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    • 23. 发明授权
    • Nonlinear optical device and method of manufacturing same
    • 非线性光学器件及其制造方法
    • US5547705A
    • 1996-08-20
    • US939965
    • 1992-09-04
    • Tadashi FukuzawaSatoru S. KanoKiyoshi KumataVictor Y. LeeFranklin M. SchellenbergYutaka Takahashi
    • Tadashi FukuzawaSatoru S. KanoKiyoshi KumataVictor Y. LeeFranklin M. SchellenbergYutaka Takahashi
    • G02F1/35G02F1/355G02F3/02B05D5/06
    • B82Y20/00G02F1/3556
    • A nonlinear optical device comprising a substrate and a film structure coated on to the substrate. The film has, in a direction normal to the substrate, an intercalation structure including a semiconductor layer and an organic layer that lave different energy gaps. The intercalation structure includes a plurality of semiconductor layers and a plurality of organic layers which comprise a quantum well system. The film structure includes an assembly of microcrystals having domain size smaller than that of the wavelength of light with which the device operates. The microcrystals have an axis aligned in a direction normal to the substrate and have randomly oriented axes in a direction parallel to the substrate. A method for producing the device comprises providing a solution of an organic material in a solvent and placing a quantity of the solution on a substrate to form the organic material film structure thereon. The film is formed by spin coating of the solution on the substrate. Preferably the film is comprised of a two-dimensional perovskite such as (C.sub.10 H.sub.21 NH.sub.3).sub.2 PbI.sub.4. The solvent is acetone or dimethoxyl ethane.
    • 一种非线性光学器件,包括涂覆在基底上的基底和薄膜结构。 该膜在与基板垂直的方向上具有包含半导体层和具有不同能隙的有机层的嵌入结构。 嵌入结构包括多个半导体层和包括量子阱系统的多个有机层。 膜结构包括具有比器件工作的光的波长小的畴尺寸的微晶组合。 微晶具有在垂直于衬底的方向上对齐的轴线,并且在平行于衬底的方向上具有随机取向的轴。 一种制造该装置的方法包括:将有机材料溶于溶剂中并将一定量的溶液放置在基材上以在其上形成有机材料膜结构。 该膜通过将溶液旋涂在基材上而形成。 优选地,该膜由诸如(C10H21NH3)2PbI4的二维钙钛矿组成。 溶剂是丙酮或二甲氧基乙烷。
    • 24. 发明授权
    • Head flying height measuring apparatus
    • 头部飞行高度测量仪
    • US5475488A
    • 1995-12-12
    • US148100
    • 1993-11-05
    • Tadashi FukuzawaTeiji HisanoKohichi IkarugiTetsuji MoritaKohki Noda
    • Tadashi FukuzawaTeiji HisanoKohichi IkarugiTetsuji MoritaKohki Noda
    • G01B9/02G01B11/14G01D1/02G11B21/21
    • G01B11/14G01B9/02007G11B5/455G11B5/6052G01B2290/25
    • A high-sensitivity apparatus having simple constitution that measures the flying height of a magnetic head. Light emitted from a white light source 25 is directed to the gap between a disk 23 and a head 21, and subjected to multiple reflection between the disk 23 and the head 21. Reflected light from an opaque object, which may be either the disk 23 or the head 21, is divided into at least three components having respective wavelength regions which are directed to different photodetectors 35, 36, and 37 for the respective wavelength regions. An estimation device 38 estimates the flying height of the head according to the least-square method from the outputs of the photodetectors using functions prepared in advance for the respective wavelength regions, and correlates the disk-head gap and the reflected light intensities detected by the respective photodetectors. Real-time calculation according to the least-square method is performed by means of a table look-up technique or a tracking servo technique.
