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21. 发明申请

US20060266244A1 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US20060266244A1
公开(公告)日：2006-11-30
申请号：US11139991
申请日：2005-05-31
申请人： Yvonne Kruijt-Stegeman , Aleksey Kolensnychenko , Helmar Santen , Erik Loopstra
发明人： Yvonne Kruijt-Stegeman , Aleksey Kolensnychenko , Helmar Santen , Erik Loopstra
IPC分类号： B41F1/34
CPC分类号： B41F1/34 , B41F1/18 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , G03F9/7042 , G03F9/7084 , H05K1/0269 , H05K3/0008 , H05K2201/09918 , H05K2203/0108
摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.
摘要翻译：公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。

22. 发明授权

US07136214B2 Active faceted mirror system for lithography 有权
标题翻译：用于光刻的主动分面镜系统
公开(公告)号：US07136214B2
公开(公告)日：2006-11-14
申请号：US10986076
申请日：2004-11-12
申请人： Erik Loopstra , Stephen Roux
发明人： Erik Loopstra , Stephen Roux
IPC分类号： G02B26/00
CPC分类号： G02B27/0977 , G02B7/1827 , G02B27/0905 , G03F7/70116 , G03F7/702 , G03F7/70291
摘要： An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.
摘要翻译：公开了一种主动刻面镜系统。主动分面镜系统包括一组主动分面镜装置，底板和一组用于将活动小面镜装置安装到基板的销。每个活性刻面镜装置包括具有反射表面的反射镜基板和用于安装的反面上的轴承孔。此外，每个活动刻面镜装置包括位于镜基板背面的至少三个致动器目标，宝石轴承和用于支撑镜面基板的挠曲件。基板包括用于安装主动分面镜装置的一系列轴承孔和用于每个主动分面镜装置的至少三个致动器。可以使用位于基板上的一组小面控制器来控制活动小面镜装置的定位以产生期望的照明效果。

23. 发明申请

US20060077372A1 Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light 有权
标题翻译：校正照明场中光强度的变化，而不会使光的远心变形
公开(公告)号：US20060077372A1
公开(公告)日：2006-04-13
申请号：US10962550
申请日：2004-10-13
申请人： Stephen Roux , Erik Loopstra , Michael Nelson
发明人： Stephen Roux , Erik Loopstra , Michael Nelson
IPC分类号： G03B27/72
CPC分类号： G03F7/70558 , G03F7/70066
摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system comprising a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system of the photolithography system and a reticle stage of the photolithography system so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The blade structure is either translucent to a wavelength of the light or opaque to the wavelength. The first portion of the light has a first area. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that, when the illumination system provides the light having the illumination field, a second portion of the light within the illumination field impinges upon the blade structure. The second portion of the light has a second area. The second area is different from the first area.
摘要翻译：一种用于改变包括叶片结构和第一致动器的光刻系统的照明场内的光聚集强度的装置。刀片结构被配置为沿着光刻系统的光路定位在光刻系统的照明系统和光刻系统的光罩台之间，使得当照明系统提供具有照明场的光时，叶片结构基本上在照明场的中心，并且照明场内的光的第一部分撞击在叶片结构上。叶片结构对于光的波长是半透明的或对于波长是不透明的。光的第一部分具有第一区域。第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且构造成在第一方向上至少移动叶片结构的第一部分，使得当照明系统提供具有照明场，照明场内的光的第二部分照射在叶片结构上。光的第二部分具有第二区域。第二个区域与第一个区域不同。

24. 发明申请

US20060017894A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060017894A1
公开(公告)日：2006-01-26
申请号：US10896000
申请日：2004-07-22
申请人： Tjarko Adriaan Van Empel , Erik Loopstra , Antonius Van Der Net , Yuri Johannes Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
发明人： Tjarko Adriaan Van Empel , Erik Loopstra , Antonius Van Der Net , Yuri Johannes Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
摘要翻译：公开了一种光刻设备。该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。投影系统包括壳体和布置在壳体中的多个光学元件。该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。提供至少一个门，用于提供气体环境与环境气氛的通信。门被设置成将经调节的气体预定的泄漏提供给环境大气。

