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1. 发明授权

US5629128A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5629128A
公开(公告)日：1997-05-13
申请号：US531081
申请日：1995-09-20
申请人： Koji Shirakawa , Kenichiro Sato , Kunihiko Kodama , Yasumasa Kawabe , Shinji Sakaguchi
发明人： Koji Shirakawa , Kenichiro Sato , Kunihiko Kodama , Yasumasa Kawabe , Shinji Sakaguchi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.
摘要翻译：描述了一种正型光致抗蚀剂组合物，其包含由下式（I）表示的多羟基化合物的碱溶性树脂和1,2-萘醌 - 二叠氮基-5-（和/或-4-）磺酸盐：（I）其中R 1至R 11相同或不同，并且各自表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或环烷基，条件是R 1至R 11中的至少一个 R11为环烷基; A表示-CH（R 12） - ，其中R 12表示氢原子或烷基; m表示2或3。

2. 发明授权

US5639587A Positive photoresist composition containing alkali soluble resins and quinonediazide ester mixture 失效
标题翻译：含有碱溶性树脂和醌二叠氮化物酯混合物的正性光致抗蚀剂组合物
公开(公告)号：US5639587A
公开(公告)日：1997-06-17
申请号：US615832
申请日：1996-03-14
申请人： Kenichiro Sato , Koji Shirakawa , Shinji Sakaguchi
发明人： Kenichiro Sato , Koji Shirakawa , Shinji Sakaguchi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023
CPC分类号： G03F7/022
摘要： A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at least one of 1,2-naphthoquinonediazidesulfonic ester of specific polyhydroxy compounds. The positive photoresist composition exhibits remarkably improved sensitivity and resolution, and broad development latitude regardless of the film thickness, and further, low film thickness dependence of resist performances.
摘要翻译：公开了一种正性光致抗蚀剂组合物，其包含碱溶性树脂，特定多羟基化合物的1,2-萘醌二叠氮化物磺酸单酯中的至少一种和特定多羟基化合物的1,2-萘醌二叠氮化物磺酸酯中的至少一种。正光致抗蚀剂组合物显示出显着提高的灵敏度和分辨率，并且广泛的开发纬度，而不管膜厚度如何，以及抗蚀剂性能的低膜厚依赖性。

3. 发明授权

US06489080B2 Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US06489080B2
公开(公告)日：2002-12-03
申请号：US09449899
申请日：1999-12-02
申请人： Kazuya Uenishi , Toru Fujimori , Kunihiko Kodama , Koji Shirakawa , Shiro Tan
发明人： Kazuya Uenishi , Toru Fujimori , Kunihiko Kodama , Koji Shirakawa , Shiro Tan
IPC分类号： G03F7027
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/0392 , G03F7/0397 , Y10S430/115
摘要： The present invention provides a positive electron beam or X-ray resist composition containing (a) a compound which generates an acid by the irradiation with radiation and (b) a compound having a cationic polymerizable function. The positive electron beam or X-ray resist composition is high sensitivity, has high resolution, can provide an excellent rectangular pattern profile, and is excellent in PCD stability and PED stability.
摘要翻译：本发明提供一种正电子束或X射线抗蚀剂组合物，其含有（a）通过辐射照射产生酸的化合物和（b）具有阳离子可聚合官能团的化合物。正电子束或X射线抗蚀剂组成灵敏度高，分辨率高，可提供优异的矩形图案，PCD稳定性和PED稳定性优异。

4. 发明申请

US20120094235A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
公开(公告)号：US20120094235A1
公开(公告)日：2012-04-19
申请号：US13320116
申请日：2010-05-20
申请人： Toru Tsuchihashi , Hideaki Tsubaki , Koji Shirakawa , Hidenori Takahashi , Tomotaka Tsuchimura
发明人： Toru Tsuchihashi , Hideaki Tsubaki , Koji Shirakawa , Hidenori Takahashi , Tomotaka Tsuchimura
IPC分类号： G03F7/20 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below.
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包括其在碱性显影剂中的溶解度通过酸的作用而增加的树脂（A），所述树脂包含任何通式（AI）的单元，和下述通式（AII）的任何单元和当暴露于光化射线或辐射时产生具有以下通式（BI）的任何结构的酸的化合物（B）。

5. 发明授权

US07361446B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07361446B2
公开(公告)日：2008-04-22
申请号：US10812074
申请日：2004-03-30
申请人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
发明人： Koji Shirakawa , Toru Fujimori , Shoichiro Yasunami
IPC分类号： G03C1/73 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（a）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，含有具有本说明书中定义的由式（X）表示的基团的结构单元，其重均分子量分子量不大于5000，并且基于酸分解基团的数量和未被酸保护的碱可溶性基团的总数，含有不大于40％的酸分解基团可分解基团，和（b）在光化射线或辐射照射时产生酸的化合物。

6. 发明授权

US06746813B2 Negative resist composition 有权
标题翻译：负阻抗组成
公开(公告)号：US06746813B2
公开(公告)日：2004-06-08
申请号：US10396583
申请日：2003-03-26
申请人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
发明人： Shoichiro Yasunami , Yutaka Adegawa , Koji Shirakawa
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , Y10S430/106
摘要： A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.
摘要翻译：一种负型抗蚀剂组合物，其包含（A-1）含有本说明书中定义的式（1）表示的重复单元的碱溶性树脂（A-2）含有式（2）表示的重复单元的碱溶性树脂，（B）通过酸的作用与碱溶性树脂（A-1）或（A-2）交联的交联剂，（C）在光化反应下产生酸的化合物射线或辐射，和（D）含氮碱性化合物。

