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21. 发明授权

US08405825B2 Method of detecting a particle and a lithographic apparatus 失效
标题翻译：检测颗粒和光刻设备的方法
公开(公告)号：US08405825B2
公开(公告)日：2013-03-26
申请号：US12904610
申请日：2010-10-14
申请人： Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Christian Wagner
发明人： Luigi Scaccabarozzi , Vadim Yevgenyevich Banine , Christian Wagner
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01N2021/95676 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.
摘要翻译：检测器检测来自掩模的辐射以形成图像，但是图像的焦平面位于掩模的前面。布置在面罩上的任何颗粒将被聚焦。然而，面具上的图案将会失焦。因此可以检测具有任意图案的掩模上的颗粒的存在和位置。检测器的景深较小，焦平面不比图案形成装置的表面高两倍的景深。

22. 发明申请

US20110305789A1 SYSTEM FOR POST-TREATING AND TRANSFERRING PREFORMS 有权
标题翻译：后处理和转移预付系统
公开(公告)号：US20110305789A1
公开(公告)日：2011-12-15
申请号：US13133262
申请日：2008-12-12
申请人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
发明人： Witold Neter , Helmut Thoemmes , Rainer Petry , Christian Wagner
IPC分类号： B29B11/08
CPC分类号： B29C45/7207 , B29C49/06 , B29C49/6427 , B29C2045/7214
摘要： A system for the post-treatment of preforms (9) produced by means of injection moulding, including a removal element (4) having at least one receiving element (5) for receiving a preform (9), and a device for moving the removal element (4) between two tool halves of an opened injection moulding mould and for moving the removal element (4) out of the opened injection moulding mould, a post-treatment element (6) having at least one post-treatment pin (7) having a pin-shaped passage element (7), of which one end can be connected to the environment or a vacuum or reduced-pressure source and of which the other end has an outlet (18) for a coolant, and a motion device with which the removal element (4) can be reciprocated relative to the post-treatment element (6) between a first position in which the post-treatment pin (7) is positioned within the receiving element (5) and a second position in which the post-treatment pin (7) is not positioned within the receiving element (5), wherein the removal element (4) and the post-treatment element (6) are so designed that in the first position coolant can be introduced by way of the coolant inlet into a preform held in the receiving element (5) in such a way that it can flow between the inside wall of the preform (9) and the outside wall of the pin-shaped passage element (7) to the coolant outlet (18) and can be discharged by way of the passage element (7).
摘要翻译：一种用于后处理通过注射成型制成的预成型件（9）的系统，包括具有用于容纳预成型件（9）的至少一个接收元件（5）的去除元件（4））以及用于移动所述移除装置在打开的注塑模具的两个工具半部之间的元件（4）和用于将所述移除元件（4）移出所述打开的注塑模具中的后处理元件（6），所述后处理元件（6）具有至少一个后处理销（7）具有销形通道元件（7），其一端可连接到环境或真空或减压源，另一端具有用于冷却剂的出口（18），以及具有其中所述移除元件（4）可以在所述后处理销（7）位于所述接收元件（5）内的第一位置和所述第二位置之间相对于所述后处理元件（6）往复运动，后处理销（7）不位于接收元件（5）内，其中r 表面元件（4）和后处理元件（6）被设计成使得在第一位置中，可以通过冷却剂入口将冷却剂引入保持在接收元件（5）中的预成型件中，使得其可以在预成型件（9）的内壁和销状通道元件（7）的外壁到冷却剂出口（18）之间流动并且可以通过通道元件（7）排出。

23. 发明授权

US07663741B2 Lithographic apparatus, device manufacturing method, calibration method and computer program product 失效
标题翻译：光刻设备，器件制造方法，校准方法和计算机程序产品
公开(公告)号：US07663741B2
公开(公告)日：2010-02-16
申请号：US10929882
申请日：2004-08-31
申请人： Hans Van Der Laan , Christian Wagner
发明人： Hans Van Der Laan , Christian Wagner
IPC分类号： G01B9/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70666 , G03F7/70516
摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
摘要翻译：为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。操纵器的适当设置被确定为给出最大对比度值的那些。

