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21. 发明申请

US20080125903A1 Semiconductor production system 失效
标题翻译：半导体生产系统
公开(公告)号：US20080125903A1
公开(公告)日：2008-05-29
申请号：US12010279
申请日：2008-01-23
申请人： Hidemitsu Naya , Rikio Tomiyoshi , Shigeo Moriyama , Mutsumi Kikuchi , Kotaro Shimamura
发明人： Hidemitsu Naya , Rikio Tomiyoshi , Shigeo Moriyama , Mutsumi Kikuchi , Kotaro Shimamura
IPC分类号： G06F17/00
CPC分类号： H01L21/67225 , G03F7/70508 , G03F7/70991 , G05B19/418 , G05B19/41855 , G05B2219/31323 , G05B2219/31326 , G05B2219/45031 , H01L21/67276 , H04L67/1097 , Y02P90/185 , Y02P90/24 , Y02P90/265
摘要： A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.
摘要翻译：半导体制造系统具有具有曝光单元的半导体制造装置，用于控制曝光单元的控制单元和存储装置; 具有观察单元的半导体检查装置，用于控制观察单元的控制单元和存储装置; 以及半导体制造装置和半导体检查装置通常使用的存储装置。制造装置，检查装置和常用的存储装置经由存储区域网互连。随着半导体制造装置和存储装置经由存储区域网络连接在一起，可以高速地传送大量图像数据或设计数据，从而提高系统吞吐量。

22. 发明申请

US20070027569A1 Semiconductor production system 审中-公开
标题翻译：半导体生产系统
公开(公告)号：US20070027569A1
公开(公告)日：2007-02-01
申请号：US11543204
申请日：2006-10-05
申请人： Hidemitsu Naya , Rikio Tomiyoshi , Shigeo Moriyama , Mutsumi Kikuchi , Kotaro Shimamura
发明人： Hidemitsu Naya , Rikio Tomiyoshi , Shigeo Moriyama , Mutsumi Kikuchi , Kotaro Shimamura
IPC分类号： G06F19/00
CPC分类号： H01L21/67225 , G03F7/70508 , G03F7/70991 , G05B19/418 , G05B19/41855 , G05B2219/31323 , G05B2219/31326 , G05B2219/45031 , H01L21/67276 , H04L67/1097 , Y02P90/185 , Y02P90/24 , Y02P90/265
摘要： A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.
摘要翻译：半导体制造系统具有具有曝光单元的半导体制造装置，用于控制曝光单元的控制单元和存储装置; 具有观察单元的半导体检查装置，用于控制观察单元的控制单元和存储装置; 以及半导体制造装置和半导体检查装置通常使用的存储装置。制造装置，检查装置和常用的存储装置经由存储区域网互连。随着半导体制造装置和存储装置经由存储区域网络连接在一起，可以高速地传送大量图像数据或设计数据，从而提高系统吞吐量。

23. 发明授权

US5981399A Method and apparatus for fabricating semiconductor devices 失效
标题翻译：用于制造半导体器件的方法和装置
公开(公告)号：US5981399A
公开(公告)日：1999-11-09
申请号：US894308
申请日：1997-08-14
申请人： Yoshio Kawamura , Tatuharu Yamamoto , Shigeo Moriyama , Yoshifumi Kawamoto , Natsuki Yokoyama , Fumihiko Uchida , Minoru Hidaka , Miyako Matsui
发明人： Yoshio Kawamura , Tatuharu Yamamoto , Shigeo Moriyama , Yoshifumi Kawamoto , Natsuki Yokoyama , Fumihiko Uchida , Minoru Hidaka , Miyako Matsui
IPC分类号： B65G49/07 , H01L21/00 , H01L21/677
CPC分类号： H01L21/67167 , H01L21/67196 , H01L21/67742 , H01L21/67748
摘要： A semiconductor device fabrication apparatus having multiple processing chambers for different processes, where a substrate is carried in and out in a sophisticated manner, with their different internal ambient conditions being retained, so that the substrate is free from contamination, thereby manufacturing high-quality semiconductor devices at high throughput. The apparatus includes a movable buffer chamber having a wafer carriage means within a transfer chamber which faces a process chamber, an evacuation means which evacuates of gas the buffer chamber, transfer chamber and process chamber independently, a gas feed means, and a control means.
摘要翻译： PCT No.PCT / JP95 / 00210 Sec。 371日期1997年8月14日 102（e）日期1997年8月14日PCT提交1995年2月15日PCT公布。公开号WO96 / 25760 PCT 日期1996年8月22日一种半导体器件制造装置，具有用于不同工艺的多个处理室，其中衬底以复杂的方式进出，同时保持其不同的内部环境条件，使得衬底没有污染，从而以高产量制造高品质半导体器件。该装置包括可移动缓冲室，其具有面向处理室的传送室内的晶片托架装置，独立地排出缓冲室，传送室和处理室的气体的抽气装置，气体供给装置和控制装置。

