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21. 发明授权

US07479189B2 Coating plant with a charging lock and device therefor 有权
标题翻译：涂装厂带有充电锁及其装置
公开(公告)号：US07479189B2
公开(公告)日：2009-01-20
申请号：US10547718
申请日：2004-03-11
申请人： Uwe Schüssler , Stefan Bangert , Jürgen Henrich
发明人： Uwe Schüssler , Stefan Bangert , Jürgen Henrich
IPC分类号： B05C15/00
CPC分类号： C03C17/001 , C03C17/002 , C23C14/56 , C23C14/566 , F16K1/2007 , F16K1/205 , F16K1/2085 , F16K1/24 , F16K51/02
摘要： The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.
摘要翻译：本发明涉及一种具有充电锁，特别是用于涂覆室的矩形真空锁的涂覆设备，特别是真空镀膜设备，其具有长度至少为1000mm的锁定孔（13），其包括快门（ 6）用于关闭和打开锁定孔，以及用于固定闸门的闩锁（7），其中设置有用于将闸板和闩锁从第一打开位置移动到第二关闭位置的装置，反之亦然，这些装置确保还有，快门（6）和闩锁（7）的运动将以这样的方式彼此联接，使得在快门关闭之后快门（6）将被闩锁（7）自动固定，并且将是在开放之前再次释放。

22. 发明申请

US20060162659A1 Coating plant with a charging lock and device therefor 有权
标题翻译：涂装厂带有充电锁及其装置
公开(公告)号：US20060162659A1
公开(公告)日：2006-07-27
申请号：US10547718
申请日：2004-03-11
申请人： Uwe Schussler , Stefan Bangert , Jurgen Henrich
发明人： Uwe Schussler , Stefan Bangert , Jurgen Henrich
IPC分类号： C23C16/00
CPC分类号： C03C17/001 , C03C17/002 , C23C14/56 , C23C14/566 , F16K1/2007 , F16K1/205 , F16K1/2085 , F16K1/24 , F16K51/02
摘要： The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.
摘要翻译：本发明涉及一种具有充电锁，特别是用于涂覆室的矩形真空锁的涂覆设备，特别是真空镀膜设备，其具有长度至少为1000mm的锁定孔（13），其包括快门（ 6）用于关闭和打开锁定孔，以及用于固定闸门的闩锁（7），其中设置有用于将闸板和闩锁从第一打开位置移动到第二关闭位置的装置，反之亦然，这些装置确保还有，快门（6）和闩锁（7）的运动将以这样的方式彼此联接，使得在快门关闭之后快门（6）将被闩锁（7）自动固定，并且将是在开放之前再次释放。

23. 发明申请

US20060102863A1 Vacuum closure with linear drive unit 审中-公开
标题翻译：带线性驱动单元的真空关闭
公开(公告)号：US20060102863A1
公开(公告)日：2006-05-18
申请号：US11143822
申请日：2005-06-02
申请人： Stefan Bangert , Michael Konig , Ralph Lindenberg , Uwe Schussler , Tobias Stolley , Frank Fuchs
发明人： Stefan Bangert , Michael Konig , Ralph Lindenberg , Uwe Schussler , Tobias Stolley , Frank Fuchs
IPC分类号： F16K11/074
CPC分类号： F16K31/04 , F16K51/02
摘要： This invention relates to a vacuum treatment installation and a device therefor for the tight, especially vacuum-tight closing of an aperture, in particular a slit-like or rectangular aperture with a length that is preferably a multiple of the width of the aperture, in particular for a lock arrangement of a vacuum treatment installation, said device having a closure member (2) and for said closure member a linear drive unit (3,4,5) which, by way of a translational movement, can move the closure member from an open position into a closed position, said closure member having a sealing surface which is disposed in a plane (16) and which, in the closed position, makes sealing contact with a counter-sealing surface on the aperture side, and said plane running perpendicular to the direction of the translational movement (14) and at an oblique angle to the aperture normal (13).
摘要翻译：本发明涉及一种真空处理装置及其装置，用于紧密，特别地真空密封孔，特别是狭缝状或矩形孔，其长度优选为孔的宽度的倍数，在特别是用于真空处理装置的锁定装置，所述装置具有闭合构件（2），并且对于所述闭合构件，线性驱动单元（3,4,5）通过平移运动可移动闭合构件从打开位置到关闭位置，所述封闭构件具有设置在平面（16）中的密封表面，并且在关闭位置与密封面密封接触开口侧上的反向密封表面，并且所述平面垂直于平移运动（14）的方向延伸并且与孔径法线（13）成倾斜的角度。

