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21. 发明授权

US06420082B1 Positive resist fluid and positive resist composition 有权
标题翻译：正抗蚀液和正光刻胶组成
公开(公告)号：US06420082B1
公开(公告)日：2002-07-16
申请号：US09438789
申请日：1999-11-12
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/107 , Y10S430/111
摘要： The present invention provides a positive resist fluid excellent in the storage stability of the fluid and in defocus latitude depended on line pitch, and a positive photoresist composition for far ultraviolet exposure which forms a resist pattern having excellent defocus latitude depended on line pitch and has excellent sensitivity to short-wavelength exposure lights. The positive resist fluid comprises a resin which contains repeating units represented by formula (I) as defined in the specification, a photo-acid generator, and a solvent and the positive photoresist composition for far ultraviolet exposure comprises a resin which contains both alkali-soluble groups protected by groups containing an alicyclic hydrocarbon structure and represented by at least one of formulae (pI) to (pVI) and groups represented by formula (qI): —A—X—R5 as defined in the specification.
摘要翻译：本发明提供一种在流体的保存稳定性和取决于线间距的散焦纬度方面优异的正性抗蚀剂流体和用于远紫外线曝光的正性光致抗蚀剂组合物，其形成具有优异的散焦纬度的抗蚀图案，其依赖于线间距，并且具有优异的对短波长曝光灯的敏感度。正型抗蚀剂流体包括含有本说明书中定义的式（I）表示的重复单元的树脂，光酸产生剂和溶剂，并且用于远紫外线照射的正性光致抗蚀剂组合物包含含有碱溶性的树脂由含有脂环族烃结构的基团保护并且由式（pI）至（pVI）中的至少一个表示的基团和由式（qI）表示的基团保护的基团：如说明书中所定义。

22. 发明授权

US06777160B2 Positive-working resist composition 有权
标题翻译：正面抗蚀剂组成
公开(公告)号：US06777160B2
公开(公告)日：2004-08-17
申请号：US10093411
申请日：2002-03-11
申请人： Kenichiro Sato , Kunihiko Kodama
发明人： Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.
摘要翻译：一种正性抗蚀剂组合物，其包含（A）具有脂族环状烃基的特定树脂，并且通过酸的作用在碱性显影液中的溶解速度提高，（B）通过照射产生酸的特定化合物的光化射线或辐射。该组合物的分辨能力和曝光余量优异，并且可以适用于使用远紫外线，特别是ArF准分子激光束的微光制造。

23. 发明授权

US06692884B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06692884B2
公开(公告)日：2004-02-17
申请号：US10116137
申请日：2002-04-05
申请人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Toru Fujimori , Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106
摘要： A positive photoresist composition comprises: a compound capable of generating an acid upon irradiation with an actinic ray or a radiation, in which the compound contains (A1) a sulfonate compound of a sulfonium, and (A2) a sulfonate compound of an N-hydroxyimide or a disulfonyldiazomethane compound; and a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developing solution, in which the resin contains a repeating unit having a specific lactone structure.
摘要翻译：正型光致抗蚀剂组合物包括：在光化学射线或辐射照射时能够产生酸的化合物，其中该化合物含有（A1）锍磺酸盐化合物，和（A2）N-羟基酰亚胺的磺酸盐化合物或二磺酰基重氮甲烷化合物; 以及能够通过酸的作用分解以增加在碱性显影液中的溶解度的树脂，其中树脂含有具有特定内酯结构的重复单元。

