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    • 3. 发明授权
    • Array substrate for liquid crystal display device and method of manufacturing the same
    • 液晶显示装置用阵列基板及其制造方法
    • US07489369B2
    • 2009-02-10
    • US11325570
    • 2006-01-05
    • Youn-Gyoung ChangHeung-Lyul ChoSoon-Sung Yoo
    • Youn-Gyoung ChangHeung-Lyul ChoSoon-Sung Yoo
    • G02F1/136G02F1/1343
    • G02F1/136227G02F1/134336G02F1/13458G02F1/1362G02F2001/136231G02F2001/136236
    • A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.
    • 制造液晶显示装置用阵列基板的方法包括通过第一掩模工艺在基板上形成栅极线,栅极焊盘和栅电极,形成数据线,数据焊盘,源电极,漏极 电极和通过第二掩模处理的包括栅极线,栅极焊盘和栅电极的衬底上的有源层,其中数据线与栅极线交叉以限定像素区域,源电极从数据线延伸, 所述漏电极与所述源电极间隔开,并且所述有源层设置在所述栅电极与所述源漏电极之间,在所述基板的整个表面上形成钝化层,所述整个表面包括所述数据线,所述源电极和所述漏极 电极通过第三掩模工艺,钝化层被蚀刻以暴露像素区域中的衬底,漏电极的一部分,栅极焊盘和数据焊盘,并且形成像素e 栅极焊盘端子和数据焊盘端子,通过在包括钝化层的基板的整个表面上沉积透明导电材料,直接接触漏电极的暴露部分的像素电极,直接接触栅极的栅极焊盘端子 焊盘和数据焊盘端子直接接触数据焊盘。
    • 4. 发明授权
    • Manufacturing method of liquid crystal display device
    • 液晶显示装置的制造方法
    • US07256076B2
    • 2007-08-14
    • US10814186
    • 2004-04-01
    • Heung-Lyul ChoSoon-Sung YooYoun-Gyoung Chang
    • Heung-Lyul ChoSoon-Sung YooYoun-Gyoung Chang
    • H01L21/00
    • H01L27/1288G02F1/1368G02F2001/136231H01L27/1214
    • A manufacturing method of a thin film transistor of a liquid crystal display device using 3-mask includes forming a gate electrode over a substrate, consecutively forming a gate insulating layer and an active layer, forming a first photoresist pattern, removing an active layer formed at a source/drain region, ashing the first photoresist pattern to expose a part of an active region, forming a source/drain electrode, forming a passivation layer, forming a second photoresist pattern that exposes a pixel region over the passivation layer; forming a pixel region by using the second photoresist pattern as a mask, side-etching a part of the passivation layer to expose a part of the drain electrode, forming a pixel electrode material over the second photoresist pattern and the pixel region, and simultaneously removing the second photoresist pattern and the pixel electrode material formed thereon to form a pixel electrode.
    • 使用3掩模的液晶显示装置的薄膜晶体管的制造方法包括在基板上形成栅电极,连续地形成栅极绝缘层和有源层,形成第一光致抗蚀剂图案,除去形成在第 源极/漏极区域,灰化第一光致抗蚀剂图案以暴露有源区的一部分,形成源极/漏极,形成钝化层,形成在钝化层上暴露像素区域的第二光致抗蚀剂图案; 通过使用第二光致抗蚀剂图案作为掩模形成像素区域,侧蚀刻钝化层的一部分以暴露部分漏电极,在第二光致抗蚀剂图案和像素区域上形成像素电极材料,并同时去除 第二光致抗蚀剂图案和形成在其上的像素电极材料以形成像素电极。
    • 7. 发明授权
    • Array substrate for liquid crystal display device and method of manufacturing the same
    • 液晶显示装置用阵列基板及其制造方法
    • US07763483B2
    • 2010-07-27
    • US12318654
    • 2009-01-05
    • Youn-Gyoung ChangHeung-Lyul ChoSoon-Sung Yoo
    • Youn-Gyoung ChangHeung-Lyul ChoSoon-Sung Yoo
    • H01L21/00
    • G02F1/136227G02F1/134336G02F1/13458G02F1/1362G02F2001/136231G02F2001/136236
    • A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.
    • 制造液晶显示装置用阵列基板的方法包括通过第一掩模工艺在基板上形成栅极线,栅极焊盘和栅电极,形成数据线,数据焊盘,源电极,漏极 电极和通过第二掩模处理的包括栅极线,栅极焊盘和栅电极的衬底上的有源层,其中数据线与栅极线交叉以限定像素区域,源电极从数据线延伸, 所述漏电极与所述源电极间隔开,并且所述有源层设置在所述栅电极与所述源漏电极之间,在所述基板的整个表面上形成钝化层,所述整个表面包括所述数据线,所述源电极和所述漏极 电极通过第三掩模工艺,钝化层被蚀刻以暴露像素区域中的衬底,漏电极的一部分,栅极焊盘和数据焊盘,并且形成像素e 栅极焊盘端子和数据焊盘端子,通过在包括钝化层的基板的整个表面上沉积透明导电材料,直接接触漏电极的暴露部分的像素电极,直接接触栅极的栅极焊盘端子 焊盘和数据焊盘端子直接接触数据焊盘。