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21. 发明授权

US08461560B2 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US08461560B2
公开(公告)日：2013-06-11
申请号：US13087207
申请日：2011-04-14
申请人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G01N21/00 , G01N21/33 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
摘要翻译：公开了一种装置和方法，其包括或使用包括输出激光束的激光装置的EUV光源，将激光束引导到照射部位的光束传递系统，以及用于在照射部位与激光束相互作用的材料创建用于处理衬底的EUV发光等离子体。

22. 发明授权

US08017924B2 Drive laser delivery systems for EUV light source 有权
标题翻译：驱动用于EUV光源的激光输送系统
公开(公告)号：US08017924B2
公开(公告)日：2011-09-13
申请号：US12322669
申请日：2009-02-04
申请人： Alexander N. Bykanov , Igor V. Fomenkov , Alexander I. Ershov
发明人： Alexander N. Bykanov , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译：公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。

23. 发明申请

US20090230326A1 Systems and methods for target material delivery in a laser produced plasma EUV light source 有权
标题翻译：用于激光产生等离子体EUV光源的靶材料输送的系统和方法
公开(公告)号：US20090230326A1
公开(公告)日：2009-09-17
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/006 , H05G2/008
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译：本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。

24. 发明授权

US07928417B2 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US07928417B2
公开(公告)日：2011-04-19
申请号：US12288970
申请日：2008-10-24
申请人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Alexander I. Ershov , Alexander N. Bykanov , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G01N21/00 , G01N21/33 , G01J1/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100μm的EUV目标液滴在所涉及的几何形状的约束条件下是不实际的聚焦镜头。驱动激光器可以包括CO2激光器。驱动激光重定向机构可以包括镜子。

25. 发明授权

US07838854B2 Method and apparatus for EUV plasma source target delivery 有权
标题翻译：用于EUV等离子体源目标传递的方法和装置
公开(公告)号：US07838854B2
公开(公告)日：2010-11-23
申请号：US12220560
申请日：2008-07-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

26. 发明授权

US07655925B2 Gas management system for a laser-produced-plasma EUV light source 有权
公开(公告)号：US07655925B2
公开(公告)日：2010-02-02
申请号：US11897644
申请日：2007-08-31
申请人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
发明人： Alexander N. Bykanov , Alexander I. Ershov , Igor V. Fomenkov , David C. Brandt
IPC分类号： H05G2/00 , H01H1/00 , H05H1/24 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.

27. 发明申请

US20080283776A1 Method and apparatus for EUV plasma source target delivery 有权
公开(公告)号：US20080283776A1
公开(公告)日：2008-11-20
申请号：US12220560
申请日：2008-07-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

28. 发明申请

US20100176313A1 Extreme ultraviolet light source 审中-公开
标题翻译：极紫外光源
公开(公告)号：US20100176313A1
公开(公告)日：2010-07-15
申请号：US12653585
申请日：2009-12-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： G21K5/02
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译：公开了一种用于产生EUV辐射的装置，其可以包括目标材料，产生用于与靶材料相互作用的激光束的系统和一对电极。可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。

29. 发明授权

US07368741B2 Extreme ultraviolet light source 失效
标题翻译：极紫外光源
公开(公告)号：US07368741B2
公开(公告)日：2008-05-06
申请号：US11107535
申请日：2005-04-14
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：本发明提供了一种可靠，高重复率的生产线兼容高能光子源。在真空室中产生含有活性物质的非常热的等离子体。活性物质是具有期望的极紫外（EUV）范围内的发射线的原子元素。包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲，其具有足够的能量和电势，足以以超过5瓦的速率在中间焦点处产生EUV光。在由申请人带内设计的优选实施例中，中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。

30. 发明授权

US06815700B2 Plasma focus light source with improved pulse power system 失效
标题翻译：等离子聚焦光源具有改进的脉冲电源系统
公开(公告)号：US06815700B2
公开(公告)日：2004-11-09
申请号：US10189824
申请日：2002-07-03
申请人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
发明人： Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. Special techniques are described for cooling the central electrode. In one example, water is circulated through the walls of the hollow electrode. In another example, a heat pipe cooling system is described for cooling the central electrode.
摘要翻译：本发明提供了一种高能量光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。优选地，电极被同轴配置。中心电极优选是中空电极，并且活性气体从中空电极引出。这允许对光谱线源进行优化和缓冲气体的单独优化。在优选的实施例中，中心电极用高的负电脉冲脉冲，使得中心电极用作空心阴极。本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。描述了用于冷却中心电极的特殊技术。在一个实例中，水通过中空电极的壁循环。在另一个实例中，描述了用于冷却中心电极的热管冷却系统。

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