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11. 发明申请

US20100099036A1 Pattern forming method and method of manufacturing semiconductor device 审中-公开
标题翻译：图案形成方法和制造半导体器件的方法
公开(公告)号：US20100099036A1
公开(公告)日：2010-04-22
申请号：US12654295
申请日：2009-12-16
申请人： Daisuke Kawamura , Shinichi Ito
发明人： Daisuke Kawamura , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/11 , G03F7/70341 , G03F7/7065 , G03F7/70958 , Y10S430/162
摘要： A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.
摘要翻译：图案形成方法包括在基板上形成抗蚀剂膜，在抗蚀剂膜上形成覆盖膜的涂布溶液涂布抗蚀膜，在抗蚀剂膜上形成覆盖膜，通过浸渍将图案转印到抗蚀剂膜上使用液浸液体在抗蚀剂膜上形成潜像的光刻方法，在形成潜像后去除覆盖膜，进行第一次检查以检查覆盖膜在形成潜像之间是否存在缺陷并且在所述第一检查中发现所述缺陷时，移除所述覆盖膜，执行预定处理，以及在除去所述覆盖膜之后，在所述基板上显影所述抗蚀剂膜以形成抗蚀剂图案。

12. 发明授权

US07687227B2 Resist pattern forming method and manufacturing method of semiconductor device 失效
标题翻译：半导体器件的抗蚀图案形成方法和制造方法
公开(公告)号：US07687227B2
公开(公告)日：2010-03-30
申请号：US11316898
申请日：2005-12-27
申请人： Eishi Shiobara , Daisuke Kawamura , Yasunobu Onishi , Shinichi Ito
发明人： Eishi Shiobara , Daisuke Kawamura , Yasunobu Onishi , Shinichi Ito
IPC分类号： G03F7/26
CPC分类号： G03F7/11 , G03F7/2041
摘要： According to an aspect of the invention, there is provided a resist pattern forming method of forming a resist pattern by immersion exposure, comprising forming a resist film on a substrate to be treated, a contact angle between the resist film and an immersion liquid being a first angle, forming a first cover film on the resist film, a contact angle between the first cover film and the immersion liquid being a second angle which is larger than the first angle, forming a second cover film on the first cover film, a contact angle between the second cover film and the immersion liquid being a third angle which is smaller than the second angle, and forming a latent image on the resist film by the immersion exposure.
摘要翻译：根据本发明的一个方面，提供了一种通过浸渍曝光形成抗蚀剂图案的抗蚀剂图案形成方法，包括在待处理的基底上形成抗蚀剂膜，所述抗蚀剂膜和浸渍液体之间的接触角为第一角度，在抗蚀剂膜上形成第一覆盖膜，第一覆盖膜和浸渍液体之间的接触角是大于第一角度的第二角度，在第一覆盖膜上形成第二覆盖膜，接触第二覆盖膜和浸液之间的角度是比第二角度小的第三角度，并且通过浸渍曝光在抗蚀剂膜上形成潜像。

13. 发明授权

US07662546B2 Apparatus for processing substrate and method of processing the same 失效
标题翻译：基板处理装置及其处理方法
公开(公告)号：US07662546B2
公开(公告)日：2010-02-16
申请号：US11304549
申请日：2005-12-16
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： H05B3/68
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.
摘要翻译：用涂膜处理的基板的加热装置具有内部空间的室，在内部空间中加热被处理基板的加热板和分隔构件。加热板具有支撑表面，该支撑表面支撑在腔室内待处理的基底。分隔构件布置在腔室中以面向支撑表面。分隔构件将内部空间分隔成第一和第二空间，并且具有允许第一和第二空间彼此连通的多个孔。加热板的支撑表面设置在第一空间中。形成空气流的气流形成机构设置在第二空间中。该机理将从光致抗蚀剂膜蒸发的物质排出。

14. 发明申请

US20080287067A1 SYSTEM FOR CONTROLLING WIRELESS COMMUNICATION BETWEEN PORTABLE DEVICE AND COMMUNICATION CONTROLLER 有权
标题翻译：用于控制便携式设备和通信控制器之间无线通信的系统
公开(公告)号：US20080287067A1
公开(公告)日：2008-11-20
申请号：US12061277
申请日：2008-04-02
申请人： Daisuke Kawamura , Yoshiyuki Mizuno , Hidenobu Hanaki , Hiroaki Iwashita
发明人： Daisuke Kawamura , Yoshiyuki Mizuno , Hidenobu Hanaki , Hiroaki Iwashita
IPC分类号： H04B1/00
CPC分类号： G07C9/00309 , B60R25/24 , G07C2009/00373 , G07C2009/00793 , G07C2209/61
摘要： A portable device for preventing communication errors caused by disturbance such as noise. The portable device receives a first request signal from a communication controller and transmits a first response signal corresponding to the first request signal. A transmitter transmits the first response signal with a selected one of a plurality of frequencies. A transmission control unit transmits the first response signal from the transmitter with the one of the plurality of frequencies. The portable device further receives a second request signal from the communication control unit, which receives the first response signal. When the second request signal cannot be received, the portable device retransmits the first response signal from the transmitter with a frequency that differs from the one of the plurality of frequencies.
摘要翻译：一种便携式设备，用于防止诸如噪声等干扰引起的通信错误。便携式设备从通信控制器接收第一请求信号并发送与第一请求信号对应的第一响应信号。发射机以多个频率中选择的一个发射第一响应信号。发送控制单元利用多个频率中的一个发送来自发送机的第一响应信号。便携式设备还从通信控制单元接收第一请求信号，该第一请求信号接收第一响应信号。当第二请求信号不能被接收时，便携式设备以与多个频率中的一个频率不同的频率从发射机重发第一响应信号。