24. 发明授权

US5107628A Method of fabricating article having aspheric figure and tool for use in carrying out the method 失效
标题翻译：制作具有平面图的文章的方法和用于实施方法的工具
公开(公告)号：US5107628A
公开(公告)日：1992-04-28
申请号：US390107
申请日：1989-08-07
申请人： Yoshimasa Kondo , Shigeo Moriyama , Akira Arimoto , Koji Takahashi , Kenichi Kugai
发明人： Yoshimasa Kondo , Shigeo Moriyama , Akira Arimoto , Koji Takahashi , Kenichi Kugai
IPC分类号： B24B13/00 , B24B13/06
CPC分类号： B24B13/06
摘要： A method of and apparatus for fabricating an article having an aspheric figure, wherein the three-dimensional positional relationship between a work and a grinding spindle as a processing tool is controlled in terms of a polar coordinate system. The grinding spindle extends in a plane which is perpendicular to the direction of rotation of said work and is made to swing along an arcuate path. The distance between the axis of rotation of the work and the axis of the swing of the grinding spindle is changed in relation to the rotational angular position of the work.
摘要翻译：一种用于制造具有非球面图形的制品的方法和装置，其中工件与作为加工工具的磨削主轴之间的三维位置关系是根据极坐标系进行控制的。研磨主轴在与所述工件的旋转方向垂直的平面中延伸并且沿着弓形路径摆动。工件的旋转轴线与磨削主轴的摆动轴线之间的距离相对于工件的旋转角度位置而改变。

25. 发明授权

US4358198A Apparatus for moving table on stage 失效
标题翻译：用于在舞台上移动桌子的装置
公开(公告)号：US4358198A
公开(公告)日：1982-11-09
申请号：US188511
申请日：1980-09-18
申请人： Shigeo Moriyama , Tatsuo Harada , Masaaki Ito
发明人： Shigeo Moriyama , Tatsuo Harada , Masaaki Ito
IPC分类号： B26D7/20 , B23Q1/26 , B23Q1/62 , G02B21/32 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/68 , H05K13/00 , G03B27/42
CPC分类号： G03F7/70716 , B23Q1/26 , B23Q1/621 , G02B21/32 , H01L21/30 , H05K13/0015
摘要： An apparatus for moving a table or a stage having movable parts adapted to be guided by guide rail means slidingly and rectilinearly. At least the movable parts are made of a non-iron light metal material. The sliding surfaces of the movable parts making sliding contact with the guide rail means are made of a self-lubricating material, while the sliding surfaces of the guide rail means making sliding contact with the movable parts are made of a material having a higher hardness and wear resistance than the non-iron light metal material, so that the weight of at least the movable parts is reduced to decrease the weight of the apparatus as a whole.
摘要翻译：一种用于移动桌子或台架的装置，其具有适于被导轨装置滑动且直线地引导的可移动部件。至少可移动部件由非铁轻金属材料制成。与导轨装置滑动接触的可移动部件的滑动表面由自润滑材料制成，而与可移动部件滑动接触的导轨装置的滑动表面由具有较高硬度的材料制成，耐磨性比非铁轻金属材料低，使得至少可移动部件的重量减小，从而降低整体装置的重量。

