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21. 发明申请

US20040152271A1 Method of forming bottom oxide layer in trench structure 有权
标题翻译：在沟槽结构中形成底部氧化物层的方法
公开(公告)号：US20040152271A1
公开(公告)日：2004-08-05
申请号：US10668454
申请日：2003-09-22
申请人： MOSEL VITELIC, INC.
发明人： Ta-Chung Wu , Yi-Chuan Yang , Shih-Chi Lai , Yew-Jung Chang
IPC分类号： H01L021/42 , H01L021/336 , H01L021/324 , H01L021/26 , H01L021/477
CPC分类号： H01L21/76224 , H01L29/42368 , H01L29/7813
摘要： Embodiments of the invention are directed to a method of forming a bottom oxide in a trench structure. In one embodiment, the method includes steps of providing a semiconductor substrate and forming a trench structure in the semiconductor substrate; performing an PECVD process with TEOS as a source to deposit an oxide layer on the bottom and sidewall of the trench structure and the semiconductor substrate; and removing the oxide layer on the sidewall of the trench structure substantially completely and the oxide layer on the bottom of the trench structure partially to define the remained oxide layer as the bottom oxide layer.
摘要翻译：本发明的实施例涉及在沟槽结构中形成底部氧化物的方法。在一个实施例中，该方法包括以下步骤：提供半导体衬底并在半导体衬底中形成沟槽结构; 以TEOS作为源进行PECVD处理，以在沟槽结构和半导体衬底的底部和侧壁上沉积氧化物层; 并且基本上完全去除沟槽结构的侧壁上的氧化物层，并且部分地去除沟槽结构的底部上的氧化物层以限定作为底部氧化物层的剩余氧化物层。

22. 发明申请

US20040055141A1 Method for assembling a scrubber 有权
标题翻译：组装洗涤器的方法
公开(公告)号：US20040055141A1
公开(公告)日：2004-03-25
申请号：US10671814
申请日：2003-09-26
申请人： MOSEL VITELIC, INC. A Taiwanese Corporation
发明人： Hsiu-Chieh Chen , Hsiao-Ping Hsieh , Wen-Kan Hu , Wen-Chin Wu
IPC分类号： H02K015/14 , B23P019/00
CPC分类号： H01L21/67046 , Y10T29/49009 , Y10T29/49826 , Y10T29/49895 , Y10T29/53143 , Y10T29/53961
摘要： The present invention relates to an auxiliary tool for assembling a scrubber which includes a motor, a shaft rotatably coupled to and extending through the motor, a shaft pin detachably connected to the shaft, and a disk coupled to the shaft and having a notch located relative to the shaft pin at a predetermined angle with respect to a longitudinal axis of the shaft when properly assembled. In specific embodiments, the auxiliary tool comprises a tool body configured to at least partially receive the motor, the shaft pin, the disk, and the notch of the disk. The tool body includes a first recess configured to at least partially receive the shaft pin and a protrusion configured to be at least partially received into the notch of the disk. The first recess and the protrusion are arranged at the predetermined angle to position the notch of the disk and the shaft pin of the scrubber for proper assembly at the predetermined angle with respect to the longitudinal axis of the shaft.
摘要翻译：本发明涉及一种用于组装洗涤器的辅助工具，该辅助工具包括电动机，可旋转地联接到电动机上并延伸穿过电动机的轴，可拆卸地连接到轴的轴销和联接到轴的盘，并且具有位于相对在正确组装时相对于轴的纵向轴线以预定角度延伸到轴销。在具体实施例中，辅助工具包括被配置为至少部分地接收电动机，轴销，盘和盘的凹口的工具主体。所述工具主体包括第一凹部，所述第一凹部被构造成至少部分地容纳所述轴销和突出部，所述突起被配置为至少部分地容纳在所述盘的凹口中。第一凹部和突出部以预定角度布置，以将盘的凹口和洗涤器的轴销定位成相对于轴的纵向轴线以预定角度正确组装。