15. 发明申请

US20070128554A1 Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus 失效
标题翻译：形成抗蚀剂图案的半导体器件制造方法以及基板处理装置
公开(公告)号：US20070128554A1
公开(公告)日：2007-06-07
申请号：US11600198
申请日：2006-11-16
申请人： Daisuke Kawamura , Eishi Shiobara , Tomoyuki Takeishi , Kei Hayasaki , Yasunobu Onishi , Shinichi Ito , Tatsuhiko Higashiki
发明人： Daisuke Kawamura , Eishi Shiobara , Tomoyuki Takeishi , Kei Hayasaki , Yasunobu Onishi , Shinichi Ito , Tatsuhiko Higashiki
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341
摘要： This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
摘要翻译：本发明公开了一种通过浸渍曝光在待处理衬底上形成抗蚀剂图案的方法。在被处理基板的上表面的中央部，在上表面的斜面部分上形成抗蚀剂膜，该斜面部分是通过倒角被处理基板的周边部分而得到的，待处理衬底的端部。在抗蚀剂膜和曝光装置的投影光学系统的构成元素之间存在折射率高于空气的液体的情况下，在抗蚀剂膜上形成期望图案的潜像的图案曝光，其为最接近被处理衬底。在执行图案曝光之后，通过向被处理基板的端部供给冲洗液，除去形成在被处理基板的端部的抗蚀剂膜。

16. 发明申请

US20060263726A1 Pattern forming method and method of manufacturing semiconductor device 失效
标题翻译：图案形成方法和制造半导体器件的方法
公开(公告)号：US20060263726A1
公开(公告)日：2006-11-23
申请号：US11431823
申请日：2006-05-11
申请人： Shinichi Ito , Kentaro Matsunaga , Daisuke Kawamura , Yasunobu Onishi
发明人： Shinichi Ito , Kentaro Matsunaga , Daisuke Kawamura , Yasunobu Onishi
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/11 , Y10S430/162
摘要： A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.
摘要翻译：图案形成方法包括在被处理膜上形成光致抗蚀剂膜，通过涂布法在光致抗蚀剂膜上形成用于保护光致抗蚀剂膜的浸渍液的保护膜，选择性地进行部分浸渍曝光通过浸渍液将该光致抗蚀剂膜，浸渍液体供给到光致抗蚀剂膜上，在形成保护膜之后，在进行浸渍曝光前，选择性地除去包含浸渍液的残留物质的残留物质，通过选择性地去除光致抗蚀剂膜的曝光区域或未曝光区域，去除保护膜，以及形成包括光致抗蚀剂膜的图案。

17. 发明申请

US20060177777A1 Pattern forming method and method of manufacturing semiconductor device 失效
标题翻译：图案形成方法和制造半导体器件的方法
公开(公告)号：US20060177777A1
公开(公告)日：2006-08-10
申请号：US11350080
申请日：2006-02-09
申请人： Daisuke Kawamura , Shinichi Ito
发明人： Daisuke Kawamura , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/11 , G03F7/70341 , G03F7/7065 , G03F7/70958 , Y10S430/162
摘要： A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a latent image on the resist film, removing the cover film after the formation of the latent image, conducting a first inspection to inspect whether or not the cover film has a defect between said forming the latent image and said removing the cover film, performing predetermined processing when the defect is found in the first inspection, and developing the resist film to form a resist pattern on the substrate after said removing the cover film.
摘要翻译：图案形成方法包括在基板上形成抗蚀剂膜，在抗蚀剂膜上形成覆盖膜的涂布溶液涂布抗蚀膜，在抗蚀剂膜上形成覆盖膜，通过浸渍将图案转印到抗蚀剂膜上使用液浸液体在抗蚀剂膜上形成潜像的光刻方法，在形成潜像后去除覆盖膜，进行第一次检查以检查覆盖膜在形成潜像之间是否存在缺陷并且在所述第一检查中发现所述缺陷时，移除所述覆盖膜，执行预定处理，以及在除去所述覆盖膜之后，在所述基板上显影所述抗蚀剂膜以形成抗蚀剂图案。

