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21. 发明授权

US3977884A Metal plating solution 失效
标题翻译：金属电镀液
公开(公告)号：US3977884A
公开(公告)日：1976-08-31
申请号：US538125
申请日：1975-01-02
申请人： Michael Gulla , Charles A. Gaputis
发明人： Michael Gulla , Charles A. Gaputis
IPC分类号： C23C18/36 , C23C18/40 , C23C18/52 , C23C3/02
CPC分类号： C23C18/405 , C23C18/36 , C23C18/52
摘要： An electroless metal plating solution is characterized by an elemental sulfur stabilizer, either in colloidal or soluble, non-ionic form. Elemental sulfur as a stabilizer is an improvement over prior art stabilizers as it can be used in substantially larger concentration than prior art divalent sulfur stabilizers which are catalytic poisons.
摘要翻译：无电金属电镀溶液的特征在于以胶态或可溶性非离子形式的元素硫稳定剂。作为稳定剂的元素硫是比现有技术的稳定剂更好的改进，因为它可以比现有技术的二价硫稳定剂（其是催化毒物）大得多的浓度使用。

22. 发明授权

US4674440A Apparatus for automatically replenishing an electroless plating bath 失效
标题翻译：用于自动补充化学镀浴的装置
公开(公告)号：US4674440A
公开(公告)日：1987-06-23
申请号：US748968
申请日：1985-06-26
申请人： William J. Cardin , Michael Gulla , Charles L. Newton
发明人： William J. Cardin , Michael Gulla , Charles L. Newton
IPC分类号： C23C18/16 , B05C11/10
CPC分类号： C23C18/1617 , C23C18/1683
摘要： An apparatus for maintaining the consumable components of an electroless plating solution at predetermined concentration in a plating tank containing the plating solution while workpieces are being processed in the tank. The apparatus measures the concentrations of the consumable components in a sample stream of the electroless plating solution and based on these measurements, meters the required amounts of the components into the plating solution. A portion of the apparatus provides for the introduction of plating solution poison into the sample stream to prevent autocatalytic decomposition and deposition of the plating metal, e.g., copper, onto to the walls and sensors of the apparatus.
摘要翻译：一种用于在罐内处理工件时，将包含电镀溶液的镀槽中的预定浓度的化学镀溶液的消耗部件维持的装置。该装置测量化学镀溶液的样品流中的可消耗部件的浓度，并且基于这些测量，将所需量的组分计量到电镀溶液中。该装置的一部分提供了将电解液毒物引入样品流中以防止电镀金属（例如铜）自动催化分解和沉积到装置的壁和传感器上。

23. 发明授权

US4482596A Electroless alloy plating 失效
标题翻译：无电镀合金
公开(公告)号：US4482596A
公开(公告)日：1984-11-13
申请号：US411346
申请日：1982-08-25
申请人： Michael Gulla , Oleh B. Dutkewych
发明人： Michael Gulla , Oleh B. Dutkewych
IPC分类号： C22C9/00 , C23C18/36 , C23C18/40 , C23C18/48 , H05K3/18 , H05K3/24 , H05K3/46 , B32B3/10 , B32B15/04
CPC分类号： H05K3/181 , C23C18/48 , Y10S428/901 , Y10T428/24273 , Y10T428/31507 , Y10T428/31529 , Y10T428/31533 , Y10T428/31678 , Y10T428/31681 , Y10T428/31692 , Y10T428/31703 , Y10T428/31707
摘要： A structure having a catalytic surface plated with an autocatalytic electroless alloy of copper, a metal selected from nickel, cobalt, mixtures thereof and phosphorous.
摘要翻译：具有镀有铜的自催化无电解合金的催化表面的结构，选自镍，钴，其混合物和磷的金属。

