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21. 发明授权

US07867796B2 Liquid crystal display and fabrication method thereof 有权
标题翻译：液晶显示及其制造方法
公开(公告)号：US07867796B2
公开(公告)日：2011-01-11
申请号：US11968065
申请日：2007-12-31
申请人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
发明人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
IPC分类号： H01L21/00 , H01L21/84 , H01L21/44
CPC分类号： H01L27/1288 , H01L27/1285 , H01L27/1292 , H01L29/66765
摘要： A method for fabricating an LCD includes: providing a substrate with a thin film transistor (ITT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.
摘要翻译：一种用于制造LCD的方法包括：为衬底提供限定在其上的薄膜晶体管（ITT）部分; 在基板上形成用于栅电极的金属膜; 通过第一印刷工艺蚀刻金属膜以形成栅电极; 在基板上依次形成栅极绝缘层，半导体层和源极和漏极的金属膜; 通过第二印刷工艺选择性地蚀刻用于源极和漏极，半导体层和栅极绝缘层的金属膜，以形成顺序堆叠的栅极绝缘层图案，预活性图案和金属膜图案，使得栅极绝缘层图案从预活性图案的侧面过蚀刻; 在金属膜图案的基板上形成绝缘层; 蚀刻绝缘层以暴露金属膜图案; 在金属膜图案上形成透明导电膜和剩余的绝缘膜; 并且选择性地蚀刻透明导电膜，金属膜图案，预活性图案以形成有源图案，源电极，漏电极和与漏极连接的像素电极。

22. 发明授权

US07599034B2 Thin film transistor substrate of a horizontal electric field type LCD and fabricating method thereof 有权
标题翻译：水平电场型LCD薄膜晶体管基板及其制造方法
公开(公告)号：US07599034B2
公开(公告)日：2009-10-06
申请号：US11542249
申请日：2006-10-04
申请人： Soon-Sung Yoo , Youn-Gyoung Chang , Heung-Lyul Cho
发明人： Soon-Sung Yoo , Youn-Gyoung Chang , Heung-Lyul Cho
IPC分类号： G02F1/1343
CPC分类号： G02F1/1362 , G02F1/134363 , G02F2001/136231 , H01L27/124 , H01L27/1288 , H01L29/66765
摘要： A thin film transistor substrate structure of a horizontal electric field type LCD comprises a plurality of signal lines including a gate, a data, and a common lines disposed on a substrate; the data line intersecting with the gate and common lines, a gate insulating film disposed between the data line and the gate and common lines, a pixel area being defined by the intersection of the data and gate lines; a thin film transistor disposed at the intersection of the data line and gate line; a common and a pixel electrodes both having a portion extended into the pixel area; a protective film disposed over the substrate and the thin film transistor; and at least one pad structure including an upper pad electrode contacting a lower pad electrode within a first contact hole wherein the upper pad electrode is absent from the upper surface of the protective film.
摘要翻译：水平电场型LCD的薄膜晶体管衬底结构包括多个信号线，包括设置在衬底上的栅极，数据和公共线; 与栅极和公共线相交的数据线，设置在数据线与栅极和公共线之间的栅极绝缘膜，像素区域由数据与栅极线的交点定义; 设置在数据线与栅极线的交点处的薄膜晶体管; 一个共同的和一个像素电极，两者都具有延伸到像素区域中的一部分; 设置在所述基板和所述薄膜晶体管上的保护膜; 以及至少一个焊盘结构，其包括在第一接触孔内接触下焊盘电极的上焊盘电极，其中上焊盘电极不在保护膜的上表面中。

23. 发明授权

US07489369B2 Array substrate for liquid crystal display device and method of manufacturing the same 有权
标题翻译：液晶显示装置用阵列基板及其制造方法
公开(公告)号：US07489369B2
公开(公告)日：2009-02-10
申请号：US11325570
申请日：2006-01-05
申请人： Youn-Gyoung Chang , Heung-Lyul Cho , Soon-Sung Yoo
发明人： Youn-Gyoung Chang , Heung-Lyul Cho , Soon-Sung Yoo
IPC分类号： G02F1/136 , G02F1/1343
CPC分类号： G02F1/136227 , G02F1/134336 , G02F1/13458 , G02F1/1362 , G02F2001/136231 , G02F2001/136236
摘要： A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.
摘要翻译：制造液晶显示装置用阵列基板的方法包括通过第一掩模工艺在基板上形成栅极线，栅极焊盘和栅电极，形成数据线，数据焊盘，源电极，漏极电极和通过第二掩模处理的包括栅极线，栅极焊盘和栅电极的衬底上的有源层，其中数据线与栅极线交叉以限定像素区域，源电极从数据线延伸，所述漏电极与所述源电极间隔开，并且所述有源层设置在所述栅电极与所述源漏电极之间，在所述基板的整个表面上形成钝化层，所述整个表面包括所述数据线，所述源电极和所述漏极电极通过第三掩模工艺，钝化层被蚀刻以暴露像素区域中的衬底，漏电极的一部分，栅极焊盘和数据焊盘，并且形成像素e 栅极焊盘端子和数据焊盘端子，通过在包括钝化层的基板的整个表面上沉积透明导电材料，直接接触漏电极的暴露部分的像素电极，直接接触栅极的栅极焊盘端子焊盘和数据焊盘端子直接接触数据焊盘。

