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1. 发明授权

US08890167B2 Array substrate for display device including signal lines with reduced resistance 有权
标题翻译：用于显示装置的阵列衬底包括具有降低的电阻的信号线
公开(公告)号：US08890167B2
公开(公告)日：2014-11-18
申请号：US13587028
申请日：2012-08-16
申请人： Seung-Hee Nam , Soon-Sung Yoo , Tae-Hyoung Moon , Tae-Joon Song , Kyu-Hwang Lee
发明人： Seung-Hee Nam , Soon-Sung Yoo , Tae-Hyoung Moon , Tae-Joon Song , Kyu-Hwang Lee
IPC分类号： H01L27/14 , H01L27/12 , H01L27/32
CPC分类号： H01L27/1214 , H01L27/124 , H01L27/1259 , H01L27/1288 , H01L27/3279
摘要： An array substrate for a display device and manufacturing method thereof is disclosed. The device comprises: a substrate; a gate line formed on the substrate along a first direction; a data line formed over the substrate along a second direction, wherein the data line and the gate line cross each other to define a pixel region; a thin film transistor formed in the pixel region, and having a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode; a pixel electrode formed in the pixel region and connected to the drain electrode; a first auxiliary gate pattern formed over the gate line and contacting the gate line; and a first auxiliary data pattern formed over the data line and contacting the data line.
摘要翻译：公开了一种显示装置用阵列基板及其制造方法。该装置包括：基板; 沿着第一方向形成在所述基板上的栅极线; 沿着第二方向形成在所述基板上的数据线，其中所述数据线和所述栅极线彼此交叉以限定像素区域; 形成在像素区域中的薄膜晶体管，并且具有连接到栅极线的栅电极，连接到数据线的源电极和漏电极; 像素电极，其形成在所述像素区域中并连接到所述漏电极; 形成在栅极线上并接触栅极线的第一辅助栅极图案; 以及形成在数据线上并接触数据线的第一辅助数据模式。

2. 发明授权

US07884913B2 Liquid crystal display device 有权
标题翻译：液晶显示装置
公开(公告)号：US07884913B2
公开(公告)日：2011-02-08
申请号：US12333033
申请日：2008-12-11
申请人： Yun-Ho Kook , Soon-Sung Yoo , Youn-Gyoung Chang , Seung-Hee Nam , Nam-Kook Kim
发明人： Yun-Ho Kook , Soon-Sung Yoo , Youn-Gyoung Chang , Seung-Hee Nam , Nam-Kook Kim
IPC分类号： G02F1/1345
CPC分类号： G02F1/13458
摘要： A LCD device and its fabrication method as discussed. According to an embodiment, the LCD device includes a plurality of gate lines and data lines arranged on a substrate to define a plurality of unit pixels; thin film transistors (TFTs) each formed at an intersecting region of the gate lines and the data lines; a plurality of gate pad portions and data pad portions formed at end portions of the gate lines and the data lines, respectively, at least one of the gate and data pad portions being made up of at least two pad unit portions, each pad unit portion having at least one contact hole such that the contact holes of one of the plurality of gate or data pad portions are arranged in a zigzag or an oblique line format; and pixel electrodes formed at the unit pixels.
摘要翻译：一种LCD装置及其制造方法。根据实施例，LCD装置包括布置在基板上以限定多个单位像素的多个栅极线和数据线; 薄膜晶体管（TFT）各自形成在栅极线和数据线的交叉区域; 分别形成在栅极线和数据线的端部的多个栅极焊盘部分和数据焊盘部分，至少一个栅极和数据焊盘部分由至少两个焊盘单元部分构成，每个焊盘单元部分具有至少一个接触孔，使得所述多个栅极或数据焊盘部分中的一个的接触孔以锯齿形或斜线形式布置; 以及形成在单位像素处的像素电极。

