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    • 2. 发明授权
    • Liquid crystal display device having particular connections among drain and pixel electrodes and contact hole
    • 液晶显示装置在漏极和像素电极与接触孔之间具有特定的连接
    • US07023501B2
    • 2006-04-04
    • US10412237
    • 2003-04-14
    • Byung Chul AhnByung Ho LimSoon Sung YooYong Wan KimYoung Hun Ha
    • Byung Chul AhnByung Ho LimSoon Sung YooYong Wan KimYoung Hun Ha
    • G02F1/136H01L29/04H01L29/12
    • G02F1/136213G02F2001/136231
    • A liquid crystal display device and a method of fabricating the same are disclosed. The device, as disclosed, reduces the number of masks required to fabricate. Thus, cost is reduced and yield is increased. The device includes a plurality of gate lines, a plurality of data lines crossing the gate lines such that active regions are defined near the crossover points, thin film transistors are formed near the active regions, and a plurality of pixel electrodes are formed within regions defined by the adjacent gate and data lines. Also, pixel electrodes overlap gate lines and the two electrodes function as a storage capacitor. A fabrication method includes forming a gate line; forming a data line region, protections layers, and an active area where drain and source electrodes are spaced apart a predetermined distance; forming a data line, a gate line protection layer, and a gate insulating layer; and forming pixel electrodes by depositing a transparent conductive material, such that each pixel electrode also overlaps a portion of a gate line.
    • 公开了一种液晶显示装置及其制造方法。 所公开的装置减少了制造所需的面罩数量。 因此,成本降低并且产量增加。 该器件包括多条栅极线,与栅极线交叉的多条数据线,使得在交叉点附近限定有源区,在有源区附近形成薄膜晶体管,并且在限定的区域内形成多个像素电极 通过相邻的门和数据线。 此外,像素电极与栅极线重叠,并且两个电极用作存储电容器。 制造方法包括形成栅极线; 形成数据线区域,保护层以及漏极和源极间隔开预定距离的有源区域; 形成数据线,栅极线保护层和栅极绝缘层; 以及通过沉积透明导电材料形成像素电极,使得每个像素电极也与栅极线的一部分重叠。
    • 3. 发明授权
    • Liquid crystal display having passivation layer partially exposing gate insulating layer
    • 具有钝化层的液晶显示器部分地暴露栅极绝缘层
    • US06972825B2
    • 2005-12-06
    • US10616960
    • 2003-07-11
    • Yong Wan Kim
    • Yong Wan Kim
    • G02F1/133G02F1/1362G02F1/1333
    • G02F1/136259G02F2001/136263
    • A method of removing pattern defects in a liquid crystal display more particularly, a liquid crystal display having an IOP structure where a transparent conductive layer is formed on a passivation layer, removes pattern defects in active layers or data wires of an LCD simultaneously and quickly, without causing any damage on other parts of the LCD, by exposing pattern defects in the air, then carrying out an etching process in use of pixel electrodes and an etch-stop layer as an etch mask. The method of removing pattern defects in a liquid crystal display, wherein the liquid crystal display comprises a gate wire on a substrate wherein the gate wire includes a gate electrode and gate line, a gate insulating layer covering an exposed surface of the substrate including the gate wire, a data wire on the gate insulating layer wherein the data wire includes a data line, source electrode, and drain electrode, an active layer on the gate insulating layer wherein the active layer constitutes a thin film transistor with the gate, source, and drain electrodes which are properly overlapped one another, a passivation layer covering an exposed surface of the substrate except a portion of the data wire, and a pixel electrode on the passivation layer wherein the pixel electrode is connected to the exposed data wire, includes the steps of forming an etch-stop layer covering the data wire and thin film transistor, exposing at least one pattern defect by etching the passivation layer in use of the etch-stop layer and pixel electrode as an etch mask, removing the pattern defect, and removing the etch-stop layer.