24. 发明授权

US07381988B2 Array substrate for liquid crystal display device and the fabrication method of the same 有权
标题翻译：液晶显示装置用阵列基板及其制造方法
公开(公告)号：US07381988B2
公开(公告)日：2008-06-03
申请号：US11806979
申请日：2007-06-05
申请人： Byung-chul Ahn , Byoung-ho Lim , Soon-Sung Yoo , Yong-wan Kim
发明人： Byung-chul Ahn , Byoung-ho Lim , Soon-Sung Yoo , Yong-wan Kim
IPC分类号： H01L29/04 , H01L29/10 , H01L31/20 , H01L31/036 , H01L31/0376
CPC分类号： H01L27/1288 , H01L27/124 , H01L27/1255
摘要： The present invention discloses a four-mask method of manufacturing an array substrate of a liquid crystal display device and the liquid crystal display device having the same array substrate. The method includes forming a plurality of gate lines, gate electrodes and gate extension lines by depositing a first metallic material on a substrate and patterning the first metallic material with a first mask, the gate extension lines extending toward the opposite direction of the gate electrodes; forming a first insulating layer on the whole surface having gate lines, gate electrodes, and gate extension lines; forming a plurality of data lines, source electrodes, drain electrodes, and capacitor electrodes over the gate lines by depositing a semiconductor layer, an ohmic contact layer and a second metallic material sequentially on the first insulating layer, and patterning the second metallic material and the ohmic contact layer with a second mask; forming a passivation layer and a plurality of first and second contact holes by depositing a second insulating layer on the data lines, the source electrodes, the drain electrodes and the capacitor electrodes, and patterning the second insulating layer with a third mask, the first contact holes exposing a portion of the drain electrode, the second contact holes exposing a portion of the capacitor electrodes; and forming a plurality of pixel electrodes by depositing a transparent conductive layer on the passivation layer, and patterning the transparent conductive layer by a fourth mask, the pixel electrodes contacting the drain electrodes through the first contact holes and contacting the capacitor electrodes through the second contact holes.
摘要翻译：本发明公开了一种制造液晶显示装置的阵列基板的四掩模方法和具有相同阵列基板的液晶显示装置。该方法包括通过在衬底上沉积第一金属材料并用第一掩模图案化第一金属材料来形成多条栅极线，栅电极和栅极延伸线，栅极延伸线朝向栅电极的相反方向延伸; 在具有栅极线，栅极电极和栅极延伸线的整个表面上形成第一绝缘层; 通过在第一绝缘层上依次沉积半导体层，欧姆接触层和第二金属材料，在栅极线上形成多个数据线，源电极，漏电极和电容器电极，并将第二金属材料和具有第二掩模的欧姆接触层; 通过在数据线，源电极，漏电极和电容器电极上沉积第二绝缘层，并用第三掩模对第二绝缘层进行构图来形成钝化层和多个第一和第二接触孔，第一接触露出一部分漏电极的第二接触孔暴露电容器电极的一部分; 以及通过在所述钝化层上沉积透明导电层并形成多个像素电极，以及通过第四掩模对所述透明导电层进行图案化，所述像素电极通过所述第一接触孔与所述漏电极接触并通过所述第二接触接触所述电容器电极孔。

