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    • 28. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US4405935A
    • 1983-09-20
    • US227679
    • 1981-01-23
    • Toru BajiNorio KoikeToshihisa TsukadaIwao TakemotoHideaki YamamotoYukio Takasaki
    • Toru BajiNorio KoikeToshihisa TsukadaIwao TakemotoHideaki YamamotoYukio Takasaki
    • H01L27/146H04N5/335H04N5/359H04N5/369H04N5/374H01L27/14
    • H01L27/14672
    • Disclosed is a solid-state imaging device having a semiconductor integrated circuit in which a plurality of switching elements for selecting positions of picture elements and scanners for turning "on" and "off" the switching elements in time sequence are disposed on an identical substrate, a photoconductive film which is disposed on the integrated circuit and which is connected to one end of each of the switching elements, and a light transmitting electrode which is disposed on the photoconductive film, characterized at least in that a breakdown voltage of a junction formed between the semiconductor substrate and an impurity region which has a conductivity type opposite to that of the semiconductor substrate and which stores therein carriers attendant upon incidence of light is made smaller than a breakdown voltage between the storing first impurity region of said each switching element and a second impurity region thereof which forms a signal leading-out portion.
    • 公开了一种具有半导体集成电路的固态成像装置,其中用于选择用于按时间顺序将开关元件“接通”和“关闭”的图像元素和扫描器的位置的多个开关元件设置在相同的基板上, 设置在所述集成电路上并连接到每个所述开关元件的一端的光电导膜和设置在所述光电导膜上的透光电极,其特征在于,至少形成在所述光电导膜之间形成的结的击穿电压, 所述半导体衬底和具有与所述半导体衬底的导电类型相反的导电类型并且存储在入射时伴随的载流子的杂质区域被制成小于所述每个开关元件的所述存储第一杂质区域与所述第二开关元件的存储第一杂质区域之间的击穿电压 其形成信号导出部分的杂质区域。