    • 一种在液晶显示器中去除图案缺陷的方法,更具体地说,具有在钝化层上形成透明导电层的IOP结构的液晶显示器同时且快速地去除LCD的有源层或数据线中的图案缺陷, 而不会对LCD的其它部分造成任何损害,通过暴露空气中的图案缺陷,然后在使用像素电极和蚀刻停止层作为蚀刻掩模进行蚀刻工艺。 一种去除液晶显示器中的图案缺陷的方法,其中液晶显示器包括在基板上的栅极线,其中栅极线包括栅电极和栅极线,栅极绝缘层覆盖包括栅极的基板的暴露表面 导线,栅极绝缘层上的数据线,其中数据线包括数据线,源电极和漏电极,栅极绝缘层上的有源层,其中有源层构成具有栅极,源极和/或栅极的薄膜晶体管, 漏极彼此适当地重叠,覆盖除了数据线的一部分之外的衬底的暴露表面的钝化层和钝化层上的像素电极,其中像素电极连接到暴露的数据线,包括步骤 形成覆盖数据线和薄膜晶体管的蚀刻停止层,通过蚀刻我们中的钝化层来暴露至少一个图案缺陷 e蚀刻停止层和像素电极作为蚀刻掩模,去除图案缺陷,以及去除蚀刻停止层。
    • 4. 发明授权
    • Array substrate for a liquid crystal display and method for fabricating thereof
    • 液晶显示器用阵列基板及其制造方法
    • US06906760B2
    • 2005-06-14
    • US09917861
    • 2001-07-31
    • Soon-Sung YooDong-Yeung KwakHu-Sung KimYu-Ho JungYong-Wan KimDuk-Jin ParkWoo-Chae Lee
    • Soon-Sung YooDong-Yeung KwakHu-Sung KimYu-Ho JungYong-Wan KimDuk-Jin ParkWoo-Chae Lee
    • G02F1/1333G02F1/1362G02F1/136
    • G02F1/136286G02F2001/136263
    • A liquid crystal display device includes a substrate, a thin film transistor disposed on the substrate, the thin film transistor including a gate electrode, a source electrode and a drain electrode, a gate line arranged in a first direction on the substrate, the gate line connected with the gate electrode of the thin film transistor, a gate insulation layer disposed on the substrate and covering the gate line and the gate electrode of the thin film transistor, an intrinsic semiconductor layer disposed on the gate insulation layer, an extrinsic semiconductor layer disposed on the intrinsic semiconductor layer, a data line arranged in a second direction substantially perpendicular to the first direction disposed on the extrinsic semiconductor layer, the data line connected to the source electrode of the thin film transistor, first and second dummy metal layers formed over the gate line and arranged on opposite sides of the data line, a passivation layer covering the data line, the source electrode, the drain electrode and the first and second dummy metal layers, and a pixel electrode located at a pixel region defined by an intersection of the gate line and the data line, the pixel electrode contacting the drain electrode of the thin film transistor.
    • 液晶显示装置包括基板,设置在基板上的薄膜晶体管,薄膜晶体管,其包括栅电极,源电极和漏电极,在基板上沿第一方向排列的栅极线,栅极线 与所述薄膜晶体管的栅电极连接,栅极绝缘层,设置在所述基板上并覆盖所述薄膜晶体管的栅极线和栅极,设置在所述栅极绝缘层上的本征半导体层,设置在所述栅极绝缘层上的外部半导体层 在本征半导体层上,沿与第二方向大致垂直的第二方向布置在非本征半导体层上的数据线,与薄膜晶体管的源极连接的数据线,形成在该半导体层上的第一和第二虚设金属层 栅极线并布置在数据线的相对侧,覆盖数据线的钝化层,源极 电极,漏电极和第一和第二虚拟金属层,以及位于由栅极线和数据线的交点限定的像素区域的像素电极,该像素电极与薄膜晶体管的漏电极接触。
    • 5. 发明授权
    • Liquid crystal display device and method of manufacturing the same
    • 液晶显示装置及其制造方法
    • US06862051B2
    • 2005-03-01
    • US10397261
    • 2003-03-27
    • Byung-Chul AhnSoon-Sung YooYong-Wan Kim
    • Byung-Chul AhnSoon-Sung YooYong-Wan Kim
    • G02F1/136G02F1/1362
    • G02F1/13458G02F1/136213G02F1/136227
    • A liquid crystal display, and a method of manufacturing thereof, includes providing a substrate; depositing sequentially a first metal layer and a first insulating layer on the substrate; patterning the first metal layer and the first insulating layer using a first mask to form a gate line and a first gate insulating layer; depositing sequentially a second gate insulating layer, a pure semiconductor layer, a doped semiconductor layer and a second metal layer over the whole substrate; patterning the second metal layer using a second mask to form a data line, source and drain electrodes, a capacitor electrode, the capacitor electrode overlapping a portion of the gae line; etching the doped semiconductor layer between the source and drain electrodes to form a channel region; depositing a third insulating layer over the whole substrate; patterning the third insulating layer using a third mask to form a passivation film, the passivation film having a smaller width than the data line and covering the source and drain electrodes and exposing a portion of the drain electrode and the capacitor electrode; depositing a transparent conductive material layer over the whole substrate; and patterning the transparent conductive material layer using a fourth mask to pixel electrode, the pixel electrode contacting the drain electrode.
    • 液晶显示器及其制造方法包括提供基板; 在基板上依次沉积第一金属层和第一绝缘层; 使用第一掩模对第一金属层和第一绝缘层进行构图以形成栅极线和第一栅极绝缘层; 在整个衬底上依次沉积第二栅绝缘层,纯半导体层,掺杂半导体层和第二金属层; 使用第二掩模图案化第二金属层以形成数据线,源极和漏极,电容器电极,电容器电极与gae线的一部分重叠; 蚀刻源极和漏极之间的掺杂半导体层以形成沟道区; 在整个衬底上沉积第三绝缘层; 使用第三掩模对第三绝缘层进行图案化以形成钝化膜,所述钝化膜具有比所述数据线更小的宽度并且覆盖所述源电极和漏电极并暴露所述漏电极和所述电容器电极的一部分; 在整个基板上沉积透明导电材料层; 以及使用第四掩模到像素电极对所述透明导电材料层进行图案化,所述像素电极与所述漏极接触。