26. 发明授权

US5609511A Polishing method 失效
标题翻译：抛光方法
公开(公告)号：US5609511A
公开(公告)日：1997-03-11
申请号：US421247
申请日：1995-04-13
申请人： Shigeo Moriyama , Yoshio Kawamura , Yoshio Homma , Kikuo Kusukawa , Takeshi Furusawa
发明人： Shigeo Moriyama , Yoshio Kawamura , Yoshio Homma , Kikuo Kusukawa , Takeshi Furusawa
IPC分类号： B23Q17/24 , B24B49/04 , B24B49/12 , B24D7/12 , H01L21/304 , B24B49/00 , B24B51/00
CPC分类号： B24B37/013 , B24B49/12 , B24D7/12
摘要： Disclosed is a method of polishing a thin film layer to be polished, which is formed on the surface of a substrate, by pressing the substrate on the surface of a polishing pad and relatively moving the substrate and the polishing pad, the method comprising the steps of: detecting the position of a front surface of the thin film layer to be polished using a first sensor and also detecting the position of a bottom surface of the thin film layer using a second sensor, on the way of the polishing; calculating the residual thickness of the thin film layer on the basis of the detected positions of the front and bottom surfaces of the thin film layer; and controlling the processing condition of the subsequent polishing on the basis of the calculated residual thickness of the thin film layer.
摘要翻译：本发明公开了一种通过将基板压在抛光垫的表面上并使基板和抛光垫相对移动而形成在基板表面上的抛光薄膜层的方法，该方法包括步骤使用第一传感器检测待研磨的薄膜层的前表面的位置，并且在抛光的同时使用第二传感器检测薄膜层的底面的位置; 基于检测到的薄膜层的前表面和底表面的位置计算薄膜层的剩余厚度; 并根据计算出的薄膜层的残留厚度来控制后续研磨的处理条件。

27. 发明授权

US5563465A Actuator 失效
标题翻译：执行器
公开(公告)号：US5563465A
公开(公告)日：1996-10-08
申请号：US225978
申请日：1994-04-12
申请人： Hitoshi Nakahara , Masakazu Ichikawa , Yuishin Tanaka , Sakae Saitou , Shigeo Moriyama
发明人： Hitoshi Nakahara , Masakazu Ichikawa , Yuishin Tanaka , Sakae Saitou , Shigeo Moriyama
IPC分类号： H02N2/00 , H01L41/09 , H01L41/08
CPC分类号： H02N2/026 , H02N2/0025 , H02N2/067
摘要： An actuator includes piezo electric devices which are installed in contact with a drive head and a driven body which is contact-driven by the drive head. Thus, only one mechanism performs coarse motion and micromotion by forming a gap between the drive head and driven body. The high precision positioning mechanism can be miniaturized and constructed at a low price.
摘要翻译：致动器包括安装成与驱动头接触的压电装置和由驱动头接触驱动的从动体。因此，只有一个机构通过在驱动头和被驱动体之间形成间隙来执行粗略运动和微动作。高精度定位机构可以以低价格小型化和建造。

28. 发明授权

US5411430A Scanning optical device and method for making a hybrid scanning lens used therefor 失效
标题翻译：用于制造用于其的混合扫描透镜的扫描光学装置和方法
公开(公告)号：US5411430A
公开(公告)日：1995-05-02
申请号：US950687
申请日：1992-09-25
申请人： Takashi Nishimura , Akira Arimoto , Yoshinori Miyamura , Yumiko Anzai , Yoshimasa Kondo , Fumihiko Uchida , Shigeo Moriyama
发明人： Takashi Nishimura , Akira Arimoto , Yoshinori Miyamura , Yumiko Anzai , Yoshimasa Kondo , Fumihiko Uchida , Shigeo Moriyama
IPC分类号： B23Q1/48 , B23Q1/54 , B24B13/06 , B41J2/47 , G02B26/12 , G05B19/18 , B24B49/00
CPC分类号： B23Q1/5406 , B23Q1/4852 , B24B13/06 , B41J2/471 , G02B26/125 , G05B19/184 , G05B2219/45157
摘要： The present invention provides a hybrid lens having an axially asymmetrical non-spherical shape, good mass productivity, and excellent shape precision surface precision as well as environment resistant property, and a method for fabricating same, as well as a method and a device for a laser printer using that hybrid lens. In particular, there are disclosed a method, by which, when an axially asymmetrical non-spherical convex lens is formed by the replica method, the shape thereof is transcribed with a high precision, as well as a method and a device for fabricating an axially asymmetrical non-spherical concave lens (female die) serving as an original for the transcription. In a device for fabricating a female die by direct grinding, the positions of a rotation axis of an object to be worked and a rotation axis of a grinding wheel are controlled and it has further a function of correcting mounting errors, when the object to be worked and the grinding wheel are mounted.
摘要翻译：本发明提供一种具有轴对称非球面形状，良好的质量生产率和优异的形状精度表面精度以及耐环境性能的混合透镜及其制造方法，以及用于激光打印机使用该混合镜头。特别地，公开了一种方法，当通过复制方法形成轴向不对称非球面凸透镜时，其形状被高精度地转录，以及用于制造轴向非球面凸透镜的方法和装置不对称非球面凹透镜（女模）用作转录的原件。在通过直接研磨制造阴模的装置中，控制被加工物的旋转轴的位置和砂轮的旋转轴的位置，并且还具有校正安装误差的功能，当要被加工的物体工作，砂轮安装。

