专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US06602646B1 Positive-working resist composition 有权
标题翻译：正面抗蚀剂组成
公开(公告)号：US06602646B1
公开(公告)日：2003-08-05
申请号：US09684888
申请日：2000-10-06
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： The present invention provides a high sensitivity chemically amplified positive-working resist composition which eliminates edge roughness on pattern and provides an excellent resist pattern profile. A novel positive-working resist composition is provided comprising (A) a resin containing an alkali-soluble group protected by at least one of moieties containing alicyclic hydrocarbon represented by general formulae (pI) to (pVI) and having a monomer component content of 5% or less of the total pattern area as determined by gel permeation chromatography (GPC), which increases in its solution velocity with respect to an alkaline developer by the action of an acid and (B) a compound which is capable of generating an acid by irradiation with an active ray or radiation.
摘要翻译：本发明提供一种消除图案上的边缘粗糙度并提供优异的抗蚀剂图案轮廓的高灵敏度化学放大正性抗蚀剂组合物。提供了一种新型的正性抗蚀剂组合物，其包含（A）含有由至少一个含有由通式（pI）至（pVI）表示的脂环族烃部分并且单体组分含量为5的部分保护的碱溶性基团的树脂通过凝胶渗透色谱法（GPC）确定的总图案面积的百分比或更少，其通过酸的作用相对于碱性显影剂的溶液速度增加，和（B）能够产生酸的化合物用活性射线或辐射照射。

22. 发明授权

US06576392B1 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06576392B1
公开(公告)日：2003-06-10
申请号：US09456827
申请日：1999-12-06
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hidekazu Ohashi
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hidekazu Ohashi
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition comprising a photo-acid gererator and a specific resin. The resin contains repeating units each having a group represented by formula (I): —SO2—O—R wherein R represents an optionally substituted alkyl, cycloalkyl, or alkenyl group and comes to have an increased rate of dissolution in an alkaline developing solution by the action of an acid, or contains alkali-soluble groups protected by partial structures containing an alicyclic hydrocarbon and represented by at least one of formulae (pI) to (pVI) defined in the specification and which decomposes by the action of an acid to have enhanced solubility in an alkali. The latter is used in combination with a compound which decomposes by the action of an acid to generate a sulfonic acid.
摘要翻译：一种正型光致抗蚀剂组合物，其包含光酸注射器和特定树脂。树脂含有各自具有由式（I）表示的基团的重复单元：其中R表示任选取代的烷基，环烷基或烯基，并且通过酸的作用使碱显影溶液的溶解速率增加，或含有由说明书中定义的至少一种式（pI）至（pVI）表示的含有脂环族烃的部分结构保护的碱溶性基团，其通过酸的作用而分解，从而具有增强的在碱中的溶解度。后者与通过酸的作用分解以产生磺酸的化合物组合使用。

23. 发明授权

US06517991B1 Positive photosensitive composition 失效
公开(公告)号：US06517991B1
公开(公告)日：2003-02-11
申请号：US09606681
申请日：2000-06-30
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III) as described in the specification or (B-2) a resin having at least one monovalent polyalicyclic group represented by formula (Ib) as described in the specification and a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution. The positive photosensitive composition containing the resin according to the present invention has high transmittance to far ultraviolet light particularly having a wavelength of 220 nm or less and exhibits good dry etching resistance. Further, the positive photosensitive composition exhibits high sensitivity, good resolution and good pattern profile when far ultraviolet light having a wavelength of 250 nm or less, particularly 220 nm or less (especially an ArF excimer laser beam) is employed as an exposure light source, and thus it can be effectively employed for the formation of fine pattern necessary for the production of semiconductor elements.