24. 发明申请

US20050034981A1 Cathodic sputtering apparatus 审中-公开
标题翻译：阴极溅射装置
公开(公告)号：US20050034981A1
公开(公告)日：2005-02-17
申请号：US10851998
申请日：2004-05-20
申请人： Frank Fuchs , Stefan Bangert , Ralph Lindenberg , Helmut Grimm , Tobias Stolley , Uwe Schussler
发明人： Frank Fuchs , Stefan Bangert , Ralph Lindenberg , Helmut Grimm , Tobias Stolley , Uwe Schussler
IPC分类号： C23C14/35 , C23C14/00 , C23C14/34 , H01J37/34
CPC分类号： H01J37/3455 , C23C14/3407 , C23C14/35 , H01J37/3405
摘要： The invention relates to a cathodic sputtering apparatus (8) for coating substrates (17) in a vacuum, comprising an essentially tubular support for the material to be sputtered (2) which is rotatable about its longitudinal axis, a cooling system which is suitable for circulating a cooling medium in the tubular support (2) in conjunction with a cooling device external to the support (2), a device for connecting to an electrical power circuit, and a device for the rotary drive of the tubular support about its longitudinal axis. This apparatus also is provided with a magnet system which extends along the axis for the magnetic confinement of a plasma which is provided near a target made of the material to be sputtered, the magnet system being composed of pole shoes (9, 10), magnet yokes (12, 13) made of magnetically permeable metal, and magnetization means (5) which are suitable for generating a magnetic flux in the magnet system. The magnet poles of one polarity in the magnet system are situated outside the tubular target support (2) and enclose same in a frame-like manner, and the opposite magnetic poles are provided in the tubular, rotatable target support (2).
摘要翻译：本发明涉及一种用于在真空中涂覆基底（17）的阴极溅射装置（8），其包括可围绕其纵向轴线旋转的待溅射材料（2）的基本上管状的支撑件，适用于将冷却介质与支撑件（2）外部的冷却装置结合在一起，在管状支撑件（2）中循环冷却介质，用于连接到电力回路的装置和用于管状支撑件围绕其纵向轴线的旋转驱动的装置。该装置还设置有磁体系统，其沿着轴线延伸，用于限制等离子体的磁场限制，等离子体设置在由被溅射材料制成的靶材附近，磁体系统由极靴（9,10），磁体由导磁体金属制成的轭铁（12,13）和适用于在磁铁系统中产生磁通量的磁化装置（5）。磁体系中一个极性的磁极位于管状目标支架（2）的外侧并以框架状方式封闭，并且相对的磁极设置在管状可转动的目标支架（2）中。