24. 发明授权

US06596458B1 Positive-working photoresist composition 有权
标题翻译：正光刻胶组合物
公开(公告)号：US06596458B1
公开(公告)日：2003-07-22
申请号：US09563436
申请日：2000-05-03
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Yasumasa Kawabe
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai , Yasumasa Kawabe
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/111
摘要： Disclosed is a positive-working photoresist composition having reduced development defects, and excellent in resist pattern profiles and in the resolving power of contact holes, which comprises (i) a compound generating an acid by irradiation of active light or radiation, and (ii) a resin containing repeating units of at least one kind selected from the group consisting of (a) repeating units having alkali-soluble groups each protected with at least one group selected from the group consisting of groups containing alicyclic hydrocarbon structures represented by specific general formulas (pI) to (pVI), (b) repeating units represented by specific general formula (II) and (c) repeating units represented by specific general formulas (III-a) to (III-d), and decomposed by the action of an acid to increase the solubility of the resin into an alkali.
摘要翻译：公开了具有减少的显影缺陷，抗蚀剂图案轮廓和接触孔分辨能力优异的正性光致抗蚀剂组合物，其包括（i）通过活性光或辐射的照射产生酸的化合物，和（ii）含有重复单元的树脂，所述重复单元选自（a）具有碱溶性基团的重复单元，各自被至少一个选自由特定通式表示的脂环族烃结构的基团所选择的基团保护的基团 pI）至（pVI），（b）由特定通式（II）表示的重复单元和（c）由特定通式（III-a）至（III-d）表示的重复单元，并通过酸以增加树脂在碱中的溶解度。

25. 发明授权

US06544715B2 Positive photoresist composition for far ultraviolet ray exposure 有权
公开(公告)号：US06544715B2
公开(公告)日：2003-04-08
申请号：US09492848
申请日：2000-01-27
申请人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Toshiaki Aoai
IPC分类号： G03C173
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115
摘要： A positive photoresist composition for far ultraviolet ray exposure improved in standard developing solution suitability, good in defocus latitude depended on line pitch of a resist pattern formed and excellent in sensitivity to a light source of shorter wavelength, which comprises (i) a compound capable of generating an acid by irradiation of actinic light or radiation; and (ii) a resin containing (a) repeating units each having an alkali-soluble group protected with at least one specific group containing an alicyclic hydrocarbon structure, (b) repeating units having, for example, lactone rings, and (c) repeating units derived from (meth)acrylic acid, the content of the repeating units of (c) being from 5 mol % to 18 mol % based on the total repeating units of the resin, and the resin being decomposable by action of an acid to increase its solubility in an alkali solution.

26. 发明授权

US06506535B1 Positive working photoresist composition 失效
标题翻译：正工作光致抗蚀剂组成
公开(公告)号：US06506535B1
公开(公告)日：2003-01-14
申请号：US09698221
申请日：2000-10-30
申请人： Kazuyoshi Mizutani , Kenichiro Sato , Kunihiko Kodama
发明人： Kazuyoshi Mizutani , Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03C172
CPC分类号： G03F7/0758 , G03F7/0045 , G03F7/0395 , G03F7/0397 , Y10S430/106
摘要： Disclosed is a positive working photoresist composition comprising an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), and also disclosed is a positive working photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (B) an acid-decomposable polymer containing at least a repeating unit represented by the following formula (I) and at least either one repeating unit represented by the following formula (IIa) or (IIb), (C) at least one solvent capable of dissolving the components (A) and (B), (D) an organic basic compound and (E) at least one surfactant selected from fluorine-containing surfactants, silicon-containing surfactants and nonionic surfactants:
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含至少含有由下式（I）表示的重复单元和至少一种由下式（IIa）或（IIb）表示的重复单元的酸可分解聚合物，并且还公开是一种正性光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物，（B）至少含有由下式（I）表示的重复单元的酸可分解聚合物和至少由下式（IIa）或（IIb）表示的一个重复单元，（C）至少一种能够溶解组分（A）和（B）的溶剂，（D）有机碱性化合物和（E）一种选自含氟表面活性剂，含硅表面活性剂和非离子表面活性剂的表面活性剂：

27. 发明授权

US06410204B1 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06410204B1
公开(公告)日：2002-06-25
申请号：US09669907
申请日：2000-09-27
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0397 , Y10S430/122
摘要： A positive photoresist composition comprising (A) a compound which generates a sulfonic acid having naphthalene structure by the irradiation with actinic rays of a wavelength of 220 nm or less or radiation, and (B) a resin whose solubility in an alkali developing solution increases by the action of an acid is disclosed.
摘要翻译：一种正型光致抗蚀剂组合物，其包含（A）通过用波长为220nm以下的光化射线照射或辐射而产生具有萘结构的磺酸的化合物，和（B）在碱性显影溶液中的溶解度增加的树脂公开了酸的作用。

