
摘要： A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

22. 发明申请

US20170076908A1 TECHNIQUES AND APPARATUS FOR MANIPULATING AN ION BEAM 有权
标题翻译：用于操纵离子束的技术和装置
公开(公告)号：US20170076908A1
公开(公告)日：2017-03-16
申请号：US14849813
申请日：2015-09-10
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： James S. Buff , Victor Benveniste , Frank Sinclair
IPC分类号： H01J37/147 , H01J37/14 , H01J37/317
CPC分类号： H01J37/1475 , H01J37/14 , H01J37/1471 , H01J37/1478 , H01J37/3171 , H01J2237/1415 , H01J2237/152 , H01J2237/31701
摘要： A method may include: generating an ion beam from an ion source, the ion beam having an initial direction of propagation; deflecting the ion beam at an initial angle of inclination with respect to the initial direction of propagation; passing the ion beam through an aperture in a magnetic assembly; and generating in the aperture, a quadrupole field extending along a first direction perpendicular to the initial direction of propagation of the ion beam, and a dipole field extending along a second direction perpendicular to the first direction and the initial direction of propagation.
摘要翻译：一种方法可以包括：从离子源产生离子束，离子束具有初始的传播方向; 使离子束以相对于初始传播方向的初始倾斜角偏转; 使离子束通过磁性组件中的孔; 并且在所述孔中产生垂直于离子束的初始传播方向的第一方向延伸的四极场，以及沿垂直于第一方向和初始传播方向的第二方向延伸的偶极场。

23. 发明申请

US20160314929A1 Beam Guidance System, Particle Beam Therapy System and Method 审中-公开
标题翻译：光束引导系统，粒子束治疗系统和方法
公开(公告)号：US20160314929A1
公开(公告)日：2016-10-27
申请号：US15133347
申请日：2016-04-20
申请人： Jürgen Drees , Helmut Piel
发明人： Jürgen Drees , Helmut Piel
IPC分类号： H01J37/147 , A61N5/10 , H01J37/14
CPC分类号： H01J37/147 , A61N5/1077 , A61N2005/1087 , G21K1/093 , G21K5/04 , H01J37/14 , H01J2237/14 , H01J2237/152
摘要： The invention relates, inter alia, to a beam guidance system for guiding a beam of charged particles with a magnetic beam deflection unit, wherein the magnetic beam deflection unit has an entry side for entry of the beam of charged particles into the magnetic beam deflection unit in a direction of entry, wherein the magnetic beam deflection unit has an exit side for exit of the beam of charged particles from the magnetic beam deflection unit in a direction of exit. A further aspect of the invention relates to an advantageous particle beam therapy system. The problem of providing improving beam properties and at the same time reducing the amount of space required is solved in that the entry side of the magnetic beam deflection unit is, at least in sections, aligned substantially parallel to the exit side of the magnetic beam deflection unit.
摘要翻译：本发明尤其涉及用于用磁束偏转单元引导带电粒子束的光束引导系统，其中磁光束偏转单元具有入射侧，用于将带电粒子束进入磁束偏转单元在入射方向上，其中所述磁束偏转单元具有用于沿着出射方向从所述磁束偏转单元离开所述带电粒子束的出射侧。本发明的另一方面涉及一种有利的粒子束治疗系统。提供改进的光束特性并同时减少所需空间量的问题被解决为，磁束偏转单元的入射侧至少部分地基本平行于磁束偏转的出射侧排列单元。

24. 发明授权

US09472373B1 Beam separator device, charged particle beam device and methods of operating thereof 有权
标题翻译：光束分离装置，带电粒子束装置及其操作方法
公开(公告)号：US09472373B1
公开(公告)日：2016-10-18
申请号：US14828181
申请日：2015-08-17
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Stefan Lanio , John Breuer , Jürgen Frosien , Matthias Firnkes , Johannes Hopster
IPC分类号： H01J37/147 , H01J37/12 , H01J37/28 , H01J37/153
CPC分类号： H01J37/1472 , H01J37/12 , H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/12 , H01J2237/152 , H01J2237/1532 , H01J2237/1534 , H01J2237/2538
摘要： A beam separator device (200) is described. The beam separator device (200) includes a first deflector (112) providing a first magnetic deflection field (B1) for deflecting a charged particle beam (101) propagating along a beam entrance axis (A1) by a first deflection angle (α1); a second deflector (114) arranged downstream from the first deflector (112) providing a second magnetic deflection field (B2) for deflecting the charged particle beam by a second deflection angle (α2) in the direction of an intermediate beam axis (A2), wherein the second deflector (114) is configured for deflecting the charged particle beam (102) re-entering the beam separator device (200) along the intermediate beam axis (A2) by a third deflection angle (α3); a third deflector (212) arranged downstream from the second deflector (114) providing a third magnetic deflection field (B2) for deflecting the charged particle beam (102) by a fourth deflection angle (α4) in the direction of a beam exit axis (A3); a first rotation-free lens to be arranged at a first crossover (X1) of the charged particle beam between the first deflector (112) and the second deflector (114) for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector; and a second rotation-free lens to be arranged at a second crossover (X2) of the charged particle beam between the second deflector (114) and the third deflector (212) for at least partially compensating for a dispersion introduced by at least one of the second deflector and the third deflector.
摘要翻译：光束分离装置（200）被描述。分束器装置（200）包括第一偏转器（112），其提供第一磁偏转场（B1），用于使沿着光束入射轴线（A1）传播的带电粒子束（101）偏转第一偏转角（α1）; 第二偏转器（114）布置在第一偏转器（112）的下游，提供用于使带电粒子束沿中间光束轴线（A2）的方向偏转第二偏转角（α2）的第二磁偏转场（B2）其中所述第二偏转器（114）构造成用于使沿着所述中间光束轴线（A2）重新进入所述光束分离器装置（200）的带电粒子束（102）偏转第三偏转角（α3）; 布置在第二偏转器（114）的下游的第三偏转器（212）提供第三磁偏转场（B2），用于使带电粒子束（102）沿光束出射轴线的方向偏转第四偏转角（α4） A3）; 布置在第一偏转器（112）和第二偏转器（114）之间的带电粒子束的第一交叉（X1）处的第一无旋转透镜，用于至少部分补偿由至少一个第一偏转器和第二偏转器; 以及第二无旋转透镜，被布置在所述带电粒子束在所述第二偏转器（114）和所述第三偏转器（212）之间的第二交叉（X2）处，用于至少部分地补偿由所述第二偏转器第二偏转器和第三偏转器。

