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21. 发明申请

US20060194127A1 Method and apparatus for producing color filter with a line-scan exposure technology by high-speed shutter control 有权
标题翻译：通过高速快门控制用线扫描曝光技术生产滤色镜的方法和装置
公开(公告)号：US20060194127A1
公开(公告)日：2006-08-31
申请号：US11187825
申请日：2005-07-25
申请人： Yu-Cheng Lo , Huai-An Li , Feng-Lin Hsu
发明人： Yu-Cheng Lo , Huai-An Li , Feng-Lin Hsu
IPC分类号： G02B5/20 , G03F7/20
CPC分类号： G03F7/0043 , G02B5/201 , G03F7/70391
摘要： A method and apparatus for producing a color filter is disclosed. It mainly uses an exposure apparatus which can produce a plurality of exposure light sources to do an exposure process. Through fast controlling the on/off time of the plurality of exposure light sources as well as making a relative moving between the plurality of exposure light sources and a substrate plane, a color photoresist layer on the substrate plane can be exposed to form a pattern thereon, wherein the on/off time of the exposure light sources are respectively controlled by a plurality of shutters of the exposure apparatus. Then, with a developing process to the exposed color photoresist layer, a color layer is formed on the substrate plane. The main advantage of the invention is that photo-mask is not needed in the exposure process and any size substrate plane can be handled by the present exposure apparatus.
摘要翻译：公开了一种生产滤色器的方法和装置。它主要使用可产生多个曝光光源进行曝光处理的曝光装置。通过快速控制多个曝光光源的开/关时间以及在多个曝光光源和基板平面之间进行相对移动，可以暴露基板平面上的着色光致抗蚀剂层以形成图案上的图案其中曝光光源的开/关时间分别由曝光装置的多个快门控制。然后，通过对曝光的彩色光致抗蚀剂层的显影处理，在基板平面上形成着色层。本发明的主要优点是在曝光过程中不需要光掩模，并且可以通过本曝光装置处理任何尺寸的基板平面。

22. 发明申请

US20050219496A1 Pattern exposure method and pattern exposure apparatus 失效
标题翻译：图案曝光方法和图案曝光装置
公开(公告)号：US20050219496A1
公开(公告)日：2005-10-06
申请号：US11075245
申请日：2005-03-09
申请人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Bunji Uchiyama , Tsuyoshi Yamaguchi
发明人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Bunji Uchiyama , Tsuyoshi Yamaguchi
IPC分类号： G02B26/10 , G02B26/12 , G03B27/54 , G03F7/20 , G03F7/22
CPC分类号： G03F7/70791 , G02B26/123 , G03F7/70383 , G03F7/70391 , G03F7/70466
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.
摘要翻译：图案曝光方法和图案曝光装置，其中通过廉价的装置提高生产量并且没有低的运行成本。从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。方向之一是与多面镜的扫描方向相同的方向，而另一方向是与多面镜的扫描方向交叉的方向。在这种情况下，使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。在这种情况下，每个激光器的波长可以不超过410nm。

23. 发明授权

US06819843B1 Device and method for photolithographically irradiating biological substances 有权
标题翻译：用于光刻照射生物物质的装置和方法
公开(公告)号：US06819843B1
公开(公告)日：2004-11-16
申请号：US09980194
申请日：2002-07-23
申请人： Aron Braun , Arno Heuermann
发明人： Aron Braun , Arno Heuermann
IPC分类号： G02B604
CPC分类号： B82Y30/00 , B01J19/0046 , B01J2219/00436 , B01J2219/00585 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00608 , B01J2219/00659 , B01J2219/00707 , B01J2219/00711 , B01J2219/00722 , B01J2219/00725 , B01J2219/00729 , C40B40/06 , C40B40/10 , C40B60/14 , G01N21/6428 , G03F7/20 , G03F7/70275 , G03F7/70283 , G03F7/70383 , G03F7/70391
摘要： A device and a method for the photolithographic exposure of biological substances is described, which comprises at least one light source, a bundle of optical fibers and a control unit, whereby each of the optical fibers can be controlled by light independently from one another and/or light can be coupled to each fiber independently. The device is particularly suitable for the exposure of DNA, PNA or peptide chips.
摘要翻译：描述了用于生物物质的光刻曝光的装置和方法，其包括至少一个光源，一束光纤和一个控制单元，由此每个光纤可以彼此独立地控制光纤和/ 或者光可以独立地耦合到每个纤维。该装置特别适合于暴露DNA，PNA或肽芯片。

