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21. 发明授权

US07019819B2 Chucking system for modulating shapes of substrates 有权
标题翻译：用于调制基板形状的卡盘系统
公开(公告)号：US07019819B2
公开(公告)日：2006-03-28
申请号：US10293224
申请日：2002-11-13
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
IPC分类号： G03B27/62 , G03B27/42 , G03B27/60 , H01L21/4763
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.
摘要翻译：本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。夹持系统包括具有第一和第二相对侧的卡盘体。侧面在其间延伸。第一侧包括限定第一和第二间隔开的支撑区域的第一和第二间隔开的凹部。第一支撑区域使第二支撑区域和第一和第二凹槽成像。第二支撑区域使第二凹部成像，其中身体的与第二凹部重叠的部分对于具有预定波长的辐射是透明的。第二面和侧面限定外表面。主体包括使第一和第二凹槽与外表面之一流体连通的通道。

22. 发明授权

US06408260B1 Laser lithography quality alarm system 失效
标题翻译：激光光刻质量报警系统
公开(公告)号：US06408260B1
公开(公告)日：2002-06-18
申请号：US09505233
申请日：2000-02-16
申请人： Michael P. C. Watts , Tom A. Watson
发明人： Michael P. C. Watts , Tom A. Watson
IPC分类号： G06F1500
CPC分类号： G03F7/70025 , G03F7/70525 , G03F7/70591 , G05B19/00 , G05B2219/31205 , G05B2219/31485 , G07C3/005 , Y02P90/86
摘要： An electric discharge laser with an associated programmable controller which (1) will permit an operator to specify beam quality parameters based on historical data (2) will monitor those parameters and (3) will provide a notification signal to the operator informing him when the beam quality is adequate for integrated circuit fabrication. The controller is programmed to indicate an out-of-control condition when one or more quality parameters exhibit certain specified non-random behavior such as two out of three quality measurements deviating by more than 4 standard deviations and/or three out of four quality measurements deviating by more three standard deviations. In a preferred embodiment the program is designed to detect poor quality by looking for these “runs” of bad quantity data and to produce false indication of system out of control, on the average, no more than once each two months.
摘要翻译：具有相关可编程控制器的放电激光器（1）将允许操作者基于历史数据（2）指定光束质量参数将监视这些参数，并且（3）将向操作者提供通知信号，以便当光束质量足以用于集成电路制造。控制器被编程为当一个或多个质量参数表现出特定的非随机行为时指示失控状态，例如偏离超过4个标准偏差的三个质量测量中的两个和/或四个质量测量中的三分之一偏离更多的三个标准偏差。在优选实施例中，该程序旨在通过查找这些“数量”数据的错误来检测质量差，并且每两个月平均不超过一次产生系统失控的虚假指示。

23. 发明授权

US08889332B2 Low-K dielectric functional imprinting materials 有权
标题翻译：低K电介质功能压印材料
公开(公告)号：US08889332B2
公开(公告)日：2014-11-18
申请号：US13172350
申请日：2011-06-29
申请人： Frank Y. Xu , Jun Sung Chun , Michael P. C. Watts
发明人： Frank Y. Xu , Jun Sung Chun , Michael P. C. Watts
IPC分类号： G03F7/028 , G03F7/038 , G03F7/075
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L21/76817 , H01L21/7682 , H01L2221/1047 , Y10T428/24545 , Y10T428/24612
摘要： A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO1.5, partially condensed alkoxysilanes, organically modified silicates having the composition RSiO3 and R2SiO2, and partially condensed orthosilicates having the composition SiOR4, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.
摘要翻译：可聚合组合物包括选自组成为RSiO 1.5的倍半硅氧烷，部分缩合的烷氧基硅烷，具有组成为RSiO 3和R 2 SiO 2的有机改性硅酸盐和具有组成SiOR 4的部分缩合的原硅酸盐的有机改性硅酸盐，其中R是有机取代基; 可分解的有机化合物; 光引发剂; 和脱模剂。组合物在暴露于UV辐射下聚合以形成无机二氧化硅网络，并且可分解有机化合物在暴露于热量时分解，以在无机二氧化硅网络中形成孔隙。组合物可以用于在集成电路器件中形成图案化的介电层。金属膜可以设置在图案化的介电层上，然后平坦化。

24. 发明授权

US07727453B2 Step and repeat imprint lithography processes 有权
标题翻译：步骤和重复刻印光刻工艺
公开(公告)号：US07727453B2
公开(公告)日：2010-06-01
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
IPC分类号： B29C35/08 , B29C41/12 , B29C41/52 , B81C1/00
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to a method of forming a layer on a region of a substrate, the method including, inter alia, positioning a liquid on the substrate; and contacting the liquid with the mold, defining a gap between the mold and the substrate, with the gap enabling positioning of the liquid by capillary forces to generate the layer over the region.
摘要翻译：本发明涉及一种在衬底的区域上形成层的方法，该方法尤其包括将液体定位在衬底上; 并且使液体与模具接触，从而在模具和衬底之间形成间隙，间隙使得能够通过毛细管力定位液体以在该区域上产生层。