23. 发明申请

US20030216887A1 Statistical process control method and system thereof 有权
标题翻译：统计过程控制方法及其系统
公开(公告)号：US20030216887A1
公开(公告)日：2003-11-20
申请号：US10382548
申请日：2003-03-05
申请人： MOSEL VITELIC, INC.
发明人： Ming-Yuan Shieh
IPC分类号： G06F015/00
CPC分类号： G05B13/021 , G05B5/01 , G05B19/41875 , G05B2219/32201 , Y02P90/22
摘要： A statistical process control (SPC) method, wherein a post-stage process corresponds to a pre-stage process, is disclosed in the present invention. In one embodiment, the SPC method comprises: collecting a plurality of pre-stage measurements and post-stage measurements respectively during the pre-stage process and the post-stage process; evaluating an equation for approaching a relation between the plurality of post-stage measurements and the plurality of pre-stage measurements; calculating based on the equation a post-stage variance being independent of the fluctuation of the plurality of pre-stage measurements; and monitoring the post-stage process of mass production by an upper and a lower control limits, wherein the upper control limit is equal to the equation plus half order of the post-stage variance and the lower control limit is equal to the equation minus half order of the post-stage variance.
摘要翻译：在本发明中公开了一种统计过程控制（SPC）方法，其中后期处理对应于前期处理。在一个实施例中，SPC方法包括：在前期处理和后期处理期间分别收集多个前期测量和后期测量; 评估用于接近所述多个后级测量与所述多个前级测量之间的关系的方程; 基于该方程式计算后级方差与多个前级测量的波动无关; 并监控大规模生产的后期处理，控制上限和下限，其中上限控制等于后加方差的等式加上半数，下限控制等于方程减一半后期方差的顺序。

24. 发明申请

US20020166255A1 System for sensing position of spin dryer cover 有权
标题翻译：用于感应旋转干燥器盖的位置的系统
公开(公告)号：US20020166255A1
公开(公告)日：2002-11-14
申请号：US10087096
申请日：2002-03-01
申请人： MOSEL VITELIC, INC., A Taiwanese Corporation
发明人： Yu Chih Lin , Chih Hsin Tsai , Ming Hua Shih , Shih Kai Pao
IPC分类号： F26B017/24 , F26B017/30 , F26B019/00 , F26B013/26
CPC分类号： H01L21/67259 , F26B5/08
摘要： Embodiments of the present invention relate to an apparatus for spin drying substrates in a spin dryer tank. A spin dryer cover is movable between a closed position to close an opening of the spin dryer tank and an open position to open the spin dryer tank, and a cylinder is coupled with the spin dryer cover. The cylinder is movable in a first operation to move the spin dryer cover to the open position and movable in a second operation to move the spin dryer cover to the closed position. A system for sensing the position of the spin dryer cover comprises a cylinder sensor configured to sense the first operation and the second operation of the cylinder. A cover sensor is configured to sense the position of the spin dryer cover. A logic circuit is configured to output a cover opening signal indicating that the spin dryer cover is in the open position when the cylinder sensor senses the first operation of the cylinder and the cover sensor senses that the spin dryer cover is in the open position.
摘要翻译：本发明的实施例涉及一种用于在旋转干燥箱中旋转基材的设备。旋转干燥器盖可以在关闭位置以关闭旋转干燥器箱的开口和打开位置以打开旋转干燥箱之间移动，并且圆筒与旋转干燥器盖结合。气缸可在第一操作中移动，以将旋转干衣机盖移动到打开位置，并且可在第二操作中移动以使旋转干衣机盖移动到关闭位置。用于感测旋转干燥器盖的位置的系统包括被配置为感测气缸的第一操作和第二操作的气缸传感器。盖传感器构造成感测旋转干燥器盖的位置。逻辑电路被配置为当气缸传感器检测到气缸的第一操作并且盖传感器感测到旋转干衣机盖处于打开位置时，输出指示旋转干衣机盖处于打开位置的盖打开信号。

