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1. 发明授权

US06576392B1 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06576392B1
公开(公告)日：2003-06-10
申请号：US09456827
申请日：1999-12-06
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hidekazu Ohashi
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Hidekazu Ohashi
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition comprising a photo-acid gererator and a specific resin. The resin contains repeating units each having a group represented by formula (I): —SO2—O—R wherein R represents an optionally substituted alkyl, cycloalkyl, or alkenyl group and comes to have an increased rate of dissolution in an alkaline developing solution by the action of an acid, or contains alkali-soluble groups protected by partial structures containing an alicyclic hydrocarbon and represented by at least one of formulae (pI) to (pVI) defined in the specification and which decomposes by the action of an acid to have enhanced solubility in an alkali. The latter is used in combination with a compound which decomposes by the action of an acid to generate a sulfonic acid.
摘要翻译：一种正型光致抗蚀剂组合物，其包含光酸注射器和特定树脂。树脂含有各自具有由式（I）表示的基团的重复单元：其中R表示任选取代的烷基，环烷基或烯基，并且通过酸的作用使碱显影溶液的溶解速率增加，或含有由说明书中定义的至少一种式（pI）至（pVI）表示的含有脂环族烃的部分结构保护的碱溶性基团，其通过酸的作用而分解，从而具有增强的在碱中的溶解度。后者与通过酸的作用分解以产生磺酸的化合物组合使用。

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