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    • 12. 发明授权
    • Method of unidirectionally aligning whiskers during tape casting
    • 在铸造过程中单方向调整晶须的方法
    • US5993715A
    • 1999-11-30
    • US868838
    • 1997-06-09
    • Dong-Soo Park
    • Dong-Soo Park
    • B28B1/52C04B35/593C04B35/622C04B35/80B28B1/14C04B35/81
    • B28B1/52C04B35/5935C04B35/62218C04B35/806
    • A method of unidirectionally aligning the whiskers during tape casting and a sintered silicon nitride laminate of controlled properties and microstructure through alignment of the reinforcing grains fabricated by using the method are disclosed. The whiskers are unidirectionally oriented by placing a row of guides 0.2-0.5 mm apart from each other at exit of the reservoir of the slip containing the whiskers during tape casting. The silicon nitride comprising 10-30 volume % of elongated large grains growing from the .beta.-Si.sub.3 N.sub.4 whiskers and oriented unidirectionally in the fine grained matrix is fully densified by gas pressure sintering at 1900.degree. C. It exhibits a fracture toughness value as high as 9.24 Mpa m normal to the whisker alignment according to the Evans-Charles' method disclosed in the Journal of the American Ceramic Society, 59 [7-8], 371-372 (1976).
    • 公开了一种通过使用该方法制造的增强晶粒的对准来控制带铸期间的晶须和控制性能和微结构的烧结氮化硅层压体的方法。 在晶圆铸造期间,通过在包含晶须的滑块的储存器的出口处彼此排列一排彼此相距0.2-0.5mm的导向器将晶须单向取向。 包含10-30体积%的从β-SiN3N4晶须生长并在细粒基体中单向取向的细长大晶粒的氮化硅通过在1900℃下的气体压力烧结而完全致密化。其断裂韧性值高达9.24 根据“美国陶瓷学会杂志”59 [7-8],371-372(1976)中公开的Evans-Charles'方法,晶须对准中的Mpa + E,rad m + EE。
    • 13. 发明授权
    • Silicon nitride ceramic sliding material and process for producing the
same
    • 氮化硅陶瓷滑动材料及其制造方法
    • US5922629A
    • 1999-07-13
    • US847746
    • 1997-04-22
    • Jin-Joo ParkYasushi MochidaAkira KuibiraOsamu KomuraAkira Yamaguchi
    • Jin-Joo ParkYasushi MochidaAkira KuibiraOsamu KomuraAkira Yamaguchi
    • F16C33/24C04B35/584C04B35/593C04B35/64C04B38/00C10M103/06C04B35/587
    • C04B35/5935C04B35/584C04B38/0051C04B2111/00353
    • A silicon nitride ceramic sliding material comprising silicon nitride crystal grains and a grain boundary phase and having a porosity of 2 to 10% and a maximum pore size of 20 to 100 .mu.m. The silicon nitride ceramic sliding material preferably has a textural structure wherein the proportion of the total area of silicon nitride crystal grains of 0.1 to 10 .mu.m.sup.2 in area to the total area of all the silicon nitride crystal grains present in an arbitrary two-dimensional cross section is 30 to 90% and the proportion of the number of silicon nitride crystal grains of 2 to 10 in aspect ratio to the number of all the silicon nitride crystal grains present in that cross section is at least 20%. The material is produced by mixing a silicon nitride powder with a sintering aid powder, molding the resulting mixture, then heat-treating the resulting molded body in a nitrogen-containing atmosphere under reduced pressure at 1,000 to 1,500.degree. C., and then sintering it in a nonoxidizing atmosphere under ordinary pressure or under pressure, at 1,550 to 1,800.degree. C.