25. 发明申请

US20020108567A1 Assembly station for sputter shield assembly 失效
标题翻译：溅射屏蔽组件装配站
公开(公告)号：US20020108567A1
公开(公告)日：2002-08-15
申请号：US10006224
申请日：2001-12-10
申请人： Mosel Vitelic Inc.
发明人： Wen-Ken Hu , Hsiao-Ping Hsieh , Zhi-Zhao Tai , Mark Wang
IPC分类号： B05C011/11
CPC分类号： H01J37/3447 , C23C14/34 , C23C14/564 , Y10T29/53 , Y10T29/53961
摘要： An assembly station for a sputter shield assembly provides a work bench for assembling and disassembling the sputter shield assembly. The shield assembly has a clamp shield facing downwards to hold the shield assembly which is turned over by 180 degrees, and includes at least three bottom rim support arms for supporting the clamp shield and bearing the weight of the shield assembly, and at least three inner rim retaining arms for contacting the inner rim formed by the shield and the clamp shield. The invention provides a changed support means for holding the shield assembly on the assembly station so that one person is enough to do the assembly and disassembly of the shield assembly, and thus save manpower and operation time.
摘要翻译：用于溅射屏蔽组件的装配站提供用于组装和拆卸溅射屏蔽组件的工作台。屏蔽组件具有面向下的夹持屏蔽件，以将屏蔽组件保持180度，并且包括至少三个底部边缘支撑臂，用于支撑夹具屏蔽并承载屏蔽组件的重量，并且至少三个内部用于接触由护罩和夹具护罩形成的内缘的轮辋保持臂。本发明提供了一种用于将屏蔽组件保持在组装工位上的改变的支撑装置，使得一个人足以进行屏蔽组件的组装和拆卸，从而节省人力和操作时间。

26. 发明申请

US20020084391A1 Heating lamp brackets for reaction chambers of evaporation coating machines 有权
标题翻译：蒸发涂布机反应室加热灯支架
公开(公告)号：US20020084391A1
公开(公告)日：2002-07-04
申请号：US10029930
申请日：2001-12-31
申请人： Mosel Vitelic Inc.
发明人： Hung-Lin Ke , Hua-Jen Tseng , Chun-Chieh Lee , Muh-Lang Jang
IPC分类号： F16M011/00 , F21V007/20 , E04G005/06
CPC分类号： H05B3/0033
摘要： A heating lamp bracket for reaction chambers of evaporation coating machines uses paired and insulation means to mount a plurality of heating lamps to a chamber wall of a reaction chamber. The bracket includes a mounting frame that has an insulation outer surface and a mounting outer face opposing to the insulation outer surface. The insulation outer surface has at least one insulation member located thereon for fastening the mounting frame to the chamber wall. The mounting outer surface has at least two independent mounting spots for connecting respectively a connection end of the corresponding heating lamp. The independent mounting spots and non-encased type insulation members of the present invention can effectively resolve the problems of difficult replacement of the heating lamps and defective insulation that happens to the conventional heating lamp brackets.
摘要翻译：用于蒸发涂布机的反应室的加热灯支架使用配对和绝缘装置将多个加热灯安装到反应室的室壁。支架包括具有绝缘外表面和与绝缘外表面相对的安装外表面的安装框架。绝缘外表面具有位于其上的至少一个绝缘构件，用于将安装框架紧固到室壁。安装外表面具有至少两个独立的安装点，用于分别连接相应加热灯的连接端。本发明的独立安装点和非封装型绝缘构件可以有效地解决常规加热灯托架发生的加热灯难以更换和绝缘不良的问题。

27. 发明申请

US20020079414A1 Structure of supporting frame for heater lamp in e-beam evaporator 审中-公开
标题翻译：电子束蒸发器中加热灯支架的结构
公开(公告)号：US20020079414A1
公开(公告)日：2002-06-27
申请号：US10014596
申请日：2001-12-14
申请人： Mosel Vitelic Inc.
发明人： Hua-Jen Tseng , Chun-Chieh Lee , Kung-Wei Cheng , Hung-Lin Ke
IPC分类号： A47K001/00 , F16L003/08 , E04G005/06
CPC分类号： H01L21/67115 , B01D1/0029 , C23C14/541 , F21V21/22 , H05B3/0047
摘要： A structure of supporting frame for heater lamp in evaporator is disclosed. The supporting frame contains a lower supporting frame and an upper supporting female, respectively, by means of a non-circle section on the male portion and a complementary section on the female portion to conjoin together and to restrain them to rotate. Consequently, the proposed supporting frame provides directly locating during the female joint step of male portion and female portion. The time consuming steps for e-beam evaporator maintain are thus omitted.
摘要翻译：公开了一种用于蒸发器中加热灯支撑框架的结构。支撑框架分别通过阳部分上的非圆形部分和阴部分上的互补部分共同组合并且限制它们旋转，分别包括下支撑框架和上支撑阴件。因此，所提出的支撑框架在男性部分和女性部分的女性接合步骤期间提供直接定位。因此省略了电子束蒸发器维护的耗时步骤。

28. 发明申请

US20020022314A1 Dummy structures that protect circuit elements during polishing 有权
公开(公告)号：US20020022314A1
公开(公告)日：2002-02-21
申请号：US09846123
申请日：2001-04-30
申请人： Mosel Vitelic, Inc.
发明人： Hsing Ti Tuan , Chung Wai Leung
IPC分类号： H01L021/8242 , H01L021/20 , H01L021/461 , H01L023/58
CPC分类号： H01L27/11526 , H01L21/31053 , H01L21/823462 , H01L27/105 , H01L27/115 , H01L27/11546 , Y10S438/926
摘要： Circuit elements (e.g. transistor gates) formed over a semiconductor substrate are protected by adjacent dummy structures during mechanical or chemical mechanical polishing of an overlying dielectric.