    • 具有测量磁头的飞行高度的简单结构的高灵敏度装置。 从白光源25发射的光被引导到盘23和头21之间的间隙,并且在盘23和头21之间经受多次反射。来自不透明物体的反射光可以是盘23 或头21被分成至少三个分量,其中各个波长区域被引导到各个波长区域的不同的光电探测器35,36和37。 估计装置38使用对于各个波长区域预先准备的功能,根据最小二乘法估计头部的飞行高度与光电检测器的输出之间的关系,并且将磁头间隙和由 各个光电探测器。 根据最小二乘法的实时计算是通过表查找技术或跟踪伺服技术进行的。
    • 27. 发明授权
    • Fabrication process of semiconductor lasers
    • 半导体激光器的制造工艺
    • US4783425A
    • 1988-11-08
    • US924774
    • 1986-10-30
    • Tadashi FukuzawaYuichi OnoShinichi NakatsukaTakashi Kajimura
    • Tadashi FukuzawaYuichi OnoShinichi NakatsukaTakashi Kajimura
    • H01L33/00H01S5/20H01S5/223H01S5/323H01S5/34H01L21/205H01L21/225H01L21/265
    • B82Y20/00H01L33/0062H01S5/2231H01S5/34H01S5/2081H01S5/32316
    • A p-GaAlAs cladding layer is exposed to the air if a groove of the form of a stripe is formed by chemical etching in an n-GaAs layer that serves as a current confinement layer on the p-GaAlAs cladding layer, the groove being so formed as to reach the cladding layer. The GaAlAs is oxidized so easily that an unstable degradation layer is formed on the surface thereof. To solve this problem according to the prior art, an undoped GaAs layer that serves as a cover layer is formed on the p-GaAlAs cladding layer, the n-GaAs layer is formed, and the etching is effected so that the undoped GaAs layer is simply exposed. The undoped GaAs layer is then heated in the MBE apparatus while being irradiated with the As molecular beam and is thermally etched. Therefore, the cladding layer is exposed in vacuum and the p-GaAlAs layer is formed thereon. However, this method is not suited for mass-production since the thermal etching is unstable and it needs the MBE apparatus of a very high degree of vacuum. Quality of the crystal decreases, too, due to the heating. This invention therefore provides a fabrication process of semiconductor lasers in which the cover layer disappears due to interdiffusion of constituent elements that stem from the diffusion of impurities such as zinc ions in the undoped GaAs layer.
    • 如果通过在p-GaAlAs包层上作为电流限制层的n-GaAs层中的化学蚀刻形成条纹形式的沟槽,则p-GaAlAs包层暴露于空气中,凹槽为 形成为到达包层。 GaAlAs容易氧化,从而在其表面上形成不稳定的降解层。 为了解决现有技术的问题,在p-GaAlAs包层上形成作为覆盖层的未掺杂的GaAs层,形成n-GaAs层,进行蚀刻,使未掺杂的GaAs层为 简单暴露。 然后在MBE装置中加热未掺杂的GaAs层,同时用As分子束照射并进行热蚀刻。 因此,在真空中露出包覆层,在其上形成p-GaAlAs层。 然而,该方法不适于批量生产,因为热蚀刻不稳定,并且需要非常高真空度的MBE装置。 由于加热,晶体的质量也降低。 因此,本发明提供一种半导体激光器的制造工艺,其中由于在未掺杂的GaAs层中的诸如锌离子的杂质的扩散而导致的构成元素的相互扩散,覆盖层消失。
    • 30. 发明授权
    • Semiconductor light emitting element
    • 半导体发光元件
    • US4361887A
    • 1982-11-30
    • US125779
    • 1980-02-29
    • Michiharu NakamuraMotohisa HiraoShigeo YamashitaTadashi FukuzawaJunichi Umeda
    • Michiharu NakamuraMotohisa HiraoShigeo YamashitaTadashi FukuzawaJunichi Umeda
    • H01L29/80H01L21/338H01L27/095H01L27/15H01L29/812H01S5/00H01S5/026H01S5/042H01S3/19
    • H01S5/0265
    • A semiconductor laser light emitting element comprises a semiconductor substrate, a laminate region of semiconductor layers having at least a first, a second and a third semiconductor layer formed over the substrate and having a p-n junction defined therein. The first and third semiconductor layers have smaller refractive indices and greater forbidden band gaps than the second semiconductor layer and are opposite in conductivity type to each other. Provided are on the substrate a field effect transistor section having first and second electrodes and a gate electrode disposed between the first and second electrodes, a means for serving as an optical resonator for emitting light in the lengthwise direction of the p-n junction. A means is formed on one surface of the laminate region for injecting current into the third semiconductor layer, the current injection means is short-circuited with the first electrode of the field transistor section and a means is formed on the substrate for receiving the current injected from the current injecting means.
    • 半导体激光发光元件包括半导体衬底,半导体层的层叠区域,其至少形成在衬底上并具有限定在其中的p-n结的第一,第二和第三半导体层。 第一和第三半导体层具有比第二半导体层更小的折射率和更大的禁带宽度,并且与导电类型相反。 在基板上设置有具有第一和第二电极的场效应晶体管部分和设置在第一和第二电极之间的栅电极,用作用于在p-n结的长度方向上发光的光谐振器的装置。 在层叠区域的一个表面上形成用于将电流注入到第三半导体层中的装置,电流注入装置与场晶体管部分的第一电极短路,并且在基板上形成用于接收注入电流的装置 从目前的注射手段。