24. 发明授权

US4229218A Self-monitoring electroless plating solution 失效
标题翻译：自我监测化学镀溶液
公开(公告)号：US4229218A
公开(公告)日：1980-10-21
申请号：US9542
申请日：1979-02-05
申请人： Michael Gulla , Barry J. Hartnett
发明人： Michael Gulla , Barry J. Hartnett
IPC分类号： C23C18/16 , C23C18/31 , C23C18/34 , C23C18/40 , G01N21/78 , H05K1/02 , H05K3/18 , C23C3/02
CPC分类号： G01N21/78 , H05K1/0266 , H05K3/187
摘要： This invention relates to monitoring the concentration of a component dissolved in solution where the component imparts a perceptible color to the solution and varies in concentration with use of the solution.The invention is based upon use of a colorant of a fixed optical density that absorbs light in a different region of the visible spectrum than the monitored component. As the monitored component varies in concentration with use of the solution, the optical density of that component in solution varies as a function of its concentration and consequently, the amount of light, i.e., the intensity of light, passing through the solution will also vary as a function of concentration. Since the optical density of the colorant remains fixed during use, the optical density of the monitored component changes relative to the optical density of the colorant during use of the solution. Because the monitored component and colorant absorb light in different regions of the visible spectrum and their optical densities change relative to each other, there results a perceptible color change as a function of concentration that may be seen visually or measured by instrumentation.
摘要翻译：本发明涉及监测溶解在溶液中的组分的浓度，其中组分向溶液赋予可察觉的颜色，并且使用溶液的浓度变化。本发明基于使用固定光密度的着色剂，该着色剂吸收可见光谱的不同区域中的光，而不是所监测的组分。当被监测的组分随着溶液的浓度变化时，溶液中该组分的光密度随着其浓度的变化而变化，因此，通过溶液的光的量，即光的强度也将变化作为浓度的函数。由于着色剂的光学密度在使用期间保持固定，所以在使用溶液时，所监测的组分的光密度相对于着色剂的光密度而变化。因为被监测的组分和着色剂吸收可见光谱的不同区域的光，并且它们的光学密度相对于彼此变化，所以会产生视觉上可视或通过仪器测量的可见的浓度变化的颜色变化。

25. 发明授权

US4189324A Stabilized electroless plating solutions 失效
标题翻译：稳定化学镀电解液
公开(公告)号：US4189324A
公开(公告)日：1980-02-19
申请号：US911807
申请日：1978-06-02
申请人： Michael Gulla , Christy Savas
发明人： Michael Gulla , Christy Savas
IPC分类号： C23C18/34 , C23C3/02
CPC分类号： C23C18/34
摘要： An electroless nickel plating solution is characterized by the addition of a small but effective amount of a source of gallium for improved stability and deposit properties.
摘要翻译：化学镀镍溶液的特征在于加入少量但有效量的镓来提高稳定性和沉积性能。

26. 发明授权

US4152164A Electroless nickel plating 失效
标题翻译：化学镀镍
公开(公告)号：US4152164A
公开(公告)日：1979-05-01
申请号：US734486
申请日：1976-10-21
申请人： Michael Gulla , Charles R. Shipley, Jr. , Howard A. MacKay
发明人： Michael Gulla , Charles R. Shipley, Jr. , Howard A. MacKay
IPC分类号： C23C18/16 , C23C18/31 , C23C18/40 , C23C18/44 , C23C18/50 , C23C18/52 , C23C3/02
CPC分类号： C23C18/1617
摘要： This invention relates to electroless metal deposition and more specifically, to a process where a plating solution is brought to equilibrium and thereafter operated with the concentration of plating reactants and by-products maintained substantially constant. The plating solution treated in accordance with the invention is one having evaporative losses of at least one percent per plating cycle. Following the process, a plating solution can be operated indefinitely and yields a metal plate of uniform quality and predictable properties at any time during use of the solution. The invention avoids the known problems of by-product build-up and variable concentration of reactants typically associated with the use of such solutions.
摘要翻译：本发明涉及无电金属沉积，更具体地说，涉及一种使电镀液达到平衡并随后以电镀反应物和副产物的浓度保持基本恒定的方式操作的方法。根据本发明处理的电镀溶液是每个电镀循环具有至少1％的蒸发损失的镀液。在该过程之后，可以无限期地操作电镀溶液，并且在使用溶液期间的任何时间产生均匀质量的金属板和可预测的性质。本发明避免了通常与使用这种溶液相关的副产物积聚和反应物的可变浓度的已知问题。