25. 发明申请

US20150284841A1 PLASMA ENHANCED DEPOSITION ARRANGEMENT FOR EVAPORATION OF DIELECTRIC MATERIALS, DEPOSITION APPARATUS AND METHODS OF OPERATING THEREOF 审中-公开
标题翻译：用于电介质材料蒸发的等离子体增强沉积装置，沉积装置及其操作方法
公开(公告)号：US20150284841A1
公开(公告)日：2015-10-08
申请号：US14646680
申请日：2013-12-20
申请人： Stefan KELLER , Stefan BANGERT , Leo KWAK BYUNG-SUNG
发明人： Stefan Keller , Stefan Bangert , Kwak Byung-Sung Leo
IPC分类号： C23C14/24 , C23C14/32 , C23C14/50 , C23C14/30
CPC分类号： C23C14/243 , C23C14/0676 , C23C14/246 , C23C14/30 , C23C14/32 , C23C14/50 , H01J37/32091 , H01J37/32357 , H01J37/3244 , H01M4/0428 , H01M4/1391 , H01M10/052 , H01M10/0562
摘要： A depositing arrangement for evaporation of a dielectric material onto a substrate is described. The deposition arrangement a vapor distribution showerhead, a holder for providing the dielectric material in the vapor distribution showerhead, wherein the holder has a feeding unit for feeding the dielectric material into the vapor distribution showerhead, an energy source configured for melting and evaporating the dielectric material in the vapor distribution showerhead or sublimating the dielectric material in the vapor distribution showerhead, wherein the vapor distribution showerhead has one or more outlets for directing the vaporized dielectric material towards a substrate, and particularly wherein the energy source emits electrons or photons, wherein the electrons or photons melt and evaporate the dielectric material or sublimate the dielectric material. The arrangement further includes a plasma source configured for providing a plasma between the vapor distribution showerhead and the substrate.
摘要翻译：描述了用于将电介质材料蒸发到基底上的沉积布置。沉积装置包括蒸气分配喷头，用于在蒸气分配喷头中提供电介质材料的保持器，其中保持器具有用于将电介质材料馈送到蒸气分配喷头中的馈送单元，被配置用于熔化和蒸发介电材料的能量源在蒸气分配淋浴喷头中或升华蒸气分配淋浴喷头中的介电材料，其中蒸气分配喷头具有一个或多个出口，用于将蒸发的介电材料引向基板，特别是其中能量源发射电子或光子，其中电子或光子熔化和蒸发电介质材料或使电介质材料升华。该装置还包括等离子体源，其构造成在蒸气分配喷头和衬底之间提供等离子体。

26. 发明授权

US09130238B2 Methods of and hybrid factories for thin-film battery manufacturing 有权
标题翻译：薄膜电池制造方法和混合工厂
公开(公告)号：US09130238B2
公开(公告)日：2015-09-08
申请号：US13157651
申请日：2011-06-10
申请人： Byung-Sung Kwak , Stefan Bangert , Dieter Haas , Omkaram Nalamasu
发明人： Byung-Sung Kwak , Stefan Bangert , Dieter Haas , Omkaram Nalamasu
IPC分类号： H01M6/00 , C23F1/08 , C23C16/448 , H01M10/04 , H01M4/04 , H01M4/134 , H01M4/1395 , H01M4/38 , H01M10/052 , H01M6/18 , H01M6/50 , H01M6/40
CPC分类号： H01M10/0436 , H01M4/0423 , H01M4/0426 , H01M4/134 , H01M4/1395 , H01M4/382 , H01M6/188 , H01M6/40 , H01M6/50 , H01M10/0404 , H01M10/052 , Y02E60/122 , Y02P70/54
摘要： Methods of and hybrid factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A hybrid factory includes one or more tool sets for fabricating a thin-film battery.
摘要翻译：描述了薄膜电池制造的方法和混合工厂。一种方法包括制造薄膜电池的操作。混合工厂包括一个或多个用于制造薄膜电池的工具组。