28. 发明授权

US6150068A Photosensitive resin composition for far-ultraviolet exposure 失效
标题翻译：用于远紫外线曝光的感光树脂组合物
公开(公告)号：US6150068A
公开(公告)日：2000-11-21
申请号：US911165
申请日：1997-08-14
申请人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/039 , G03F7/30 , H01L21/027 , B03F7/004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/121
摘要： A photosensitive resin composition for far-ultraviolet exposure of from 170 to 220 nm, which comprises an N-hydroxymaleinimide-type sulfonate photo acid generator having a specific structure and a resin having a substituent capable of increasing the solubility to an alkali developer by an acid, and a pattern forming method using the photosensitive resin composition. The photosensitive resin composition has a high transparency to light having a wavelength of from 170 to 220 nm and is excellent in the photocomposition property and the acid generating efficiency.
摘要翻译：一种用于远紫外线暴露于170至220nm的感光树脂组合物，其包含具有特定结构的N-羟基马来酰亚胺型磺酸盐光致酸产生剂和具有能够通过酸增加对碱性显影剂的溶解度的取代基的树脂，以及使用感光性树脂组合物的图案形成方法。感光性树脂组合物对波长为170〜220nm的光具有高透明性，并且光致变色性和酸产生效率优异。

29. 发明授权

US5629128A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5629128A
公开(公告)日：1997-05-13
申请号：US531081
申请日：1995-09-20
申请人： Koji Shirakawa , Kenichiro Sato , Kunihiko Kodama , Yasumasa Kawabe , Shinji Sakaguchi
发明人： Koji Shirakawa , Kenichiro Sato , Kunihiko Kodama , Yasumasa Kawabe , Shinji Sakaguchi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.
摘要翻译：描述了一种正型光致抗蚀剂组合物，其包含由下式（I）表示的多羟基化合物的碱溶性树脂和1,2-萘醌 - 二叠氮基-5-（和/或-4-）磺酸盐：（I）其中R 1至R 11相同或不同，并且各自表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或环烷基，条件是R 1至R 11中的至少一个 R11为环烷基; A表示-CH（R 12） - ，其中R 12表示氢原子或烷基; m表示2或3。

30. 发明授权

US08299055B2 8-substituted isoquinoline derivative and the use thereof 有权
标题翻译： 8-取代的异喹啉衍生物及其用途
公开(公告)号：US08299055B2
公开(公告)日：2012-10-30
申请号：US12571601
申请日：2009-10-01
申请人： Shunsuke Kaneko , Kenichiro Sato , Daisuke Shikanai , Rintaro Yamada , Katsuhiko Sakurada
发明人： Shunsuke Kaneko , Kenichiro Sato , Daisuke Shikanai , Rintaro Yamada , Katsuhiko Sakurada
IPC分类号： C07D401/12 , A61K31/47
CPC分类号： C07D401/12 , C07D217/02 , C07D401/10 , C07D401/14 , C07D405/14 , C07D409/14 , C07D413/12 , C07D413/14 , C07D417/14
摘要： The present invention relates to a compound represented by the following formula (1): wherein D1, A1, D2, R1, D3, and R2 each have the same meaning as defined in the present specification or a salt thereof. The compound represented by the formula (1) or a salt thereof has an IKKβ inhibiting activity and the like and is useful for the prevention and/or treatment of IKKβ-associated diseases or symptoms and the like.
摘要翻译：本发明涉及由下式（1）表示的化合物：其中D1，A1，D2，R1，D3和R2各自具有与本说明书中定义的相同的含义或其盐。由式（1）表示的化合物或其盐具有IKK＆bgr; 抑制活性等，并且可用于预防和/或治疗IKK和相关疾病或症状等。

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