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21. 发明授权

US5268579A Monopole magnetic lens field 失效
标题翻译：单极磁场透镜
公开(公告)号：US5268579A
公开(公告)日：1993-12-07
申请号：US741026
申请日：1991-08-06
申请人： Arno J. Bleeker , Pieter Kruit
发明人： Arno J. Bleeker , Pieter Kruit
IPC分类号： G01Q30/02 , G01Q70/08 , H01J37/141 , H01J37/244 , H01J37/30 , H01V37/141
CPC分类号： H01J37/141 , H01J37/3007 , H01J2237/142
摘要： In an electron optical system a monopole shaped magnetic field is introduced enabling an aberration free imaging writing or detection in the system. Apparatus based on this field distribution result in improved secondary electron detection such as for chip inspection, in improved resolution in Auger electron detection for analysis, in a higher exactness in chip production in an electron beam pattern generator and in an electron beam image projector in which now also size reduction can aberration free be introduced.

22. 发明授权

US09607806B2 Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams 有权
公开(公告)号：US09607806B2
公开(公告)日：2017-03-28
申请号：US13484231
申请日：2012-05-30
申请人： Aernout Christiaan Zonnevylle , Pieter Kruit
发明人： Aernout Christiaan Zonnevylle , Pieter Kruit
IPC分类号： G21K1/08 , H01J37/30 , H01J37/317 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205 , H01J2237/15 , H01J2237/1532
摘要： The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

23. 发明授权

US09208989B2 Lithography system and method of refracting 有权
$Lithography system and method of refracting$
标题翻译：光刻系统和折射方法
公开(公告)号：US09208989B2
公开(公告)日：2015-12-08
申请号：US13295243
申请日：2011-11-14
申请人： Alexander Hendrik Vincent Van Veen , Yanxia Zhang , Gun Sari Mari Berglund , Pieter Kruit
发明人： Alexander Hendrik Vincent Van Veen , Yanxia Zhang , Gun Sari Mari Berglund , Pieter Kruit
IPC分类号： H01J3/26 , H01J37/09
CPC分类号： H01J37/09 , H01J2237/002 , H01J2237/0453 , H01J2237/1534 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
摘要翻译：一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。

24. 再颁专利

USRE45049E1 Electron beam exposure system 有权
公开(公告)号：USRE45049E1
公开(公告)日：2014-07-29
申请号：US13343038
申请日：2012-01-04
申请人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
发明人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
IPC分类号： H01J37/30 , H01J37/304
CPC分类号： H01J3/02 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/0435 , H01J2237/06308 , H01J2237/06375 , H01J2237/3045
摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

25. 发明授权

US08648318B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08648318B2
公开(公告)日：2014-02-11
申请号：US13071225
申请日：2011-03-24
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/317 , H01J37/147 , H01J37/26
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

26. 发明授权

US08242470B2 Optical switching in a lithography system 有权
标题翻译：光刻系统中的光开关
公开(公告)号：US08242470B2
公开(公告)日：2012-08-14
申请号：US11653107
申请日：2007-01-11
申请人： Marco Jan-Jaco Wieland , Johannes Christiaan van 't Spijker , Remco Jager , Pieter Kruit
发明人： Marco Jan-Jaco Wieland , Johannes Christiaan van 't Spijker , Remco Jager , Pieter Kruit
IPC分类号： G21K5/10 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
摘要翻译：一种用于将图案转印到目标表面上的无掩模光刻系统。用于产生多个子束的至少一个光束发生器。多个调制器调制小波束的幅度，并且控制单元控制调制器。控制单元生成并将模式数据传送到调制器，以控制每个单独子束的幅度。控制单元包括用于存储图案数据的至少一个数据存储器，用于从数据存储器读出数据的至少一个读出单元，至少一个数据转换器，用于将从数据存储器读出的数据转换为至少一个调制光束和至少一个用于将至少一个调制光束发射到调制调制器的光发射器。

27. 发明授权

US08134135B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08134135B2
公开(公告)日：2012-03-13
申请号：US11880872
申请日：2007-07-23
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/302 , H01J37/04
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

28. 发明申请

US20110180721A1 SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A DISPENSER CATHODE FOR HOMOGENEOUS ELECTRON EMISSION 有权
标题翻译：包含用于均质电子发射的分配器阴极的多光束光刻的系统，方法和装置
公开(公告)号：US20110180721A1
公开(公告)日：2011-07-28
申请号：US13082333
申请日：2011-04-07
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
IPC分类号： H01J3/14 , H01J1/28 , H01T23/00
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
摘要翻译：分配器阴极，其包括排放表面，用于材料释放的储存器，当被加热时，功能降低颗粒和至少一个通道，用于允许功能降低颗粒从所述储存器扩散到所述发射表面，所述发射表面包括至少一个发射区域和至少一个覆盖有发射抑制材料并且围绕每个发射区域的非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道，并在从放射区域的扩散长度距离，用于允许功能降低颗粒从所述储存器扩散到所述发射区域。

29. 发明申请

US20110163244A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110163244A1
公开(公告)日：2011-07-07
申请号：US13050875
申请日：2011-03-17
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J3/14
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

30. 发明授权

US07859760B2 Method and apparatus for imaging 有权
标题翻译：成像方法和装置
公开(公告)号：US07859760B2
公开(公告)日：2010-12-28
申请号：US12339551
申请日：2008-12-19
申请人： Bob van Someren , Pieter Kruit
发明人： Bob van Someren , Pieter Kruit
IPC分类号： G02B27/10
CPC分类号： H01J29/488 , G02B3/0056 , Y10S359/90
摘要： A method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means of the redirecting organ depending on the distance of that beamlet to a central axis of the beam, such that the beamlets converge in a common point with the beamlets from the beam source being focused to foci located in the redirecting organ, and with the beamlets originating from these foci being focused in the common imaging point.
摘要翻译：一种在操作期间形成光束源的图像的方法提供一个光束，并且其中光束被分割以将光束分成子束，其中使用重定向器件，每个单独的子束通过该重定向器被重定向到预定的程度，取决于该子束到该光束的中心轴的距离，通过重定向装置重定向每个子束的程度，使得子束在与源光束的子束被聚焦到位于重定向器官以及源自这些灶的子束被聚焦在共同的成像点中。

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