25. 发明申请

US20080002127A1 Liquid crystal display device and method of fabricating the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20080002127A1
公开(公告)日：2008-01-03
申请号：US11646533
申请日：2006-12-28
申请人： Seung-Hee Nam , Soon-Sung Yoo
发明人： Seung-Hee Nam , Soon-Sung Yoo
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F2001/134372 , G02F2001/134381 , G02F2201/40
摘要： An LCD device having an improved aperture ratio is disclosed. The LCD device includes first and second substrate facing each other; gate and data lines formed on the first substrate, wherein the gate and data lines are formed substantially perpendicularly with respect to each other to define a pixel region; common and pixel electrodes formed in the pixel region, wherein the common and pixel electrodes are arranged in an alternating pattern with an empty space therebetween, wherein a horizontal electric field is generated between the common and pixel electrodes; and a liquid crystal layer formed between the first and second substrates.
摘要翻译：公开了一种具有改善的开口率的LCD装置。 LCD装置包括彼此面对的第一和第二基板; 形成在第一基板上的栅极和数据线，其中栅极和数据线相对于彼此大致垂直地形成以限定像素区域; 在像素区域中形成的公共和像素电极，其中公共和像素电极以交替图案排列，其间具有空白空间，其中在公共和像素电极之间产生水平电场; 以及形成在第一和第二基板之间的液晶层。

26. 发明授权

US07256076B2 Manufacturing method of liquid crystal display device 有权
标题翻译：液晶显示装置的制造方法
公开(公告)号：US07256076B2
公开(公告)日：2007-08-14
申请号：US10814186
申请日：2004-04-01
申请人： Heung-Lyul Cho , Soon-Sung Yoo , Youn-Gyoung Chang
发明人： Heung-Lyul Cho , Soon-Sung Yoo , Youn-Gyoung Chang
IPC分类号： H01L21/00
CPC分类号： H01L27/1288 , G02F1/1368 , G02F2001/136231 , H01L27/1214
摘要： A manufacturing method of a thin film transistor of a liquid crystal display device using 3-mask includes forming a gate electrode over a substrate, consecutively forming a gate insulating layer and an active layer, forming a first photoresist pattern, removing an active layer formed at a source/drain region, ashing the first photoresist pattern to expose a part of an active region, forming a source/drain electrode, forming a passivation layer, forming a second photoresist pattern that exposes a pixel region over the passivation layer; forming a pixel region by using the second photoresist pattern as a mask, side-etching a part of the passivation layer to expose a part of the drain electrode, forming a pixel electrode material over the second photoresist pattern and the pixel region, and simultaneously removing the second photoresist pattern and the pixel electrode material formed thereon to form a pixel electrode.
摘要翻译：使用3掩模的液晶显示装置的薄膜晶体管的制造方法包括在基板上形成栅电极，连续地形成栅极绝缘层和有源层，形成第一光致抗蚀剂图案，除去形成在第源极/漏极区域，灰化第一光致抗蚀剂图案以暴露有源区的一部分，形成源极/漏极，形成钝化层，形成在钝化层上暴露像素区域的第二光致抗蚀剂图案; 通过使用第二光致抗蚀剂图案作为掩模形成像素区域，侧蚀刻钝化层的一部分以暴露部分漏电极，在第二光致抗蚀剂图案和像素区域上形成像素电极材料，并同时去除第二光致抗蚀剂图案和形成在其上的像素电极材料以形成像素电极。

27. 发明申请

US20070153166A1 Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same 有权
标题翻译：液晶显示装置的滤色器层的制造方法及使用其的液晶显示装置的制造方法
公开(公告)号：US20070153166A1
公开(公告)日：2007-07-05
申请号：US11478297
申请日：2006-06-29
申请人： Soon-Sung Yoo , Duk-Chul Yun , Oh-Nam Kwon , Youn-Gyoung Chang , Heung-Lyul Cho , Seung-Hee Nam
发明人： Soon-Sung Yoo , Duk-Chul Yun , Oh-Nam Kwon , Youn-Gyoung Chang , Heung-Lyul Cho , Seung-Hee Nam
IPC分类号： G02F1/1335 , G03C1/825 , G02F1/136
CPC分类号： G02F1/133516 , G02B5/201 , G02F1/133512
摘要： A method for fabricating color filter layer of an LCD comprises forming a plurality of black matrixes separated at certain intervals on a color filter substrate, and forming R, G and B color filter layers by using a plurality of needles between the plurality of black matrixes on the color filter substrate.
摘要翻译：一种用于制造LCD的滤色器层的方法包括在滤色器基板上形成以一定间隔分离的多个黑矩阵，并且通过使用多个黑色矩阵之间的多个针来形成R，G和B滤色器层滤色器基板。

28. 发明申请

US20060119779A1 Array substrate for liquid crystal display device and method of manufacturing the same 有权
公开(公告)号：US20060119779A1
公开(公告)日：2006-06-08
申请号：US11325570
申请日：2006-01-05
申请人： Youn-Gyoung Chang , Heung-Lyul Cho , Soon-Sung Yoo
发明人： Youn-Gyoung Chang , Heung-Lyul Cho , Soon-Sung Yoo
IPC分类号： G02F1/1345
CPC分类号： G02F1/136227 , G02F1/134336 , G02F1/13458 , G02F1/1362 , G02F2001/136231 , G02F2001/136236
摘要： A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.