18. 发明申请

US20050183056A1 Simulator of lithography tool, simulation method, and computer program product for simulator 失效
标题翻译：光刻工具的模拟器，模拟方法，以及模拟器的计算机程序产品
公开(公告)号：US20050183056A1
公开(公告)日：2005-08-18
申请号：US11045296
申请日：2005-01-31
申请人： Shoji Mimotogi , Daisuke Kawamura , Akiko Yamada
发明人： Shoji Mimotogi , Daisuke Kawamura , Akiko Yamada
IPC分类号： G03F7/20 , G03C5/00 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G06F17/5009 , G03F7/70625
摘要： A simulator of a lithography tool includes a correcting parameter memory storing a correcting scaling value to correct a focus error of a projection optical system in the lithography tool and a correcting bias to correct a critical dimension error gene rated in the lithography tool. A model simulation engine simulates an image formation under a corrected focus calculated by multiplying a defocus of the projection optical system by the correcting scaling value to model a calculated critical dimension of an image. A bias corrector adds the correcting bias to the calculated critical dimension to correct the image.
摘要翻译：光刻工具的模拟器包括校正参数存储器，其存储校正缩放值以校正光刻工具中的投影光学系统的聚焦误差，以及校正偏差以校正光刻工具中评估的关键尺寸误差基因。模型仿真引擎模拟在通过将投影光学系统的散焦乘以校正缩放值计算的校正焦点下的图像形成，以对图像的计算临界尺寸进行建模。偏置校正器将校正偏差添加到计算的临界尺寸以校正图像。

19. 发明申请

US20050179518A1 Security control system for managing registration of ID codes for portable devices 有权
标题翻译：用于管理便携式设备的ID代码注册的安全控制系统
公开(公告)号：US20050179518A1
公开(公告)日：2005-08-18
申请号：US11058831
申请日：2005-02-16
申请人： Daisuke Kawamura , Kiyokazu Ohtaki , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
发明人： Daisuke Kawamura , Kiyokazu Ohtaki , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
IPC分类号： E05B49/00 , B60R25/01 , B60R25/04 , B60R25/102 , B60R25/23 , B60R25/24 , G07C9/00 , H04B1/00
CPC分类号： G07C9/00309 , B60R25/04 , B60R25/2036 , B60R25/24 , B60R2325/205 , G07C9/00103 , G07C9/00571
摘要： A security control system for improving security. The security control system includes a portable device, having a communication function and a portable device ID code. A security controller includes a memory for recording a controller ID code. The security controller communicates with the portable device and determines whether the portable device ID code matches the controller ID code. In accordance with the determination, the security controller selectively deactivates the security functions of a door lock driver and an engine controller. The security controller records and registers the portable device ID code as the controller ID code in the memory and transmits a registration signal containing the portable device ID code. A portable device management apparatus receives the registration signal from the security controller and manages the portable device based on the registration signal.
摘要翻译：一种用于提高安全性的安全控制系统。安全控制系统包括具有通信功能的便携式设备和便携式设备ID代码。安全控制器包括用于记录控制器ID代码的存储器。安全控制器与便携式设备通信，并确定便携式设备ID代码是否与控制器ID代码相匹配。根据该确定，安全控制器选择性地去激活门锁驱动器和发动机控制器的安全功能。安全控制器将便携式设备ID代码记录并登记为存储器中的控制器ID代码，并发送包含便携式设备ID代码的注册信号。便携式设备管理设备从安全控制器接收注册信号，并根据注册信号管理便携式设备。

20. 发明授权

US09524095B2 Display control device, display control method, and program 有权
标题翻译：显示控制装置，显示控制方式和程序
公开(公告)号：US09524095B2
公开(公告)日：2016-12-20
申请号：US14112398
申请日：2012-04-12
申请人： Koichi Akasaka , Daisuke Kawamura , Hiromitsu Oka
发明人： Koichi Akasaka , Daisuke Kawamura , Hiromitsu Oka
IPC分类号： G06F3/048 , G06F3/0488 , G06F3/0482 , G08C17/02
CPC分类号： G06F3/0488 , G06F3/0482 , G06F3/04883 , G08C17/02 , G08C2201/93
摘要： The present technique relates to a display control device, a display control method, and a program that are capable of making inputtable gesture motions easy to notice. A display control unit causes a display unit to display a gesture motion guide in a first state. When a detecting unit for detecting gesture motions detects a predetermined gesture motion, the display control unit changes the guide corresponding to the detected gesture motion to a second state and then causes the display unit to display the guide. The technique according to this disclosure can be applied to an information processing terminal that includes a display unit, for example.
摘要翻译：本技术涉及能够使输入的手势运动容易注意的显示控制装置，显示控制方法和程序。显示控制单元使显示单元在第一状态下显示手势运动指南。当用于检测手势运动的检测单元检测到预定手势运动时，显示控制单元将与检测到的手势运动相对应的指南改变为第二状态，然后使显示单元显示该指南。根据本公开的技术可以应用于例如包括显示单元的信息处理终端。

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