25. 发明申请

US20050231043A1 Lithographic apparatus, coil assembly, positioning device including a coil assembly, and device manufacturing method 失效
标题翻译：平版印刷装置，线圈组件，包括线圈组件的定位装置和装置制造方法
公开(公告)号：US20050231043A1
公开(公告)日：2005-10-20
申请号：US10825224
申请日：2004-04-16
申请人： Johannes Petrus Martinus Vermeulen , Henricus Wilhelmus Janssen , Erik Loopstra
发明人： Johannes Petrus Martinus Vermeulen , Henricus Wilhelmus Janssen , Erik Loopstra
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , H02K3/04 , H02K41/00 , H02K41/03
CPC分类号： H02K41/03 , G03F7/70758 , H02K3/04
摘要： A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.
摘要翻译：线圈组件具有布置在公共平面中的至少两个线圈，并且在线圈的交叉部分中部分重叠。交叉部分具有降低的高度，这导致线圈组件的总高度减小。这导致更紧凑的线圈组件，并且因此导致施加线圈组件的定位装置的更好的动态特性。

26. 发明申请

US20050105069A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050105069A1
公开(公告)日：2005-05-19
申请号：US10715828
申请日：2003-11-19
申请人： Erik Loopstra , Dominicus Adrianus Franken
发明人： Erik Loopstra , Dominicus Adrianus Franken
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70258 , G03F7/70833
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation used to irradiate a patterning device, and a first support that supports the patterning device. The patterning device capable of patterning the beam of radiation. The apparatus also includes a second support that supports a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a projection system positioning module that controls at least one of a position and an orientation of the projection system based on at least one of a velocity and an acceleration of the projection system.
摘要翻译：公开了一种光刻投影装置。该装置包括用于提供用于照射图案形成装置的辐射束的照明系统和支撑图案形成装置的第一支撑件。能够图案化辐射束的图案形成装置。该装置还包括支撑基板的第二支撑件，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及投影系统定位模块，其控制投影的位置和取向中的至少一个基于投影系统的速度和加速度中的至少一个的系统。

27. 发明授权

US10481500B2 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type 有权
公开(公告)号：US10481500B2
公开(公告)日：2019-11-19
申请号：US13197065
申请日：2011-08-03
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Erik Loopstra , David R. Shafer
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Erik Loopstra , David R. Shafer
IPC分类号： G03B27/42 , G03F7/20 , G02B17/06
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

28. 发明申请

US20120069312A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 审中-公开
标题翻译：成像光学系统和投影曝光安装与这种类型的成像光学系统的微型计算
公开(公告)号：US20120069312A1
公开(公告)日：2012-03-22
申请号：US13197065
申请日：2011-08-03
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Erik Loopstra , David R. Shafer
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Erik Loopstra , David R. Shafer
IPC分类号： G03F7/20 , G03B27/70 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0647 , G02B17/0652 , G02B17/0663 , G03F7/7015 , G03F7/7025
摘要： An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.
摘要翻译：成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。成像光学系统具有光瞳遮蔽。在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。

29. 发明申请

US20070273851A1 Lithographic apparatus and method of reducing thermal distortion 失效
标题翻译：平版印刷设备和减少热变形的方法
公开(公告)号：US20070273851A1
公开(公告)日：2007-11-29
申请号：US11440437
申请日：2006-05-25
申请人： Jozef Finders , Erik Loopstra
发明人： Jozef Finders , Erik Loopstra
IPC分类号： G03B27/52
CPC分类号： G03B27/522 , G03F7/70258 , G03F7/70875
摘要： A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal distortion pattern to reduce the effect of thermal distortion of the patterning device on a pattern.
摘要翻译：公开了一种光刻设备，其具有被配置为向图案形成装置供应能量以加热图案形成装置以形成图案形成装置的期望热变形图案的加热器，以及被配置为在对应于所需热量的装置中实现光学校正的控制器畸变图案，以减少图案形成装置的热变形对图案的影响。

30. 发明申请

US20070013894A1 Stage apparatus, lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070013894A1
公开(公告)日：2007-01-18
申请号：US11335715
申请日：2006-01-20
申请人： Erik Loopstra
发明人： Erik Loopstra
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70425 , G03F7/70716
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

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