25. 发明申请

US20160189913A1 Combined Multipole Magnet and Dipole Scanning Magnet 有权
标题翻译：组合多极磁铁和偶极扫描磁铁
公开(公告)号：US20160189913A1
公开(公告)日：2016-06-30
申请号：US14978776
申请日：2015-12-22
申请人： Axcelis Technologies, Inc.
发明人： Edward C. Eisner
IPC分类号： H01J37/141 , H01J37/317 , H01J37/08
CPC分类号： H01J37/141 , H01J37/05 , H01J37/08 , H01J37/1472 , H01J37/1475 , H01J37/3171 , H01J2237/04922 , H01J2237/1415 , H01J2237/152
摘要： A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.
摘要翻译：提供了用于离子注入系统的组合扫描和聚焦磁体。组合的扫描和聚焦磁体具有磁导率高的磁轭。轭限定了构造成使离子束通过其中的孔。一个或多个扫描器线圈可操作地耦合到磁轭并且被配置为当电耦合到电源时产生随时间变化的主要偶极磁场。一个或多个聚焦线圈可操作地耦合到磁轭并且被配置为产生主要是多极磁场，其中主要是多极磁场是静态或时变之一。

26. 发明申请

US20160027610A1 ANNULAR COOLING FLUID PASSAGE FOR MAGNETS 有权
标题翻译：用于磁铁的环形冷却液通道
公开(公告)号：US20160027610A1
公开(公告)日：2016-01-28
申请号：US14873284
申请日：2015-10-02
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Scott Barraclough , James S. Buff
IPC分类号： H01J37/30 , H01J37/147 , H01J37/317 , H01F7/20 , H05K7/20
CPC分类号： H01J37/3007 , H01F7/20 , H01F27/10 , H01J37/1472 , H01J37/1475 , H01J37/3171 , H01J2237/002 , H01J2237/152 , H01J2237/1526 , H01J2237/303 , H01J2237/31701 , H05K7/20
摘要： A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.
摘要翻译：通常描述具有环形冷却剂流体通道的磁体。各种实施例提供一种包括第一磁体和设置在离子束耦合器周围的第二磁体的磁体，其中具有通孔。所述第一和第二磁体各自包括在其中具有空腔的金属芯，设置在所述金属芯周围的一个或多个导电线圈，以及被构造成插入所述空腔中的环形芯体元件，其中环形冷却剂流体通道形成在腔和环形芯元件。此外，环形芯元件可以具有第一直径和具有第二直径的中间部分，第二直径小于第一直径。公开和要求保护其他实施例。

27. 发明授权

US09162082B2 Circular accelerator and particle beam therapy apparatus 有权
标题翻译：圆形加速器和粒子束治疗仪
公开(公告)号：US09162082B2
公开(公告)日：2015-10-20
申请号：US14559111
申请日：2014-12-03
申请人： Kabushiki Kaisha Toshiba
发明人： Akihiro Osanai
IPC分类号： A61N5/10 , A61B6/00 , H01J37/30 , H01J37/147 , H05H13/04 , H05H7/10 , H05H7/08 , H05H7/00
CPC分类号： A61N5/1077 , A61N2005/1087 , A61N2005/1095 , H01J37/1472 , H01J37/3007 , H01J2237/04732 , H01J2237/152 , H01J2237/30472 , H05H7/08 , H05H7/10 , H05H13/04 , H05H2007/005 , H05H2007/087
摘要： One embodiment of a particle circular accelerator 1 includes: a beam deflector for beam injections, bending electromagnets that causes the beam injected from the beam deflector for beam injections to circulate so as to form a circulation orbit, orbit adjusting electromagnets for injected beams that shift the position of each injected beam relative to the center of the circulation orbit of the beam, quadrupole electromagnets and sextupole electromagnets that adjust their respective quantities of magnetic excitation at the time of a beam extraction so as to extract a beam in a resonant region off a stable reason of beams and a beam deflector for beam extractions that takes out the beam extracted from the resonant region to the outside. The circular accelerator 1 injects beams from the inner side thereof and emits beams to the outer side thereof.
摘要翻译：颗粒环形加速器1的一个实施例包括：用于光束注入的光束偏转器，弯曲电磁体，其使从光束偏转器注入的光束进行光束注入循环，以便形成循环轨道，用于注入光束的轨道调整电磁体，每个注入的光束相对于光束的循环轨道的中心的位置，四极电磁体和六极电磁体，其在光束提取时调整它们各自的磁激励量，以便将谐振区域中的光束提取出稳定的光束的原因和用于将从共振区域提取的光束取出到外部的光束提取的光束偏转器。圆形加速器1从其内侧注入光束并向其外侧发射光束。