    • 一种氮化硅陶瓷滑动材料,其包含氮化硅晶粒和晶界相,并且具有2至10%的孔隙率和20至100μm的最大孔径。 氮化硅陶瓷滑动材料优选具有纹理结构,其中氮化硅晶粒的总面积与面积中的所有氮化硅晶粒的总面积的相对于任意二维十字形中的全部氮化硅晶粒的面积为0.1-10μm 截面积为30〜90%,氮化硅晶粒数的比例为纵横比为2〜10的比例与存在于该截面中的全部氮化硅晶粒的数量的比例为20%以上。 通过将氮化硅粉末与烧结助剂粉末混合,将所得混合物成型,然后在含氮气氛中,在减压下在1000〜1500℃下对所得成形体进行热处理,然后烧结 在常压或压力下的非氧化性气氛中,在1550〜1800℃。
    • 15. 发明授权
    • Method of producing silicon nitride ceramics having thermal high
conductivity
    • 具有导热性高的氮化硅陶瓷的制造方法
    • US5902542A
    • 1999-05-11
    • US766317
    • 1996-12-13
    • Kiyoshi HiraoKoji WatariMotohiro ToriyamaSyuzo KanzakiMasaaki Obata
    • Kiyoshi HiraoKoji WatariMotohiro ToriyamaSyuzo KanzakiMasaaki Obata
    • C04B35/584C04B35/593C04B35/638C04B35/64C04B35/645
    • C04B35/5935
    • The present invention provides silicon nitride ceramics having high thermal conductivity and a method for production thereof. This invention relates to a method for producing a silicon nitride sintered body having a microstructure with silicon nitride crystals oriented uniaxially and exhibiting high thermal conductivity of 100 to 150 W/mK in the direction parallel to the orientation direction of the crystals, which comprises of preparing a slurry by mixing a mixed powder of a sintering auxiliary, beta-silicon nitride single crystals as seed crystals and a silicon nitride raw powder with a dispersing medium, forming the slurry by tape casting or extrusion forming, calcining the formed silicon nitride body with beta-silicon nitride single crystals oriented parallel to the casting plane to remove the organic components, densifying it by hot pressing and the like if required, and further annealing it at 1700 to 2000.degree. C. under the nitrogen pressure of 1 to 100 atmospheres.
    • 本发明提供了具有高导热性的氮化硅陶瓷及其制造方法。 本发明涉及一种具有氮化硅结构的氮化硅烧结体的制造方法,该氮化硅烧结体具有在与晶体取向方向平行的方向上单轴取向并具有100〜150W / mK的高导热率的微结构, 通过将烧结助剂,β-氮化硅单晶的混合粉末作为晶种和氮化硅原料粉末与分散介质混合来形成浆料,通过带状流延或挤出成型形成浆料,用β - 氮化硅单晶,其平行于铸造平面取向以去除有机组分,如果需要,通过热压等来致密化,并且在1〜100个大气压的氮气压力下,在1700〜2000℃进一步退火。
    • 20. 发明授权
    • High-strength, high-toughness silicon nitride sinter
    • 高强度高韧性氮化硅烧结体
    • US5705449A
    • 1998-01-06
    • US761206
    • 1996-12-06
    • Kiyoshi HiraoManuel E. BritoShuzo Kanzaki
    • Kiyoshi HiraoManuel E. BritoShuzo Kanzaki
    • C30B1/02C04B35/584C04B35/593C04B35/626C30B29/62C04B35/587
    • C04B35/5935
    • A method for the production of a high-strength high-toughness silicon nitride sinter includes the steps of mixing a silicon nitride powder with a sintering additive, adding to the resultant mixture as seed particles 0.1 to 10% by volume, based on the amount of the mixture, of elongated single crystal .beta.-silicon nitride particles having a larger minor diameter than the average particle diameter of the silicon nitride powder and having an aspect ratio of at least 2, forming the resultant mixture so as to orient the elongated single crystal .beta.-silicon nitride particles as seed particles in a specific direction, and heating the green body to density it and simultaneously induce epitaxial growth of single crystal .beta.-silicon nitride particles, and a high-strength, high-toughness silicon nitride sinter obtained by the method.
    • 制造高强度高韧性氮化硅烧结体的方法包括以下步骤:将氮化硅粉末与烧结添加剂混合,将所得混合物作为0.1〜10体积%的种子颗粒,以 该混合物具有比氮化硅粉末的平均粒径小的直径比至少为2的长径比的细长的单晶β-氮化硅颗粒,形成所得混合物以便使细长单晶β - 氮化硅颗粒作为特定方向的种子颗粒,并且加热生坯以使其密度并同时诱导单晶β-氮化硅颗粒的外延生长,以及通过该方法获得的高强度,高韧性氮化硅烧结体 。