3. 发明申请

US20080224141A1 LIQUID CRYSTAL DISPLAY AND FABRICATION METHOD THEREOF 有权
标题翻译：液晶显示及其制造方法
公开(公告)号：US20080224141A1
公开(公告)日：2008-09-18
申请号：US11968065
申请日：2007-12-31
申请人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
发明人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
IPC分类号： H01L33/00 , H01L21/00
CPC分类号： H01L27/1288 , H01L27/1285 , H01L27/1292 , H01L29/66765
摘要： A method for fabricating an LCD includes: providing a substrate with a thin film transistor (ITT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.
摘要翻译：一种用于制造LCD的方法包括：为衬底提供限定在其上的薄膜晶体管（ITT）部分; 在基板上形成用于栅电极的金属膜; 通过第一印刷工艺蚀刻金属膜以形成栅电极; 在基板上依次形成栅极绝缘层，半导体层和源极和漏极的金属膜; 通过第二印刷工艺选择性地蚀刻用于源极和漏极，半导体层和栅极绝缘层的金属膜，以形成顺序堆叠的栅极绝缘层图案，预活性图案和金属膜图案，使得栅极绝缘层图案从预活性图案的侧面过蚀刻; 在金属膜图案的基板上形成绝缘层; 蚀刻绝缘层以暴露金属膜图案; 在金属膜图案上形成透明导电膜和剩余的绝缘膜; 并且选择性地蚀刻透明导电膜，金属膜图案，预活性图案以形成有源图案，源电极，漏电极和与漏极连接的像素电极。

4. 发明授权

US08462307B2 Liquid crystal display device having gate or data pad portions arranged in a zigzag or an oblique line format 有权
标题翻译：液晶显示装置具有以锯齿形或倾斜线格式布置的栅极或数据焊盘部分
公开(公告)号：US08462307B2
公开(公告)日：2013-06-11
申请号：US13007336
申请日：2011-01-14
申请人： Yun-Ho Kook , Soon-Sung Yoo , Youn-Gyoung Chang , Seung-Hee Nam , Nam-Kook Kim
发明人： Yun-Ho Kook , Soon-Sung Yoo , Youn-Gyoung Chang , Seung-Hee Nam , Nam-Kook Kim
IPC分类号： G02F1/1345
CPC分类号： G02F1/13458
摘要： A LCD device and its fabrication method as discussed. According to an embodiment, the LCD device includes a plurality of gate lines and data lines arranged on a substrate to define a plurality of unit pixels; thin film transistors (TFTs) each formed at an intersecting region of the gate lines and the data lines; a plurality of gate pad portions and data pad portions formed at end portions of the gate lines and the data lines, respectively, at least one of the gate and data pad portions being made up of at least two pad unit portions, each pad unit portion having at least one contact hole such that the contact holes of one of the plurality of gate or data pad portions are arranged in a zigzag or an oblique line format; and pixel electrodes formed at the unit pixels.
摘要翻译：一种LCD装置及其制造方法。根据实施例，LCD装置包括布置在基板上以限定多个单位像素的多个栅极线和数据线; 薄膜晶体管（TFT）各自形成在栅极线和数据线的交叉区域; 分别形成在栅极线和数据线的端部的多个栅极焊盘部分和数据焊盘部分，至少一个栅极和数据焊盘部分由至少两个焊盘单元部分构成，每个焊盘单元部分具有至少一个接触孔，使得所述多个栅极或数据焊盘部分中的一个的接触孔以锯齿形或斜线形式布置; 以及形成在单位像素处的像素电极。