27. 发明授权

US08733277B2 Mask support, mask assembly, and assembly comprising a mask support and a mask 有权
标题翻译：掩模支撑，面罩组装和组件，其包括掩模支架和掩模
公开(公告)号：US08733277B2
公开(公告)日：2014-05-27
申请号：US12988499
申请日：2008-12-01
申请人： Heike Landgraf , Uwe Schussler , Stefan Bangert
发明人： Heike Landgraf , Uwe Schussler , Stefan Bangert
IPC分类号： B05C11/00 , B23P11/02 , B23P11/00 , C23C14/04 , G03F7/12 , H05B33/10 , B05C21/00
CPC分类号： C23C14/042 , B05C21/005 , C23C14/04 , G03F7/12 , H05B33/10 , Y10T29/49826 , Y10T29/49863
摘要： A mask support 10 comprises a frame element 20 and an elastic element 30. The elastic element 30 is fixed to the frame element 20. The elastic element 30 is a component integrally formed of a flexible material. It comprises a lever or arm portion 37 having a first engagement protrusion 38 extending in an angle of approximately 90° from the free end of the arm portion 37. A mask assembly 40 comprises a laminar mask 41, e.g. manufactured from a thin metal foil, and connecting elements 42. The connecting elements 42 include an engagement portion 43 for engagement with the engagement protrusion 38 of the elastic element 30. The mask 41 may be attached/stretched to the mask support 10 as well as to detached from the mask support 10 comfortably.
摘要翻译：面罩支撑件10包括框架元件20和弹性元件30.弹性元件30固定到框架元件20.弹性元件30是由柔性材料整体形成的部件。它包括杠杆或臂部分37，其具有从臂部分37的自由端以大约90°的角度延伸的第一接合突出部38。由薄金属箔制成，以及连接元件42.连接元件42包括用于与弹性元件30的接合突起38接合的接合部分43.掩模41可以附着/拉伸到掩模支撑件10以及以便从面罩支撑件10舒适地脱离。

28. 发明授权

US08464419B2 Methods of and factories for thin-film battery manufacturing 有权
标题翻译：薄膜电池制造方法和工厂
公开(公告)号：US08464419B2
公开(公告)日：2013-06-18
申请号：US12882002
申请日：2010-09-14
申请人： Byung-Sung Kwak , Stefan Bangert , Dieter Haas , Omkaram Nalamasu
发明人： Byung-Sung Kwak , Stefan Bangert , Dieter Haas , Omkaram Nalamasu
IPC分类号： B23P19/00 , C23C16/00
CPC分类号： H01M10/0404 , H01M4/621 , H01M6/40 , H01M10/052 , H01M10/0585 , Y02E60/122 , Y02P70/54 , Y10T29/52
摘要： Methods of and factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A factory includes one or more tool sets for fabricating a thin-film battery.
摘要翻译：描述了薄膜电池制造的方法和工厂。一种方法包括制造薄膜电池的操作。工厂包括用于制造薄膜电池的一个或多个工具组。

29. 发明申请

US20120312474A1 METHODS OF AND HYBRID FACTORIES FOR THIN-FILM BATTERY MANUFACTURING 有权
标题翻译：薄膜电池制造和混合工艺方法
公开(公告)号：US20120312474A1
公开(公告)日：2012-12-13
申请号：US13157651
申请日：2011-06-10
申请人： Byung-Sung Kwak , Stefan Bangert , Dieter Haas , Omkaram Nalamasu
发明人： Byung-Sung Kwak , Stefan Bangert , Dieter Haas , Omkaram Nalamasu
IPC分类号： C23F1/08 , C23C16/448
CPC分类号： H01M10/0436 , H01M4/0423 , H01M4/0426 , H01M4/134 , H01M4/1395 , H01M4/382 , H01M6/188 , H01M6/40 , H01M6/50 , H01M10/0404 , H01M10/052 , Y02E60/122 , Y02P70/54
摘要： Methods of and hybrid factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A hybrid factory includes one or more tool sets for fabricating a thin-film battery.
摘要翻译：描述了薄膜电池制造的方法和混合工厂。一种方法包括制造薄膜电池的操作。混合工厂包括一个或多个用于制造薄膜电池的工具组。

30. 发明授权

US08137510B2 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US08137510B2
公开(公告)日：2012-03-20
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
IPC分类号： C23C14/00
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

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