25. 发明授权

US07279113B2 Method of forming a compliant template for UV imprinting 有权
标题翻译：形成用于UV印记的兼容模板的方法
公开(公告)号：US07279113B2
公开(公告)日：2007-10-09
申请号：US11298244
申请日：2005-12-09
申请人： Michael P. C. Watts , Ronald D. Voisin , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Ronald D. Voisin , Sidlgata V. Sreenivasan
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A method of forming a lithographic template having an elastomer layer positioned between a body and an imprinting layer, the imprinting layer having a pattern formed thereon.
摘要翻译：一种形成具有位于主体和压印层之间的弹性体层的光刻模板的方法，所述压印层具有形成在其上的图案。

26. 发明授权

US06982783B2 Chucking system for modulating shapes of substrates 有权
标题翻译：用于调制基板形状的卡盘系统
公开(公告)号：US06982783B2
公开(公告)日：2006-01-03
申请号：US10864591
申请日：2004-06-09
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.
摘要翻译：本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。

27. 发明授权

US4909631A Method for film thickness and refractive index determination 失效
$Method for film thickness and refractive index determination$
标题翻译：薄膜厚度和折射率测定方法
公开(公告)号：US4909631A
公开(公告)日：1990-03-20
申请号：US134638
申请日：1987-12-18
申请人： Raul Y. Tan , David W. Myers , Robert G. Ozarski , John F. Schipper , Michael P. C. Watts
发明人： Raul Y. Tan , David W. Myers , Robert G. Ozarski , John F. Schipper , Michael P. C. Watts
IPC分类号： G01B11/06 , G01N21/41
CPC分类号： G01N21/41 , G01B11/065 , G01N2021/4126
摘要： Two methods for determination of thickness of a film of known material that is mounted on one face of a solid substrate of known material are disclosed, using: (1) inversion of an optical beam reflectivity equation; or (2) determination of the film thickness that minimizes the variance of the optical beam reflectivity, computed at each of a predetermined sequence of optical beam wavelengths. Four methods for determination of the (real) refractive index of a film of known thickness mounted on a face of a solid substrate of known material are disclosed, using: (1) minimization of absolute differences of computed and measured optical beam reflectivity, summed over a sequence of known film thicknesses, for assumed values of the refractive index; (2 and 3) two iterative techniques of promote convergence of an estimate of the index to a final value of the refractive index; or (4) solution of a quadratic equation whose coefficients are slowly varying functions of the solution variable.
摘要翻译：公开了两种用于确定安装在已知材料的固体基板的一个面上的已知材料的膜的厚度的方法：（1）反射光束反射率方程; 或（2）确定在预定的光束波长序列中计算出的光束反射率的方差最小化的膜厚度。公开了用于确定安装在已知材料的固体基板的表面上的已知厚度的膜的（实际）折射率的四种方法，其使用：（1）最小化计算和测量的光束反射率的绝对差，已知膜厚度序列，用于折射率的假设值; （2和3）两种迭代技术来促进指数估计与折射率的最终值的收敛; 或（4）二次方程的解，其系数是解变量的缓慢变化函数。

28. 发明授权

US4874240A Characterization of semiconductor resist material during processing 失效
标题翻译：半导体抗蚀剂材料在加工过程中的表征
公开(公告)号：US4874240A
公开(公告)日：1989-10-17
申请号：US162431
申请日：1988-03-01
申请人： Michael P. C. Watts , Thiloma I. Perera , David W. Myers , Robert G. Ozarski , John F. Schipper , Raul V. Tan
发明人： Michael P. C. Watts , Thiloma I. Perera , David W. Myers , Robert G. Ozarski , John F. Schipper , Raul V. Tan
IPC分类号： G03F7/26 , G03F7/16 , G03F7/38
CPC分类号： G03F7/168
摘要： Several methods for evaluating certain changes induced in a film of semiconductor resist material after the coat process and before or at completion of the softbake process, by monitoring thickness of and absorption by a film of resist material.

29. 发明授权

US07845931B2 Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor 有权
标题翻译：聚合技术减弱了液体固化的氧气抑制及其组成
公开(公告)号：US07845931B2
公开(公告)日：2010-12-07
申请号：US11858687
申请日：2007-09-20
申请人： Frank Y. Xu , Edward Brian Fletcher , Pankaj B. Lad , Michael P. C. Watts
发明人： Frank Y. Xu , Edward Brian Fletcher , Pankaj B. Lad , Michael P. C. Watts
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerizable process.
摘要翻译：本发明包括固化可聚合液体以在基材上形成薄膜的方法，其特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生额外的自由基以促进可聚合过程。

30. 发明授权

US07140861B2 Compliant hard template for UV imprinting 有权
标题翻译：适用于UV印记的硬模板
公开(公告)号：US07140861B2
公开(公告)日：2006-11-28
申请号：US10833240
申请日：2004-04-27
申请人： Michael P. C. Watts , Ronald D. Voisin , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Ronald D. Voisin , Sidlgata V. Sreenivasan
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.
摘要翻译：还可以充当热植入模板的兼容UV压印光刻模板及其制造方法。模板基本上包括浮雕图像和适于调整浮雕图像的弹性体。在一个实施例中，浮雕图像被布置在柔性压印层中，其中弹性体布置在压印层和刚性透明衬底之间。在一个实施例中，模板符合晶片表面。在一个实施例中，在基底上层叠弹性体和压印层并将浮雕图案图案化成压印层，形成模板。

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