5. 发明申请

US20110079853A1 LIQUID CRYSTAL DISPLAY AND FABRICATION METHOD THEREOF 有权
标题翻译：液晶显示及其制造方法
公开(公告)号：US20110079853A1
公开(公告)日：2011-04-07
申请号：US12963403
申请日：2010-12-08
申请人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
发明人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
IPC分类号： H01L29/786 , H01L21/336
CPC分类号： H01L27/1288 , H01L27/1285 , H01L27/1292 , H01L29/66765
摘要： A method for fabricating an LCD includes: providing a substrate with a thin film transistor (TFT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.
摘要翻译：一种用于制造LCD的方法包括：为衬底提供限定在其上的薄膜晶体管（TFT）部分; 在基板上形成用于栅电极的金属膜; 通过第一印刷工艺蚀刻金属膜以形成栅电极; 在基板上依次形成栅极绝缘层，半导体层和源极和漏极的金属膜; 通过第二印刷工艺选择性地蚀刻用于源极和漏极，半导体层和栅极绝缘层的金属膜，以形成顺序堆叠的栅极绝缘层图案，预活性图案和金属膜图案，使得栅极绝缘层图案从预活性图案的侧面过蚀刻; 在金属膜图案的基板上形成绝缘层; 蚀刻绝缘层以暴露金属膜图案; 在金属膜图案上形成透明导电膜和剩余的绝缘膜; 并且选择性地蚀刻透明导电膜，金属膜图案，预活性图案以形成有源图案，源电极，漏电极和与漏极连接的像素电极。

6. 发明授权

US08187927B2 Liquid crystal display and fabrication method thereof 有权
标题翻译：液晶显示及其制造方法
公开(公告)号：US08187927B2
公开(公告)日：2012-05-29
申请号：US12963403
申请日：2010-12-08
申请人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
发明人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
IPC分类号： H01L21/00 , H01L21/84 , H01L21/44
CPC分类号： H01L27/1288 , H01L27/1285 , H01L27/1292 , H01L29/66765
摘要： A method for fabricating an LCD includes: providing a substrate with a thin film transistor (TFT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.
摘要翻译：一种用于制造LCD的方法包括：为衬底提供限定在其上的薄膜晶体管（TFT）部分; 在基板上形成用于栅电极的金属膜; 通过第一印刷工艺蚀刻金属膜以形成栅电极; 在基板上依次形成栅极绝缘层，半导体层和源极和漏极的金属膜; 通过第二印刷工艺选择性地蚀刻用于源极和漏极，半导体层和栅极绝缘层的金属膜，以形成顺序堆叠的栅极绝缘层图案，预活性图案和金属膜图案，使得栅极绝缘层图案从预活性图案的侧面过蚀刻; 在金属膜图案的基板上形成绝缘层; 蚀刻绝缘层以暴露金属膜图案; 在金属膜图案上形成透明导电膜和剩余的绝缘膜; 并且选择性地蚀刻透明导电膜，金属膜图案，预活性图案以形成有源图案，源电极，漏电极和与漏极连接的像素电极。

7. 发明授权

US07867796B2 Liquid crystal display and fabrication method thereof 有权
标题翻译：液晶显示及其制造方法
公开(公告)号：US07867796B2
公开(公告)日：2011-01-11
申请号：US11968065
申请日：2007-12-31
申请人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
发明人： Seung-Hee Nam , Nam-Kook Kim , Soon-Sung Yoo , Youn-Gyoung Chang
IPC分类号： H01L21/00 , H01L21/84 , H01L21/44
CPC分类号： H01L27/1288 , H01L27/1285 , H01L27/1292 , H01L29/66765
摘要： A method for fabricating an LCD includes: providing a substrate with a thin film transistor (ITT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.
摘要翻译：一种用于制造LCD的方法包括：为衬底提供限定在其上的薄膜晶体管（ITT）部分; 在基板上形成用于栅电极的金属膜; 通过第一印刷工艺蚀刻金属膜以形成栅电极; 在基板上依次形成栅极绝缘层，半导体层和源极和漏极的金属膜; 通过第二印刷工艺选择性地蚀刻用于源极和漏极，半导体层和栅极绝缘层的金属膜，以形成顺序堆叠的栅极绝缘层图案，预活性图案和金属膜图案，使得栅极绝缘层图案从预活性图案的侧面过蚀刻; 在金属膜图案的基板上形成绝缘层; 蚀刻绝缘层以暴露金属膜图案; 在金属膜图案上形成透明导电膜和剩余的绝缘膜; 并且选择性地蚀刻透明导电膜，金属膜图案，预活性图案以形成有源图案，源电极，漏电极和与漏极连接的像素电极。