24. 发明授权

US6138263A Error correcting method and apparatus for information data having error correcting product code block 失效
标题翻译：具有纠错产品代码块的信息数据的纠错方法和装置
公开(公告)号：US6138263A
公开(公告)日：2000-10-24
申请号：US55911
申请日：1998-04-07
申请人： Kunihiko Kodama
发明人： Kunihiko Kodama
IPC分类号： G06F11/10 , G11B20/10 , G11B20/18 , H03M13/00 , H03M13/15 , H03M13/27 , H03M13/29
CPC分类号： H03M13/293 , G11B20/1813 , H03M13/00 , H03M13/15 , H03M13/151 , H03M13/29 , H03M13/2909 , G11B20/10527 , H03M13/1515
摘要： When the number of pieces of error position information detected by using one symbol, of internal and external symbols constituting an error correcting code added to information data, which has a data sequence substantially corresponding to the reception order of the information data exceeds the erasure correcting ability based on the other symbol, error position information is selected upon weighting based on the continuity of the error position information in consideration of the fact that burst error position information exhibits high continuity. By selecting error position information upon weighting based on continuity, erasure correction, which cannot be performed in the prior art, can be performed.
摘要翻译：当通过使用一个符号，构成添加到信息数据的纠错码的内部和外部符号检测到的具有与信息数据的接收顺序基本对应的数据序列的错误位置信息的数量超过了擦除校正能力基于另一符号，考虑到突发错误位置信息表现出高连续性的事实，基于误差位置信息的连续性加权来选择错误位置信息。通过基于连续性加权来选择错误位置信息，可以执行在现有技术中不能执行的擦除校正。

25. 发明授权

US5981140A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5981140A
公开(公告)日：1999-11-09
申请号：US932168
申请日：1997-09-17
申请人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/121 , Y10S430/122
摘要： A positive photosensitive composition comprising:a compound represented by formula (I) or (I') and a compound represented by formula (II) as compounds which generate a sulfonic acid upon irradiation with actinic rays or radiation: ##STR1## The substituents in these formulae are as defined in the specification. The positive photosensitive composition has high sensitivity and high resolving power, undergoes neither a decrease in resist pattern line width nor the formation of a T-top resist pattern surface with the lapse of time from exposure to heat treatment, and exhibits less profile deterioration such as residual standing wave and collapse.
摘要翻译：一种正型光敏组合物，其包含：由式（I）或（I'）表示的化合物和由式（II）表示的化合物作为在光化射线或辐射照射时产生磺酸的化合物：这些式中的取代基为在规范中定义。正型感光性组合物具有高灵敏度和高分辨能力，经历曝光与热处理后的时间不会影响抗蚀剂图案线宽度的降低和T型抗蚀剂图形表面的形成，并且表现出较小的轮廓劣化，例如残余驻波和崩溃。

26. 发明授权

US5553041A Disc data reproducing apparatus and signal processing unit for preventing underflow and overflow 失效
标题翻译：光盘数据再现装置和用于防止下溢和溢出的信号处理单元
公开(公告)号：US5553041A
公开(公告)日：1996-09-03
申请号：US419272
申请日：1995-04-10
申请人： Jun Inagawa , Masahide Nagumo , Kunihiko Kodama
发明人： Jun Inagawa , Masahide Nagumo , Kunihiko Kodama
IPC分类号： G11B7/00 , G06F5/06 , G11B7/005 , G11B7/09 , G11B19/02 , G11B19/28 , G11B20/10 , G11B20/14 , H01L27/10
CPC分类号： G11B20/10527 , G06F5/06 , G11B19/02 , G11B20/10 , G06F2205/061 , G11B2020/10814 , G11B2020/10824 , G11B7/0946
摘要： An apparatus, a signal processing circuit and a method for reproducing data stored on a disc to prevent a buffer memory from going overflow/underflow. Writing information data read from the disc to the buffer memory is performed in synchronism with a reproduction stage clock signal, and reading from the buffer memory is in synchronism with a signal processing stage clock. The signal processing stage clock for reading information data from the buffer memory is changed in accordance with the amount of information data stored in the buffer memory for preventing interruptions in data reproduction.
摘要翻译：一种用于再现存储在盘上的数据以防止缓冲存储器上溢/下溢的装置，信号处理电路和方法。将从盘读取的信息数据写入缓冲存储器是与再现级时钟信号同步执行的，并且从缓冲存储器读取与信号处理级时钟同步。用于从缓冲存储器读取信息数据的信号处理级时钟根据存储在缓冲存储器中的用于防止数据再现中断的信息数据量而改变。

