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    • 23. 发明授权
    • ZIF connector in which a position of a contact is automatically adjusted during a connecting operation
    • ZIF连接器,其中在连接操作期间自动调整触点的位置
    • US07077675B2
    • 2006-07-18
    • US11037704
    • 2005-01-18
    • Toshihiko MaedaYoshinori MizusawaIsao Takahashi
    • Toshihiko MaedaYoshinori MizusawaIsao Takahashi
    • H01R13/15
    • H01R12/88H01R13/193Y10S439/952
    • In a ZIF connector having first and second connectors, the first connector includes an operating member rotatably held by a first insulator portion holding first contacts arranged adjacent to one another in a predetermined direction. The second connector includes a floating member held by a second insulator portion to be rotatable and slidable in the predetermined direction. The floating member has a first and a second surface which face the first contacts and the operating member, respectively, in a mutually fitted state of the first and the second connectors. Second contacts have one parts held by the first surface and arranged adjacent to one another in the predetermined direction. The floating member is rotated in a first rotating direction to bring the second contacts into contact with the first contacts when the operating member is rotated in the mutually fitted state.
    • 在具有第一和第二连接器的ZIF连接器中,第一连接器包括操作构件,该操作构件由保持沿预定方向彼此相邻布置的第一触点的第一绝缘体可旋转地保持。 第二连接器包括由第二绝缘体部分保持的可沿预定方向旋转和滑动的浮动部件。 浮动部件具有第一和第二表面,第一和第二表面分别面对第一和第二连接器的相互配合的状态。 第二触点具有由第一表面保持的一个部分并且沿预定方向彼此相邻地布置。 当操作构件在相互配合的状态下旋转时,浮动构件在第一旋转方向上旋转以使第二触点与第一触点接触。
    • 28. 发明授权
    • Membrane for use in X-ray mask and method for preparing the same
    • 用于X射线掩模的膜及其制备方法
    • US4940851A
    • 1990-07-10
    • US111996
    • 1987-10-21
    • Akira OyobeToshihiko MaedaHiroyuki NakaeToshio HiraiTsuyoshi Masumoto
    • Akira OyobeToshihiko MaedaHiroyuki NakaeToshio HiraiTsuyoshi Masumoto
    • C01B35/14G03F1/00G03F1/22H01L21/027
    • G03F1/22
    • A membrane for use in an X-ray mask composed of a compound comprising at least three kinds of elements of boron (B), silicon (Si) and nitrogen (N) in which the content of silicon in the compound is at least 15 atomic percent, but less than 100 atomic percent, and the atomic ratio of Si/(B+Si) in the compound is at least 0.2, but less than one. The membrane is synthesized from source gases including at least the foregoing three kinds of elements by chemical reaction under such conditions that the ratio of nitrogen to boron plus silicon is at least one in the source gases and thereby depositing a film of the compound onto a substrate. Since the membrane thus prepared has a high transmittance in the visible region and X-ray and their residual stress can be readily controlled by adjusting the conditions for the formation of the membrane, it is suitable for the preparation of X-ray masks.
    • 一种用于由包含硼(B),硅(Si)和氮(N))的至少三种元素的化合物构成的X射线掩模的膜,其中化合物中的硅含量为至少15原子 百分比但小于100原子%,化合物中Si /(B + Si)的原子比为至少0.2,但小于1。 在源气体中氮与硼与硅的比例至少为1的条件下,通过化学反应在至少包含上述3种元素的源气体中合成膜,由此将化合物的膜沉积在基材上 。 由于如此制备的膜在可见光区域具有高透射率,并且通过调节形成膜的条件可以容易地控制X射线及其残余应力,因此适用于制备X射线掩模。