27. 发明授权

US5500315A Processes and compositions for electroless metallization 失效
公开(公告)号：US5500315A
公开(公告)日：1996-03-19
申请号：US317347
申请日：1994-10-04
申请人： Jeffrey M. Calvert , Walter J. Dressick , Gary S. Calabrese , Michael Gulla
发明人： Jeffrey M. Calvert , Walter J. Dressick , Gary S. Calabrese , Michael Gulla
IPC分类号： B05D1/18 , C09D4/00 , C12N5/00 , C23C18/16 , C23C18/20 , C23C18/28 , C40B60/14 , G03F7/004 , G06N3/00 , G06N99/00 , H01L21/288 , H05K3/18 , G03C5/58 , G03F7/038
CPC分类号： G06N99/007 , B05D1/185 , B82Y10/00 , B82Y30/00 , B82Y40/00 , B82Y5/00 , C09D4/00 , C12N5/0068 , C23C18/1603 , C23C18/1608 , C23C18/1612 , C23C18/1893 , C23C18/2086 , C23C18/28 , C23C18/30 , C23C18/31 , G03F7/004 , G06N3/002 , H01L21/288 , H01L21/2885 , H05K3/185 , B01J2219/00432 , B01J2219/00603 , B01J2219/00605 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/00637 , B01J2219/00659 , B01J2219/00711 , C12N2535/10 , C40B60/14 , Y10T428/24917 , Y10T428/31536
摘要： Methods and compositions for electroless metallization. In one aspect, the invention is characterized by the use of chemical groups capable of ligating with an electroless metallization catalyst, including use of ligating groups that are chemically bound to the substrate. In a preferred aspect, the invention provides a means for selective metallization without the use of a conventional photoresist patterning sequence, enabling fabrication of high resolution metal patterns in a direct and convenient manner.

28. 发明授权

US5213841A Metal accelerator 失效
标题翻译：金属加速器
公开(公告)号：US5213841A
公开(公告)日：1993-05-25
申请号：US523713
申请日：1990-05-15
申请人： Michael Gulla , Prasit Sricharoenchaikit
发明人： Michael Gulla , Prasit Sricharoenchaikit
IPC分类号： C23C18/30 , C23C18/28
CPC分类号： C23C18/28
摘要： A process for metal plating characterized by use of an accelerator solution of a metal reducible by stannous tin between a step of catalysis and metal deposition.

29. 发明授权

US5203911A Controlled electroless plating 失效
标题翻译：控制电镀
公开(公告)号：US5203911A
公开(公告)日：1993-04-20
申请号：US719979
申请日：1991-06-24
申请人： Prasit Sricharoenchaikit , Gary S. Calabrese , Michael Gulla
发明人： Prasit Sricharoenchaikit , Gary S. Calabrese , Michael Gulla
IPC分类号： C23C18/20 , C23C18/31 , C23C18/34 , C23C18/52 , H05K3/18
CPC分类号： C23C18/52
摘要： A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.

30. 发明授权

US5158860A Selective metallization process 失效
标题翻译：选择性金属化过程
公开(公告)号：US5158860A
公开(公告)日：1992-10-27
申请号：US607711
申请日：1990-11-01
申请人： Michael Gulla , Prasit Sricharoenchaikit
发明人： Michael Gulla , Prasit Sricharoenchaikit
IPC分类号： H05K3/02 , C23C18/16 , G03F7/20 , H05K3/18
CPC分类号： G03F7/2022 , C23C18/1608 , C23C18/1612 , C23C18/204 , C23C18/285 , C23C18/30 , C23C18/32 , C23C18/38 , H05K3/184 , H05K2203/0505 , H05K2203/0706 , H05K2203/1415
摘要： A process for selective metallization comprising the steps of providing a substrate coated with a photoresist, imaging the photoresist coating by exposure to pattern radiation and development, flood exposing the photoresist coating to activating radiation, depositing an electroless plating catalyst over the entire imaged photoresist coating and bared underlying substrate, removing the top surface of the flood exposed, catalyzed photoresist coating by development whereby plating catalyst remains in a desired selective pattern and depositing metal over the catalyzed surface to form a metal deposit in a selective pattern such as in a circuit pattern. The process is suitable for the manufacture of diverse articles including printed circuit boards.

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