27. 发明授权

US09684233B2 Curable composition for imprints, patterning method and pattern 有权
公开(公告)号：US09684233B2
公开(公告)日：2017-06-20
申请号：US13509209
申请日：2010-11-10
申请人： Kunihiko Kodama
发明人： Kunihiko Kodama
IPC分类号： B32B3/10 , C08F2/46 , C08L83/00 , G03F7/00 , B82Y10/00 , B82Y40/00 , C08F220/22 , C08F220/30 , C08F230/08 , G03F7/004 , G03F7/027 , G03F7/075 , C08F222/10
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F220/22 , C08F220/30 , C08F222/1006 , C08F230/08 , G03F7/0046 , G03F7/027 , G03F7/0755 , Y10T428/24802
摘要： A curable composition for imprints, containing (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom, (A2) a polymerizable compound having an aromatic group and (B) a photopolymerization initiator, exhibits good patternability in repeated pattern transferring and solvent resistance.

28. 发明授权

US08883065B2 Curable composition for imprints, patterning method and pattern 有权
标题翻译：可印刷的组合物，图案化方法和图案
公开(公告)号：US08883065B2
公开(公告)日：2014-11-11
申请号：US13132717
申请日：2009-12-02
申请人： Kunihiko Kodama , Kyouhei Sakita , Hiroyuki Yonezawa
发明人： Kunihiko Kodama , Kyouhei Sakita , Hiroyuki Yonezawa
IPC分类号： B29C35/08 , C08F2/48 , C08F220/16 , B82Y40/00 , C09D4/00 , B82Y10/00 , G03F7/00
CPC分类号： C08F222/20 , B05D5/00 , B29C59/005 , B29K2033/04 , B29K2105/0085 , B82Y10/00 , B82Y40/00 , C08F2/48 , C08F220/18 , C08F222/14 , C08F222/24 , C09D4/00 , G03F7/0002 , G03F7/004
摘要： Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
摘要翻译：提供了具有良好的图案性和耐干蚀刻性的用于印痕的可固化组合物。公开了一种用于印痕的可固化组合物，其包含具有芳基且具有100以上分子量的取代基的可聚合单体（Ax）和光聚合引发剂。

29. 发明授权

US08877828B2 Method for producing curable composition for imprints 有权
标题翻译：印刷用固化性组合物的制造方法
公开(公告)号：US08877828B2
公开(公告)日：2014-11-04
申请号：US13371088
申请日：2012-02-10
申请人： Yuichiro Enomoto , Kunihiko Kodama , Shinji Tarutani
发明人： Yuichiro Enomoto , Kunihiko Kodama , Shinji Tarutani
IPC分类号： C08F2/46 , C08F20/18 , G03F7/00 , B82Y10/00 , G03F7/16 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16
摘要： Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).
摘要翻译：提供一种印刷用固化性组合物的制造方法，其包括（A）可聚合单体，（B）聚合引发剂和（C）可有效抑制图案的提升或分离，涂布性优异的溶剂和优异的在时间上依赖稳定。制备用于印记的可固化组合物的方法包括制备一种含有可聚合单体（A）和聚合引发剂（B）中的至少一种的液体（D），使液体（D）通过过滤器，以及然后加入溶剂（C）。

30. 发明授权

US08859071B2 Curable composition for imprint, patterning method and pattern 有权
标题翻译：用于印记，图案化方法和图案的可固化组合物
公开(公告)号：US08859071B2
公开(公告)日：2014-10-14
申请号：US12991082
申请日：2010-03-08
申请人： Kunihiko Kodama
发明人： Kunihiko Kodama
IPC分类号： B32B3/00 , C08F22/10 , C08F20/38 , C08F22/24 , C08F22/18 , G03F7/027 , B82Y40/00 , G03F7/004 , B82Y10/00 , C08F20/22 , G03F7/00
CPC分类号： C08F20/22 , B82Y10/00 , B82Y40/00 , C08F20/38 , C08F22/105 , C08F22/18 , C08F22/24 , G03F7/0002 , G03F7/0046 , G03F7/027 , Y10T428/24479 , Y10T428/24802 , Y10T428/3154
摘要： A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms.
摘要翻译：提供了一种用于印刷的可固化组合物，其图案性和线边缘粗糙度优异。用于印迹的可固化组合物包含至少一种可聚合单体（A）和至少一种光聚合引发剂（B）。可聚合单体（A）包含至少两个选自氟代烷基和氟代烷基醚的含氟基团，并且两个含氟基团中的每一个通过具有至少两个碳原子的连接基彼此连接。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式