7. 发明授权

US08900791B2 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition 有权
标题翻译：光化射线敏感或辐射敏感性树脂组合物和组合物形成图案的方法
公开(公告)号：US08900791B2
公开(公告)日：2014-12-02
申请号：US13071153
申请日：2011-03-24
申请人： Tomotaka Tsuchimura , Koji Shirakawa , Toru Tsuchihashi , Hideaki Tsubaki
发明人： Tomotaka Tsuchimura , Koji Shirakawa , Toru Tsuchihashi , Hideaki Tsubaki
IPC分类号： G03F7/004 , G03F7/028 , C07C309/25 , C07C309/28 , C07C309/42 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07D209/82 , C07D339/08 , G03F7/038 , G03F7/039
CPC分类号： C07C309/42 , C07C309/25 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/28 , C07C2602/42 , C07C2602/44 , C07C2603/24 , C07C2603/28 , C07C2603/74 , C07D209/82 , C07D339/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O)2— and —OS(═O)2—, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包含下列通式（I）的任何化合物; 其中：Ar表示可以具有除 - （A-B）基团以外的取代基的芳香环; n是1或更大的整数; A表示选自单键，亚烷基，-O - ， - S - ， - C（= O） - ， - S（= O） - ， - S（ ≡O）2-和-OS（ΟO）2-，条件是不包括-C（= O）O-; B表示含有具有4个以上碳原子的烃基，其中含有叔或季碳原子的基团，当n为2以上时，两个以上（AB）基可以相同或不同，其他; M +表示有机鎓离子。

8. 发明申请

US20110287234A1 NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN 有权
标题翻译：负极电阻图案形成方法，开发商和负极化学放大电阻组合物及其电阻图案
公开(公告)号：US20110287234A1
公开(公告)日：2011-11-24
申请号：US13146976
申请日：2010-01-29
申请人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
发明人： Toru Tsuchihashi , Tadateru Yatsuo , Koji Shirakawa , Hideaki Tsubaki , Akira Asano
IPC分类号： G03F7/038 , G03F7/20 , B32B3/14 , G03F7/30
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/325
摘要： A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
摘要翻译：一种抗蚀剂图案形成方法，包括以下顺序：（1）通过使用能够通过交联反应进行负转化的负性化学增幅抗蚀剂组合物形成膜的步骤，（2）曝光所述膜的步骤，以及（4）通过使用含有有机溶剂的显影剂使曝光的膜显影的步骤; 用于此的显影剂和负化学放大抗蚀剂组合物; 以及通过图案形成方法形成的抗蚀剂图案。

9. 发明申请

US20050277060A1 Positive resist composition and pattern forming method using the same 审中-公开
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US20050277060A1
公开(公告)日：2005-12-15
申请号：US11151549
申请日：2005-06-14
申请人： Koji Shirakawa , Tomoya Sasaki
发明人： Koji Shirakawa , Tomoya Sasaki
IPC分类号： G03F7/039 , C08F12/24 , G03C1/492 , G03F7/004 , G03F7/033 , H01L21/027
CPC分类号： G03F7/0392
摘要： A positive resist composition satisfying high sensitivity, high resolution, good pattern profile and good in-vacuum PED property at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising: (A) a resin which is insoluble or sparingly soluble in an alkali developer and becomes soluble in an alkali developer under the action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) an organic basic compound, wherein (A1) a resin containing a repeating unit having a specific structure and (A2) a resin other than the resin (A1) are contained as the resin of the component (A); and a pattern forming method using the composition.
摘要翻译：提供了一种能够同时满足高灵敏度，高分辨率，良好的图案形状和良好的真空PED特性的正性抗蚀剂组合物和使用该组合物的图案形成方法，其是正性抗蚀剂组合物，其包含：（A）树脂，其不溶或微溶于碱显影剂，并在酸的作用下变得可溶于碱显影剂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）有机碱性化合物，其中（A1）包含具有特定结构的重复单元的树脂和（A2）除树脂（A1）之外的树脂的树脂包含作为组分（A）的树脂; 以及使用该组合物的图案形成方法。

10. 发明授权

US06887647B2 Negative-working resist composition for electron beams or x-rays 失效
标题翻译：用于电子束或X射线的负性抗蚀剂组合物
公开(公告)号：US06887647B2
公开(公告)日：2005-05-03
申请号：US10101178
申请日：2002-03-20
申请人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
发明人： Shoichiro Yasunami , Koji Shirakawa , Yutaka Adegawa
IPC分类号： C08F12/24 , C08F20/26 , C08F20/56 , C08F28/02 , C08K5/00 , C08K5/16 , C08L101/00 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/115
摘要： A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.
摘要翻译：一种用于电子束或X射线的负性抗蚀剂组合物，其包含（A）通过照射电子束或X射线产生磺酸的化合物，（B）不溶于水并溶于碱性水溶液的树脂溶液，（C）通过酸作用与树脂（B）交联的交联剂，和（D）通过电子束或X射线的照射产生具有特定结构的羧酸的化合物。

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