8. 发明申请

US20080002127A1 Liquid crystal display device and method of fabricating the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20080002127A1
公开(公告)日：2008-01-03
申请号：US11646533
申请日：2006-12-28
申请人： Seung-Hee Nam , Soon-Sung Yoo
发明人： Seung-Hee Nam , Soon-Sung Yoo
IPC分类号： G02F1/1343
CPC分类号： G02F1/134363 , G02F2001/134372 , G02F2001/134381 , G02F2201/40
摘要： An LCD device having an improved aperture ratio is disclosed. The LCD device includes first and second substrate facing each other; gate and data lines formed on the first substrate, wherein the gate and data lines are formed substantially perpendicularly with respect to each other to define a pixel region; common and pixel electrodes formed in the pixel region, wherein the common and pixel electrodes are arranged in an alternating pattern with an empty space therebetween, wherein a horizontal electric field is generated between the common and pixel electrodes; and a liquid crystal layer formed between the first and second substrates.
摘要翻译：公开了一种具有改善的开口率的LCD装置。 LCD装置包括彼此面对的第一和第二基板; 形成在第一基板上的栅极和数据线，其中栅极和数据线相对于彼此大致垂直地形成以限定像素区域; 在像素区域中形成的公共和像素电极，其中公共和像素电极以交替图案排列，其间具有空白空间，其中在公共和像素电极之间产生水平电场; 以及形成在第一和第二基板之间的液晶层。

9. 发明申请

US20070153166A1 Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same 有权
标题翻译：液晶显示装置的滤色器层的制造方法及使用其的液晶显示装置的制造方法
公开(公告)号：US20070153166A1
公开(公告)日：2007-07-05
申请号：US11478297
申请日：2006-06-29
申请人： Soon-Sung Yoo , Duk-Chul Yun , Oh-Nam Kwon , Youn-Gyoung Chang , Heung-Lyul Cho , Seung-Hee Nam
发明人： Soon-Sung Yoo , Duk-Chul Yun , Oh-Nam Kwon , Youn-Gyoung Chang , Heung-Lyul Cho , Seung-Hee Nam
IPC分类号： G02F1/1335 , G03C1/825 , G02F1/136
CPC分类号： G02F1/133516 , G02B5/201 , G02F1/133512
摘要： A method for fabricating color filter layer of an LCD comprises forming a plurality of black matrixes separated at certain intervals on a color filter substrate, and forming R, G and B color filter layers by using a plurality of needles between the plurality of black matrixes on the color filter substrate.
摘要翻译：一种用于制造LCD的滤色器层的方法包括在滤色器基板上形成以一定间隔分离的多个黑矩阵，并且通过使用多个黑色矩阵之间的多个针来形成R，G和B滤色器层滤色器基板。

10. 发明授权

US08993043B2 Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same 有权
标题翻译：液晶显示装置的滤色器层的制造方法及使用其的液晶显示装置的制造方法
公开(公告)号：US08993043B2
公开(公告)日：2015-03-31
申请号：US11478297
申请日：2006-06-29
申请人： Soon-Sung Yoo , Duk-Chul Yun , Oh-Nam Kwon , Youn-Gyoung Chang , Heung-Lyul Cho , Seung-Hee Nam
发明人： Soon-Sung Yoo , Duk-Chul Yun , Oh-Nam Kwon , Youn-Gyoung Chang , Heung-Lyul Cho , Seung-Hee Nam
IPC分类号： B05D5/00 , G02F1/1335 , G02B5/20
CPC分类号： G02F1/133516 , G02B5/201 , G02F1/133512
摘要： A method for fabricating color filter layer of an LCD comprises forming a plurality of black matrixes separated at certain intervals on a color filter substrate, and forming R, G and B color filter layers by using a plurality of needles between the plurality of black matrixes on the color filter substrate.
摘要翻译：一种用于制造LCD的滤色器层的方法包括在滤色器基板上形成以一定间隔分离的多个黑矩阵，并且通过使用多个黑色矩阵之间的多个针来形成R，G和B滤色器层滤色器基板。

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