29. 发明授权

US4818351A Method for the surface treatment of an iron or iron alloy article 失效
标题翻译：铁或铁合金制品的表面处理方法
公开(公告)号：US4818351A
公开(公告)日：1989-04-04
申请号：US80828
申请日：1987-07-24
申请人： Tohru Arai , Hironori Fujita , Yoshihiko Sugimoto , Yukio Ohta , Shigeo Moriyama , Akira Sato
发明人： Tohru Arai , Hironori Fujita , Yoshihiko Sugimoto , Yukio Ohta , Shigeo Moriyama , Akira Sato
IPC分类号： C23C12/02 , C23C8/32
CPC分类号： C23C12/02
摘要： A surface layer which is composed of the carbonitride of at least one of vanadium and chromium is formed on an article made of iron or an iron alloy if the article, a material containing at least one of vanadium and chromium and a treating agent are heated together. The treating agent may be composed of at least one of the cyanides and cyanates of alkali metals and alkaline earth metals. The layer adhering closely to the article can be formed efficiently at a temperature which is so low that virtually no thermal strain may develop in the article.
摘要翻译：如果将含有钒和铬中的至少一种的材料和处理剂一起加热到一起，则在由铁或铁合金制成的制品上形成由钒和铬中的至少一种的碳氮化物组成的表面层。处理剂可以由碱金属和碱土金属的氰化物和氰酸盐中的至少一种组成。可以在如此低的温度下有效地形成附着在制品上的层，实际上在制品中几乎不产生热应变。

30. 发明授权

US4045141A Photoelectric microscope 失效
标题翻译：光电显微镜
公开(公告)号：US4045141A
公开(公告)日：1977-08-30
申请号：US695556
申请日：1976-06-14
申请人： Shigeo Moriyama , Yoshio Kawamura
发明人： Shigeo Moriyama , Yoshio Kawamura
IPC分类号： G01B9/04 , G01B11/02
CPC分类号： G01B9/04 , G01B11/02
摘要： Description is made of improvements in a photoelectric microscope which is employed for the measurement of a very small distance. According to this invention, an optical system for making point-symmetric images is disposed in an optical path of an objective of a photoelectric microscope so as to form on an identical focal plane a pair of (two) images of a reference line (or mark) on a test piece which are in the relation of point symmetry to each other, and the distance between the pair of (two) images is measured, whereby the deviating distance of the reference line (or mark) on the test piece from the optic axis of the objective is evaluated. The distance between the pair of images is evaluated by gauging the time difference between two detection signals which are obtained by scanning the pair of images at equal speeds with photoelectric detectors.
摘要翻译：描述用于测量非常小距离的光电显微镜的改进。根据本发明，用于制造点对称图像的光学系统设置在光电显微镜的物镜的光路中，以便在同一焦平面上形成参考线（或标记）的一对（两个）图像），并且测量一对（两个）图像之间的距离，由此测试片上的参考线（或标记）与光学元件的偏离距离评估目标轴。通过测量通过用光电检测器以等速扫描一对图像而获得的两个检测信号之间的时间差来评估该对图像之间的距离。

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