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    • 1. 发明授权
    • Apparatus and method for repairing liquid crystal display device
    • 液晶显示装置修复装置及方法
    • US08724074B2
    • 2014-05-13
    • US12591499
    • 2009-11-20
    • Soon Sung YooOh Nam KwonHeung Lyul ChoSeung Hee Nam
    • Soon Sung YooOh Nam KwonHeung Lyul ChoSeung Hee Nam
    • G02F1/13
    • G02F1/136259
    • The present invention relates to an apparatus and method for repairing a liquid crystal display panel, which is capable of improving a yield thereof by darkening a bright point to minimize a defect ratio thereof. An apparatus for repairing a liquid crystal display panel according to the present invention includes: a liquid crystal display panel including a repair film formed on any one of a first substrate and a second substrate, which are facing to each other with a liquid crystal layer therebetween; and a laser irradiating device to irradiate a laser to the repair film to darken a specific area of the repair film, which is corresponded to an area where a bright point appears in the liquid crystal display panel.
    • 本发明涉及一种用于修复液晶显示面板的装置和方法,该液晶显示面板能够通过使亮点变暗来提高其成品率,从而使其缺陷率最小化。 根据本发明的液晶显示面板的修理装置包括:液晶显示面板,包括形成在第一基板和第二基板中的任一个上的修补膜,所述修补膜彼此面对并具有液晶层 ; 以及激光照射装置,用于向修复膜照射激光,以使修补膜的特定区域变暗,这对应于在液晶显示面板中出现亮点的区域。
    • 7. 发明申请
    • LIQUID CRYSTAL DISPLAY AND FABRICATION METHOD THEREOF
    • 液晶显示及其制造方法
    • US20110079853A1
    • 2011-04-07
    • US12963403
    • 2010-12-08
    • Seung-Hee NamNam-Kook KimSoon-Sung YooYoun-Gyoung Chang
    • Seung-Hee NamNam-Kook KimSoon-Sung YooYoun-Gyoung Chang
    • H01L29/786H01L21/336
    • H01L27/1288H01L27/1285H01L27/1292H01L29/66765
    • A method for fabricating an LCD includes: providing a substrate with a thin film transistor (TFT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.
    • 一种用于制造LCD的方法包括:为衬底提供限定在其上的薄膜晶体管(TFT)部分; 在基板上形成用于栅电极的金属膜; 通过第一印刷工艺蚀刻金属膜以形成栅电极; 在基板上依次形成栅极绝缘层,半导体层和源极和漏极的金属膜; 通过第二印刷工艺选择性地蚀刻用于源极和漏极,半导体层和栅极绝缘层的金属膜,以形成顺序堆叠的栅极绝缘层图案,预活性图案和金属膜图案,使得栅极绝缘 层图案从预活性图案的侧面过蚀刻; 在金属膜图案的基板上形成绝缘层; 蚀刻绝缘层以暴露金属膜图案; 在金属膜图案上形成透明导电膜和剩余的绝缘膜; 并且选择性地蚀刻透明导电膜,金属膜图案,预活性图案以形成有源图案,源电极,漏电极和与漏极连接的像素电极。