29. 发明授权

US06165843A Covered slit isolation between integrated circuit devices 失效
标题翻译：集成电路器件之间的覆盖狭缝隔离
公开(公告)号：US06165843A
公开(公告)日：2000-12-26
申请号：US48832
申请日：1998-03-20
申请人： Kuo-Tung Sung
发明人： Kuo-Tung Sung
IPC分类号： H01L21/762 , H01L29/423 , H01L21/8247
CPC分类号： H01L29/42324 , H01L21/76224
摘要： A capped slit provides isolation between adjacent devices of an integrated circuit. The cap and slit provide very high immunity to punchthrough and protect the edge of the slit against becoming exposed during subsequent processing that could otherwise remove field oxide. In one embodiment, the capped slit isolates two cells of a flash EEPROM device, and the field oxide lines the slit and serves as the tunneling oxide in the cells. In another embodiment, the slit is filled with a plug of dielectric material.
摘要翻译：封闭狭缝提供集成电路的相邻器件之间的隔离。盖和狭缝提供非常高的穿透免疫力并保护狭缝的边缘，以防止在后续处理期间暴露，否则可以去除场氧化物。在一个实施例中，封盖狭缝隔离闪存EEPROM器件的两个单元，并且场氧化物对狭缝进行管线，并且用作单元中的隧道氧化物。在另一个实施例中，狭缝填充有电介质材料塞。

30. 发明授权

US6133155A Method for preventing corrosion of a metallic layer of a semiconductor chip 有权
标题翻译：防止半导体芯片的金属层腐蚀的方法
公开(公告)号：US6133155A
公开(公告)日：2000-10-17
申请号：US198308
申请日：1998-11-23
申请人： Lin Tsai-Sen , Chou-Shin Jou , Tings Wang , Chin-Kang Li
发明人： Lin Tsai-Sen , Chou-Shin Jou , Tings Wang , Chin-Kang Li
IPC分类号： G03F7/42 , H01L21/02 , H01L21/3213 , H01L21/3065
CPC分类号： H01L21/02071 , G03F7/42 , G03F7/427
摘要： The present invention provides a method for preventing corrosion of an aluminum-containing metallic layer having a plurality of trenches on the surface of a semiconductor chip caused by chlorine atoms residing on side walls of the trenches of the metallic layer after a trench etching process. The method comprises the following steps: (1) removing the photo resistance layer on top of the metallic layer by ashing at temperatures between 178.degree. C. and 200.degree. C. after a trench etching process, (2) using an acidic solution comprising hydroxylamine (NH.sub.2 OH), hydroquinone C.sub.6 H.sub.4 (OH).sub.2, monoethanolanine (HOCH.sub.2 CH.sub.2 NH.sub.2) and water to wash off residues on the surface of the semiconductor chip, and (3) heating the semiconductor chip for a predetermined time period at temperatures between 200.degree. C. and 250.degree. C. so as to completely dissipate the chlorine atoms resided on the side walls of the metallic layer for preventing recurrent corrosion of an aluminum-containing metallic layer.
摘要翻译：本发明提供了一种在沟槽蚀刻工艺之后，由位于金属层的沟槽的侧壁上的氯原子引起的在半导体芯片的表面上具有多个沟槽的含铝金属层的腐蚀的方法。该方法包括以下步骤：（1）在沟槽蚀刻工艺之后，在178℃至200℃之间的温度下，通过灰化除去金属层顶部的光电层，（2）使用包含羟胺的酸性溶液（NH 2 OH），氢醌C 6 H 4（OH）2，单乙醇化（HOCH 2 CH 2 NH 2）和水，以清洗半导体芯片表面上的残留物，和（3）在200℃至200℃的温度下加热半导体芯片预定时间 250℃，以便完全消散存在于金属层的侧壁上的氯原子，以防止含铝金属层的反复腐蚀。

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