24. 发明申请

US20040165163A1 [SUBSTRATE EXPOSURE APPARATUS AND METHOD] 审中-公开
标题翻译： [基板曝光装置及方法]
公开(公告)号：US20040165163A1
公开(公告)日：2004-08-26
申请号：US10604364
申请日：2003-07-15
发明人： Kuo-Tso Chen
IPC分类号： G03B027/42
CPC分类号： G03F7/70391 , G03F7/704
摘要： A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.
摘要翻译：具有线光源和控制系统的基板曝光装置。线光源有几个点光源。控制系统将图案转换成定时信号，以控制每个点光源的光线状态和暗态。控制系统还控制扫描光源以在衬底上辐射光致抗蚀剂，使得光致抗蚀剂暴露。此外，在基板曝光方法中，多个点光源被布置为至少一个线光源以扫描光致抗蚀剂一次或几次以获得转印到光致抗蚀剂的图案的更好的分辨率。

25. 发明授权

US06713219B2 Substrate exposure apparatus and method 有权
标题翻译：基板曝光装置及方法
公开(公告)号：US06713219B2
公开(公告)日：2004-03-30
申请号：US10064208
申请日：2002-06-21
申请人： Kuo-Tso Chen
发明人： Kuo-Tso Chen
IPC分类号： G03F900
CPC分类号： G03F7/70391 , G03F7/704
摘要： A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.
摘要翻译：具有线光源和控制系统的基板曝光装置。线光源有几个点光源。控制系统将图案转换为定时信号，以控制每个点光源的光线状态和暗态。控制系统还控制扫描光源以在衬底上辐射光致抗蚀剂，使得光致抗蚀剂暴露。此外，在基板曝光方法中，多个点光源被布置为至少一个线光源以扫描光致抗蚀剂一次或几次以获得转印到光致抗蚀剂的图案的更好的分辨率。

26. 发明授权

US06683421B1 Addressable semiconductor array light source for localized radiation delivery 有权
标题翻译：用于局部辐射传输的可寻址半导体阵列光源
公开(公告)号：US06683421B1
公开(公告)日：2004-01-27
申请号：US09769266
申请日：2001-01-26
申请人： John Kennedy , Jim Farrell , Manfred Hubert , Roy Kayser , Eduardo Ghelman
发明人： John Kennedy , Jim Farrell , Manfred Hubert , Roy Kayser , Eduardo Ghelman
IPC分类号： G02B604
CPC分类号： B29C35/0805 , B29C35/0288 , B29C2035/0822 , B29C2035/0838 , G03F7/70391
摘要： A photocuring device and a method of photocuring using it. The device includes a housing and a light emitting semiconductor array mounted to the housing, capable of emitting light energy having a light output wavelength suitable for initiating a photoreaction. The device also has a power source for providing power to energize the array to emit light energy and a controller coupled to the power source for varying the power provided by the power source to the array.
摘要翻译：光固化装置及其使用的光固化方法。该装置包括壳体和安装到壳体的发光半导体阵列，其能够发射具有适于起始光反应的光输出波长的光能。该装置还具有用于提供功率以激励阵列以发射光能的电源和耦合到电源的控制器，用于将由电源提供的功率改变为阵列。

27. 发明授权

US06538682B2 Exposure device 有权
公开(公告)号：US06538682B2
公开(公告)日：2003-03-25
申请号：US10029177
申请日：2001-12-28
申请人： Kazunobu Ohkubo
发明人： Kazunobu Ohkubo
IPC分类号： B41J2745
CPC分类号： G03F7/70375 , G03B27/52 , G03F7/70391
摘要： The present invention provides an exposure device in which availability of the emitted light is high, optical crosstalk is reduced, and an image can be formed at high resolution. Concave microlenses are formed on one surface of the exposure device facing a photosensitive material, and organic EL elements are formed on the other surface. The organic EL elements are disposed at some of portions at which anode lines and cathode lines intersect each other. A diameter D of an aperture of the microlens is n times an array pitch p of each organic EL element, n lines of the cathode lines are formed, and the organic EL elements arranged on one cathode line are shifted from those on another cathode line in a main-scanning direction by the array pitch p. Accordingly, exposure spots, which are exposed by the organic EL elements incorporated in the n lines of the cathode lines, are offset without overlapping one another, and the entire photosensitive material can be exposed.

