专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US06717722B2 Catadioptric optical system and exposure apparatus having the same 失效
标题翻译：反折射光学系统和具有该反射光学系统的曝光装置
公开(公告)号：US06717722B2
公开(公告)日：2004-04-06
申请号：US10079964
申请日：2002-02-20
申请人： David R. Shafer , Helmut Beierl , Gerhard Fürter , Karl-Heinz Schuster , Wilhelm Ulrich
发明人： David R. Shafer , Helmut Beierl , Gerhard Fürter , Karl-Heinz Schuster , Wilhelm Ulrich
IPC分类号： G02B1314
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.
摘要翻译：投影曝光透镜系统具有物体侧反射折射系统，中间像和折射透镜系统。折射透镜系统从其中间像侧并且在其图像平面的方向上具有正屈光力的第一透镜组，负折光力的第二透镜组，正折光力的第三透镜组，第四透镜组负折射光焦度和正屈光力的第五透镜组。

12. 发明授权

US06646718B2 Projection objective having adjacently mounted aspheric lens surfaces 有权
公开(公告)号：US06646718B2
公开(公告)日：2003-11-11
申请号：US10177580
申请日：2002-06-24
申请人： Karl-Heinz Schuster , David R. Shafer , Wilhelm Ulrich , Helmut Beierl , Wolfgang Singer
发明人： Karl-Heinz Schuster , David R. Shafer , Wilhelm Ulrich , Helmut Beierl , Wolfgang Singer
IPC分类号： G03B2754
CPC分类号： G02B17/0892 , G02B3/14 , G02B13/143 , G02B13/18 , G02B17/08 , G03F7/70225 , G03F7/70241 , G03F7/70883 , G03F7/70933
摘要： A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0′) which is greater than the maximum lens diameter (D2) of the objective.

13. 发明授权

US06496306B1 Catadioptric optical system and exposure apparatus having the same 有权
公开(公告)号：US06496306B1
公开(公告)日：2002-12-17
申请号：US09364382
申请日：1999-07-29
申请人： David R. Shafer , Helmut Beierl , Gerhard Fürter , Karl-Heinz Schuster , Wilhelm Ulrich
发明人： David R. Shafer , Helmut Beierl , Gerhard Fürter , Karl-Heinz Schuster , Wilhelm Ulrich
IPC分类号： G02B1314
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

14. 发明授权

US07046459B1 Catadioptric reductions lens 失效
标题翻译：反射折射减少镜片
公开(公告)号：US07046459B1
公开(公告)日：2006-05-16
申请号：US10869943
申请日：2004-06-18
申请人： David R. Shafer , Alexander Epple
发明人： David R. Shafer , Alexander Epple
IPC分类号： G02B17/00
CPC分类号： G02B17/08 , G02B17/0892
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane while creating a real intermediate image, having a catadioptric first lens section having a concave mirror and a beam-deflection device, as well as a dioptric second lens section that follows the catadioptric lens section, between its object plane and image plane. The beam-deflection device deflects radiation coming from the object plane to the concave mirror. Positive refractive power is arranged following the first reflective surface, between the latter and the concave mirror, within an optical near-field of the object plane, within which the height of the principal ray of the outermost field point of radiation coming from the object exceeds the marginal-ray height. The intermediate image is arranged prior to light which forms the intermediate image being reflected by a second reflective surface that is provided for the purpose of allowing arranging the object plane and image plane such that they will be parallel to one another.
摘要翻译：一种反射折射投影透镜，用于对构成物体平面的图案进行成像，同时产生具有凹面镜和光束偏转装置的反射折射式第一透镜部分的真实中间图像以及跟随反射折射透镜的屈光度第二透镜部分在物体平面和图像平面之间。光束偏转装置将来自物体平面的辐射偏转到凹面镜。在物平面的光学近场内，在第一反射表面之间，后者和凹面镜之间布置正屈光力，其中来自物体的最外面的辐射场点的主光线的高度超过边缘射线高度。中间图像被布置在光之前，其形成由被设置用于允许布置物平面和图像平面以使得它们彼此平行的目的而被第二反射表面反射的中间图像。

15. 发明授权

US07859748B2 Microlithographic reduction projection catadioptric objective 有权
标题翻译：微光刻折射反射折射目标
公开(公告)号：US07859748B2
公开(公告)日：2010-12-28
申请号：US11686157
申请日：2007-03-14
申请人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译：光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。第二光学组具有用于提供图像缩小的负总体放大倍率。第一光学组为第二光学组提供补偿像差校正。目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。

16. 发明授权

US07450312B2 Optical projection lens system 失效
标题翻译：光学投影镜头系统
公开(公告)号：US07450312B2
公开(公告)日：2008-11-11
申请号：US11175092
申请日：2005-07-05
申请人： David R. Shafer , Wilhelm Ulrich
发明人： David R. Shafer , Wilhelm Ulrich
IPC分类号： G02B3/00
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography includes in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group. At least one lens of the projection lens system which is arranged in front of the waist includes an aspherical surface.
摘要翻译：用于微光刻的光学投影透镜系统包括传播辐射的方向：具有正屈光力的第一透镜组，具有负屈光力的第二透镜组和具有最小传播辐射直径的腰部（缩小部分），以及另外具有正屈光力的透镜装置，其跟随第二透镜组。布置在腰部前方的投影透镜系统的至少一个透镜包括非球面。

17. 发明授权

US06930837B2 Optical projection lens system 失效
标题翻译：光学投影镜头系统
公开(公告)号：US06930837B2
公开(公告)日：2005-08-16
申请号：US10833840
申请日：2004-04-27
申请人： David R. Shafer , Wilhelm Ulrich
发明人： David R. Shafer , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B9/00 , G02B13/14 , G02B13/18 , G02B13/24 , G03F7/20 , H01L21/027
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.
摘要翻译：一种用于微光刻的光学投影透镜系统，包括在传播辐射的方向上：具有正折光力的第一透镜组，具有负屈光力的第二透镜组，并且包括具有最小传播辐射直径的腰部（缩小部分），以及具有正屈光力的另外的透镜装置，其跟随第二透镜组，其中布置在腰部前方的投影透镜系统的至少一个透镜包括非球面。

18. 发明授权

US06791761B2 Optical projection lens system 失效
公开(公告)号：US06791761B2
公开(公告)日：2004-09-14
申请号：US10393593
申请日：2003-03-20
申请人： David R. Shafer , Wilhelm Ulrich
发明人： David R. Shafer , Wilhelm Ulrich
IPC分类号： G02B300
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography comprising in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group, wherein at least one lens of the projection lens system which is arranged in front of the waist comprises an aspherical surface.

19. 发明授权

US06636350B2 Microlithographic reduction projection catadioptric objective 失效
标题翻译：微光刻折射反射折射目标
公开(公告)号：US06636350B2
公开(公告)日：2003-10-21
申请号：US09761562
申请日：2001-01-16
申请人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译：光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。第二光学组具有用于提供图像缩小的负总体放大倍率。第一光学组为第二光学组提供补偿像差校正。目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。

20. 发明授权

US07218445B2 Microlithographic reduction projection catadioptric objective 失效
标题翻译：微光刻折射反射折射目标
公开(公告)号：US07218445B2
公开(公告)日：2007-05-15
申请号：US10438153
申请日：2003-05-13
申请人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译：光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。第二光学组具有用于提供图像缩小的负总体放大倍率。第一光学组为第二光学组提供补偿像差校正。目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式