28. 发明授权

US07977649B2 Plasma ion source mass spectrometer 有权
标题翻译：等离子体离子源质谱仪
公开(公告)号：US07977649B2
公开(公告)日：2011-07-12
申请号：US12405378
申请日：2009-03-17
申请人： Kazushi Hirano
发明人： Kazushi Hirano
IPC分类号： H01J49/00
CPC分类号： H01J49/0045 , H01J37/14 , H01J49/06 , H01J49/067 , H01J2237/14 , H01J2237/152
摘要： Provided is a plasma ion source mass spectrometer with an ion deflector lens having an improved removal ratio of photons and neutral particles as compared with the conventional art while an ion transmittance is maintained. The ion deflector includes an input side plate-like electrode, an output side plate-like electrode, and a tubular electrode disposed between the input side plate-like electrode and the output side plate-like electrode. The tubular electrode is of a point asymmetrical configuration. The tubular electrode is arranged so that a center axis of the tubular electrode is closer to an axis of travel of ions upstream of the input side plate-like electrode than an axis of travel of ions downstream of the output side plate-like electrode.
摘要翻译：本发明提供了一种具有离子透射透镜的等离子体离子源质谱仪，其与常规技术相比具有改善的光子和中性粒子的去除率，同时保持离子透射率。离子偏转器包括输入侧板状电极，输出侧板状电极和设置在输入侧板状电极和输出侧板状电极之间的管状电极。管状电极具有点对称配置。管状电极被布置成使得管状电极的中心轴线比输入侧板状电极的上游更靠近输入侧板状电极的上游离子的行进轴线。

29. 发明授权

US07829866B2 Broad energy-range ribbon ion beam collimation using a variable-gradient dipole 失效
标题翻译：使用可变梯度偶极子的宽能谱带状离子束准直
公开(公告)号：US07829866B2
公开(公告)日：2010-11-09
申请号：US12228473
申请日：2008-08-13
申请人： Kenneth H. Purser , Norman L. Turner
发明人： Kenneth H. Purser , Norman L. Turner
IPC分类号： H01J3/20
CPC分类号： H01J37/05 , H01J37/1472 , H01J37/3171 , H01J2237/055 , H01J2237/057 , H01J2237/152 , H01J2237/31701
摘要： A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.
摘要翻译：一种满足日益增长的要求的方法和装置，其用于提高在半导体晶片通过离子束时冲击半导体晶片的注入离子的强度。该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合在一起，以抵抗离子束诱导的空间电荷力的破坏性影响。新型光学元件的设计成为可能：（1）当光束通过均匀或不均匀的磁场时，对带状离子束进行聚焦; （2）减少包含直流电的离子的损失。当带状光束被磁场偏转时，带状光束到达磁极。

30. 发明授权

US07655922B2 Techniques for confining electrons in an ion implanter 有权
标题翻译：用于将电子限制在离子注入机中的技术
公开(公告)号：US07655922B2
公开(公告)日：2010-02-02
申请号：US11568000
申请日：2006-12-07
申请人： Donna L. Smatlak , Gordon C. Angel , Rajesh Dorai
发明人： Donna L. Smatlak , Gordon C. Angel , Rajesh Dorai
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/026 , H01J2237/0041 , H01J2237/055 , H01J2237/152 , H01J2237/31701
摘要： Techniques for confining electrons in an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for confining electrons in an ion implanter. The apparatus may comprise a first array of magnets and a second array of magnets positioned along at least a portion of a beam path, the first array being on a first side of the beam path and the second array being on a second side of the beam path, the first side opposing the second side. At least one magnet in the first array may have a pole facing an opposite pole of a corresponding magnet in the second array.
摘要翻译：公开了将电子限制在离子注入机中的技术。在一个特定的示例性实施例中，技术可以被实现为用于将电子限制在离子注入机中的装置。该装置可以包括第一磁体阵列和沿着光束路径的至少一部分定位的第二磁体阵列，第一阵列位于光束路径的第一侧上，第二阵列位于光束的第二侧上路径，第一面反对第二面。第一阵列中的至少一个磁体可以具有面对第二阵列中相应磁体的相对极的极。

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