28. 发明申请

US20020085187A1 Exposure device 有权
标题翻译：曝光装置
公开(公告)号：US20020085187A1
公开(公告)日：2002-07-04
申请号：US10029177
申请日：2001-12-28
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Kazunobu Ohkubo
IPC分类号： G03B027/52
CPC分类号： G03F7/70375 , G03B27/52 , G03F7/70391
摘要： The present invention provides an exposure device in which availability of the emitted light is high, optical crosstalk is reduced, and an image can be formed at high resolution. Concave microlenses are formed on one surface of the exposure device facing a photosensitive material, and organic EL elements are formed on the other surface. The organic EL elements are disposed at some of portions at which anode lines and cathode lines intersect each other. A diameter D of an aperture of the microlens is n times an array pitch p of each organic EL element, n lines of the cathode lines are formed, and the organic EL elements arranged on one cathode line are shifted from those on another cathode line in a main-scanning direction by the array pitch p. Accordingly, exposure spots, which are exposed by the organic EL elements incorporated in the n lines of the cathode lines, are offset without overlapping one another, and the entire photosensitive material can be exposed.
摘要翻译：本发明提供了一种曝光装置，其中发射光的可用性高，光学串扰减少，并且可以以高分辨率形成图像。在曝光装置的面向感光材料的一个表面上形成凹透镜，在另一个表面上形成有机EL元件。有机EL元件设置在阳极线和阴极线彼此相交的部分。微透镜的孔径的直径D是每个有机EL元件的阵列间距p的n倍，形成n条阴极线，并且排列在一条阴极线上的有机EL元件与另一条阴极线上的有机EL元件偏移通过阵列间距p的主扫描方向。因此，由并入阴极线的n行的有机EL元件露出的曝光点被偏移而不会彼此重叠，并且整个感光材料可能被曝光。

29. 发明授权

US5840451A Individually controllable radiation sources for providing an image pattern in a photolithographic system 失效
标题翻译：用于在光刻系统中提供图像图案的可单独控制的辐射源
公开(公告)号：US5840451A
公开(公告)日：1998-11-24
申请号：US760029
申请日：1996-12-04
申请人： Bradley T. Moore , Robert Dawson , H. Jim Fulford, Jr. , Mark I. Gardner , Frederick N. Hause , Mark W. Michael , Derick J. Wristers
发明人： Bradley T. Moore , Robert Dawson , H. Jim Fulford, Jr. , Mark I. Gardner , Frederick N. Hause , Mark W. Michael , Derick J. Wristers
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70391 , G03F7/20 , Y10S430/146 , Y10S430/168
摘要： A photolithographic system includes individually controllable radiation sources for forming an image pattern on an image plane without using a reticle or mask during fabrication of an integrated circuit device. The radiation sources are selectively activated as they scan the image plane. The image pattern can consist of parallel lines having identical widths and varying lengths, or alternatively, pixels having identical shapes and sizes. The radiation sources can be arranged as a linear array, or a staggered array, to achieve the desired linear density. Suitable radiation sources include light pipes, light emitting diodes, and laser diodes. Preferably, each of the activated radiation sources provides an exposure field of less than 0.1 microns on the image plane, and at least two of the radiation sources must be activated to provide the minimum line width of the image pattern.
摘要翻译：光刻系统包括单独可控的辐射源，用于在集成电路器件的制造期间在图像平面上形成图像图案而不使用掩模版或掩模。当扫描图像平面时，辐射源被选择性地激活。图像图案可以由具有相同宽度和变化长度的平行线组成，或者替代地，具有相同形状和尺寸的像素。辐射源可以被布置为线性阵列或交错阵列，以实现期望的线密度。合适的辐射源包括光管，发光二极管和激光二极管。优选地，每个激活的辐射源在图像平面上提供小于0.1微米的曝光场，并且必须激活至少两个辐射源以提供图像图案的最小线宽。

30. 发明授权

US5343271A Exposure apparatus for drawing patterns on substrates 失效
标题翻译：用于在基板上绘制图案的曝光装置
公开(公告)号：US5343271A
公开(公告)日：1994-08-30
申请号：US96725
申请日：1993-07-23
申请人： Yukio Morishige
发明人： Yukio Morishige
IPC分类号： G03F7/20 , G06K15/12 , H01L21/027 , H04N1/193 , G03B27/42
CPC分类号： G03F7/70391 , G03F7/70791 , G06K15/1295 , H04N1/1906 , H04N1/193
摘要： The invention is an exposure apparatus for directly drawing a pattern on a photoresist layer on a substrate. The apparatus has a movable stage on which the substrate is placed, an array of a plurality of semiconductor lasers held above the movable stage, laminated arrays of optical elements to project a suitably shaped laser beam spot on the substrate from each semiconductor laser and control means for exciting and deexciting the semiconductor lasers each individually while moving the stage such that the substrate passes under the array of semiconductor lasers. The primary merit of this apparatus is a great reduction in the time taken to accomplish exposure of a very large-sized substrate such as, e.g., a substrate of a flat-panel display for a high-definition television set.
摘要翻译：本发明是用于在基板上的光致抗蚀剂层上直接绘制图案的曝光装置。该装置具有放置基板的可移动台，保持在可移动台上方的多个半导体激光器的阵列，光学元件的层叠阵列，以从每个半导体激光器和控制装置在基板上投射适当形状的激光束点用于在移动台架的同时单独地激励和去激活半导体激光器，使得基板通过半导体激光器阵列。该装置的主要优点是大大减少了实现非常大尺寸的基板（例如用于高清晰度电视机的平板显示器的基板）的曝光所花费的时间。

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