29. 发明授权

US06760092B2 Method for fabricating an array substrate for a liquid crystal display with an insulating stack made from TFT layers between crossed conductors 有权
标题翻译：用于制造具有由交叉导体之间的TFT层制成的绝缘层的液晶显示器用阵列基板的方法
公开(公告)号：US06760092B2
公开(公告)日：2004-07-06
申请号：US10652311
申请日：2003-09-02
申请人： Soon-Sung Yoo , Dong-Yeung Kwak , Hu-Sung Kim , Yu-Ho Jung , Yong-Wan Kim , Duk-Jin Park , Woo-Chae Lee
发明人： Soon-Sung Yoo , Dong-Yeung Kwak , Hu-Sung Kim , Yu-Ho Jung , Yong-Wan Kim , Duk-Jin Park , Woo-Chae Lee
IPC分类号： G02F11333
CPC分类号： G02F1/136286 , G02F1/133345 , G02F1/136204 , G02F2201/50
摘要： An array substrate for use in a liquid crystal display device is fabricated by the steps of forming a first metal layer on a substrate, patterning the first metal layer to form a gate line, a gate electrode, a gate pad, a first shorting bar, and a second shorting bar, forming a gate insulation layer, a pure amorphous silicon layer, a doped amorphous silicon layer and a second metal layer to cover the patterned first metal layer, patterning the second metal layer and the doped amorphous silicon layer to form first, second and third through-holes and first and second grooves to expose a portion of the pure amorphous silicon layer, the first and second grooves creating an isolated portions of the second metal layer, forming a passivation layer to cover the patterned second metal layer, forming a source electrode, a drain electrode, a data line, a data pad, an insulating segment, and first, second and third contact holes, and forming a pixel electrode, a first connector and a second connector of a transparent conductive material.
摘要翻译：通过以下步骤制造用于液晶显示装置的阵列基板：在基板上形成第一金属层，图案化第一金属层以形成栅极线，栅电极，栅极焊盘，第一短路棒，以及第二短路棒，形成栅绝缘层，纯非晶硅层，掺杂非晶硅层和第二金属层以覆盖图案化的第一金属层，图案化第二金属层和掺杂的非晶硅层以形成第一第二和第三通孔以及第一和第二凹槽以暴露纯非晶硅层的一部分，第一和第二凹槽产生第二金属层的隔离部分，形成钝化层以覆盖图案化的第二金属层，形成源电极，漏电极，数据线，数据焊盘，绝缘段以及第一，第二和第三接触孔，并形成像素电极，第一连接器和第二连接器透明导电材料。

30. 发明授权

US06746887B1 Method of preventing a data pad of an array substrate from overetching 有权
标题翻译：防止阵列基板的数据焊盘过度蚀刻的方法
公开(公告)号：US06746887B1
公开(公告)日：2004-06-08
申请号：US09784088
申请日：2001-02-16
申请人： Kyo-Ho Moon , Soon-Sung Yoo
发明人： Kyo-Ho Moon , Soon-Sung Yoo
IPC分类号： H01L2100
CPC分类号： G02F1/1368 , G02F2001/136236
摘要： A method of fabricating an array substrate for use in an LCD device which can be used in a four-, five- or six-mask process includes simultaneously etching layers formed over gate and data pads. When performing a photolithography process, photoresist remains over the data pad and acts as an etch stopper. And thus, while etching the layers over the gate pad, the layers over the data pad are etched without any damage to the data pad and without overetching the data pad. Therefore, defects caused by the resistance between the data pad and the data pad electrode do not occur, and pixel defects in the LCD device are prevented. Moreover, the manufacturing yield increases when this method is used.
摘要翻译：制造可用于四，五或六掩模工艺的LCD装置中使用的阵列基板的方法包括同时蚀刻形成在栅极和数据焊盘上的层。当进行光刻工艺时，光致抗蚀剂保留在数据焊盘上，并用作蚀刻停止层。因此，当在栅极焊盘上蚀刻层时，在数据焊盘上的层被蚀刻而不会对数据焊盘造成任何损坏，而不会过蚀刻数据焊盘。因此，不会发生由数据焊盘和数据焊盘电极之间的电阻引起的缺陷，并且防止了LCD器件中的像素缺陷。此外，当使用该方法时，制造产量增加。

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