24. 发明申请

US20080055740A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD 审中-公开
标题翻译：具有自适应镜像和投射曝光方法的目标投影目标
公开(公告)号：US20080055740A1
公开(公告)日：2008-03-06
申请号：US11925359
申请日：2007-10-26
申请人： Christian Wagner , Michael Gerhard , Gerald Richter
发明人： Christian Wagner , Michael Gerhard , Gerald Richter
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/08 , G02B26/06 , G02B26/0825 , G02B27/0025 , G02B27/0043 , G03F7/70225 , G03F7/70266
摘要： A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are mated to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.
摘要翻译：用于微光刻的反射折射投射物镜具有至少一个可变形的弯曲镜，并且可调节可变形反射镜的元件。调整元件与给定的图像错误及其校正相匹配。本发明适用于散光，由于透镜加热，压实等引起的四重波前变形。

25. 发明申请

US20070266882A1 Active body 有权
标题翻译：活体
公开(公告)号：US20070266882A1
公开(公告)日：2007-11-22
申请号：US11727869
申请日：2007-03-28
申请人： Rainer Gaisbauer , Heinz Bannach , Vikron Kadavanich , Martin Fegg , Christian Wagner
发明人： Rainer Gaisbauer , Heinz Bannach , Vikron Kadavanich , Martin Fegg , Christian Wagner
IPC分类号： F42B4/26
CPC分类号： F42B5/16 , C06B45/00 , C06C15/00 , F42B4/26
摘要： An active body is provided that includes at least one active mass block made of monobasic or polybasic high-energy materials such as a nitrocellulose mixture, for example, comprising approximately 60 percent nitroglycerin and 40 percent diethylene glycol dinitrate, which is provided with structures both on a surface and on an interior. In addition, the inner structures can be filled with an active mass substance. The ignition is triggered by a pyrotechnical primer composition, which initiates the active body, preferably from the inside.
摘要翻译：提供了一种活性物质，其包含至少一种由一元或多碱性高能材料如硝酸纤维素混合物制成的至少一种活性质量块，例如包含约60％硝酸甘油和40％二甘醇二硝酸酯，其具有两者结构表面和内部。此外，内部结构可以填充有活性物质。点火是由烟火底漆组合物触发的，其引发活性体，优选从内部引发。

26. 发明申请

US20060171020A1 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US20060171020A1
公开(公告)日：2006-08-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
IPC分类号： G02B13/14 , G02B3/00
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

27. 发明申请

US20060046165A1 Lithographic apparatus, device manufacturing method, calibration method and computer program product 失效
标题翻译：光刻设备，器件制造方法，校准方法和计算机程序产品
公开(公告)号：US20060046165A1
公开(公告)日：2006-03-02
申请号：US10929882
申请日：2004-08-31
申请人： Hans Laan , Christian Wagner
发明人： Hans Laan , Christian Wagner
IPC分类号： G03C5/00 , G03B27/42
CPC分类号： G03F7/70666 , G03F7/70516
摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
摘要翻译：为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。操纵器的适当设置被确定为给出最大对比度值的那些。

28. 发明授权

US06950174B2 Projection exposure system for microlithography and method for generating microlithographic images 失效
标题翻译：用于微光刻的投影曝光系统和用于产生微光刻图像的方法
公开(公告)号：US06950174B2
公开(公告)日：2005-09-27
申请号：US10984161
申请日：2004-11-09
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G02B19/00 , G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20 , G03F9/00 , H01L21/027 , G03B27/54 , G03B27/42
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译：用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。

29. 发明授权

US06822729B2 Projection exposure system for microlithography and method for generating microlithographic images 失效
标题翻译：用于微光刻的投影曝光系统和用于产生微光刻图像的方法
公开(公告)号：US06822729B2
公开(公告)日：2004-11-23
申请号：US09797961
申请日：2001-03-05
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.
摘要翻译：用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。提供了影响在照明系统和还原目标中适应于偶极子照明的切向偏振或线偏振的布置。

30. 发明授权

US09516732B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US09516732B2
公开(公告)日：2016-12-06
申请号：US14241986
申请日：2012-07-27
申请人： Christian Wagner , Erik Roelof Loopstra
发明人： Christian Wagner , Erik Roelof Loopstra
IPC分类号： H05G2/00 , G03F7/20 , H01S3/23 , H01S3/00 , G02B27/28
CPC分类号： H05G2/008 , G02B27/283 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/0064 , H01S3/2316 , H01S3/2333 , H05G2/003 , H05G2/005
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.
摘要翻译：根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58）位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

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